SG115818A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG115818A1 SG115818A1 SG200501978A SG200501978A SG115818A1 SG 115818 A1 SG115818 A1 SG 115818A1 SG 200501978 A SG200501978 A SG 200501978A SG 200501978 A SG200501978 A SG 200501978A SG 115818 A1 SG115818 A1 SG 115818A1
- Authority
- SG
- Singapore
- Prior art keywords
- device manufacturing
- lithographic apparatus
- lithographic
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/814,815 US7227619B2 (en) | 2004-04-01 | 2004-04-01 | Lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG115818A1 true SG115818A1 (en) | 2005-10-28 |
Family
ID=34887725
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200501978A SG115818A1 (en) | 2004-04-01 | 2005-03-30 | Lithographic apparatus and device manufacturing method |
SG200716415-5A SG136151A1 (en) | 2004-04-01 | 2005-03-30 | Lithographic apparatus and device manufacturing method |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200716415-5A SG136151A1 (en) | 2004-04-01 | 2005-03-30 | Lithographic apparatus and device manufacturing method |
Country Status (8)
Country | Link |
---|---|
US (1) | US7227619B2 (ja) |
EP (1) | EP1582935B1 (ja) |
JP (3) | JP4350056B2 (ja) |
KR (1) | KR100622089B1 (ja) |
CN (1) | CN100520589C (ja) |
DE (1) | DE602005000147T2 (ja) |
SG (2) | SG115818A1 (ja) |
TW (1) | TWI318725B (ja) |
Families Citing this family (90)
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TWI474380B (zh) | 2003-05-23 | 2015-02-21 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
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-
2004
- 2004-04-01 US US10/814,815 patent/US7227619B2/en not_active Expired - Lifetime
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2005
- 2005-03-30 SG SG200501978A patent/SG115818A1/en unknown
- 2005-03-30 SG SG200716415-5A patent/SG136151A1/en unknown
- 2005-03-31 TW TW094110313A patent/TWI318725B/zh active
- 2005-03-31 CN CNB2005100716968A patent/CN100520589C/zh active Active
- 2005-03-31 DE DE602005000147T patent/DE602005000147T2/de active Active
- 2005-03-31 JP JP2005100825A patent/JP4350056B2/ja active Active
- 2005-03-31 EP EP05252043A patent/EP1582935B1/en active Active
- 2005-04-01 KR KR1020050027447A patent/KR100622089B1/ko active IP Right Grant
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Also Published As
Publication number | Publication date |
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JP4669033B2 (ja) | 2011-04-13 |
JP4350056B2 (ja) | 2009-10-21 |
KR20060045412A (ko) | 2006-05-17 |
TW200604754A (en) | 2006-02-01 |
DE602005000147D1 (de) | 2006-11-09 |
US7227619B2 (en) | 2007-06-05 |
KR100622089B1 (ko) | 2006-09-15 |
JP2008306217A (ja) | 2008-12-18 |
JP2005294838A (ja) | 2005-10-20 |
JP5623880B2 (ja) | 2014-11-12 |
DE602005000147T2 (de) | 2007-10-25 |
JP2011066440A (ja) | 2011-03-31 |
SG136151A1 (en) | 2007-10-29 |
CN100520589C (zh) | 2009-07-29 |
CN1702555A (zh) | 2005-11-30 |
EP1582935A1 (en) | 2005-10-05 |
EP1582935B1 (en) | 2006-09-27 |
TWI318725B (en) | 2009-12-21 |
US20050219499A1 (en) | 2005-10-06 |
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