ATE426914T1 - Belichtungsgerat und verfahren zur herstellung einer vorrichtung - Google Patents

Belichtungsgerat und verfahren zur herstellung einer vorrichtung

Info

Publication number
ATE426914T1
ATE426914T1 AT04726018T AT04726018T ATE426914T1 AT E426914 T1 ATE426914 T1 AT E426914T1 AT 04726018 T AT04726018 T AT 04726018T AT 04726018 T AT04726018 T AT 04726018T AT E426914 T1 ATE426914 T1 AT E426914T1
Authority
AT
Austria
Prior art keywords
substrate
liquid
optical system
projection optical
exposure apparatus
Prior art date
Application number
AT04726018T
Other languages
German (de)
English (en)
Inventor
Hideaki Hara
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=33156817&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE426914(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE426914T1 publication Critical patent/ATE426914T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
  • Liquid Crystal (AREA)
AT04726018T 2003-04-07 2004-04-06 Belichtungsgerat und verfahren zur herstellung einer vorrichtung ATE426914T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003103145 2003-04-07

Publications (1)

Publication Number Publication Date
ATE426914T1 true ATE426914T1 (de) 2009-04-15

Family

ID=33156817

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04726018T ATE426914T1 (de) 2003-04-07 2004-04-06 Belichtungsgerat und verfahren zur herstellung einer vorrichtung

Country Status (8)

Country Link
US (4) US7480029B2 (enExample)
EP (1) EP1612850B1 (enExample)
JP (2) JP4902201B2 (enExample)
KR (1) KR101176817B1 (enExample)
AT (1) ATE426914T1 (enExample)
DE (1) DE602004020200D1 (enExample)
TW (1) TWI385706B (enExample)
WO (1) WO2004090956A1 (enExample)

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US20070064209A1 (en) 2007-03-22
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US20060023188A1 (en) 2006-02-02
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JP4902201B2 (ja) 2012-03-21
US8537331B2 (en) 2013-09-17
KR101176817B1 (ko) 2012-08-24
WO2004090956A1 (ja) 2004-10-21
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DE602004020200D1 (de) 2009-05-07

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