TWI698290B - 塗布器洗淨裝置以及塗布裝置 - Google Patents

塗布器洗淨裝置以及塗布裝置 Download PDF

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Publication number
TWI698290B
TWI698290B TW105139832A TW105139832A TWI698290B TW I698290 B TWI698290 B TW I698290B TW 105139832 A TW105139832 A TW 105139832A TW 105139832 A TW105139832 A TW 105139832A TW I698290 B TWI698290 B TW I698290B
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TW
Taiwan
Prior art keywords
washing
liquid
cleaning
applicator
tank
Prior art date
Application number
TW105139832A
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English (en)
Chinese (zh)
Other versions
TW201722569A (zh
Inventor
堀內展雄
Original Assignee
日商東麗工程股份有限公司
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Application filed by 日商東麗工程股份有限公司 filed Critical 日商東麗工程股份有限公司
Publication of TW201722569A publication Critical patent/TW201722569A/zh
Application granted granted Critical
Publication of TWI698290B publication Critical patent/TWI698290B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0405—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads
    • B05B13/041—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads with spray heads reciprocating along a straight line
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid

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  • Coating Apparatus (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW105139832A 2015-12-17 2016-12-02 塗布器洗淨裝置以及塗布裝置 TWI698290B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015246346A JP6664952B2 (ja) 2015-12-17 2015-12-17 塗布器洗浄装置及び塗布装置
JP??2015-246346 2015-12-17

Publications (2)

Publication Number Publication Date
TW201722569A TW201722569A (zh) 2017-07-01
TWI698290B true TWI698290B (zh) 2020-07-11

Family

ID=59078946

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105139832A TWI698290B (zh) 2015-12-17 2016-12-02 塗布器洗淨裝置以及塗布裝置

Country Status (4)

Country Link
JP (1) JP6664952B2 (ja)
KR (1) KR102520093B1 (ja)
CN (1) CN106914366B (ja)
TW (1) TWI698290B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108045772B (zh) * 2017-12-01 2019-07-19 常德金德新材料科技股份有限公司 一种恒温料槽
WO2019145988A1 (en) * 2018-01-29 2019-08-01 Corob S.P.A. Cleaning device and corresponding method
KR102322678B1 (ko) * 2019-12-12 2021-11-05 세메스 주식회사 노즐 건조 방지 장치
CN113492080B (zh) * 2020-04-01 2022-11-18 阳程科技股份有限公司 可减缓溶剂回流至涂布头内的涂布机及浸泡方法
JP7308182B2 (ja) * 2020-12-21 2023-07-13 株式会社Ｓｃｒｅｅｎホールディングス ノズル洗浄装置および塗布装置

Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH0415233U (ja) * 1990-05-25 1992-02-06
TW546728B (en) * 2001-09-27 2003-08-11 Mitsui Chemicals Inc Surface protecting adhesive film for semiconductor wafer and protecting method for semiconductor wafer using said adhesive film
JP2005205329A (ja) * 2004-01-23 2005-08-04 Tokyo Electron Ltd 塗布装置
TW201123281A (en) * 2009-10-05 2011-07-01 Tokyo Electron Ltd Ultrasonic cleaning device, ultrasonic cleaning method, and recording medium that records computer program for executing the ultrasonic cleaning method
TW201325728A (zh) * 2011-07-12 2013-07-01 Toray Industries 噴嘴清洗方法及塗佈裝置

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JPH07328573A (ja) * 1994-06-09 1995-12-19 Supiide Fuamu Clean Syst Kk 洗浄方法及び洗浄装置
DE19654903C2 (de) * 1996-04-24 1998-09-24 Steag Micro Tech Gmbh Vorrichtung zum Behandeln von Substraten in einem Fluid-Behälter
US7077916B2 (en) * 2002-03-11 2006-07-18 Matsushita Electric Industrial Co., Ltd. Substrate cleaning method and cleaning apparatus
JP2004314048A (ja) 2003-01-15 2004-11-11 Toray Ind Inc 循環式口金洗浄装置および洗浄方法
KR100926308B1 (ko) * 2003-04-23 2009-11-12 삼성전자주식회사 세정 유닛, 이를 갖는 코팅 장치 및 방법
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JP4934739B2 (ja) * 2010-06-07 2012-05-16 独立行政法人産業技術総合研究所 超音波洗浄装置及び超音波洗浄方法
JP2013071033A (ja) * 2011-09-27 2013-04-22 Dainippon Screen Mfg Co Ltd ノズル洗浄装置および該ノズル洗浄装置を備えた塗布装置
JP5701822B2 (ja) * 2012-06-20 2015-04-15 東レエンジニアリング株式会社 洗浄装置および洗浄方法
CN103294309B (zh) * 2013-05-09 2017-09-26 晟光科技股份有限公司 一种ogs触摸屏黑色边框的制作方法
CN103331276B (zh) * 2013-07-12 2016-05-18 深圳市华星光电技术有限公司 超声波清洗装置和具有该超声波清洗装置的涂布机
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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0415233U (ja) * 1990-05-25 1992-02-06
TW546728B (en) * 2001-09-27 2003-08-11 Mitsui Chemicals Inc Surface protecting adhesive film for semiconductor wafer and protecting method for semiconductor wafer using said adhesive film
JP2005205329A (ja) * 2004-01-23 2005-08-04 Tokyo Electron Ltd 塗布装置
TW201123281A (en) * 2009-10-05 2011-07-01 Tokyo Electron Ltd Ultrasonic cleaning device, ultrasonic cleaning method, and recording medium that records computer program for executing the ultrasonic cleaning method
TW201325728A (zh) * 2011-07-12 2013-07-01 Toray Industries 噴嘴清洗方法及塗佈裝置

Also Published As

Publication number Publication date
JP6664952B2 (ja) 2020-03-13
CN106914366B (zh) 2020-11-17
KR20170072789A (ko) 2017-06-27
KR102520093B1 (ko) 2023-04-10
JP2017109180A (ja) 2017-06-22
TW201722569A (zh) 2017-07-01
CN106914366A (zh) 2017-07-04

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