ATE268015T1 - Durch licht und wärme aushärtbare harzzusammensetzung, aus dieser hergestellte lichtempfindliche trockenfolie und verfahren zur bildung eines musters damit - Google Patents

Durch licht und wärme aushärtbare harzzusammensetzung, aus dieser hergestellte lichtempfindliche trockenfolie und verfahren zur bildung eines musters damit

Info

Publication number
ATE268015T1
ATE268015T1 AT01917564T AT01917564T ATE268015T1 AT E268015 T1 ATE268015 T1 AT E268015T1 AT 01917564 T AT01917564 T AT 01917564T AT 01917564 T AT01917564 T AT 01917564T AT E268015 T1 ATE268015 T1 AT E268015T1
Authority
AT
Austria
Prior art keywords
resin composition
light
therefrom
dry film
forming
Prior art date
Application number
AT01917564T
Other languages
English (en)
Inventor
Seiya Di Onodera
Tadatomi Nishikubo
Atsushi Kurio Kameyama
Masaki Sasaki
Okura Ranzanmachi Oaza
Masatoshi Kusama
Original Assignee
Univ Kanagawa
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Kanagawa, Taiyo Ink Mfg Co Ltd filed Critical Univ Kanagawa
Application granted granted Critical
Publication of ATE268015T1 publication Critical patent/ATE268015T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C08G65/18—Oxetanes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
AT01917564T 2000-03-29 2001-03-28 Durch licht und wärme aushärtbare harzzusammensetzung, aus dieser hergestellte lichtempfindliche trockenfolie und verfahren zur bildung eines musters damit ATE268015T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000090906 2000-03-29
JP2000373410 2000-12-07
PCT/JP2001/002590 WO2001073510A1 (en) 2000-03-29 2001-03-28 Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same

Publications (1)

Publication Number Publication Date
ATE268015T1 true ATE268015T1 (de) 2004-06-15

Family

ID=26588697

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01917564T ATE268015T1 (de) 2000-03-29 2001-03-28 Durch licht und wärme aushärtbare harzzusammensetzung, aus dieser hergestellte lichtempfindliche trockenfolie und verfahren zur bildung eines musters damit

Country Status (9)

Country Link
US (2) US6844130B2 (de)
EP (1) EP1276011B1 (de)
JP (1) JP4606684B2 (de)
KR (1) KR100748219B1 (de)
CN (1) CN100454142C (de)
AT (1) ATE268015T1 (de)
DE (1) DE60103529T2 (de)
TW (1) TWI284780B (de)
WO (1) WO2001073510A1 (de)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002064662A1 (en) * 2001-02-15 2002-08-22 Kanagawa University Unsaturated polyester compound, resin curable with actinic energy ray, processes for producing these, and curable composition
CN1327293C (zh) * 2001-07-26 2007-07-18 西巴特殊化学品控股有限公司 光敏性树脂组合物
CN100401189C (zh) * 2001-10-22 2008-07-09 太阳油墨制造株式会社 光固化性·热固化性树脂组合物
US7604755B2 (en) * 2003-02-17 2009-10-20 Japan Composite Co., Ltd. Electroconductive resin composition and separator for fuel cell
WO2004095093A1 (ja) * 2003-04-23 2004-11-04 Taiyo Ink Mfg. Co., Ltd. 光導波路、光電気混載基板および該光電気混載基板の製造方法
JP4564240B2 (ja) * 2003-05-06 2010-10-20 日東電工株式会社 電池用セパレータのための反応性ポリマー担持多孔質フィルムとそれを用いた電池の製造方法
JP2005002166A (ja) * 2003-06-10 2005-01-06 Konica Minolta Medical & Graphic Inc オキセタン化合物、それを用いた活性エネルギー線硬化組成物、インクジェット用インク組成物及び画像形成方法
JP4662533B2 (ja) * 2003-08-26 2011-03-30 日東電工株式会社 電池用セパレータのための反応性ポリマー担持多孔質フィルムとそれを用いる電池の製造方法
TW200533692A (en) * 2003-11-06 2005-10-16 Showa Denko Kk Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof
JP2005307162A (ja) * 2004-03-23 2005-11-04 Konica Minolta Medical & Graphic Inc 活性光線硬化組成物、活性光線硬化型インク、それを用いた画像形成方法及びインクジェット記録装置
TWI255535B (en) * 2004-03-31 2006-05-21 Sanyo Electric Co Device mounting board and semiconductor apparatus using the same
JP4587865B2 (ja) * 2004-04-22 2010-11-24 昭和電工株式会社 感光性樹脂組成物及びその硬化物並びにそれらを使用するプリント配線基板の製造方法
JP2005347411A (ja) 2004-06-01 2005-12-15 Sanyo Electric Co Ltd 素子搭載基板およびそれを用いる半導体装置
KR100845657B1 (ko) * 2004-07-07 2008-07-10 다이요 잉키 세이조 가부시키가이샤 광 경화성·열 경화성 수지 조성물과 그것을 사용한 건식필름, 및 그의 경화물
CN100569825C (zh) * 2004-07-15 2009-12-16 太阳油墨制造株式会社 光固化性·热固化性树脂组合物及其固化物
JP4368266B2 (ja) * 2004-07-30 2009-11-18 東京応化工業株式会社 レジスト保護膜形成用材料、およびこれを用いたレジストパターン形成方法
JP4368267B2 (ja) 2004-07-30 2009-11-18 東京応化工業株式会社 レジスト保護膜形成用材料、およびこれを用いたレジストパターン形成方法
JP4547212B2 (ja) * 2004-09-01 2010-09-22 太陽インキ製造株式会社 光硬化性・熱硬化性ドライフィルム、及び光・電気混載基板
JP4547225B2 (ja) * 2004-09-29 2010-09-22 太陽インキ製造株式会社 光硬化性・熱硬化性樹脂組成物、及び光・電気混載基板
EP1676937B1 (de) * 2004-11-26 2016-06-01 Rohm and Haas Electronic Materials, L.L.C. UV härtbare Katalysatormischung
KR100729256B1 (ko) * 2005-01-13 2007-06-15 삼성전자주식회사 포토레지스트 조성물, 이를 이용한 포토레지스트 패턴의형성 방법 및 반도체 소자의 보호막 형성방법
JP4621036B2 (ja) * 2005-02-08 2011-01-26 太陽ホールディングス株式会社 感光性樹脂組成物、及びその硬化物並びに該硬化物からなる表示パネル用スペーサー
KR100670004B1 (ko) * 2005-02-25 2007-01-19 삼성전자주식회사 잉크젯 프린트헤드
US20060257785A1 (en) * 2005-05-13 2006-11-16 Johnson Donald W Method of forming a photoresist element
TW200710570A (en) * 2005-05-31 2007-03-16 Taiyo Ink Mfg Co Ltd Composition for forming adhesive pattern, multilayer structure obtained by using same, and method for producing such multilayer structure
JP4504275B2 (ja) 2005-07-06 2010-07-14 株式会社有沢製作所 感光性熱硬化型樹脂組成物、並びに該組成物を用いた感光性カバーレイ、及びフレキシブルプリント配線板
JP4763390B2 (ja) * 2005-09-05 2011-08-31 東京応化工業株式会社 感光性樹脂組成物
JP4849860B2 (ja) * 2005-10-04 2012-01-11 太陽ホールディングス株式会社 光硬化性・熱硬化性樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板
US7645564B2 (en) * 2006-03-03 2010-01-12 Haixin Yang Polymer solutions, aqueous developable thick film compositions, processes of making and electrodes formed thereof
JP2007277148A (ja) * 2006-04-06 2007-10-25 Nitto Denko Corp トリスオキセタンエーテル化合物およびその製法、ならびにそれを用いた光導波路
JP5027458B2 (ja) * 2006-07-12 2012-09-19 太陽ホールディングス株式会社 光硬化性・熱硬化性の一液型ソルダーレジスト組成物及びそれを用いたプリント配線板
TWI357536B (en) * 2006-10-24 2012-02-01 Taiyo Ink Mfg Co Ltd Photosetting and thermosetting solder resist ink c
KR20090098837A (ko) 2006-11-29 2009-09-17 도요 보세키 가부시키가이샤 옥세탄 함유 수지, 이를 사용한 접착제 및 레지스트제
KR100837409B1 (ko) 2006-11-30 2008-06-12 삼성전자주식회사 옥세탄-함유 화합물, 이를 포함한 포토레지스트 조성물,상기 포토레지스트 조성물을 이용한 패턴 형성 방법 및잉크젯 프린트 헤드
KR101338110B1 (ko) * 2006-12-29 2013-12-06 엘지디스플레이 주식회사 건조레지스트필름 및 이를 이용한 액정표시패널의 제조방법
US8420216B2 (en) * 2007-07-18 2013-04-16 Showa Denko K.K. Thermosetting resin composition
KR101422203B1 (ko) * 2007-08-07 2014-07-30 삼성전자주식회사 포토레지스트 조성물, 상기 포토레지스트 조성물을 이용한 패턴 형성 방법 및 잉크젯 프린트 헤드
KR100988271B1 (ko) * 2007-09-19 2010-10-18 주식회사 엘지화학 감광성 수지와 이의 제조방법과 감광성 수지조성물 및 이에의해 형성된 경화물
JP5285257B2 (ja) * 2007-09-21 2013-09-11 太陽ホールディングス株式会社 光硬化性・熱硬化性樹脂組成物及びその硬化物
JP4637221B2 (ja) * 2007-09-28 2011-02-23 富士フイルム株式会社 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法
CN101462428B (zh) * 2007-12-19 2011-11-16 仁宝电脑工业股份有限公司 热转印膜片及其制作方法和转印方法
US20090186293A1 (en) * 2008-01-23 2009-07-23 Bryan Thomas Fannin Dry film protoresist for a micro-fluid ejection head and method therefor
CN101246310B (zh) * 2008-03-19 2010-11-03 吉林大学 负性含氟光刻胶组合物及在聚合物光波导器件中的应用
JP5218298B2 (ja) * 2008-07-02 2013-06-26 信越化学工業株式会社 熱硬化性シリコーン樹脂−エポキシ樹脂組成物及び当該樹脂で成形したプレモールドパッケージ
JP5404028B2 (ja) * 2008-12-25 2014-01-29 東京応化工業株式会社 被エッチング基体の製造方法
JP6054012B2 (ja) 2009-03-31 2016-12-27 太陽ホールディングス株式会社 硬化性樹脂組成物およびそれを用いたプリント配線板と反射板
CN102804066B (zh) * 2010-03-22 2015-04-01 株式会社Lg化学 光固化和热固化树脂组合物及防焊干膜
JP5817237B2 (ja) * 2010-07-29 2015-11-18 Jsr株式会社 感放射線性樹脂組成物、硬化膜、カラーフィルタ、硬化膜の形成方法及びカラーフィルタの形成方法
JP6192898B2 (ja) * 2011-05-30 2017-09-06 住友化学株式会社 硬化性樹脂組成物
KR101998449B1 (ko) * 2012-03-26 2019-07-09 도레이 카부시키가이샤 감광성 흑색 수지 조성물 및 수지 블랙 매트릭스 기판
KR101545724B1 (ko) 2012-08-01 2015-08-19 주식회사 엘지화학 광경화성 및 열경화성을 갖는 수지 조성물과, 드라이 필름 솔더 레지스트
JP6117547B2 (ja) * 2012-12-21 2017-04-19 新日鉄住金化学株式会社 熱硬化性組成物、硬化膜及びカラーフィルター
KR101470467B1 (ko) 2013-03-15 2014-12-08 주식회사 엘지화학 코팅 조성물
CN103901719A (zh) * 2014-04-28 2014-07-02 无锡德贝尔光电材料有限公司 一种快干型含羧基的感光性树脂及其制备方法
TWI559082B (zh) 2014-07-07 2016-11-21 財團法人工業技術研究院 生質材料與其形成方法與印刷電路板
US10106643B2 (en) * 2015-03-31 2018-10-23 3M Innovative Properties Company Dual-cure nanostructure transfer film
KR102787541B1 (ko) * 2015-06-04 2025-03-26 카티바, 인크. 금속 표면 상에서 에치 레지스트 패턴의 제조 방법
EP3866572B1 (de) 2015-08-13 2024-01-03 Kateeva, Inc. Verfahren zur herstellung eines metallischen musters auf einem substrat
TWI730037B (zh) * 2016-01-26 2021-06-11 日商富士軟片和光純藥股份有限公司 光硬化方法，及用於該光硬化方法之化合物和組成物
JP6886782B2 (ja) * 2016-06-30 2021-06-16 東京応化工業株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ素子における発光層の区画用のバンク、有機ｅｌ素子用の基板、有機ｅｌ素子、硬化膜の製造方法、バンクの製造方法、及び有機ｅｌ素子の製造方法
US10398034B2 (en) 2016-12-12 2019-08-27 Kateeva, Inc. Methods of etching conductive features, and related devices and systems
JP7246615B2 (ja) * 2017-12-20 2023-03-28 住友電気工業株式会社 プリント配線板の製造方法及び積層体
CN109970953B (zh) * 2017-12-27 2021-04-09 太阳油墨（苏州）有限公司 固化性树脂组合物、干膜、固化物、及印刷电路板
CN110982398B (zh) * 2019-12-20 2021-11-23 北京印刷学院 Uv光油及其应用
CN112126274A (zh) * 2020-09-16 2020-12-25 四川乐凯新材料有限公司 含链烯基醚和/或氧杂环丁烷类化合物的pcb用光固化性组合物
CN112159639B (zh) * 2020-11-09 2022-05-06 珠海市能动科技光学产业有限公司 一种改性高分子粘合剂及含有该粘合剂的干膜光阻剂
CN115703884A (zh) * 2021-08-11 2023-02-17 常州强力先端电子材料有限公司 氧杂环丁烷类聚合物及其制备方法
CN113759663B (zh) * 2021-09-15 2023-07-14 广东硕成科技股份有限公司 一种改性丙烯酸树脂组合物、制备方法及其阻焊干膜
CN114380809B (zh) * 2021-12-30 2023-06-02 同济大学 一类含阳离子可聚合基团的离子液体及制备方法和应用
KR102929109B1 (ko) 2023-03-31 2026-02-19 한국다이요잉크 주식회사 드라이 필름 솔더 레지스트의 제조 방법, 드라이 필름 솔더 레지스트 및 인쇄 회로 기판

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
JPH01203424A (ja) * 1988-02-09 1989-08-16 Toagosei Chem Ind Co Ltd 硬化性組成物
JP3353399B2 (ja) * 1993-07-22 2002-12-03 三菱瓦斯化学株式会社 ポリカーボネートの製造法
JPH07330865A (ja) * 1994-06-07 1995-12-19 Hitachi Ltd 感光性樹脂組成物
JPH09255741A (ja) * 1996-03-22 1997-09-30 Tamura Kaken Kk 感光性樹脂組成物、その硬化塗膜及び回路基板
US6190833B1 (en) * 1997-03-30 2001-02-20 Jsr Corporation Radiation-sensitive resin composition
JPH1165116A (ja) 1997-06-09 1999-03-05 Jsr Corp 感放射線性樹脂組成物
DE19736471A1 (de) * 1997-08-21 1999-02-25 Espe Dental Ag Lichtinduziert kationisch härtende Zusammensetzungen und deren Verwendung
JP3508502B2 (ja) 1997-09-30 2004-03-22 宇部興産株式会社 オキセタン環を有するビフェニル誘導体
US6338936B1 (en) 1998-02-02 2002-01-15 Taiyo Ink Manufacturing Co., Ltd. Photosensitive resin composition and method for formation of resist pattern by use thereof
JPH11246541A (ja) * 1998-03-06 1999-09-14 Ube Ind Ltd 多官能性オキセタン化合物
JPH11322944A (ja) 1998-03-17 1999-11-26 Nippon Kayaku Co Ltd 活性エネルギー線硬化性組成物及びその硬化物
JPH11343346A (ja) * 1998-05-29 1999-12-14 Ube Ind Ltd 熱硬化性オキセタン組成物およびその硬化方法ならびに該方法により得られる硬化物
JP2001222103A (ja) * 1999-08-05 2001-08-17 Nippon Paint Co Ltd 水性フォトソルダーレジスト組成物
JP5016768B2 (ja) * 2000-03-29 2012-09-05 学校法人神奈川大学 活性エネルギー線硬化性樹脂、その製造方法及び光硬化性・熱硬化性樹脂組成物
US6609744B2 (en) * 2000-06-29 2003-08-26 Collins & Aikman Products Co. Collapsible storage apparatus for vehicle cargo compartments
CN1306338C (zh) * 2000-09-11 2007-03-21 昭和电工株式会社 感光组合物、固化制品以及利用它的印刷电路板
EP1327642A4 (de) 2000-09-20 2006-07-19 Taiyo Ink Mfg Co Ltd Carboxyliertes photosensitives harz, dieses enthaltende, mit alkali entwickelbare, lichthärtbare/hitzehärtbare zusammensetzung und daraus erhältlicher gehärteter artikel

Also Published As

Publication number Publication date
CN100454142C (zh) 2009-01-21
US6844130B2 (en) 2005-01-18
DE60103529D1 (de) 2004-07-01
WO2001073510A1 (en) 2001-10-04
EP1276011B1 (de) 2004-05-26
EP1276011A4 (de) 2003-05-14
DE60103529T2 (de) 2005-06-02
JP4606684B2 (ja) 2011-01-05
TWI284780B (en) 2007-08-01
US7226710B2 (en) 2007-06-05
EP1276011A1 (de) 2003-01-15
KR20030051419A (ko) 2003-06-25
CN1420998A (zh) 2003-05-28
US20050112500A1 (en) 2005-05-26
KR100748219B1 (ko) 2007-08-09
US20040023120A1 (en) 2004-02-05

Similar Documents

Publication Publication Date Title
ATE268015T1 (de) Durch licht und wärme aushärtbare harzzusammensetzung, aus dieser hergestellte lichtempfindliche trockenfolie und verfahren zur bildung eines musters damit
DE60017470D1 (de) Phot0- oder wärmehärtende zusammensetzungen zur herstellung matter filme
US4943516B1 (de)
EP1624001A4 (de) Photohärtende/wärmehärtende tintenstrahlzusammensetzung und leiterplatte damit
DE69224365D1 (de) Verfahren zur Beschichtung von Leiterplatten
ATE427519T1 (de) Uv-aushartbare harzzusammensetzung und photolít- resistfarbstoff mit der zusammensetzung
TW200627066A (en) Photosensitive resin composition, photosensitive film for permanent resist, method for forming resist pattern, printed wiring board and semiconductor device
KR950000755A (ko) 수지 조성물
US9104099B2 (en) Curable coatings for photoimaging
KR102613669B1 (ko) 감광성 수지 조성물, 감광성 수지 조성물 필름, 경화물, 절연막 및 다층 배선 기판
TWI484290B (zh) Solder resist composition and printed wiring board
ATE56828T1 (de) Photolackzusammensetzung und hieraus hergestellte gedruckte schaltungsplatte.
JP2963772B2 (ja) 感光性樹脂組成物
KR970019793A (ko) 땜납 및 납땜법
US20020120031A1 (en) Photothermosetting component
TW200641524A (en) Photosensitive solder resist composition, photosensitive solder resist film, permanent pattern and method for forming the same
KR900014937A (ko) 광경화성 디알릴프탈레이트 수지조성물과 그것을 사용한 프린트회로판과 그의 제조방법
CN1255489C (zh) 积层电路板用液态感光绝缘油墨
CN112859520A (zh) 一种低能量固化的光刻胶、抗蚀剂图案及其制备方法
JP2547884B2 (ja) 感光性樹脂組成物
JP2004264560A (ja) 感光性熱硬化性樹脂組成物およびソルダーレジストパターン形成方法
CN208490031U (zh) 高反射率防焊阻剂薄膜
DK1493313T3 (da) Vandbårne overtrækningssammensætninger for printplader
KR950013333A (ko) 광중합성 조성물 및 이것을 사용한 경화도막패턴의 형성방법
KR930005519B1 (ko) 전자부품 장치에 사용하기 위한 접착성 조성물과 그와 같은 것을 사용하여 프린트 회로기판에 전자부품을 부착하기 위한 방법

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties