WO2010113715A1 - 半導体装置の製造方法及び半導体装置 - Google Patents
半導体装置の製造方法及び半導体装置 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 43
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 41
- 239000010703 silicon Substances 0.000 claims abstract description 41
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 41
- 229910052751 metal Inorganic materials 0.000 claims abstract description 35
- 239000002184 metal Substances 0.000 claims abstract description 35
- 238000005530 etching Methods 0.000 claims abstract description 19
- 238000002955 isolation Methods 0.000 claims abstract description 17
- 238000007772 electroless plating Methods 0.000 claims abstract description 13
- 238000004519 manufacturing process Methods 0.000 claims description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 21
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000956 alloy Substances 0.000 claims description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 229910017052 cobalt Inorganic materials 0.000 claims description 6
- 239000010941 cobalt Substances 0.000 claims description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005844 autocatalytic reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7839—Field effect transistors with field effect produced by an insulated gate with Schottky drain or source contact
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System
- H01L21/28537—Deposition of Schottky electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
- H01L29/0653—Dielectric regions, e.g. SiO2 regions, air gaps adjoining the input or output region of a field-effect device, e.g. the source or drain region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66636—Lateral single gate silicon transistors with source or drain recessed by etching or first recessed by etching and then refilled
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66643—Lateral single gate silicon transistors with source or drain regions formed by a Schottky barrier or a conductor-insulator-semiconductor structure
Definitions
- the present invention relates to a method for manufacturing a semiconductor device and a semiconductor device, and more particularly to a method for manufacturing a field effect transistor using a Schottky junction for a source / drain.
- a semiconductor device integrated circuit in which a large number of circuit elements (for example, transistors) and wirings are formed on a single substrate is known.
- a semiconductor element that constitutes the semiconductor device for example, a pair of source / drain formed in the element region defined on the surface layer of the silicon substrate with the channel region interposed therebetween, and a poly insulator via a gate insulating film on the channel region.
- FET field effect transistor
- Non-Patent Document 1 a technique has been proposed in which the source / drain of the FET is not composed of a diffusion layer formed by doping a silicon substrate with impurities, but is composed of metal (for example, Non-Patent Document 1). According to this technique, it is easy to form a shallow junction as compared with the case where the source / drain is formed of a diffusion layer, and the resistance can be significantly reduced.
- the FET in which the source / drain is realized by a Schottky junction using a metal / silicon substrate is called a Schottky junction FET.
- FIG. 2 is an explanatory view showing an example of a manufacturing process of a conventional Schottky junction FET.
- FIG. 2 shows the formation of the source / drain after the gate 212 is formed on the silicon substrate 201.
- the gate 212 of the Schottky junction FET 20 is formed on the silicon substrate 101 by a general semiconductor device manufacturing process.
- the gate 212 includes a gate insulating film 203, a gate electrode 204, and an insulating film 205 covering the gate electrode.
- the gate electrode 204 functions as a so-called gate for controlling the movement of electrons formed of a metal or a compound having metallic conductivity (for example, Ni, Co, Pt, or an alloy thereof). Electrode.
- FIG. 2A after the gate insulating film 203, the gate electrode 204, and the insulating film 205 are formed on the entire surface of the silicon substrate 201, unnecessary portions of the gate electrode 204 and the insulating film 205 are removed by a photoetching process using the resist pattern 206 as a mask. Shows the state. After removing the gate electrode 204 and the insulating film 205 as shown in FIG. 2A, the gate insulating film 203 is further removed. Then, the silicon substrate 201 is etched by a predetermined depth by self-alignment (FIG. 2B). A source / drain is formed on the etching region 201a.
- a silicon nitride film 207 is formed on the entire surface of the substrate (FIG. 2C). Then, the silicon nitride film 207 is etched back by anisotropic etching to form a sidewall 207a on the side surface of the gate 212 (FIG. 2D).
- a resist pattern 208 provided with an opening 208a is formed by a photolithography process so that the etching region 201a of the silicon substrate 201 is exposed (FIG. 2E).
- a metal film (for example, Ni) is formed on the entire surface by physical vapor deposition (PVD: Physical Vapor Deposition) such as sputtering (FIG. 2F), and the resist pattern 208 is peeled off (FIG. 2G).
- PVD Physical Vapor Deposition
- FIG. 2F physical vapor deposition
- the resist pattern 208 is peeled off
- the invention described in claim 1 includes a first step of forming a gate in an element region defined on the surface of the silicon substrate by the element isolation region; A second step of etching the silicon substrate by self-alignment using the gate and the element isolation region as a mask; A third step of forming an insulating film on the side surface of the gate; And a fourth step of selectively forming a metal film to be a source / drain in an etching region of the silicon substrate by an electroless plating method.
- the metal film is a kind selected from the group consisting of gold, platinum, silver, copper, palladium, nickel, cobalt, and ruthenium. Or an alloy containing a combination of two or more kinds or an alloy containing at least one kind.
- a gate is formed in an element region defined on a surface of a silicon substrate by an element isolation region, and is formed in an etching region of the silicon substrate etched using the gate and the element isolation region as a mask.
- the source / drain is made of a metal film selectively formed by an electroless plating method.
- the metal film is a kind of metal selected from the group consisting of gold, platinum, silver, copper, palladium, nickel, cobalt, ruthenium, or two. It is an alloy containing a combination of at least one species or an alloy containing at least one species.
- the process of forming the source / drain of the Schottky junction FET is simplified, the yield of the semiconductor device can be improved and the price can be reduced. Specifically, the conventional photolithography process can be omitted.
- the metal film to be the source / drain is formed by electroless plating instead of PVD, the interface with the silicon substrate becomes smooth, and improvement in device characteristics can be expected.
- FIG. 1 is an explanatory diagram showing an example of a manufacturing process of the Schottky junction FET according to the present embodiment.
- FIG. 1 shows the formation of the source / drain after the gate 111 is formed on the silicon substrate 101. That is, in the previous stage shown in FIG. 1A, the gate 111 of the Schottky junction FET 10 is formed on the silicon substrate 101 by a general semiconductor device manufacturing process.
- an element isolation region 102 made of a silicon oxide film having a depth of 300 to 400 nm is formed in a predetermined region on the p-type silicon substrate 101.
- An element region is defined by the element isolation region 102.
- a gate insulating film (oxide film) 103 having a thickness of 5 nm is formed on the entire surface of the substrate, and a gate electrode 104 and an insulating film 105 made of polycrystalline silicon, metal film or silicide film having a thickness of 100 to 150 nm are formed thereon.
- the gate electrode 104 and the insulating film 105 are removed by a photoetching process using the resist pattern 106 as a mask, leaving a portion to be a gate.
- the gate insulating film 103 is further removed. Then, the silicon substrate 101 is etched by a predetermined depth (for example, 10 to 100 nm) by self-alignment (FIG. 1B). Source / drains are formed in the etching region 101a.
- the self-aligned etching means etching using an existing pattern (as a mask) without using a photomask. In this embodiment, since the source / drain regions are etched using the gate 111 and the isolation oxide film (element isolation region) 102 as a mask, the etching is performed by self-alignment.
- a silicon nitride film 107 having a thickness of 10 nm or less is formed on the entire surface of the substrate (FIG. 1C). Then, by performing etch back by anisotropic etching on the silicon nitride film 107, a sidewall 107a is formed on the side surface of the gate 111 (FIG. 1D). The steps up to this step are the same as in the conventional example (see FIG. 2).
- a metal film (eg, Ni) 108 having a thickness of 10 to 100 ⁇ m is selectively formed in the etching region 101a by an electroless plating method (FIG. 1E).
- a metal is formed on silicon by autocatalytic reaction of silicon. Therefore, the metal film 108 is formed only in the etching region 101 a of the silicon substrate 101.
- the semiconductor device 10 is immersed in this electroless nickel plating solution at 70 ° C. for 2 minutes. As a result, a nickel film (metal film) 108 having a thickness of about 50 nm is formed.
- the metal film formed by the electroless plating method for example, a kind of metal selected from the group of gold, platinum, silver, copper, palladium, cobalt, ruthenium or An alloy combining two or more kinds or an alloy containing at least one kind can be used. If these metals are used, a metal film can be easily formed by an electroless plating method and is also suitable as a source / drain material. Through the above steps, the Schottky junction FET 10 is obtained. The metal film 108 formed on both sides of the gate 111 becomes the source / drain 109 and 110 and forms a Schottky junction with the silicon substrate 101.
- the gate (111) is formed in the element region defined on the surface layer of the silicon substrate (101) by the element isolation region (102) (first step, FIG. 1A), and the gate (111 ) And the element isolation region (102) as a mask, the silicon substrate (101) is etched by self-alignment (second step, FIG. 1B).
- an insulating film silicon nitride film 107, sidewall 107a
- a source / source is formed in the etching region (101a) of the silicon substrate (101).
- a metal film (108) to be the drain (109, 110) is selectively formed by an electroless plating method (fourth step, FIG. 1E).
- the metal film (108) formed in the fourth step includes at least one kind of metal selected from the group consisting of gold, platinum, silver, copper, palladium, nickel, cobalt, and ruthenium, or an alloy obtained by combining two or more kinds. Composed of alloy. Thereby, the source / drain can be easily formed by the electroless plating method.
- the Schottky junction FET is formed on the silicon substrate.
- the present invention can also be applied to the case where the Schottky junction FET is formed on an SOI (silicononinsulator) substrate.
Abstract
Description
半導体装置の分野においては、高速化・高集積化を実現するために半導体素子の微細化が要求され、例えば、FETのゲート長を短くしたり、ゲート絶縁膜をさらに薄くしたりすることにより微細化が図られている。
このようにソース/ドレインを、金属/シリコン基板によるショットキー接合で実現したFETは、ショットキー接合FETと呼ばれている。
図2は、従来のショットキー接合FETの製造過程の一例について示す説明図である。
図2には、シリコン基板201上にゲート212を形成した後のソース/ドレインの形成について示している。すなわち、図2Aに示す前段において、一般的な半導体装置の製造工程によりシリコン基板101上にショットキー接合FET20のゲート212が形成されている。
なお、ゲート212は、ゲート絶縁膜203、ゲート電極204、ゲート電極をカバーする絶縁膜205で構成されている。ここで、ゲート電極204は、金属若しくは金属的な導電性を持つ化合物(例えば、Ni,Co,Pt又はこれらの合金)により形成された、電子の移動を制御するためのいわゆるゲートの役割をする電極である。
図2Aに示すようにゲート電極204及び絶縁膜205を除去した後、さらにゲート絶縁膜203を除去する。そして、シリコン基板201を自己整合により所定の深さだけエッチングする(図2B)。このエッチング領域201aの上部にソース/ドレインが形成される。
次いで、レジストパターン206を剥離した後、基板全面に、例えば、シリコン窒化膜207を形成する(図2C)。そして、このシリコン窒化膜207に対して異方性エッチングによるエッチバックを行うことにより、ゲート212の側面にサイドウォール207aを形成する(図2D)。
以上の工程により、ショットキー接合FET20が得られる。ゲート212の両側に形成された金属膜209がソース/ドレイン210,211となり、シリコン基板201との間でショットキー接合を形成する。
また、シリコン基板201のエッチング領域201aにPVDにより金属膜209を蒸着させるため、シリコン基板201と金属膜209の界面に凹凸が形成されやすく、デバイス特性の低下を招く虞がある。
前記ゲート及び素子分離領域をマスクとして自己整合により前記シリコン基板をエッチングする第2工程と、
前記ゲートの側面に絶縁膜を形成する第3工程と、
前記シリコン基板のエッチング領域に、ソース/ドレインとなる金属膜を、無電解めっき法により選択的に形成する第4工程と、を備えることを特徴とする半導体装置の製造方法である。
また、ソース/ドレインとなる金属膜をPVDではなく無電解めっき法により形成するので、シリコン基板との界面が滑らかとなり、デバイス特性の向上を期待できる。
図1は、本実施形態に係るショットキー接合FETの製造過程の一例について示す説明図である。
図1には、シリコン基板101上にゲート111を形成した後のソース/ドレインの形成について示している。
すなわち、図1Aに示す前段において、一般的な半導体装置の製造工程によりシリコン基板101上にショットキー接合FET10のゲート111が形成されている。
基板全面に厚さ5nmのゲート絶縁膜(酸化膜)103を形成し、この上に厚さ100~150nmの多結晶シリコン、金属膜又はシリサイド膜からなるゲート電極104及び絶縁膜105を形成する。そして、フォトエッチング工程により、レジストパターン106をマスクとして、ゲートとなる部分を残してゲート電極104及び絶縁膜105を除去する。
以上の工程により図1Aに示す状態が得られる。
ここで、自己整合によるエッチングとは、ホトマスクを使わずに、既存のパターンを利用して(マスクとして)エッチング加工することをいう。本実施形態では、ゲート111及びアイソレーションの酸化膜(素子分離領域)102をマスクとしてソース/ドレイン領域をエッチングしているので、自己整合によるエッチングとなる。
なお、この工程までは従来例(図2参照)と同じである。
具体的には、硫酸ニッケル0.08M、クエン酸0.10M、ホスフィン酸0.20Mを主成分とする無電解ニッケルめっき液をpH=9.5に調整する。そして、この無電解ニッケルめっき液に半導体装置10を70℃で2分間浸漬させる。これにより、厚さ約50nmのニッケル膜(金属膜)108が形成される。
以上の工程によって、ショットキー接合FET10が得られる。ゲート111の両側に形成された金属膜108がソース/ドレイン109,110となり、シリコン基板101との間でショットキー接合を形成する。
次いで、ゲート(111)の側面に絶縁膜(シリコン窒化膜107、サイドウォール107a)を形成し(第3工程、図1C、D)、シリコン基板(101)のエッチング領域(101a)に、ソース/ドレイン(109,110)となる金属膜(108)を、無電解めっき法により選択的に形成する(第4工程、図1E)。
また、ソース/ドレインとなる金属膜をPVDではなく無電解めっき法により形成するので、シリコン基板との界面が滑らかとなり、デバイス特性の向上を期待できる。
101 シリコン基板
102 素子分離領域
103 ゲート絶縁膜
104 ゲート電極
105 絶縁膜
106 レジストパターン
107 シリコン窒化膜(絶縁膜)
108 金属膜
109,110 ソース/ドレイン
111 ゲート
Claims (4)
- 素子分離領域によりシリコン基板表層に画成された素子領域にゲートを形成する第1工程と、
前記ゲート及び素子分離領域をマスクとして自己整合により前記シリコン基板をエッチングする第2工程と、
前記ゲートの側面に絶縁膜を形成する第3工程と、
前記シリコン基板のエッチング領域に、ソース/ドレインとなる金属膜を、無電解めっき法により選択的に形成する第4工程と、を備えることを特徴とする半導体装置の製造方法。 - 前記金属膜は、金、白金、銀、銅、パラジウム、ニッケル、コバルト、ルテニウムの群から選ばれた一種の金属若しくは二種以上を組み合わせた合金又は少なくとも一種を含む合金であることを特徴とする請求項1に記載の半導体装置の製造方法。
- 素子分離領域によりシリコン基板表層に画成された素子領域に形成されたゲートと、
前記ゲート及び素子分離領域をマスクとしてエッチングされた前記シリコン基板のエッチング領域に形成されたソース/ドレインと、を備えた半導体素子において、
前記ソース・ドレインは、無電解めっき法により選択的に形成された金属膜からなることを特徴とする半導体装置。 - 前記金属膜は、金、白金、銀、銅、パラジウム、ニッケル、コバルト、ルテニウムの群から選ばれた一種の金属若しくは二種以上を組み合わせた合金又は少なくとも一種を含む合金であることを特徴とする請求項3に記載の半導体装置。
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JP2011507116A JP5449326B2 (ja) | 2009-03-31 | 2010-03-24 | ショットキー接合fetの製造方法 |
US13/260,948 US20120104502A1 (en) | 2009-03-31 | 2010-03-24 | Method of producing semiconductor device, and semiconductor device |
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US9202903B2 (en) * | 2013-03-01 | 2015-12-01 | Cree, Inc. | Tunnel junction field effect transistors having self-aligned source and gate electrodes and methods of forming the same |
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JPWO2010113715A1 (ja) | 2012-10-11 |
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