TWI611856B - 雷射加工的方法、雷射加工的製品和雷射加工的裝置 - Google Patents
雷射加工的方法、雷射加工的製品和雷射加工的裝置 Download PDFInfo
- Publication number
- TWI611856B TWI611856B TW102134208A TW102134208A TWI611856B TW I611856 B TWI611856 B TW I611856B TW 102134208 A TW102134208 A TW 102134208A TW 102134208 A TW102134208 A TW 102134208A TW I611856 B TWI611856 B TW I611856B
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Links
- 238000000034 method Methods 0.000 title claims abstract description 106
- 238000003754 machining Methods 0.000 title abstract description 15
- 239000003574 free electron Substances 0.000 claims abstract description 6
- 230000008569 process Effects 0.000 claims description 42
- 238000012545 processing Methods 0.000 claims description 38
- 238000007781 pre-processing Methods 0.000 claims description 30
- 230000002787 reinforcement Effects 0.000 claims description 23
- 239000011521 glass Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 19
- 230000003746 surface roughness Effects 0.000 claims description 13
- 238000010521 absorption reaction Methods 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 11
- 230000007547 defect Effects 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 4
- 239000005341 toughened glass Substances 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000003014 reinforcing effect Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000003486 chemical etching Methods 0.000 claims 1
- 238000000992 sputter etching Methods 0.000 claims 1
- 230000006835 compression Effects 0.000 description 9
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- 150000001875 compounds Chemical class 0.000 description 6
- 238000005422 blasting Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000005361 soda-lime glass Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000005407 aluminoborosilicate glass Substances 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000006133 sodium aluminosilicate glass Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BEJRNLMOMBGWFU-UHFFFAOYSA-N bismuth boron Chemical compound [B].[Bi] BEJRNLMOMBGWFU-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000005387 chalcogenide glass Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
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- 238000005520 cutting process Methods 0.000 description 1
- 239000005383 fluoride glass Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
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- 230000004936 stimulating effect Effects 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/359—Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/02—Iron or ferrous alloys
- B23K2103/04—Steel or steel alloys
- B23K2103/05—Stainless steel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/10—Aluminium or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/14—Titanium or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/52—Ceramics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261705038P | 2012-09-24 | 2012-09-24 | |
| US61/705,038 | 2012-09-24 | ||
| US201261705559P | 2012-09-25 | 2012-09-25 | |
| US61/705,559 | 2012-09-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201431635A TW201431635A (zh) | 2014-08-16 |
| TWI611856B true TWI611856B (zh) | 2018-01-21 |
Family
ID=50337865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102134208A TWI611856B (zh) | 2012-09-24 | 2013-09-24 | 雷射加工的方法、雷射加工的製品和雷射加工的裝置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10357850B2 (enExample) |
| EP (1) | EP2897760A4 (enExample) |
| JP (1) | JP2015533654A (enExample) |
| KR (1) | KR20150060826A (enExample) |
| CN (1) | CN104703748B (enExample) |
| TW (1) | TWI611856B (enExample) |
| WO (1) | WO2014058606A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5996260B2 (ja) * | 2012-05-09 | 2016-09-21 | 株式会社ディスコ | 被加工物の分割方法 |
| EP2754524B1 (de) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| EP2781296B1 (de) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser |
| US9328011B2 (en) * | 2013-06-04 | 2016-05-03 | Coherent, Inc. | Laser-scribing of chemically strengthened glass |
| US10293436B2 (en) | 2013-12-17 | 2019-05-21 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| GB2527553B (en) * | 2014-06-25 | 2017-08-23 | Fianium Ltd | Laser processing |
| EP3166895B1 (en) * | 2014-07-08 | 2021-11-24 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| EP3169477B1 (en) | 2014-07-14 | 2020-01-29 | Corning Incorporated | System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter |
| HUE055461T2 (hu) | 2015-03-24 | 2021-11-29 | Corning Inc | Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása |
| JP6294378B2 (ja) | 2016-03-30 | 2018-03-14 | ファナック株式会社 | 前加工制御部を備えるレーザ加工装置及びレーザ加工方法 |
| WO2018022441A1 (en) * | 2016-07-28 | 2018-02-01 | Electro Scientific Industries, Inc. | Laser processing apparatus and methods of laser-processing workpieces |
| DE112017004557T5 (de) * | 2016-09-09 | 2019-05-23 | Mitsubishi Electric Corporation | Laserbearbeitungsvorrichtung |
| CN113399816B (zh) | 2016-09-30 | 2023-05-16 | 康宁股份有限公司 | 使用非轴对称束斑对透明工件进行激光加工的设备和方法 |
| CN110167891A (zh) | 2016-10-24 | 2019-08-23 | 康宁股份有限公司 | 用于对片状玻璃基材进行基于激光的机械加工的基材处理工位 |
| JP6717758B2 (ja) * | 2017-01-10 | 2020-07-01 | ファナック株式会社 | 複合加工方法及び複合加工プログラム |
| WO2018181522A1 (ja) * | 2017-03-31 | 2018-10-04 | 株式会社ジャパンディスプレイ | 電子機器及びその製造方法 |
| US20190233321A1 (en) | 2018-01-26 | 2019-08-01 | Corning Incorporated | Liquid-assisted laser micromachining of transparent dielectrics |
| TWI816897B (zh) | 2018-10-08 | 2023-10-01 | 美商伊雷克托科學工業股份有限公司 | 用於在基板中形成穿孔的方法 |
| DE102019121827A1 (de) * | 2019-08-13 | 2021-02-18 | Trumpf Laser- Und Systemtechnik Gmbh | Laserätzen mit variierender Ätzselektivität |
| DE102020123146A1 (de) | 2019-09-06 | 2021-03-11 | Andreas Wienkamp | Verfahren und Vorrichtung zum Einbringen eines Schnitts in ein Werkstück |
| KR102875674B1 (ko) * | 2020-07-21 | 2025-10-23 | 삼성디스플레이 주식회사 | 레이저 장치 및 표시 장치의 제조 방법 |
| CN113226632A (zh) * | 2021-03-31 | 2021-08-06 | 长江存储科技有限责任公司 | 用于切割半导体结构的激光系统及其操作方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5968441A (en) * | 1997-10-21 | 1999-10-19 | Nec Corporation | Laser processing method |
| JP2002192369A (ja) * | 2000-09-13 | 2002-07-10 | Hamamatsu Photonics Kk | レーザ加工方法及びレーザ加工装置 |
| US20040002199A1 (en) * | 2000-09-13 | 2004-01-01 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
| TW200631718A (en) * | 2004-12-08 | 2006-09-16 | Laser Solutions Co Ltd | Division starting point forming method in body to be divided, dividing method for body to be divided, and method of processing work by pulse laser beam |
| US20080160295A1 (en) * | 2006-04-12 | 2008-07-03 | Picodeon Ltd Oy | Method for adjusting ablation threshold |
| US20080185367A1 (en) * | 2007-02-01 | 2008-08-07 | Uri El-Hanany | Method and system of machining using a beam of photons |
| US20080299745A1 (en) * | 2007-05-30 | 2008-12-04 | Disco Corporation | Wafer separating method |
| JP2010142862A (ja) * | 2008-12-22 | 2010-07-01 | Cyber Laser Kk | 誘電体材料表面のナノ周期構造形成方法 |
| US20110049765A1 (en) * | 2009-08-28 | 2011-03-03 | Xinghua Li | Methods for Laser Cutting Glass Substrates |
| US20120061361A1 (en) * | 2010-09-10 | 2012-03-15 | Disco Corporation | Method of dividing workpiece |
Family Cites Families (171)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL298724A (enExample) | 1962-10-04 | |||
| US4702042A (en) | 1984-09-27 | 1987-10-27 | Libbey-Owens-Ford Co. | Cutting strengthened glass |
| US4828900A (en) | 1987-12-23 | 1989-05-09 | Ppg Industries, Inc. | Discrete glass cutting and edge shaping |
| JPS62248681A (ja) * | 1986-04-21 | 1987-10-29 | Kanzaki Paper Mfg Co Ltd | レ−ザ−焼付画法 |
| GB2227965B (en) | 1988-10-12 | 1993-02-10 | Rolls Royce Plc | Apparatus for drilling a shaped hole in a workpiece |
| ATE199046T1 (de) | 1990-05-09 | 2001-02-15 | Canon Kk | Erzeugung von mustern und herstellungsverfahren für halbleiteranordnungen mit diesem muster |
| RU2024441C1 (ru) | 1992-04-02 | 1994-12-15 | Владимир Степанович Кондратенко | Способ резки неметаллических материалов |
| US5637244A (en) | 1993-05-13 | 1997-06-10 | Podarok International, Inc. | Method and apparatus for creating an image by a pulsed laser beam inside a transparent material |
| FI103396B (fi) * | 1994-03-24 | 1999-06-30 | Laserplus Oy | Menetelmä ja laite merkkausten tekemiseksi lasipintaan |
| US5656186A (en) | 1994-04-08 | 1997-08-12 | The Regents Of The University Of Michigan | Method for controlling configuration of laser induced breakdown and ablation |
| US5543365A (en) | 1994-12-02 | 1996-08-06 | Texas Instruments Incorporated | Wafer scribe technique using laser by forming polysilicon |
| US5665134A (en) | 1995-06-07 | 1997-09-09 | Hughes Missile Systems Company | Laser machining of glass-ceramic materials |
| US6373026B1 (en) | 1996-07-31 | 2002-04-16 | Mitsubishi Denki Kabushiki Kaisha | Laser beam machining method for wiring board, laser beam machining apparatus for wiring board, and carbonic acid gas laser oscillator for machining wiring board |
| WO1997007927A1 (en) | 1995-08-31 | 1997-03-06 | Corning Incorporated | Method and apparatus for breaking brittle materials |
| JP3211683B2 (ja) * | 1996-07-18 | 2001-09-25 | 株式会社日立製作所 | 情報記録ディスク用ガラス基板 |
| JP3155717B2 (ja) | 1996-10-24 | 2001-04-16 | 日本板硝子株式会社 | マイクロレンズに対するレーザ加工方法 |
| US6820330B1 (en) | 1996-12-13 | 2004-11-23 | Tessera, Inc. | Method for forming a multi-layer circuit assembly |
| US5973290A (en) | 1997-02-26 | 1999-10-26 | W. L. Gore & Associates, Inc. | Laser apparatus having improved via processing rate |
| JP3957010B2 (ja) | 1997-06-04 | 2007-08-08 | 日本板硝子株式会社 | 微細孔を有するガラス基材 |
| US6577472B2 (en) | 1997-07-24 | 2003-06-10 | Hitachi, Ltd. | Glass substrate for a magnetic disk, a magnetic disk which can be formed with a stable texture |
| DE19741329C1 (de) | 1997-09-19 | 1998-10-22 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Materialbearbeitung mit Plasma induzierender Hochenergiestrahlung |
| JPH11134645A (ja) | 1997-10-30 | 1999-05-21 | Hoya Corp | 情報記録媒体用ガラス基板及びその製造方法 |
| JP3449201B2 (ja) | 1997-11-28 | 2003-09-22 | 日亜化学工業株式会社 | 窒化物半導体素子の製造方法 |
| US6313435B1 (en) * | 1998-11-20 | 2001-11-06 | 3M Innovative Properties Company | Mask orbiting for laser ablated feature formation |
| US6211488B1 (en) | 1998-12-01 | 2001-04-03 | Accudyne Display And Semiconductor Systems, Inc. | Method and apparatus for separating non-metallic substrates utilizing a laser initiated scribe |
| US6333485B1 (en) | 1998-12-11 | 2001-12-25 | International Business Machines Corporation | Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed beam |
| DE10029110B4 (de) | 1999-06-15 | 2006-05-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren für die Materialbearbeitung und Verwendung desselben |
| US6795274B1 (en) | 1999-09-07 | 2004-09-21 | Asahi Glass Company, Ltd. | Method for manufacturing a substantially circular substrate by utilizing scribing |
| CA2397315C (en) | 2000-01-27 | 2009-07-07 | National Research Council Of Canada | Method and apparatus for repair of defects in materials with short laser pulses |
| US6891997B2 (en) * | 2000-02-17 | 2005-05-10 | Xponent Photonics Inc. | Fiber-ring optical resonators |
| JP2001274441A (ja) | 2000-03-23 | 2001-10-05 | Mitsubishi Heavy Ind Ltd | 太陽電池パネルの一括切断処理方法 |
| US20010035447A1 (en) | 2000-05-05 | 2001-11-01 | Andreas Gartner | Methods for laser cut initiation |
| JP2001354439A (ja) | 2000-06-12 | 2001-12-25 | Matsushita Electric Ind Co Ltd | ガラス基板の加工方法および高周波回路の製作方法 |
| JP4786783B2 (ja) | 2000-08-18 | 2011-10-05 | 日本板硝子株式会社 | ガラス板の切断方法及び記録媒体用ガラス円盤 |
| US20020033558A1 (en) | 2000-09-20 | 2002-03-21 | Fahey Kevin P. | UV laser cutting or shape modification of brittle, high melting temperature target materials such as ceramics or glasses |
| JP4150155B2 (ja) | 2000-10-10 | 2008-09-17 | 株式会社日立製作所 | 情報記録媒体、情報の記録方法、再生方法、記録記録装置及び情報再生装置 |
| US6962279B1 (en) | 2000-10-18 | 2005-11-08 | Ge Medical Systems Global Technology Company, Llc | Apparatus and method for glass separation for flat panel displays |
| JP4512786B2 (ja) | 2000-11-17 | 2010-07-28 | 独立行政法人産業技術総合研究所 | ガラス基板の加工方法 |
| US6812430B2 (en) | 2000-12-01 | 2004-11-02 | Lg Electronics Inc. | Glass cutting method and apparatus with controlled laser beam energy |
| US20030044539A1 (en) | 2001-02-06 | 2003-03-06 | Oswald Robert S. | Process for producing photovoltaic devices |
| US20040128016A1 (en) * | 2001-03-22 | 2004-07-01 | Stewart David H. | Method for manufacturing a near net-shape mold |
| WO2003002289A1 (en) | 2001-06-28 | 2003-01-09 | Electro Scientific Industries, Inc. | Multistep laser processing of wafers supporting surface device layers |
| US6642476B2 (en) | 2001-07-23 | 2003-11-04 | Siemens Automative Corporation | Apparatus and method of forming orifices and chamfers for uniform orifice coefficient and surface properties by laser |
| JP4659301B2 (ja) | 2001-09-12 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| US6521862B1 (en) | 2001-10-09 | 2003-02-18 | International Business Machines Corporation | Apparatus and method for improving chamfer quality of disk edge surfaces with laser treatment |
| SG122749A1 (en) * | 2001-10-16 | 2006-06-29 | Inst Data Storage | Method of laser marking and apparatus therefor |
| US6642477B1 (en) | 2001-10-23 | 2003-11-04 | Imra America, Inc. | Method for laser drilling a counter-tapered through-hole in a material |
| SG147307A1 (en) | 2001-11-08 | 2008-11-28 | Sharp Kk | Method and apparatus for cutting apart a glass substrate, liquid crystal panel, and apparatus for fabricating a liquid crystal panel |
| JP2003160348A (ja) | 2001-11-21 | 2003-06-03 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板及びその製造方法 |
| US6720519B2 (en) | 2001-11-30 | 2004-04-13 | Matsushita Electric Industrial Co., Ltd. | System and method of laser drilling |
| JP2003226551A (ja) | 2002-02-05 | 2003-08-12 | Nippon Sheet Glass Co Ltd | 微細孔を有するガラス板およびその製造方法 |
| US20030155328A1 (en) * | 2002-02-15 | 2003-08-21 | Huth Mark C. | Laser micromachining and methods and systems of same |
| RU2226183C2 (ru) | 2002-02-21 | 2004-03-27 | Алексеев Андрей Михайлович | Способ резки прозрачных неметаллических материалов |
| JP4267240B2 (ja) | 2002-02-22 | 2009-05-27 | 日本板硝子株式会社 | ガラス構造物の製造方法 |
| US6756563B2 (en) | 2002-03-07 | 2004-06-29 | Orbotech Ltd. | System and method for forming holes in substrates containing glass |
| FR2839508B1 (fr) | 2002-05-07 | 2005-03-04 | Saint Gobain | Vitrage decoupe sans rompage |
| US6809291B1 (en) | 2002-08-30 | 2004-10-26 | Southeastern Universities Research Assn., Inc. | Process for laser machining and surface treatment |
| JP2004160483A (ja) * | 2002-11-12 | 2004-06-10 | Disco Abrasive Syst Ltd | レーザー加工方法およびレーザー加工装置 |
| KR100497820B1 (ko) | 2003-01-06 | 2005-07-01 | 로체 시스템즈(주) | 유리판절단장치 |
| US20050064137A1 (en) * | 2003-01-29 | 2005-03-24 | Hunt Alan J. | Method for forming nanoscale features and structures produced thereby |
| KR20050094423A (ko) * | 2003-02-04 | 2005-09-27 | 아사히 가라스 가부시키가이샤 | 유리기판 표면의 이물 제거방법 |
| US7023001B2 (en) | 2003-03-31 | 2006-04-04 | Institut National D'optique | Method for engraving materials using laser etched V-grooves |
| JP2004299969A (ja) | 2003-03-31 | 2004-10-28 | Toshiba Ceramics Co Ltd | シリカガラスのスライス方法 |
| JP2004343008A (ja) | 2003-05-19 | 2004-12-02 | Disco Abrasive Syst Ltd | レーザ光線を利用した被加工物分割方法 |
| US6949449B2 (en) | 2003-07-11 | 2005-09-27 | Electro Scientific Industries, Inc. | Method of forming a scribe line on a ceramic substrate |
| EP2269765B1 (en) | 2003-07-18 | 2014-10-15 | Hamamatsu Photonics K.K. | Cut semiconductor chip |
| US20050029240A1 (en) * | 2003-08-07 | 2005-02-10 | Translume, Inc. | Dual light source machining method and system |
| JP2005081715A (ja) | 2003-09-09 | 2005-03-31 | Sony Corp | レーザ加工装置およびレーザ加工方法 |
| JP2005088023A (ja) | 2003-09-12 | 2005-04-07 | Seiko Epson Corp | 透明体の加工方法 |
| US20050087522A1 (en) | 2003-10-24 | 2005-04-28 | Yunlong Sun | Laser processing of a locally heated target material |
| JP2005144530A (ja) | 2003-11-19 | 2005-06-09 | National Institute Of Advanced Industrial & Technology | 透明媒体のレーザー精密加工法 |
| JP2005268752A (ja) | 2004-02-19 | 2005-09-29 | Canon Inc | レーザ割断方法、被割断部材および半導体素子チップ |
| FI120082B (fi) | 2004-03-18 | 2009-06-30 | Antti Salminen | Menetelmä materiaalin työstämiseksi suuritehotiheyksisellä sähkömagneettisella säteilyllä |
| US7057133B2 (en) * | 2004-04-14 | 2006-06-06 | Electro Scientific Industries, Inc. | Methods of drilling through-holes in homogenous and non-homogenous substrates |
| DE102004020737A1 (de) | 2004-04-27 | 2005-11-24 | Lzh Laserzentrum Hannover E.V. | Vorrichtung zum Durchtrennen von Bauteilen aus sprödbrüchigen Materialien mit spannungsfreier Bauteillagerung |
| DE102004024475A1 (de) | 2004-05-14 | 2005-12-01 | Lzh Laserzentrum Hannover E.V. | Verfahren und Vorrichtung zum Trennen von Halbleitermaterialien |
| US7060933B2 (en) | 2004-06-08 | 2006-06-13 | Igor Troitski | Method and laser system for production of laser-induced images inside and on the surface of transparent material |
| KR101193874B1 (ko) | 2004-07-30 | 2012-10-26 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | 기판의 수직크랙 형성방법 및 수직크랙 형성장치 |
| US7598167B2 (en) | 2004-08-24 | 2009-10-06 | Micron Technology, Inc. | Method of forming vias in semiconductor substrates without damaging active regions thereof and resulting structures |
| US7378342B2 (en) | 2004-08-27 | 2008-05-27 | Micron Technology, Inc. | Methods for forming vias varying lateral dimensions |
| US7169687B2 (en) | 2004-11-03 | 2007-01-30 | Intel Corporation | Laser micromachining method |
| CN100481337C (zh) | 2004-12-08 | 2009-04-22 | 雷射先进科技株式会社 | 被分割体的分割起点形成方法、被分割体的分割方法 |
| US7528342B2 (en) | 2005-02-03 | 2009-05-05 | Laserfacturing, Inc. | Method and apparatus for via drilling and selective material removal using an ultrafast pulse laser |
| US20070012665A1 (en) | 2005-07-12 | 2007-01-18 | Hewlett-Packard Development Company Lp | Laser ablation |
| US9138913B2 (en) | 2005-09-08 | 2015-09-22 | Imra America, Inc. | Transparent material processing with an ultrashort pulse laser |
| US7423821B2 (en) * | 2006-03-24 | 2008-09-09 | Gentex Corporation | Vision system |
| US20070231542A1 (en) * | 2006-04-03 | 2007-10-04 | General Electric Company | Articles having low wettability and high light transmission |
| WO2007145702A2 (en) * | 2006-04-10 | 2007-12-21 | Board Of Trustees Of Michigan State University | Laser material processing systems and methods with, in particular, use of a hollow waveguide for broadening the bandwidth of the pulse above 20 nm |
| JP2007283318A (ja) | 2006-04-13 | 2007-11-01 | Seiko Epson Corp | 基体の製造方法、レーザ加工装置、表示装置、電気光学装置、電子機器 |
| US8624157B2 (en) | 2006-05-25 | 2014-01-07 | Electro Scientific Industries, Inc. | Ultrashort laser pulse wafer scribing |
| US20070272666A1 (en) | 2006-05-25 | 2007-11-29 | O'brien James N | Infrared laser wafer scribing using short pulses |
| JP2007319881A (ja) | 2006-05-31 | 2007-12-13 | Seiko Epson Corp | 基体の製造方法、レーザ加工装置、表示装置、電気光学装置、電子機器 |
| US8394301B2 (en) | 2006-06-02 | 2013-03-12 | Electro Scientific Industries, Inc. | Process for forming panel with an optically transmissive portion and products related thereto |
| US20100029459A1 (en) * | 2006-07-26 | 2010-02-04 | Josef Wilson Zwanziger | Glasses having a reduced stress-optic coefficient |
| US20080029152A1 (en) * | 2006-08-04 | 2008-02-07 | Erel Milshtein | Laser scribing apparatus, systems, and methods |
| US20080093775A1 (en) | 2006-08-19 | 2008-04-24 | Colorado State University Research Foundation | Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light |
| US8168514B2 (en) | 2006-08-24 | 2012-05-01 | Corning Incorporated | Laser separation of thin laminated glass substrates for flexible display applications |
| DE102006046313B3 (de) | 2006-09-29 | 2008-01-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Anordnung zum Strukturieren einer lichtleitenden Faser entlang deren Längsachse (longitudinale Strukturierung) basierend auf der nicht-linearen Absorption von Laserstrahlung |
| US20080156780A1 (en) * | 2006-12-29 | 2008-07-03 | Sergei Voronov | Substrate markings |
| DE102007009786B4 (de) | 2007-02-27 | 2013-09-05 | Schott Ag | Beschichtetes vorgespanntes Glas, Verfahren zu dessen Herstellung und dessen Verwendung |
| TWI394731B (zh) | 2007-03-02 | 2013-05-01 | Nippon Electric Glass Co | 強化板玻璃及其製造方法 |
| US7982162B2 (en) | 2007-05-15 | 2011-07-19 | Corning Incorporated | Method and apparatus for scoring and separating a brittle material with a single beam of radiation |
| US20080290077A1 (en) | 2007-05-22 | 2008-11-27 | Demeritt Jeffery Alan | Separation of transparent glasses and systems and methods therefor |
| US8710402B2 (en) | 2007-06-01 | 2014-04-29 | Electro Scientific Industries, Inc. | Method of and apparatus for laser drilling holes with improved taper |
| US20090020511A1 (en) | 2007-07-17 | 2009-01-22 | Kommera Swaroop K | Ablation |
| JP4402708B2 (ja) * | 2007-08-03 | 2010-01-20 | 浜松ホトニクス株式会社 | レーザ加工方法、レーザ加工装置及びその製造方法 |
| US20090045179A1 (en) | 2007-08-15 | 2009-02-19 | Ellen Marie Kosik Williams | Method and system for cutting solid materials using short pulsed laser |
| JP2009061462A (ja) | 2007-09-05 | 2009-03-26 | Sumitomo Electric Ind Ltd | 基板の製造方法および基板 |
| KR100876502B1 (ko) | 2007-09-21 | 2008-12-31 | 한국정보통신대학교 산학협력단 | 초단파 레이저 빔을 이용한 기판 절단장치 및 그 절단방법 |
| CN101610870B (zh) | 2007-10-16 | 2013-09-11 | 三星钻石工业股份有限公司 | 脆性材料基板的u形槽加工方法以及使用该方法的去除加工方法、打孔加工方法和倒角方法 |
| US8722189B2 (en) | 2007-12-18 | 2014-05-13 | Hoya Corporation | Cover glass for mobile terminals, manufacturing method of the same and mobile terminal device |
| US20090212030A1 (en) * | 2008-02-25 | 2009-08-27 | Optisolar, Inc., A Delaware Corporation | Autofocus for Ablation Laser |
| ATE501404T1 (de) | 2008-02-26 | 2011-03-15 | Rioglass Solar Sa | Reflektorelement für einen sonnenwärmereflektor und verfahren zu seiner herstellung |
| JP5826027B2 (ja) | 2008-03-21 | 2015-12-02 | イムラ アメリカ インコーポレイテッド | レーザベースの材料加工方法及びシステム |
| US8093532B2 (en) | 2008-03-31 | 2012-01-10 | Electro Scientific Industries, Inc. | Laser machining of fired ceramic and other hard and/or thick materials |
| JP2009280452A (ja) | 2008-05-23 | 2009-12-03 | Central Glass Co Ltd | ガラス基板及び製造方法 |
| US7931849B2 (en) * | 2008-06-25 | 2011-04-26 | Applied Micro Circuits Corporation | Non-destructive laser optical integrated circuit package marking |
| WO2010006067A2 (en) * | 2008-07-09 | 2010-01-14 | Fei Company | Method and apparatus for laser machining |
| WO2010016928A2 (en) | 2008-08-08 | 2010-02-11 | Corning Incorporated | Strengthened glass articles and methods of making |
| KR101107859B1 (ko) | 2008-09-12 | 2012-01-31 | 오므론 가부시키가이샤 | 할단용 스크라이브선의 형성 방법 및 장치 |
| EP2377375B1 (en) | 2008-12-13 | 2016-01-27 | M-Solv Limited | Method and apparatus for laser machining relatively narrow and relatively wide structures |
| US9346130B2 (en) | 2008-12-17 | 2016-05-24 | Electro Scientific Industries, Inc. | Method for laser processing glass with a chamfered edge |
| RU2011130891A (ru) | 2008-12-25 | 2013-01-27 | Асахи Гласс Компани, Лимитед | Способ и система для резки пластины из хрупкого материала, и оконное стекло для транспортного средства |
| GB0900036D0 (en) | 2009-01-03 | 2009-02-11 | M Solv Ltd | Method and apparatus for forming grooves with complex shape in the surface of apolymer |
| US8347651B2 (en) | 2009-02-19 | 2013-01-08 | Corning Incorporated | Method of separating strengthened glass |
| US8327666B2 (en) | 2009-02-19 | 2012-12-11 | Corning Incorporated | Method of separating strengthened glass |
| US8341976B2 (en) | 2009-02-19 | 2013-01-01 | Corning Incorporated | Method of separating strengthened glass |
| US9685186B2 (en) | 2009-02-27 | 2017-06-20 | Applied Materials, Inc. | HDD pattern implant system |
| KR101041137B1 (ko) | 2009-03-25 | 2011-06-13 | 삼성모바일디스플레이주식회사 | 기판 절단 장치 및 이를 이용한 기판 절단 방법 |
| US8609512B2 (en) | 2009-03-27 | 2013-12-17 | Electro Scientific Industries, Inc. | Method for laser singulation of chip scale packages on glass substrates |
| US8350187B2 (en) | 2009-03-28 | 2013-01-08 | Electro Scientific Industries, Inc. | Method and apparatus for laser machining |
| US20100285272A1 (en) * | 2009-05-06 | 2010-11-11 | Shari Elizabeth Koval | Multi-length scale textured glass substrates for anti-fingerprinting |
| TWI523720B (zh) | 2009-05-28 | 2016-03-01 | 伊雷克托科學工業股份有限公司 | 應用於雷射處理工件中的特徵的聲光偏轉器及相關雷射處理方法 |
| US8110419B2 (en) * | 2009-08-20 | 2012-02-07 | Integrated Photovoltaic, Inc. | Process of manufacturing photovoltaic device |
| JP2013503105A (ja) | 2009-08-28 | 2013-01-31 | コーニング インコーポレイテッド | 化学強化ガラス基板からガラス品をレーザ割断するための方法 |
| JP5565659B2 (ja) | 2009-10-22 | 2014-08-06 | 株式会社ブイ・テクノロジー | レーザ加工装置 |
| US20110127242A1 (en) | 2009-11-30 | 2011-06-02 | Xinghua Li | Methods for laser scribing and separating glass substrates |
| US8946590B2 (en) | 2009-11-30 | 2015-02-03 | Corning Incorporated | Methods for laser scribing and separating glass substrates |
| KR101758945B1 (ko) | 2009-11-30 | 2017-07-17 | 코닝 인코포레이티드 | 레이저로 유리 기판을 스크라이빙하여 분리하는 방법 |
| JP5031877B2 (ja) | 2010-01-06 | 2012-09-26 | キヤノン株式会社 | 画像処理装置及び画像処理方法 |
| TWI438162B (zh) | 2010-01-27 | 2014-05-21 | Wintek Corp | 強化玻璃切割方法及強化玻璃切割預置結構 |
| JP5451443B2 (ja) | 2010-02-15 | 2014-03-26 | 株式会社ジャパンディスプレイ | 電気的固体装置の製造方法 |
| WO2011106196A1 (en) * | 2010-02-24 | 2011-09-01 | Corning Incorporated | Oleophobic glass substrates |
| US8743165B2 (en) | 2010-03-05 | 2014-06-03 | Micronic Laser Systems Ab | Methods and device for laser processing |
| TWI494284B (zh) | 2010-03-19 | 2015-08-01 | Corning Inc | 強化玻璃之機械劃割及分離 |
| DE102010012265B4 (de) | 2010-03-22 | 2012-09-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Heraustrennen von Einzelscheiben aus einer Verbundglastafel und Verwendung einer Vorrichtung dafür |
| EP2371778A1 (en) | 2010-03-30 | 2011-10-05 | Linde Aktiengesellschaft | Method for producing toughened flat glass with anti-reflective properties |
| CN102905839B (zh) * | 2010-03-30 | 2016-03-09 | Imra美国公司 | 基于激光的材料加工装置和方法 |
| US8383984B2 (en) | 2010-04-02 | 2013-02-26 | Electro Scientific Industries, Inc. | Method and apparatus for laser singulation of brittle materials |
| JP2011230940A (ja) | 2010-04-26 | 2011-11-17 | Mitsuboshi Diamond Industrial Co Ltd | 脆性材料基板の割断方法 |
| JP2011251879A (ja) | 2010-06-02 | 2011-12-15 | Asahi Glass Co Ltd | 化学強化ガラスの切断方法および切断装置 |
| JP5664471B2 (ja) | 2010-06-28 | 2015-02-04 | 信越化学工業株式会社 | 半導体用合成石英ガラス基板の製造方法 |
| KR20120015366A (ko) | 2010-07-19 | 2012-02-21 | 엘지디스플레이 주식회사 | 강화유리 절단방법 및 절단장치 |
| JP2012031018A (ja) | 2010-07-30 | 2012-02-16 | Asahi Glass Co Ltd | 強化ガラス基板及び強化ガラス基板の溝加工方法と強化ガラス基板の切断方法 |
| US8393175B2 (en) | 2010-08-26 | 2013-03-12 | Corning Incorporated | Methods for extracting strengthened glass substrates from glass sheets |
| US8584354B2 (en) | 2010-08-26 | 2013-11-19 | Corning Incorporated | Method for making glass interposer panels |
| US8720228B2 (en) | 2010-08-31 | 2014-05-13 | Corning Incorporated | Methods of separating strengthened glass substrates |
| JP5784298B2 (ja) | 2010-11-01 | 2015-09-24 | 株式会社ディスコ | 加工方法及び加工装置 |
| US8607590B2 (en) * | 2010-11-30 | 2013-12-17 | Corning Incorporated | Methods for separating glass articles from strengthened glass substrate sheets |
| US8616024B2 (en) | 2010-11-30 | 2013-12-31 | Corning Incorporated | Methods for forming grooves and separating strengthened glass substrate sheets |
| US20120168412A1 (en) | 2011-01-05 | 2012-07-05 | Electro Scientific Industries, Inc | Apparatus and method for forming an aperture in a substrate |
| US8539794B2 (en) * | 2011-02-01 | 2013-09-24 | Corning Incorporated | Strengthened glass substrate sheets and methods for fabricating glass panels from glass substrate sheets |
| US8584490B2 (en) | 2011-02-18 | 2013-11-19 | Corning Incorporated | Laser cutting method |
| US8635887B2 (en) | 2011-08-10 | 2014-01-28 | Corning Incorporated | Methods for separating glass substrate sheets by laser-formed grooves |
| JP2013043795A (ja) | 2011-08-23 | 2013-03-04 | Nippon Electric Glass Co Ltd | 強化ガラス及びその製造方法 |
| US20130129947A1 (en) | 2011-11-18 | 2013-05-23 | Daniel Ralph Harvey | Glass article having high damage resistance |
| JP4932059B1 (ja) | 2011-12-16 | 2012-05-16 | 株式会社ミクロ技術研究所 | 強化ガラス、タッチパネル、及び強化ガラスの製造方法 |
| JP2015511571A (ja) | 2012-02-28 | 2015-04-20 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | 強化ガラスの分離のための方法及び装置並びにこれにより生成された製品 |
| US9828278B2 (en) | 2012-02-28 | 2017-11-28 | Electro Scientific Industries, Inc. | Method and apparatus for separation of strengthened glass and articles produced thereby |
| CN104125934A (zh) | 2012-02-28 | 2014-10-29 | 伊雷克托科学工业股份有限公司 | 用于分离强化玻璃的方法及装置及由该强化玻璃生产的物品 |
| US9938180B2 (en) | 2012-06-05 | 2018-04-10 | Corning Incorporated | Methods of cutting glass using a laser |
-
2013
- 2013-09-20 US US14/033,368 patent/US10357850B2/en not_active Expired - Fee Related
- 2013-09-23 KR KR1020157010309A patent/KR20150060826A/ko not_active Ceased
- 2013-09-23 JP JP2015533250A patent/JP2015533654A/ja active Pending
- 2013-09-23 EP EP13845791.6A patent/EP2897760A4/en not_active Withdrawn
- 2013-09-23 CN CN201380049563.3A patent/CN104703748B/zh not_active Expired - Fee Related
- 2013-09-23 WO PCT/US2013/061212 patent/WO2014058606A1/en not_active Ceased
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Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5968441A (en) * | 1997-10-21 | 1999-10-19 | Nec Corporation | Laser processing method |
| JP2002192369A (ja) * | 2000-09-13 | 2002-07-10 | Hamamatsu Photonics Kk | レーザ加工方法及びレーザ加工装置 |
| US20040002199A1 (en) * | 2000-09-13 | 2004-01-01 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
| TW200631718A (en) * | 2004-12-08 | 2006-09-16 | Laser Solutions Co Ltd | Division starting point forming method in body to be divided, dividing method for body to be divided, and method of processing work by pulse laser beam |
| US20080160295A1 (en) * | 2006-04-12 | 2008-07-03 | Picodeon Ltd Oy | Method for adjusting ablation threshold |
| US20080185367A1 (en) * | 2007-02-01 | 2008-08-07 | Uri El-Hanany | Method and system of machining using a beam of photons |
| US20080299745A1 (en) * | 2007-05-30 | 2008-12-04 | Disco Corporation | Wafer separating method |
| JP2010142862A (ja) * | 2008-12-22 | 2010-07-01 | Cyber Laser Kk | 誘電体材料表面のナノ周期構造形成方法 |
| US20110049765A1 (en) * | 2009-08-28 | 2011-03-03 | Xinghua Li | Methods for Laser Cutting Glass Substrates |
| US20120061361A1 (en) * | 2010-09-10 | 2012-03-15 | Disco Corporation | Method of dividing workpiece |
Also Published As
| Publication number | Publication date |
|---|---|
| US10357850B2 (en) | 2019-07-23 |
| EP2897760A4 (en) | 2016-07-20 |
| KR20150060826A (ko) | 2015-06-03 |
| WO2014058606A1 (en) | 2014-04-17 |
| US20140083986A1 (en) | 2014-03-27 |
| TW201431635A (zh) | 2014-08-16 |
| EP2897760A1 (en) | 2015-07-29 |
| CN104703748B (zh) | 2017-10-03 |
| CN104703748A (zh) | 2015-06-10 |
| JP2015533654A (ja) | 2015-11-26 |
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