KR970002468A - 화학증폭형 포지티브 레지스트 조성물 - Google Patents

화학증폭형 포지티브 레지스트 조성물

Info

Publication number
KR970002468A
KR970002468A KR1019960020528A KR19960020528A KR970002468A KR 970002468 A KR970002468 A KR 970002468A KR 1019960020528 A KR1019960020528 A KR 1019960020528A KR 19960020528 A KR19960020528 A KR 19960020528A KR 970002468 A KR970002468 A KR 970002468A
Authority
KR
South Korea
Prior art keywords
resist composition
positive resist
chemical amplification
type positive
amplification type
Prior art date
Application number
KR1019960020528A
Other languages
English (en)
Other versions
KR100424148B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR970002468A publication Critical patent/KR970002468A/ko
Application granted granted Critical
Publication of KR100424148B1 publication Critical patent/KR100424148B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
KR1019960020528A 1995-06-05 1996-06-05 화학증폭형포지티브레지스트조성물 KR100424148B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP13829595 1995-06-05
JP95-138295 1995-06-05
JP96-66665 1996-03-22
JP8066665A JPH0954437A (ja) 1995-06-05 1996-03-22 化学増幅型ポジレジスト組成物

Publications (2)

Publication Number Publication Date
KR970002468A true KR970002468A (ko) 1997-01-24
KR100424148B1 KR100424148B1 (ko) 2005-04-06

Family

ID=26407855

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960020528A KR100424148B1 (ko) 1995-06-05 1996-06-05 화학증폭형포지티브레지스트조성물

Country Status (5)

Country Link
US (1) US5939234A (ko)
EP (1) EP0747768B1 (ko)
JP (1) JPH0954437A (ko)
KR (1) KR100424148B1 (ko)
DE (1) DE69610256T2 (ko)

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JP4360844B2 (ja) * 2003-06-16 2009-11-11 富士フイルム株式会社 ポジ型レジスト組成物
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US20050214674A1 (en) * 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
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WO2007124092A2 (en) * 2006-04-21 2007-11-01 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
US20080008956A1 (en) * 2006-06-23 2008-01-10 Eastman Kodak Company Positive-working imageable members with branched hydroxystyrene polymers
US8088548B2 (en) 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
US8632948B2 (en) 2009-09-30 2014-01-21 Az Electronic Materials Usa Corp. Positive-working photoimageable bottom antireflective coating
US20110086312A1 (en) * 2009-10-09 2011-04-14 Dammel Ralph R Positive-Working Photoimageable Bottom Antireflective Coating
JP6537118B2 (ja) * 2013-08-07 2019-07-03 東洋合成工業株式会社 化学増幅フォトレジスト組成物及び装置の製造方法
KR102134381B1 (ko) 2017-07-31 2020-07-15 주식회사 엘지화학 포지티브형 포토레지스트 조성물, 이로부터 제조되는 패턴, 및 패턴 제조방법
KR20220055289A (ko) * 2020-10-26 2022-05-03 삼성전자주식회사 포토레지스트 조성물, 그를 이용한 패턴의 형성 방법 및 그를 이용한 반도체 장치의 제조 방법

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JPH06242608A (ja) 1993-02-18 1994-09-02 Fuji Photo Film Co Ltd ポジ型感光性組成物
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JP3573358B2 (ja) * 1994-02-25 2004-10-06 クラリアント インターナショナル リミテッド 放射線感応性組成物
JP2964874B2 (ja) * 1994-06-10 1999-10-18 信越化学工業株式会社 化学増幅ポジ型レジスト材料
JPH08110635A (ja) * 1994-10-07 1996-04-30 Shin Etsu Chem Co Ltd 化学増幅ポジ型レジスト材料
JP3340864B2 (ja) * 1994-10-26 2002-11-05 富士写真フイルム株式会社 ポジ型化学増幅レジスト組成物
JP3549592B2 (ja) * 1994-11-02 2004-08-04 クラリアント インターナショナル リミテッド 放射線感応性組成物
JP3198845B2 (ja) * 1994-12-05 2001-08-13 信越化学工業株式会社 化学増幅ポジ型レジスト材料
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Publication number Publication date
EP0747768A3 (en) 1997-11-12
JPH0954437A (ja) 1997-02-25
EP0747768A2 (en) 1996-12-11
DE69610256D1 (de) 2000-10-19
EP0747768B1 (en) 2000-09-13
KR100424148B1 (ko) 2005-04-06
DE69610256T2 (de) 2001-01-18
US5939234A (en) 1999-08-17

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