CN100419910C - 存储器 - Google Patents
存储器 Download PDFInfo
- Publication number
- CN100419910C CN100419910C CNB031107990A CN03110799A CN100419910C CN 100419910 C CN100419910 C CN 100419910C CN B031107990 A CNB031107990 A CN B031107990A CN 03110799 A CN03110799 A CN 03110799A CN 100419910 C CN100419910 C CN 100419910C
- Authority
- CN
- China
- Prior art keywords
- mentioned
- storage unit
- data
- selection
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000015654 memory Effects 0.000 title claims abstract description 311
- 230000009471 action Effects 0.000 claims abstract description 82
- 230000008859 change Effects 0.000 claims abstract description 45
- 230000010287 polarization Effects 0.000 claims description 188
- 230000000694 effects Effects 0.000 claims description 34
- 230000005684 electric field Effects 0.000 claims description 22
- 238000006386 neutralization reaction Methods 0.000 claims 3
- 238000000034 method Methods 0.000 abstract description 19
- 239000003990 capacitor Substances 0.000 description 98
- 238000010586 diagram Methods 0.000 description 74
- 230000006866 deterioration Effects 0.000 description 43
- 239000011159 matrix material Substances 0.000 description 37
- 239000004065 semiconductor Substances 0.000 description 19
- 239000000758 substrate Substances 0.000 description 16
- 230000006872 improvement Effects 0.000 description 14
- 230000006378 damage Effects 0.000 description 9
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000010354 integration Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000011017 operating method Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 239000002784 hot electron Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3418—Disturbance prevention or evaluation; Refreshing of disturbed memory data
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/22—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002077430 | 2002-03-20 | ||
| JP200277430 | 2002-03-20 | ||
| JP2002-77430 | 2002-03-20 | ||
| JP2002-136411 | 2002-05-13 | ||
| JP2002136411 | 2002-05-13 | ||
| JP2002136411 | 2002-05-13 | ||
| JP200357179 | 2003-03-04 | ||
| JP2003057179A JP4024166B2 (ja) | 2002-03-20 | 2003-03-04 | 強誘電体メモリ |
| JP2003-57179 | 2003-03-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1452179A CN1452179A (zh) | 2003-10-29 |
| CN100419910C true CN100419910C (zh) | 2008-09-17 |
Family
ID=28046101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031107990A Expired - Fee Related CN100419910C (zh) | 2002-03-20 | 2003-03-20 | 存储器 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US6795351B2 (enExample) |
| JP (1) | JP4024166B2 (enExample) |
| KR (2) | KR100629295B1 (enExample) |
| CN (1) | CN100419910C (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4024166B2 (ja) * | 2002-03-20 | 2007-12-19 | 三洋電機株式会社 | 強誘電体メモリ |
| JP2004220705A (ja) * | 2003-01-15 | 2004-08-05 | Seiko Epson Corp | 強誘電体記憶装置 |
| JP4285082B2 (ja) * | 2003-05-27 | 2009-06-24 | ソニー株式会社 | 記憶装置 |
| JP4024196B2 (ja) * | 2003-09-30 | 2007-12-19 | 三洋電機株式会社 | 強誘電体メモリ |
| JP4639049B2 (ja) * | 2004-01-14 | 2011-02-23 | パトレネラ キャピタル リミテッド, エルエルシー | メモリ |
| NO320149B1 (no) * | 2004-02-13 | 2005-10-31 | Thin Film Electronics Asa | Fremgangsmate for a drive en ferroelektrisk eller elektret minneinnretning |
| US7133304B2 (en) * | 2004-03-22 | 2006-11-07 | Texas Instruments Incorporated | Method and apparatus to reduce storage node disturbance in ferroelectric memory |
| US7652908B2 (en) | 2004-06-23 | 2010-01-26 | Hideaki Miyamoto | Ferroelectric memory having a refresh control circuit capable of recovering residual polarization of unselected memory cells |
| JP4427464B2 (ja) * | 2005-02-02 | 2010-03-10 | シャープ株式会社 | 不揮発性半導体記憶装置及びその動作方法 |
| JP2007123528A (ja) * | 2005-10-27 | 2007-05-17 | Sanyo Electric Co Ltd | メモリ |
| JP4714590B2 (ja) | 2006-01-23 | 2011-06-29 | パトレネラ キャピタル リミテッド, エルエルシー | メモリ |
| JP4718354B2 (ja) * | 2006-03-27 | 2011-07-06 | パトレネラ キャピタル リミテッド, エルエルシー | メモリ |
| JP4375572B2 (ja) * | 2006-10-02 | 2009-12-02 | セイコーエプソン株式会社 | 半導体記憶装置、データ記録装置、半導体記憶装置の制御方法 |
| JP2008153479A (ja) * | 2006-12-19 | 2008-07-03 | Rohm Co Ltd | 強誘電体電界効果トランジスタを備える半導体装置及びこれを用いた半導体集積回路装置 |
| US8743591B2 (en) * | 2011-04-26 | 2014-06-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor memory device and method for driving the same |
| CN106575524B (zh) * | 2014-08-14 | 2020-10-23 | 瑞萨电子株式会社 | 半导体器件 |
| US9613676B1 (en) * | 2016-06-29 | 2017-04-04 | Micron Technology, Inc. | Writing to cross-point non-volatile memory |
| KR102800875B1 (ko) | 2016-11-25 | 2025-04-28 | 삼성전자주식회사 | 리클레임 제어부를 갖는 메모리 콘트롤러 및 그에 따른 동작 제어 방법 |
| US10867653B2 (en) * | 2018-04-20 | 2020-12-15 | Micron Technology, Inc. | Access schemes for protecting stored data in a memory device |
| US10622050B2 (en) | 2018-05-09 | 2020-04-14 | Micron Technology, Inc. | Ferroelectric memory plate power reduction |
| US11915736B2 (en) * | 2021-11-04 | 2024-02-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Ferroelectric memory operation bias and power domains |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5532953A (en) * | 1995-03-29 | 1996-07-02 | Ramtron International Corporation | Ferroelectric memory sensing method using distinct read and write voltages |
| US5541871A (en) * | 1994-01-18 | 1996-07-30 | Rohm Co., Ltd. | Nonvolatile ferroelectric-semiconductor memory |
| JPH1064255A (ja) * | 1996-08-20 | 1998-03-06 | Tokyo Inst Of Technol | 単一トランジスタ型強誘電体メモリへのデータ書込み方法 |
| US6088257A (en) * | 1997-01-13 | 2000-07-11 | Samsung Electronics, Co., Ltd. | Ferroelectric random access memory device and method for operating the same |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0677434A (ja) | 1992-08-27 | 1994-03-18 | Hitachi Ltd | 半導体記憶装置 |
| JPH08218215A (ja) | 1995-02-13 | 1996-08-27 | Midori Anzen Co Ltd | ヘルメットにおける耳紐の固定部 |
| DE69630758T2 (de) * | 1995-09-08 | 2004-05-27 | Fujitsu Ltd., Kawasaki | Ferroelektrischer Speicher und Datenleseverfahren von diesem Speicher |
| JP3327071B2 (ja) | 1995-10-16 | 2002-09-24 | ソニー株式会社 | 強誘電体記憶装置 |
| JPH10162587A (ja) | 1996-11-26 | 1998-06-19 | Hitachi Ltd | 強誘電体メモリ |
| CN1845251B (zh) * | 1997-11-14 | 2010-05-26 | 罗姆股份有限公司 | 半导体存储器及半导体存储器的存取方法 |
| JP3805132B2 (ja) | 1999-03-31 | 2006-08-02 | 株式会社東芝 | マイコン搭載機器のマイコン待機状態時の消費電流削減回路 |
| JP2002353419A (ja) * | 2000-12-27 | 2002-12-06 | Seiko Epson Corp | 強誘電体メモリ装置 |
| JP4552070B2 (ja) | 2001-03-27 | 2010-09-29 | 三菱化学株式会社 | 高吸水性樹脂の製造方法 |
| JP4024166B2 (ja) * | 2002-03-20 | 2007-12-19 | 三洋電機株式会社 | 強誘電体メモリ |
| JP4214708B2 (ja) * | 2002-03-27 | 2009-01-28 | セイコーエプソン株式会社 | 強誘電体記憶装置及びその駆動方法 |
| JP2004178734A (ja) * | 2002-11-28 | 2004-06-24 | Sanyo Electric Co Ltd | メモリ装置 |
| JP2004220705A (ja) * | 2003-01-15 | 2004-08-05 | Seiko Epson Corp | 強誘電体記憶装置 |
| CN1527321B (zh) * | 2003-03-07 | 2011-05-11 | 帕特尼拉资本有限责任公司 | 存储器 |
| JP4639049B2 (ja) * | 2004-01-14 | 2011-02-23 | パトレネラ キャピタル リミテッド, エルエルシー | メモリ |
| US7133304B2 (en) * | 2004-03-22 | 2006-11-07 | Texas Instruments Incorporated | Method and apparatus to reduce storage node disturbance in ferroelectric memory |
-
2003
- 2003-03-04 JP JP2003057179A patent/JP4024166B2/ja not_active Expired - Fee Related
- 2003-03-19 KR KR1020030017086A patent/KR100629295B1/ko not_active Expired - Fee Related
- 2003-03-19 US US10/390,649 patent/US6795351B2/en not_active Expired - Lifetime
- 2003-03-20 CN CNB031107990A patent/CN100419910C/zh not_active Expired - Fee Related
-
2004
- 2004-06-24 US US10/874,168 patent/US7411841B2/en not_active Expired - Lifetime
-
2005
- 2005-05-16 KR KR1020050040560A patent/KR20050052662A/ko not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5541871A (en) * | 1994-01-18 | 1996-07-30 | Rohm Co., Ltd. | Nonvolatile ferroelectric-semiconductor memory |
| US5532953A (en) * | 1995-03-29 | 1996-07-02 | Ramtron International Corporation | Ferroelectric memory sensing method using distinct read and write voltages |
| JPH1064255A (ja) * | 1996-08-20 | 1998-03-06 | Tokyo Inst Of Technol | 単一トランジスタ型強誘電体メモリへのデータ書込み方法 |
| US6088257A (en) * | 1997-01-13 | 2000-07-11 | Samsung Electronics, Co., Ltd. | Ferroelectric random access memory device and method for operating the same |
Also Published As
| Publication number | Publication date |
|---|---|
| US20030179610A1 (en) | 2003-09-25 |
| CN1452179A (zh) | 2003-10-29 |
| KR20030076377A (ko) | 2003-09-26 |
| US20070217279A1 (en) | 2007-09-20 |
| US7411841B2 (en) | 2008-08-12 |
| JP2004047045A (ja) | 2004-02-12 |
| KR100629295B1 (ko) | 2006-09-28 |
| KR20050052662A (ko) | 2005-06-03 |
| US6795351B2 (en) | 2004-09-21 |
| JP4024166B2 (ja) | 2007-12-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: PATE LANNILA FORTUNE CO., LTD. Free format text: FORMER OWNER: SANYO ELECTRIC CO., LTD. Effective date: 20101223 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: OSAKA PREFECTURE, JAPAN TO: DELAWARE, USA |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20101223 Address after: Delaware Patentee after: Patrenella Capital Ltd.,LLC Address before: Osaka Japan Patentee before: Sanyo Electric Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080917 |