KR950007052A - 웨이퍼 스테이지장치 - Google Patents

웨이퍼 스테이지장치 Download PDF

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Publication number
KR950007052A
KR950007052A KR1019940019920A KR19940019920A KR950007052A KR 950007052 A KR950007052 A KR 950007052A KR 1019940019920 A KR1019940019920 A KR 1019940019920A KR 19940019920 A KR19940019920 A KR 19940019920A KR 950007052 A KR950007052 A KR 950007052A
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KR
South Korea
Prior art keywords
wafer
vacuum
vacuum line
stage
block
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KR1019940019920A
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English (en)
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KR0169284B1 (ko
Inventor
히토시 츠지
Original Assignee
사토 후미오
가부시키가이샤 도시바
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Publication of KR950007052A publication Critical patent/KR950007052A/ko
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Publication of KR0169284B1 publication Critical patent/KR0169284B1/ko

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00Chucks or sockets
    • Y10T279/11Vacuum

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Jigs For Machine Tools (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

본 발명의 목적은 웨이퍼의 휨을 해소한 상태에서 확실히 고정하는 것이 가능한 웨이퍼 스테이지장치를 제공하는 것이다.
본 발명에 의하면, 스테이지(11)의 각 관통구멍(13)은 진공라인(14)을 매개로 진공펌프(15)에 접속된다. 각 진공라인(14)에는 전자밸브(16a∼16g)가 설치되고, 각 전자배브(16a∼16g)는 제어부(17)에 의해 웨이퍼의 휨에 따라 개방타이밍이 제어된다. 따라서 크게 휜 웨이퍼를 평탄한 상태에서 스테이지에 흡착할 수 있게 된다.

Description

웨이퍼 스테이지장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예를 나타내는 평면도,
제2도는 제1도의 2-2선에 따른 단면과 더불어 제1실시예의 구성을 구체적으로 나타낸 구성도,
제3도는 제1실시예의 동작을 설명하기 위해 나타낸 단면도.

Claims (2)

  1. 웨이퍼(18,34)가 포면에 실리고, 이 웨이퍼를 흡착하기 위한 복수이 관통구멍(13,23,27)을 갖춘 스테이지(11,21)와, 일단부가 상기 스테이지(11,21)의 각 관통구멍(13,23,27)에 접속되고, 타단부가 진공펌프(15,29)에 접속된 복수의 진공라인(14,28,30), 상기 각 진공라인(14,28,30)의 중간부에 설치되어 진공라인을 차단하는 차단수단(16a∼16g,31,32) 및, 상기 웨이퍼의 휨에 따라 상기 차단수단(16a∼16g,31,32)의 개방타이밍을 제어하는 제어수단(17,33)을 구비한 것을 특징으로 하는 웨이퍼 스테이지장치.
  2. 웨이퍼(18,34)가 포면에 실리고, 이 웨이퍼를 흡착하기 위한 복수의 제1관통구멍(23)을 갖춘 스테이지(21)와, 일단부가 상기 스테이지(21)의 중앙부 및 그 주변에 배치되고, 스테이지표면으로부터 출입자재로 되어 웨이퍼를 흡착하기 위한 제2관통구멍(27)을 갖춘 복수의 웨이퍼 흡착수단(25a∼25d), 상기 웨이퍼 흡착수단(25a∼25d)을 개별적으로 이동시키는 구동수단(26), 일단부가 상기 제1관통구멍(23)에 접속되고, 타단부가 진공펌프(29)에 접속된 복수의 제1진공라인(30), 일단부가 상기 제2관통구멍(27)에 접속되고, 타단부가 진공펌프(29)에 접속된 복수의 제2진공라인(28), 상기 제1진공라인(30)의 중간부에 설치되어 제1진공라인을 차단하는 제1차단수단(32), 상기 제2진공라인(28)의 중간부에 설치되어 제2진공라인을 차단하는 제2차단수단(31) 및 상기 웨이퍼의 휨에 따라 상기 구동수단(26)에 의한 웨이퍼 흡착수단(25a∼25d)의 이동위치 및 상기 제1, 제2차단수단(32,31)의 개방타이밍을 제어하는 제어수단(33)을 구비한 것을 특징으로 하는 웨이퍼 스테이지장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940019920A 1993-08-13 1994-08-12 웨이퍼 스테이지장치 KR0169284B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-201560 1993-08-13
JP20156093A JPH0758191A (ja) 1993-08-13 1993-08-13 ウェハステージ装置

Publications (2)

Publication Number Publication Date
KR950007052A true KR950007052A (ko) 1995-03-21
KR0169284B1 KR0169284B1 (ko) 1999-02-01

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US (2) US5564682A (ko)
JP (1) JPH0758191A (ko)
KR (1) KR0169284B1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220029455A (ko) * 2020-08-28 2022-03-08 가부시키가이샤 스크린 홀딩스 기판 처리 장치 및 기판 처리 방법

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