JP4090416B2 - 粘着テープ付ワークの離脱方法及び離脱装置 - Google Patents
粘着テープ付ワークの離脱方法及び離脱装置 Download PDFInfo
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- JP4090416B2 JP4090416B2 JP2003340757A JP2003340757A JP4090416B2 JP 4090416 B2 JP4090416 B2 JP 4090416B2 JP 2003340757 A JP2003340757 A JP 2003340757A JP 2003340757 A JP2003340757 A JP 2003340757A JP 4090416 B2 JP4090416 B2 JP 4090416B2
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- Prior art keywords
- adhesive tape
- wafer
- holding
- tape
- workpiece
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/18—Handling of layers or the laminate
- B32B2038/1891—Using a robot for handling the layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/934—Apparatus having delaminating means adapted for delaminating a specified article
- Y10S156/941—Means for delaminating semiconductive product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1126—Using direct fluid current against work during delaminating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1922—Vibrating delaminating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
- Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/11—Vacuum
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49998—Work holding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53191—Means to apply vacuum directly to position or hold work part
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Adhesive Tape Dispensing Devices (AREA)
Description
また、気体を中央部より外側に順次供給していくことで、粘着テープ付ワークの離脱をスムースに行うことが可能となり、ワークの破損等を確実に防止することができる。
さらに、粘着テープ付ワークを真空吸着状態で気体を供給するため、真空吸着による保持力を調整することが可能となる。これにより、粘着テープの種類によって、真空吸着による保持力を調整することが可能となるため、粘着テープが真空吸着の際に変形することを防ぐことができる。
2 ウエハ供給部
3 ウエハ搬送機構
4 ウエハ押圧機構
5 アライメントステージ
6 紫外線照射ユニット
7 ウエハチャックテーブル
8 リングフレーム
9 リングフレーム供給部
10 リングフレーム搬送機構
11 ダイシング用テープ
12 ダイシング用テープ供給部
13 ダイシング用テープ貼付ユニット
14 ダイシング用テープカット部
15 ダイシング用テープ回収部
16 リングフレーム昇降機構
17 ウエハマウント機構
18 ウエハマウントフレーム搬送機構
19 剥離テーブル
20 表面保護テープ
21 剥離テープ
22 剥離テープ貼付ユニット
23 剥離テープ剥離ユニット
24 テープ回収部
25 ウエハマウントフレーム収納機構
26 ウエハマウントフレーム回収部
29 粘着テープ付ワーク
30 保持部材
31 保持テーブル
32 保持手段
33 気体供給手段
Claims (4)
- 粘着テープ付ワークを吸着保持する保持部材から前記粘着テープ付ワークを離脱する離脱方法であって、
前記粘着テープ付ワークを真空吸着したまま当該粘着テープ付ワークと前記保持部材との間であり、かつ、保持部材の中央部より外側にかけて気体を順次供給し、保持部材の保持力を低下させ、粘着テープ付ワークを保持部材から離脱することを特徴とする粘着テープ付ワークの離脱方法。 - 前記気体を、1箇所以上の気体供給口から供給することを特徴とする請求項1に記載の粘着テープ付ワークの離脱方法。
- 粘着テープ付ワークを載置保持する保持部材を有する保持テーブルと、
前記保持テーブルに設けられ、前記粘着テープ付ワークを吸着保持する保持手段と、
前記保持部材と前記粘着テープ付ワークとの間に気体を供給する気体供給手段と、
前記保持手段によって前記粘着テープ付ワークを真空吸着しつつ、前記気体供給手段によって保持部材の中央部より外側にかけて気体を順次供給するように制御する制御手段と、
を備えてなる粘着テープ付ワークの離脱装置。 - 前記保持部材が、多孔質材料で形成されてなる請求項3に記載の粘着テープ付ワークの離脱装置。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003340757A JP4090416B2 (ja) | 2003-09-30 | 2003-09-30 | 粘着テープ付ワークの離脱方法及び離脱装置 |
SG200405524A SG110174A1 (en) | 2003-09-30 | 2004-08-13 | Releasing method and releasing apparatus of work having adhesive tape |
US10/925,964 US20050067097A1 (en) | 2003-09-30 | 2004-08-26 | Releasing method and releasing apparatus of work having adhesive tape |
KR1020040073289A KR101075320B1 (ko) | 2003-09-30 | 2004-09-14 | 점착테이프 부착 가공물의 이탈방법 및 이탈장치 |
TW093129333A TWI246125B (en) | 2003-09-30 | 2004-09-29 | Releasing method and releasing apparatus of work having adhesive tape |
CNB2004100834743A CN100483640C (zh) | 2003-09-30 | 2004-09-29 | 具有粘胶带的工件的解开方法和解开设备 |
US11/545,493 US7406759B2 (en) | 2003-09-30 | 2006-10-11 | Releasing method and releasing apparatus of work having adhesive tape |
US12/134,807 US7987888B2 (en) | 2003-09-30 | 2008-06-06 | Releasing method and releasing apparatus of work having adhesive tape |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003340757A JP4090416B2 (ja) | 2003-09-30 | 2003-09-30 | 粘着テープ付ワークの離脱方法及び離脱装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005109157A JP2005109157A (ja) | 2005-04-21 |
JP4090416B2 true JP4090416B2 (ja) | 2008-05-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2003340757A Expired - Fee Related JP4090416B2 (ja) | 2003-09-30 | 2003-09-30 | 粘着テープ付ワークの離脱方法及び離脱装置 |
Country Status (6)
Country | Link |
---|---|
US (3) | US20050067097A1 (ja) |
JP (1) | JP4090416B2 (ja) |
KR (1) | KR101075320B1 (ja) |
CN (1) | CN100483640C (ja) |
SG (1) | SG110174A1 (ja) |
TW (1) | TWI246125B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014022555A (ja) * | 2012-07-18 | 2014-02-03 | Lintec Corp | シート貼付装置および装置の大型化防止方法 |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7019819B2 (en) * | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
KR100480628B1 (ko) * | 2002-11-11 | 2005-03-31 | 삼성전자주식회사 | 에어 블로잉을 이용한 칩 픽업 방법 및 장치 |
JP4090416B2 (ja) * | 2003-09-30 | 2008-05-28 | 日東電工株式会社 | 粘着テープ付ワークの離脱方法及び離脱装置 |
US8359895B2 (en) * | 2003-10-15 | 2013-01-29 | Modern Body Engineering Corporation | Machine cell with vacuum nest for holding a metal panel during a forming operation |
US7636999B2 (en) * | 2005-01-31 | 2009-12-29 | Molecular Imprints, Inc. | Method of retaining a substrate to a wafer chuck |
US7798801B2 (en) * | 2005-01-31 | 2010-09-21 | Molecular Imprints, Inc. | Chucking system for nano-manufacturing |
US7635263B2 (en) * | 2005-01-31 | 2009-12-22 | Molecular Imprints, Inc. | Chucking system comprising an array of fluid chambers |
JP2007201179A (ja) * | 2006-01-26 | 2007-08-09 | Tokyo Seimitsu Co Ltd | ウェーハマウント装置及びウェーハマウント方法 |
JP2007214357A (ja) * | 2006-02-09 | 2007-08-23 | Nitto Denko Corp | ワーク貼付け支持方法およびこれを用いたワーク貼付け支持装置 |
US8232183B2 (en) * | 2007-05-04 | 2012-07-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Process and apparatus for wafer-level flip-chip assembly |
JP2010010207A (ja) * | 2008-06-24 | 2010-01-14 | Tokyo Ohka Kogyo Co Ltd | 剥離装置および剥離方法 |
KR101036605B1 (ko) * | 2008-06-30 | 2011-05-24 | 세메스 주식회사 | 기판 지지 유닛 및 이를 이용한 매엽식 기판 연마 장치 |
JP5210060B2 (ja) * | 2008-07-02 | 2013-06-12 | 東京応化工業株式会社 | 剥離装置および剥離方法 |
US8336188B2 (en) * | 2008-07-17 | 2012-12-25 | Formfactor, Inc. | Thin wafer chuck |
CN102481774A (zh) * | 2009-09-02 | 2012-05-30 | 积水技术成型株式会社 | 片材结构体的制造装置及片材结构体的制造方法 |
JP5417131B2 (ja) * | 2009-11-20 | 2014-02-12 | 日東電工株式会社 | 粘着テープ貼付け装置および粘着テープ貼付け方法 |
JP5547954B2 (ja) * | 2009-12-14 | 2014-07-16 | 日東電工株式会社 | 粘着テープ剥離方法およびその装置 |
JP5600943B2 (ja) * | 2010-01-20 | 2014-10-08 | 大日本印刷株式会社 | シートチャックおよびそれを用いたマイクロコンタクトプリント法 |
JP5414602B2 (ja) * | 2010-03-31 | 2014-02-12 | 株式会社日立ハイテクノロジーズ | 検査装置 |
JP2012129471A (ja) * | 2010-12-17 | 2012-07-05 | Tatsumo Kk | 基板処理装置 |
US9919509B2 (en) * | 2011-01-07 | 2018-03-20 | Tokyo Electron Limited | Peeling device, peeling system and peeling method |
JP5649125B2 (ja) * | 2011-07-01 | 2015-01-07 | Necエンジニアリング株式会社 | テープ貼付装置 |
US8960686B2 (en) * | 2011-09-30 | 2015-02-24 | Electro Scientific Industries, Inc. | Controlled surface roughness in vacuum retention |
JP2013191756A (ja) * | 2012-03-14 | 2013-09-26 | Tokyo Ohka Kogyo Co Ltd | 保持装置及び基板処理装置 |
JP6099118B2 (ja) * | 2012-04-26 | 2017-03-22 | Necエンジニアリング株式会社 | シート貼付システム及びシート貼付方法 |
JP5914206B2 (ja) * | 2012-06-20 | 2016-05-11 | リンテック株式会社 | シート貼付装置 |
JP2014027015A (ja) * | 2012-07-24 | 2014-02-06 | Lintec Corp | シート貼付装置および貼付方法 |
KR20140107982A (ko) * | 2013-02-28 | 2014-09-05 | 삼성전자주식회사 | 다이 이젝터 및 다이 분리 방법 |
US9227261B2 (en) * | 2013-08-06 | 2016-01-05 | Globalfoundries Inc. | Vacuum carriers for substrate bonding |
EP2905807B1 (en) * | 2014-02-11 | 2019-03-13 | Suss MicroTec Lithography GmbH | Method and apparatus for preventing the deformation of a substrate supported at its edge area |
JP6319687B2 (ja) * | 2014-05-26 | 2018-05-09 | パナソニックIpマネジメント株式会社 | プラズマ処理装置及び方法 |
JP6464818B2 (ja) * | 2015-02-27 | 2019-02-06 | 株式会社東京精密 | ダイシング装置及びダイシング装置用のテーブル |
KR101673031B1 (ko) | 2015-07-31 | 2016-11-07 | 그래핀스퀘어 주식회사 | 그래핀 필름의 제조 장치 및 방법 |
EP3211662A1 (en) * | 2016-02-23 | 2017-08-30 | Nokia Technologies Oy | An apparatus and associated methods |
JP6815138B2 (ja) * | 2016-09-06 | 2021-01-20 | 株式会社ディスコ | 吸引保持システム |
JP6990038B2 (ja) | 2017-04-26 | 2022-01-12 | 日東電工株式会社 | 基板の離脱方法および基板の離脱装置 |
IT201700091338A1 (it) * | 2017-08-07 | 2019-02-07 | Samec S P A | Piano di lavoro a depressione per un pantografo |
JP2020102569A (ja) * | 2018-12-25 | 2020-07-02 | 東レエンジニアリング株式会社 | 保持テーブル |
JP7186356B2 (ja) * | 2019-01-16 | 2022-12-09 | 株式会社東京精密 | ウェーハチャック及びウェーハ保持装置 |
KR102700207B1 (ko) * | 2019-03-12 | 2024-08-28 | 삼성전자주식회사 | 칩 이젝팅 장치 |
KR102226270B1 (ko) * | 2019-04-03 | 2021-03-09 | 세메스 주식회사 | 기판지지 모듈 |
JP2020181887A (ja) * | 2019-04-25 | 2020-11-05 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP7485523B2 (ja) * | 2020-03-13 | 2024-05-16 | 株式会社東京精密 | チャックテーブル |
JP2022012849A (ja) * | 2020-07-02 | 2022-01-17 | 株式会社ディスコ | 加工装置 |
JP2022062986A (ja) * | 2020-10-09 | 2022-04-21 | 富士電機株式会社 | 半導体検査装置および半導体ウエハの検査方法 |
US11764098B2 (en) * | 2021-04-16 | 2023-09-19 | Asmpt Singapore Pte. Ltd. | Detaching a die from an adhesive tape by air ejection |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US77879A (en) * | 1868-05-12 | Jesse haven s | ||
US121614A (en) * | 1871-12-05 | Improvement in signs for street-lamps | ||
US4721462A (en) * | 1986-10-21 | 1988-01-26 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Active hold-down for heat treating |
JP2911997B2 (ja) * | 1989-10-20 | 1999-06-28 | 日本電気株式会社 | 半導体ウェハーへのテープ貼付装置 |
JP3325650B2 (ja) | 1993-04-15 | 2002-09-17 | 株式会社ディスコ | ウェーハの研磨方法 |
JPH0758191A (ja) * | 1993-08-13 | 1995-03-03 | Toshiba Corp | ウェハステージ装置 |
US5423716A (en) * | 1994-01-05 | 1995-06-13 | Strasbaugh; Alan | Wafer-handling apparatus having a resilient membrane which holds wafer when a vacuum is applied |
US5695600A (en) * | 1994-10-03 | 1997-12-09 | Goin; Bobby Gene | Vacuum table for decal weeding |
TW524873B (en) * | 1997-07-11 | 2003-03-21 | Applied Materials Inc | Improved substrate supporting apparatus and processing chamber |
US6173648B1 (en) * | 1997-10-24 | 2001-01-16 | Sharp Kabushiki Kaisha | Manufacturing method of liquid crystal display element and manufacturing apparatus of the same |
US6032997A (en) * | 1998-04-16 | 2000-03-07 | Excimer Laser Systems | Vacuum chuck |
JP3560823B2 (ja) * | 1998-08-18 | 2004-09-02 | リンテック株式会社 | ウェハ転写装置 |
US6202292B1 (en) * | 1998-08-26 | 2001-03-20 | Micron Technology, Inc. | Apparatus for removing carrier film from a semiconductor die |
JP3504543B2 (ja) * | 1999-03-03 | 2004-03-08 | 株式会社日立製作所 | 半導体素子の分離方法およびその装置並びに半導体素子の搭載方法 |
US6491083B2 (en) * | 2001-02-06 | 2002-12-10 | Anadigics, Inc. | Wafer demount receptacle for separation of thinned wafer from mounting carrier |
JP4482243B2 (ja) * | 2001-03-13 | 2010-06-16 | 株式会社新川 | ダイのピックアップ方法及びピックアップ装置 |
JP3761444B2 (ja) * | 2001-10-23 | 2006-03-29 | 富士通株式会社 | 半導体装置の製造方法 |
JP2003174077A (ja) * | 2001-12-04 | 2003-06-20 | Lintec Corp | 吸着保持装置 |
US7341087B2 (en) * | 2002-01-02 | 2008-03-11 | Kimberly-Clark Worldwide, Inc. | Apparatus for applying discrete parts to a moving web |
JP2003209082A (ja) | 2002-01-15 | 2003-07-25 | Nitto Denko Corp | 保護テープの貼付方法およびその装置並びに保護テープの剥離方法 |
JP4090416B2 (ja) * | 2003-09-30 | 2008-05-28 | 日東電工株式会社 | 粘着テープ付ワークの離脱方法及び離脱装置 |
JP4761381B2 (ja) * | 2006-08-01 | 2011-08-31 | 東京エレクトロン株式会社 | 薄膜除去装置及び薄膜除去方法 |
-
2003
- 2003-09-30 JP JP2003340757A patent/JP4090416B2/ja not_active Expired - Fee Related
-
2004
- 2004-08-13 SG SG200405524A patent/SG110174A1/en unknown
- 2004-08-26 US US10/925,964 patent/US20050067097A1/en not_active Abandoned
- 2004-09-14 KR KR1020040073289A patent/KR101075320B1/ko active IP Right Grant
- 2004-09-29 CN CNB2004100834743A patent/CN100483640C/zh not_active Expired - Fee Related
- 2004-09-29 TW TW093129333A patent/TWI246125B/zh not_active IP Right Cessation
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2006
- 2006-10-11 US US11/545,493 patent/US7406759B2/en not_active Expired - Fee Related
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2008
- 2008-06-06 US US12/134,807 patent/US7987888B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014022555A (ja) * | 2012-07-18 | 2014-02-03 | Lintec Corp | シート貼付装置および装置の大型化防止方法 |
CN103579045A (zh) * | 2012-07-18 | 2014-02-12 | 琳得科株式会社 | 片材粘贴装置及装置的大型化防止方法 |
TWI623971B (zh) | 2012-07-18 | 2018-05-11 | Lintec Corp | Sheet sticking device and method for preventing enlargement of the device |
CN103579045B (zh) * | 2012-07-18 | 2019-02-15 | 琳得科株式会社 | 片材粘贴装置及片材粘贴装置的大型化防止方法 |
Also Published As
Publication number | Publication date |
---|---|
US20080230183A1 (en) | 2008-09-25 |
US7406759B2 (en) | 2008-08-05 |
CN1604283A (zh) | 2005-04-06 |
US7987888B2 (en) | 2011-08-02 |
KR101075320B1 (ko) | 2011-10-19 |
JP2005109157A (ja) | 2005-04-21 |
KR20050031886A (ko) | 2005-04-06 |
US20050067097A1 (en) | 2005-03-31 |
TWI246125B (en) | 2005-12-21 |
SG110174A1 (en) | 2005-04-28 |
TW200514156A (en) | 2005-04-16 |
CN100483640C (zh) | 2009-04-29 |
US20070034331A1 (en) | 2007-02-15 |
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