KR101176817B1 - 노광장치 및 디바이스 제조방법 - Google Patents

노광장치 및 디바이스 제조방법 Download PDF

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Publication number
KR101176817B1
KR101176817B1 KR1020057019039A KR20057019039A KR101176817B1 KR 101176817 B1 KR101176817 B1 KR 101176817B1 KR 1020057019039 A KR1020057019039 A KR 1020057019039A KR 20057019039 A KR20057019039 A KR 20057019039A KR 101176817 B1 KR101176817 B1 KR 101176817B1
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South Korea
Prior art keywords
liquid
substrate
optical system
projection optical
exposure
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Korean (ko)
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KR20050118721A (ko
Inventor
히데아키 하라
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
  • Liquid Crystal (AREA)
KR1020057019039A 2003-04-07 2004-04-06 노광장치 및 디바이스 제조방법 Expired - Fee Related KR101176817B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003103145 2003-04-07
JPJP-P-2003-00103145 2003-04-07
PCT/JP2004/004969 WO2004090956A1 (ja) 2003-04-07 2004-04-06 露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20050118721A KR20050118721A (ko) 2005-12-19
KR101176817B1 true KR101176817B1 (ko) 2012-08-24

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ID=33156817

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KR1020057019039A Expired - Fee Related KR101176817B1 (ko) 2003-04-07 2004-04-06 노광장치 및 디바이스 제조방법

Country Status (8)

Country Link
US (4) US7480029B2 (enExample)
EP (1) EP1612850B1 (enExample)
JP (2) JP4902201B2 (enExample)
KR (1) KR101176817B1 (enExample)
AT (1) ATE426914T1 (enExample)
DE (1) DE602004020200D1 (enExample)
TW (1) TWI385706B (enExample)
WO (1) WO2004090956A1 (enExample)

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