ATE362197T1 - Vorrichtung für ein plasmaverfahren - Google Patents

Vorrichtung für ein plasmaverfahren

Info

Publication number
ATE362197T1
ATE362197T1 AT02708711T AT02708711T ATE362197T1 AT E362197 T1 ATE362197 T1 AT E362197T1 AT 02708711 T AT02708711 T AT 02708711T AT 02708711 T AT02708711 T AT 02708711T AT E362197 T1 ATE362197 T1 AT E362197T1
Authority
AT
Austria
Prior art keywords
microwave
supplying
waveguide
reduced
plasma
Prior art date
Application number
AT02708711T
Other languages
English (en)
Inventor
Tadahiro Ohmi
Masaki Hirayama
Shigetoshi Sugawa
Tetsuya Goto
Original Assignee
Tadahiro Ohmi
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tadahiro Ohmi, Tokyo Electron Ltd filed Critical Tadahiro Ohmi
Application granted granted Critical
Publication of ATE362197T1 publication Critical patent/ATE362197T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
AT02708711T 2001-03-28 2002-03-28 Vorrichtung für ein plasmaverfahren ATE362197T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001094271A JP4727057B2 (ja) 2001-03-28 2001-03-28 プラズマ処理装置

Publications (1)

Publication Number Publication Date
ATE362197T1 true ATE362197T1 (de) 2007-06-15

Family

ID=18948496

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02708711T ATE362197T1 (de) 2001-03-28 2002-03-28 Vorrichtung für ein plasmaverfahren

Country Status (9)

Country Link
US (2) US20030168008A1 (de)
EP (1) EP1376669B1 (de)
JP (1) JP4727057B2 (de)
KR (1) KR100486673B1 (de)
CN (1) CN1298027C (de)
AT (1) ATE362197T1 (de)
DE (1) DE60220039T2 (de)
IL (1) IL153155A0 (de)
WO (1) WO2002080250A1 (de)

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US20030168008A1 (en) 2003-09-11
CN1460285A (zh) 2003-12-03
DE60220039D1 (de) 2007-06-21
WO2002080250A1 (en) 2002-10-10
JP2002299314A (ja) 2002-10-11
US20060118241A1 (en) 2006-06-08
EP1376669A1 (de) 2004-01-02
DE60220039T2 (de) 2008-01-10
EP1376669A4 (de) 2006-01-04
US7670454B2 (en) 2010-03-02
JP4727057B2 (ja) 2011-07-20
EP1376669B1 (de) 2007-05-09
IL153155A0 (en) 2003-06-24
KR100486673B1 (ko) 2005-05-03
KR20030004428A (ko) 2003-01-14
CN1298027C (zh) 2007-01-31

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