KR850002989A - 카르복시알켄아미도 세팔로스포린의 제조방법 - Google Patents

카르복시알켄아미도 세팔로스포린의 제조방법 Download PDF

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KR850002989A
KR850002989A KR1019840006134A KR840006134A KR850002989A KR 850002989 A KR850002989 A KR 850002989A KR 1019840006134 A KR1019840006134 A KR 1019840006134A KR 840006134 A KR840006134 A KR 840006134A KR 850002989 A KR850002989 A KR 850002989A
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thiaalkylene
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요시오 하마시마
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요시또시 가즈오
시오노기 세이야꾸 가부시기가이샤
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    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/22Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D277/28Radicals substituted by nitrogen atoms
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    • C07D261/06Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members
    • C07D261/10Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
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    • C07F9/65613Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing systems of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring or ring system, with or without other non-condensed hetero rings containing the ring system (X = CH2, O, S, NH) optionally with an additional double bond and/or substituents, e.g. cephalosporins and analogs

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Abstract

내용 없음

Description

카르복시알켄아미도 세팔로스포린의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (7)

  1. 하기일반식(Ⅱ)로 표시되는 7베타-아미노-3-세펨-4-카르복시산 유도체 또는 그의 반응성유도체를 하기 일반식(Ⅲ)으로 표시되는 카르복시알켄산 또는 그의 반응성 유도체로 아미드와 시킴을 특징으로 하는 하기 일반식(Ⅰ)로 표시되는 7베타-(카르복시알케노일아미노)-3-세펨-4-카르복시산화합물 및 그의 유도체의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성원자 또는 기, 또는 에스테르 형성기이고; R4는 수소 또는 메톡시이고; R5는 수소 또는 세팔로스포린의 3-치환기이고, R6는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; X는 산소, 황, 또는 술피닐이며, 단 R이 티아알킬렌일때 R1은 할로겐이다.)
  2. 하기 일반식(Ⅰ)로 표시되는 7베타-(카르복시알케노일아미노)-3-세펨-4-카르복시산 또는 그의 반응성 유도체를 염기로 중화시킴을 특징으로 하는 하기 일반식(Ⅰ)로 표시되는 염 및 그의 유도체의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성원자 또는 기, 또는 에스테르 형성기이고; R4는 수소 또는 메톡시이고; R5는 수소 또는 세팔로스포린의 3-치환기이고, R6는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; X는 산소, 황, 또는 술피닐이며, 단 R이 티아알킬렌일때 R1은 할로겐이고, R3및 R6중 최소한 하나는 수소이다.)
  3. 대응 3-(하드록시, 아실옥시 또는 할로) 세팜의 염기 또는 열제거 반응에 의한 3-이중결합형성, 술폭시드환원, 3-(할로 또는 3-술포닐옥시) 세펨의 환원 및 3-(이탈기치환) 메틸-3-세펨을 대응 친핵성 시약으로 대치시키는 방법중에서 선택된 공지의 방법으로 3-작용기를 도입함을 특징으로하는 하기 일반식(Ⅰ)로 표시되는 화합물의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성원자 또는 기, 또는 에스테르 형성기이고; R4는 수소 또는 메톡시이고; R5는 수소 또는 세팔로스포린의 3-치환기이고; R6는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; X는 산소, 황, 또는 술피닐이며, 단 R이 티아알킬렌일때 R1은 할로겐이다.)
  4. 하기 일반식(Ⅰ)로 표시되는 R, R3, R5및 R6중 최소한 하나가 보호된 7베타-(카르복시알케노 일아미노)-3-세펨-4-카르복시산 또는 그의 반응성 유도체의 보호 아미노 또는 보호 카르복시를 공지의 방법으로 탈보호시킴을 특징으로 하기 일반식(Ⅰ)로 표시되는 화합물의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성원자 또는 기, 또는 에스테르 형성기이고; R4는 수소 또는 메톡시이고; R5는 수소 또는 세팔로스포린의 3-치환기이고; R6는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; X는 산소, 황, 또는 술피닐이며, 단 R이 티아알킬렌일 때 R1은 할로겐이다.)
  5. 하기 일반식(Ⅷ)의 옥살레이트를 불활성 용매내에서 50℃~120℃온도로 10분~10시간 동안에 하기 일반식(Ⅸ)의 알킬리덴포스포란으로 처리함으로써 비티히 반응시킴을 특징으로하는 하기 일반식(Ⅶ)의 화합물의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성원자 또는 기, 또는 에스테르 형성기이고; R6는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; Ar은 아릴이며, 단 R이 티아알킬렌일 때 R1은 할로겐이다.)
  6. 하기 일반식(Ⅳ)의 포르밀 옥살레이트 또는 그의 아세탈을 불활성 용매내에서 50℃~120℃의 온도로 10분~10시간동안에 하기 일반식(Ⅴ)의 알킬리덴 포스포란으로 처리함으로써 비티히 반응시킴을 특징으로 하는 하기 일반식(Ⅶ)의 화합물의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; R6는 수소원자, 염형성 원자 또는 기 또는 에스테르 형성기이고; R20은 단일결합 또는 1~3C알킬렌이고; Ar은 아릴이며, 단 R이 티아알킬렌일 때 R1은 할로겐이다.)
  7. 카르복시 보호기 R3또는 R6를 불활성 용매 내에서 -50℃~100℃ 온도로 1/6~10시간 동안에 산 루이스산 및 양이온 스캐빈저, 염기, 또는 수소 및 촉매로 처리함으로써 탈보호시킴을 특징으로 하는 R3및 R6중 하나 또는 둘다가 수소인 하기 일반식(Ⅶ)의 화합물의 제조방법.
    (상기 식중, R은 아릴 또는 복소환기이고; R1은 수소 또는 할로겐이고; R2는 단일결합, 알킬렌, 또는 티아알킬렌이고; R3는 수소원자, 염형성 원자 또는 기, 또는 에스테르 형성기이고; R6는 수소원자, 염형성원자 또는 기, 또는 에스테르 형성기이고; 단, R이 티아알킬렌일 때 R1은 할로겐이고, R3및 R6중 최소한 하나는 수소이다.)
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840006134A 1983-10-04 1984-10-04 카르복시 알켄아미도 세팔로스포린의 제조방법 KR880002376B1 (ko)

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KR1019880012223A KR880002684B1 (ko) 1983-10-04 1988-09-21 카르복시알켄산 및 그의 유도체의 제조방법

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JP58186601A JPS6078987A (ja) 1983-10-04 1983-10-04 アクリルアミドセフアロスポリン類
JP186601 1983-10-04
JP186601/83 1983-10-04
JP18563/84 1984-02-03
JP59018563A JPS60163884A (ja) 1984-02-03 1984-02-03 カルボキシアルケンアミドセフアロスポリン
JP18563 1984-02-03
JP59100890A JPH0780892B2 (ja) 1984-05-18 1984-05-18 カルボキシアルケンアミドセフアロスポリン
JP100890 1984-05-18
JP100890/84 1984-05-18

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KR1019880012223A KR880002684B1 (ko) 1983-10-04 1988-09-21 카르복시알켄산 및 그의 유도체의 제조방법

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JP2501785B2 (ja) * 1984-07-09 1996-05-29 明治製菓株式会社 新規セフアロスポリン系化合物
JPS6124580A (ja) * 1984-07-12 1986-02-03 Shionogi & Co Ltd アミノチアゾリルグルタル酸誘導体の製造方法
JPS6153272A (ja) * 1984-08-24 1986-03-17 Shionogi & Co Ltd グルタル酸誘導体の製法
AU580855B2 (en) * 1985-03-29 1989-02-02 Shionogi & Co., Ltd. Alkeneamidocephalosporin esters
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US4748170A (en) 1988-05-31
ES547301A0 (es) 1986-03-16
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