TWI385706B - Exposure apparatus, immersion exposure apparatus, immersion exposure method, optical system for infusion, and method for manufacturing the same - Google Patents
Exposure apparatus, immersion exposure apparatus, immersion exposure method, optical system for infusion, and method for manufacturing the same Download PDFInfo
- Publication number
- TWI385706B TWI385706B TW093109567A TW93109567A TWI385706B TW I385706 B TWI385706 B TW I385706B TW 093109567 A TW093109567 A TW 093109567A TW 93109567 A TW93109567 A TW 93109567A TW I385706 B TWI385706 B TW I385706B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- immersion
- substrate
- optical system
- exposure apparatus
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 209
- 238000007654 immersion Methods 0.000 title claims abstract description 128
- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000001802 infusion Methods 0.000 title claims description 10
- 239000007788 liquid Substances 0.000 claims abstract description 493
- 239000000758 substrate Substances 0.000 claims abstract description 216
- 238000011084 recovery Methods 0.000 claims description 117
- 230000007246 mechanism Effects 0.000 claims description 26
- 238000007789 sealing Methods 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- 238000004064 recycling Methods 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000005286 illumination Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 101000891579 Homo sapiens Microtubule-associated protein tau Proteins 0.000 description 4
- 102100040243 Microtubule-associated protein tau Human genes 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 208000034530 PLAA-associated neurodevelopmental disease Diseases 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010627 cedar oil Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003103145 | 2003-04-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200503071A TW200503071A (en) | 2005-01-16 |
| TWI385706B true TWI385706B (zh) | 2013-02-11 |
Family
ID=33156817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093109567A TWI385706B (zh) | 2003-04-07 | 2004-04-07 | Exposure apparatus, immersion exposure apparatus, immersion exposure method, optical system for infusion, and method for manufacturing the same |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US7480029B2 (enExample) |
| EP (1) | EP1612850B1 (enExample) |
| JP (2) | JP4902201B2 (enExample) |
| KR (1) | KR101176817B1 (enExample) |
| AT (1) | ATE426914T1 (enExample) |
| DE (1) | DE602004020200D1 (enExample) |
| TW (1) | TWI385706B (enExample) |
| WO (1) | WO2004090956A1 (enExample) |
Families Citing this family (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1612850B1 (en) * | 2003-04-07 | 2009-03-25 | Nikon Corporation | Exposure apparatus and method for manufacturing a device |
| KR101484435B1 (ko) | 2003-04-09 | 2015-01-19 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| WO2004092833A2 (en) | 2003-04-10 | 2004-10-28 | Nikon Corporation | Environmental system including a transport region for an immersion lithography apparatus |
| CN103383527B (zh) | 2003-04-10 | 2015-10-28 | 株式会社尼康 | 包括用于沉浸光刻装置的真空清除的环境系统 |
| EP2613195B1 (en) | 2003-04-11 | 2015-12-16 | Nikon Corporation | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| EP2261742A3 (en) | 2003-06-11 | 2011-05-25 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method. |
| US6867844B2 (en) | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
| CN101436003B (zh) | 2003-06-19 | 2011-08-17 | 株式会社尼康 | 曝光装置及器件制造方法 |
| US6809794B1 (en) * | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
| EP1491956B1 (en) * | 2003-06-27 | 2006-09-06 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| ATE513309T1 (de) | 2003-07-09 | 2011-07-15 | Nikon Corp | Belichtungsvorrichtung und verfahren zur bauelementeherstellung |
| US7370659B2 (en) | 2003-08-06 | 2008-05-13 | Micron Technology, Inc. | Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
| TWI245163B (en) | 2003-08-29 | 2005-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR101748923B1 (ko) * | 2003-09-03 | 2017-06-19 | 가부시키가이샤 니콘 | 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 |
| TWI628698B (zh) | 2003-10-28 | 2018-07-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| US7411653B2 (en) | 2003-10-28 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus |
| US7528929B2 (en) | 2003-11-14 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| TWI612338B (zh) | 2003-11-20 | 2018-01-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
| JP4323946B2 (ja) * | 2003-12-19 | 2009-09-02 | キヤノン株式会社 | 露光装置 |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| TWI614795B (zh) | 2004-02-06 | 2018-02-11 | Nikon Corporation | 光學照明裝置、曝光裝置、曝光方法以及元件製造方法 |
| CN100592210C (zh) * | 2004-02-13 | 2010-02-24 | 卡尔蔡司Smt股份公司 | 微平版印刷投影曝光装置的投影物镜 |
| US8111373B2 (en) | 2004-03-25 | 2012-02-07 | Nikon Corporation | Exposure apparatus and device fabrication method |
| KR101162938B1 (ko) | 2004-04-19 | 2012-07-05 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| US8054448B2 (en) | 2004-05-04 | 2011-11-08 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| US7304715B2 (en) | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7379155B2 (en) | 2004-10-18 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7161654B2 (en) * | 2004-12-02 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4784513B2 (ja) * | 2004-12-06 | 2011-10-05 | 株式会社ニコン | メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法 |
| US7180571B2 (en) * | 2004-12-08 | 2007-02-20 | Asml Netherlands B.V. | Lithographic projection apparatus and actuator |
| SG124351A1 (en) * | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US8692973B2 (en) | 2005-01-31 | 2014-04-08 | Nikon Corporation | Exposure apparatus and method for producing device |
| KR101427056B1 (ko) | 2005-01-31 | 2014-08-05 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| CN102385260B (zh) | 2005-02-10 | 2014-11-05 | Asml荷兰有限公司 | 浸没液体、曝光装置及曝光方法 |
| US7324185B2 (en) | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7411654B2 (en) | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20060232753A1 (en) | 2005-04-19 | 2006-10-19 | Asml Holding N.V. | Liquid immersion lithography system with tilted liquid flow |
| US8248577B2 (en) | 2005-05-03 | 2012-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2660853B1 (en) | 2005-05-12 | 2017-07-05 | Nikon Corporation | Projection optical system, exposure apparatus and exposure method |
| DE102005024163A1 (de) | 2005-05-23 | 2006-11-30 | Carl Zeiss Smt Ag | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| US7583358B2 (en) | 2005-07-25 | 2009-09-01 | Micron Technology, Inc. | Systems and methods for retrieving residual liquid during immersion lens photolithography |
| US7456928B2 (en) | 2005-08-29 | 2008-11-25 | Micron Technology, Inc. | Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography |
| JP2007088339A (ja) * | 2005-09-26 | 2007-04-05 | Nikon Corp | 露光装置、及びデバイス製造方法 |
| JPWO2007055199A1 (ja) | 2005-11-09 | 2009-04-30 | 株式会社ニコン | 露光装置及び方法、並びにデバイス製造方法 |
| US20070127002A1 (en) * | 2005-11-09 | 2007-06-07 | Nikon Corporation | Exposure apparatus and method, and device manufacturing method |
| JPWO2007055237A1 (ja) * | 2005-11-09 | 2009-04-30 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| WO2007055373A1 (ja) | 2005-11-14 | 2007-05-18 | Nikon Corporation | 液体回収部材、露光装置、露光方法、及びデバイス製造方法 |
| US7773195B2 (en) | 2005-11-29 | 2010-08-10 | Asml Holding N.V. | System and method to increase surface tension and contact angle in immersion lithography |
| WO2007066692A1 (ja) | 2005-12-06 | 2007-06-14 | Nikon Corporation | 露光方法、露光装置、及びデバイス製造方法 |
| US8472004B2 (en) | 2006-01-18 | 2013-06-25 | Micron Technology, Inc. | Immersion photolithography scanner |
| JP4889331B2 (ja) * | 2006-03-22 | 2012-03-07 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
| US9477158B2 (en) * | 2006-04-14 | 2016-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| EP2179329A1 (en) | 2007-10-16 | 2010-04-28 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
| KR101562073B1 (ko) | 2007-10-16 | 2015-10-21 | 가부시키가이샤 니콘 | 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법 |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| KR101695034B1 (ko) | 2008-05-28 | 2017-01-10 | 가부시키가이샤 니콘 | 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법 |
| DE102008050868A1 (de) * | 2008-09-30 | 2010-04-08 | M+W Zander Products Gmbh | Einrichtung zur Temperaturstabilisierung von Flüssigkeiten, vorzugsweise von ultrareinem Wasser, bei der Herstellung von Chips sowie Verfahren zur Temperaturstabilisierung von Flüssigkeiten zur Anwendung bei der Herstellung von Chips |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP4902201B2 (ja) | 2012-03-21 |
| US8111375B2 (en) | 2012-02-07 |
| EP1612850A4 (en) | 2008-01-09 |
| EP1612850B1 (en) | 2009-03-25 |
| US7480029B2 (en) | 2009-01-20 |
| US8537331B2 (en) | 2013-09-17 |
| US20080291410A1 (en) | 2008-11-27 |
| KR20050118721A (ko) | 2005-12-19 |
| US20070064209A1 (en) | 2007-03-22 |
| JP5287791B2 (ja) | 2013-09-11 |
| US20060033901A1 (en) | 2006-02-16 |
| ATE426914T1 (de) | 2009-04-15 |
| US20060023188A1 (en) | 2006-02-02 |
| JPWO2004090956A1 (ja) | 2006-07-06 |
| JP2010183109A (ja) | 2010-08-19 |
| KR101176817B1 (ko) | 2012-08-24 |
| WO2004090956A1 (ja) | 2004-10-21 |
| DE602004020200D1 (de) | 2009-05-07 |
| TW200503071A (en) | 2005-01-16 |
| EP1612850A1 (en) | 2006-01-04 |
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