TWI430391B - 低熱質量半導體晶圓支撐 - Google Patents
低熱質量半導體晶圓支撐 Download PDFInfo
- Publication number
- TWI430391B TWI430391B TW098121898A TW98121898A TWI430391B TW I430391 B TWI430391 B TW I430391B TW 098121898 A TW098121898 A TW 098121898A TW 98121898 A TW98121898 A TW 98121898A TW I430391 B TWI430391 B TW I430391B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- support
- holes
- boat
- wafer boat
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 27
- 235000012431 wafers Nutrition 0.000 claims description 186
- 238000011109 contamination Methods 0.000 claims description 9
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims description 3
- 229910003468 tantalcarbide Inorganic materials 0.000 claims description 3
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 description 10
- 230000036961 partial effect Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000010453 quartz Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 230000009467 reduction Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000005484 gravity Effects 0.000 description 3
- 230000008646 thermal stress Effects 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
- H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/165,048 US8042697B2 (en) | 2008-06-30 | 2008-06-30 | Low thermal mass semiconductor wafer support |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201009998A TW201009998A (en) | 2010-03-01 |
| TWI430391B true TWI430391B (zh) | 2014-03-11 |
Family
ID=40912053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098121898A TWI430391B (zh) | 2008-06-30 | 2009-06-29 | 低熱質量半導體晶圓支撐 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US8042697B2 (enExample) |
| EP (3) | EP2311080B1 (enExample) |
| JP (1) | JP5436552B2 (enExample) |
| KR (1) | KR20110025781A (enExample) |
| CN (1) | CN102077336A (enExample) |
| TW (1) | TWI430391B (enExample) |
| WO (1) | WO2010002617A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090162183A1 (en) * | 2007-12-19 | 2009-06-25 | Peter Davison | Full-contact ring for a large wafer |
| US8042697B2 (en) * | 2008-06-30 | 2011-10-25 | Memc Electronic Materials, Inc. | Low thermal mass semiconductor wafer support |
| JP5565242B2 (ja) * | 2010-09-29 | 2014-08-06 | 東京エレクトロン株式会社 | 縦型熱処理装置 |
| JP5881956B2 (ja) * | 2011-02-28 | 2016-03-09 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法およびウェーハホルダ |
| USD763807S1 (en) * | 2014-05-22 | 2016-08-16 | Hzo, Inc. | Boat for a deposition apparatus |
| US9099514B2 (en) * | 2012-03-21 | 2015-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer holder with tapered region |
| US10190235B2 (en) * | 2013-05-24 | 2019-01-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer supporting structure and method for forming the same |
| JP6321172B2 (ja) * | 2013-11-25 | 2018-05-09 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 熱エネルギー伝達低減のための基板キャリア |
| KR20150110207A (ko) * | 2014-03-24 | 2015-10-02 | 주식회사 테라세미콘 | 보트 |
| US10072892B2 (en) * | 2015-10-26 | 2018-09-11 | Globalwafers Co., Ltd. | Semiconductor wafer support ring for heat treatment |
| DE102015014903A1 (de) * | 2015-11-18 | 2017-05-18 | Centrotherm Photovoltaics Ag | Waferboot und Plasma-Behandlungsvorrichtung für Wafer |
| JP6770461B2 (ja) * | 2017-02-21 | 2020-10-14 | クアーズテック株式会社 | 縦型ウエハボート |
| WO2020001730A1 (en) * | 2018-06-25 | 2020-01-02 | Applied Materials, Inc. | Carrier for a substrate and method for carrying a substrate |
| TWI735115B (zh) * | 2019-12-24 | 2021-08-01 | 力成科技股份有限公司 | 晶圓儲存裝置及晶圓承載盤 |
| US12046495B2 (en) | 2020-06-26 | 2024-07-23 | Globalwafers Co., Ltd. | Wafer boats for supporting semiconductor wafers in a furnace |
| JP7734211B2 (ja) * | 2021-05-12 | 2025-09-04 | アプライド マテリアルズ インコーポレイテッド | 低質量基板支持体 |
| CN113964071A (zh) * | 2021-11-25 | 2022-01-21 | 滁州钰顺企业管理咨询合伙企业(有限合伙) | 一种降低晶圆包装破损的方法 |
| US12261068B2 (en) * | 2022-10-27 | 2025-03-25 | Intel Corporation | Wafer support member and method of manufacturing a wafer support member |
| EP4498411A3 (en) * | 2023-06-28 | 2025-03-26 | ASM IP Holding B.V. | Wafer boat system, holder ring and use thereof |
| TW202537026A (zh) * | 2024-03-13 | 2025-09-16 | 力晶積成電子製造股份有限公司 | 晶圓承載裝置 |
Family Cites Families (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1587693A (en) * | 1924-07-26 | 1926-06-08 | Edith M Beland | Attachment for sinks |
| US5199582A (en) * | 1990-05-14 | 1993-04-06 | Halstrick Robert T | Storage rack shelving with improved fire protection |
| JP3125199B2 (ja) * | 1993-03-18 | 2001-01-15 | 東京エレクトロン株式会社 | 縦型熱処理装置 |
| JPH07254591A (ja) * | 1994-03-16 | 1995-10-03 | Toshiba Corp | 熱処理装置 |
| KR0135049B1 (ko) * | 1994-05-31 | 1998-04-20 | 양승택 | 반도체 제조장비의 웨이퍼 장착 카세트 |
| JP3692697B2 (ja) | 1997-03-25 | 2005-09-07 | 三菱住友シリコン株式会社 | ウェハ支持体及び縦型ボート |
| JPH11260746A (ja) | 1998-03-13 | 1999-09-24 | Sumitomo Metal Ind Ltd | ウェーハ支持板 |
| KR20000002833A (ko) | 1998-06-23 | 2000-01-15 | 윤종용 | 반도체 웨이퍼 보트 |
| KR100427916B1 (ko) * | 1999-09-03 | 2004-04-28 | 미쯔이 죠센 가부시키가이샤 | 웨이퍼 보유 지지구 |
| JP4592849B2 (ja) | 1999-10-29 | 2010-12-08 | アプライド マテリアルズ インコーポレイテッド | 半導体製造装置 |
| US7204887B2 (en) | 2000-10-16 | 2007-04-17 | Nippon Steel Corporation | Wafer holding, wafer support member, wafer boat and heat treatment furnace |
| JP2002134484A (ja) | 2000-10-19 | 2002-05-10 | Asm Japan Kk | 半導体基板保持装置 |
| US6497403B2 (en) | 2000-12-28 | 2002-12-24 | Memc Electronic Materials, Inc. | Semiconductor wafer holder |
| US6488497B1 (en) * | 2001-07-12 | 2002-12-03 | Saint-Gobain Ceramics & Plastics, Inc. | Wafer boat with arcuate wafer support arms |
| JP4633977B2 (ja) | 2001-08-30 | 2011-02-16 | 信越半導体株式会社 | アニールウエーハの製造方法及びアニールウエーハ |
| JP3541838B2 (ja) | 2002-03-28 | 2004-07-14 | 信越半導体株式会社 | サセプタ、エピタキシャルウェーハの製造装置および製造方法 |
| JP2003197722A (ja) * | 2001-12-26 | 2003-07-11 | Toshiba Ceramics Co Ltd | 半導体ウェーハ熱処理用治具及びこれを用いた熱処理用装置並びに半導体ウェーハ熱処理用治具の製造方法 |
| JP3377996B1 (ja) * | 2001-12-27 | 2003-02-17 | 東京エレクトロン株式会社 | 熱処理用ボート及び縦型熱処理装置 |
| US7077913B2 (en) | 2002-01-17 | 2006-07-18 | Hitachi Kokusai Electric, Inc. | Apparatus for fabricating a semiconductor device |
| US7256375B2 (en) | 2002-08-30 | 2007-08-14 | Asm International N.V. | Susceptor plate for high temperature heat treatment |
| KR100492977B1 (ko) * | 2002-12-12 | 2005-06-07 | 삼성전자주식회사 | 다공성 실리카 박막의 소결을 위한 웨이퍼 보트 |
| CN100352032C (zh) | 2003-03-26 | 2007-11-28 | 信越半导体株式会社 | 热处理用晶片支持器具及热处理装置 |
| JPWO2004090967A1 (ja) | 2003-04-02 | 2006-07-06 | 株式会社Sumco | 半導体ウェーハ用熱処理治具 |
| US7033126B2 (en) | 2003-04-02 | 2006-04-25 | Asm International N.V. | Method and apparatus for loading a batch of wafers into a wafer boat |
| JP4506125B2 (ja) * | 2003-07-16 | 2010-07-21 | 信越半導体株式会社 | 熱処理用縦型ボート及びその製造方法 |
| WO2005044694A1 (ja) * | 2003-11-06 | 2005-05-19 | Sharp Kabushiki Kaisha | 基板搬送用トレイ |
| US20050145584A1 (en) * | 2004-01-06 | 2005-07-07 | Buckley Richard F. | Wafer boat with interference fit wafer supports |
| JP4826070B2 (ja) | 2004-06-21 | 2011-11-30 | 信越半導体株式会社 | 半導体ウエーハの熱処理方法 |
| JP4534619B2 (ja) | 2004-06-21 | 2010-09-01 | 株式会社Sumco | 半導体シリコン基板用熱処理治具 |
| KR100875464B1 (ko) * | 2004-09-30 | 2008-12-22 | 가부시키가이샤 히다치 고쿠사이 덴키 | 열처리 장치 및 기판의 제조방법 |
| US7033168B1 (en) | 2005-01-24 | 2006-04-25 | Memc Electronic Materials, Inc. | Semiconductor wafer boat for a vertical furnace |
| DE102005013831B4 (de) | 2005-03-24 | 2008-10-16 | Siltronic Ag | Siliciumscheibe und Verfahren zur thermischen Behandlung einer Siliciumscheibe |
| US7713355B2 (en) | 2005-05-03 | 2010-05-11 | Integrated Materials, Incorporated | Silicon shelf towers |
| JP2007201417A (ja) | 2005-12-28 | 2007-08-09 | Tokyo Electron Ltd | 熱処理用ボート及び縦型熱処理装置 |
| US20080041798A1 (en) * | 2006-06-30 | 2008-02-21 | Memc Electronic Materials, Inc. | Wafer Platform |
| JP2008108926A (ja) | 2006-10-26 | 2008-05-08 | Bridgestone Corp | ウェハ熱処理用治具 |
| JP2008130695A (ja) | 2006-11-17 | 2008-06-05 | Bridgestone Corp | 熱処理用ホルダー |
| JP4954693B2 (ja) * | 2006-12-21 | 2012-06-20 | 東京エレクトロン株式会社 | 基板の処理方法、基板の処理システム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 |
| JP4313401B2 (ja) | 2007-04-24 | 2009-08-12 | 東京エレクトロン株式会社 | 縦型熱処理装置及び被処理基板移載方法 |
| JP5208547B2 (ja) * | 2008-03-19 | 2013-06-12 | 東京エレクトロン株式会社 | 電力合成器およびマイクロ波導入機構 |
| US8042697B2 (en) * | 2008-06-30 | 2011-10-25 | Memc Electronic Materials, Inc. | Low thermal mass semiconductor wafer support |
| US20100098519A1 (en) | 2008-10-17 | 2010-04-22 | Memc Electronic Materials, Inc. | Support for a semiconductor wafer in a high temperature environment |
| USD616391S1 (en) * | 2009-03-06 | 2010-05-25 | Tokyo Electron Limited | Pedestal of heat insulating cylinder for manufacturing semiconductor wafers |
| USD616396S1 (en) * | 2009-03-12 | 2010-05-25 | Tokyo Electron Limited | Pedestal of heat insulating cylinder for manufacturing semiconductor wafers |
-
2008
- 2008-06-30 US US12/165,048 patent/US8042697B2/en active Active
-
2009
- 2009-06-22 JP JP2011516492A patent/JP5436552B2/ja active Active
- 2009-06-22 EP EP09774069A patent/EP2311080B1/en active Active
- 2009-06-22 WO PCT/US2009/048126 patent/WO2010002617A1/en not_active Ceased
- 2009-06-22 CN CN2009801252789A patent/CN102077336A/zh active Pending
- 2009-06-22 EP EP13155747.2A patent/EP2597673A2/en not_active Withdrawn
- 2009-06-22 KR KR1020107029664A patent/KR20110025781A/ko not_active Ceased
- 2009-06-22 EP EP13155744.9A patent/EP2597672A2/en not_active Withdrawn
- 2009-06-29 TW TW098121898A patent/TWI430391B/zh active
-
2011
- 2011-09-14 US US13/232,684 patent/US8220647B2/en active Active
- 2011-09-14 US US13/232,676 patent/US8220646B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP5436552B2 (ja) | 2014-03-05 |
| KR20110025781A (ko) | 2011-03-11 |
| JP2011527109A (ja) | 2011-10-20 |
| US8220647B2 (en) | 2012-07-17 |
| EP2311080B1 (en) | 2013-02-27 |
| US20090321372A1 (en) | 2009-12-31 |
| US20120077138A1 (en) | 2012-03-29 |
| US20120074081A1 (en) | 2012-03-29 |
| WO2010002617A1 (en) | 2010-01-07 |
| US8042697B2 (en) | 2011-10-25 |
| CN102077336A (zh) | 2011-05-25 |
| EP2597673A2 (en) | 2013-05-29 |
| EP2597672A2 (en) | 2013-05-29 |
| EP2311080A1 (en) | 2011-04-20 |
| US8220646B2 (en) | 2012-07-17 |
| TW201009998A (en) | 2010-03-01 |
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