ATE493754T1 - Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung - Google Patents

Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung

Info

Publication number
ATE493754T1
ATE493754T1 AT09158917T AT09158917T ATE493754T1 AT E493754 T1 ATE493754 T1 AT E493754T1 AT 09158917 T AT09158917 T AT 09158917T AT 09158917 T AT09158917 T AT 09158917T AT E493754 T1 ATE493754 T1 AT E493754T1
Authority
AT
Austria
Prior art keywords
liquid
flow path
supplying
substrate
section
Prior art date
Application number
AT09158917T
Other languages
English (en)
Inventor
Yoshitomo Nagahashi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE493754T1 publication Critical patent/ATE493754T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Prostheses (AREA)
AT09158917T 2003-10-22 2004-10-21 Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung ATE493754T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003362279 2003-10-22

Publications (1)

Publication Number Publication Date
ATE493754T1 true ATE493754T1 (de) 2011-01-15

Family

ID=34463503

Family Applications (2)

Application Number Title Priority Date Filing Date
AT09158917T ATE493754T1 (de) 2003-10-22 2004-10-21 Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
AT04792768T ATE490548T1 (de) 2003-10-22 2004-10-21 Belichtungsvorrichtung, belichtungsverfahren und verfahren zur bauelementeherstellung

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT04792768T ATE490548T1 (de) 2003-10-22 2004-10-21 Belichtungsvorrichtung, belichtungsverfahren und verfahren zur bauelementeherstellung

Country Status (7)

Country Link
US (7) US7643129B2 (de)
EP (2) EP2079100B1 (de)
JP (1) JP4325623B2 (de)
KR (8) KR101712297B1 (de)
AT (2) ATE493754T1 (de)
DE (2) DE602004030365D1 (de)
WO (1) WO2005038888A1 (de)

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KR101204157B1 (ko) 2004-01-20 2012-11-22 칼 짜이스 에스엠테 게엠베하 마이크로 리소그래픽 투영 노광 장치 및 그 투영 렌즈를 위한 측정 장치
KR101554772B1 (ko) 2004-02-04 2015-09-22 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
WO2005124835A1 (ja) * 2004-06-21 2005-12-29 Nikon Corporation 露光装置及びデバイス製造方法
US7378025B2 (en) 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
JP4072543B2 (ja) 2005-03-18 2008-04-09 キヤノン株式会社 液浸露光装置及びデバイス製造方法
EP1873816A4 (de) 2005-04-18 2010-11-24 Nikon Corp Belichtungseinrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren
JP4661322B2 (ja) * 2005-04-22 2011-03-30 株式会社ニコン 露光装置、デバイスの製造方法及び液体供給方法
US7652746B2 (en) * 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101449055B1 (ko) 2005-08-23 2014-10-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP2007286162A (ja) * 2006-04-13 2007-11-01 Nikon Corp 液浸顕微鏡装置
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8681308B2 (en) 2007-09-13 2014-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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EP2136250A1 (de) 2008-06-18 2009-12-23 ASML Netherlands B.V. Lithographische Vorrichtung und Verfahren
JP2009164642A (ja) * 2009-04-20 2009-07-23 Smc Corp 液浸露光のための屈折率調整用小流量液体の温調方法
NL2004808A (en) * 2009-06-30 2011-01-12 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP6467265B2 (ja) * 2015-03-30 2019-02-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6700794B2 (ja) * 2015-04-03 2020-05-27 キヤノン株式会社 インプリント材吐出装置
KR102645839B1 (ko) * 2018-12-18 2024-03-08 엘지이노텍 주식회사 액체 렌즈를 포함하는 카메라 모듈
CN114815524B (zh) * 2022-06-23 2022-09-02 江苏美信光电科技有限公司 一种光刻机工作台的清洁装置

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JP4582089B2 (ja) * 2003-04-11 2010-11-17 株式会社ニコン 液浸リソグラフィ用の液体噴射回収システム
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EP2264531B1 (de) * 2003-07-09 2013-01-16 Nikon Corporation Belichtungsgerät und Verfahren zur Herstellung einer Vorrichtung
US7779781B2 (en) * 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101345020B1 (ko) 2003-08-29 2013-12-26 가부시키가이샤 니콘 액체회수장치, 노광장치, 노광방법 및 디바이스 제조방법
TWI245163B (en) * 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2005136374A (ja) * 2003-10-06 2005-05-26 Matsushita Electric Ind Co Ltd 半導体製造装置及びそれを用いたパターン形成方法
KR101712297B1 (ko) 2003-10-22 2017-03-13 가부시키가이샤 니콘 노광 장치, 노광 방법, 디바이스의 제조 방법
US7697110B2 (en) * 2004-01-26 2010-04-13 Nikon Corporation Exposure apparatus and device manufacturing method
US7050146B2 (en) * 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4072543B2 (ja) * 2005-03-18 2008-04-09 キヤノン株式会社 液浸露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
KR101332543B1 (ko) 2013-11-25
US20180067406A1 (en) 2018-03-08
US7973906B2 (en) 2011-07-05
KR101712297B1 (ko) 2017-03-13
KR20110123775A (ko) 2011-11-15
JPWO2005038888A1 (ja) 2007-02-01
US20140333909A1 (en) 2014-11-13
US7643129B2 (en) 2010-01-05
KR101275464B1 (ko) 2013-06-17
US9829807B2 (en) 2017-11-28
US20060187433A1 (en) 2006-08-24
DE602004030365D1 (de) 2011-01-13
WO2005038888A1 (ja) 2005-04-28
KR20120104644A (ko) 2012-09-21
ATE490548T1 (de) 2010-12-15
EP2079100A1 (de) 2009-07-15
KR20170024154A (ko) 2017-03-06
EP1677341A1 (de) 2006-07-05
US8896813B2 (en) 2014-11-25
KR20130061770A (ko) 2013-06-11
KR20140049044A (ko) 2014-04-24
KR20150039869A (ko) 2015-04-13
EP1677341B1 (de) 2010-12-01
US20080018869A1 (en) 2008-01-24
US9581913B2 (en) 2017-02-28
DE602004030838D1 (de) 2011-02-10
US20090153815A1 (en) 2009-06-18
KR101547388B1 (ko) 2015-08-26
KR20120066080A (ko) 2012-06-21
JP4325623B2 (ja) 2009-09-02
US20110235006A1 (en) 2011-09-29
EP2079100B1 (de) 2010-12-29
US20170160651A1 (en) 2017-06-08
EP1677341A4 (de) 2008-01-16
US7948608B2 (en) 2011-05-24
KR20060071430A (ko) 2006-06-26

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