KR20170063379A - 절삭 장치 - Google Patents
절삭 장치 Download PDFInfo
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- KR20170063379A KR20170063379A KR1020160158016A KR20160158016A KR20170063379A KR 20170063379 A KR20170063379 A KR 20170063379A KR 1020160158016 A KR1020160158016 A KR 1020160158016A KR 20160158016 A KR20160158016 A KR 20160158016A KR 20170063379 A KR20170063379 A KR 20170063379A
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- 238000005520 cutting process Methods 0.000 title claims abstract description 243
- 230000007246 mechanism Effects 0.000 claims abstract description 78
- 238000004140 cleaning Methods 0.000 claims abstract description 56
- 238000012546 transfer Methods 0.000 claims description 79
- 238000003754 machining Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims 4
- 235000012431 wafers Nutrition 0.000 description 68
- 239000004065 semiconductor Substances 0.000 description 58
- 238000012545 processing Methods 0.000 description 17
- 238000001179 sorption measurement Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000003028 elevating effect Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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- Condensed Matter Physics & Semiconductors (AREA)
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract
(해결 수단) 피가공물을 유지하여 X 축 방향으로 이동 가능하게 구성된 제 1 척 테이블 및 제 2 척 테이블과, 제 1 척 테이블 및 제 2 척 테이블에 유지된 피가공물에 각각 절삭 가공을 실시하는 제 1 절삭 기구 및 제 2 절삭 기구와, 절삭된 피가공물을 세정하는 세정 수단을 구비하는 절삭 장치로서, 제 1 척 테이블은 제 1 반출입 영역과 제 1 절삭 영역에 위치되도록 구성되고, 제 2 척 테이블은 제 2 반출입 영역과 제 2 절삭 영역에 위치되도록 구성되어 있고, 제 1 절삭 기구는 Y 축 방향의 직선 상에 배치 형성된 2 개의 회전 스핀들과 2 개의 회전 스핀들의 서로 대향하는 단부에 각각 장착된 절삭 블레이드를 구비한 제 1 절삭 수단 및 제 2 절삭 수단을 구비하고, 제 2 절삭 기구는 Y 축 방향의 직선 상에 배치 형성된 2 개의 회전 스핀들과 2 개의 회전 스핀들의 서로 대향하는 단부에 각각 장착된 절삭 블레이드를 구비한 제 1 절삭 수단 및 제 2 절삭 수단을 구비하고, 제 1 절삭 기구와 제 2 절삭 기구는 제 1 반출입 영역과 제 2 반출입 영역의 중간 위치를 축으로 하여 점대칭의 위치에 배치 형성되어 있고, 세정 수단은, 제 1 반출입 영역과 제 2 반출입 영역을 잇는 Y 축 방향의 직선 상에 배치 형성된다.
Description
도 2 는, 도 1 에 나타내는 절삭 장치를 구성하는 일부의 구성 요소를 분해하여 나타내는 사시도이다.
도 3 은, 도 1 에 나타내는 절삭 장치를 구성하는 다른 일부의 구성 요소를 분해하여 나타내는 사시도이다.
3 : 제 1 척 테이블 기구
32 : 이동 기대
34 : 제 1 척 테이블
35 : 제 1 가공 이송 수단
4 : 제 2 척 테이블 기구
42 : 이동 기대
44 : 제 2 척 테이블
45 : 제 2 가공 이송 수단
5 : 제 1 절삭 기구
5a : 제 1 절삭 수단
5b : 제 2 절삭 수단
55 : 산출 이송 수단
6 : 제 2 절삭 기구
6a : 제 1 절삭 수단
6b : 제 2 절삭 수단
65 : 산출 이송 수단
7 : 세정 수단
8 : 임시 거치 수단
9 : 카세트 재치 수단
10 : 카세트
11 : 반출입 수단
12 : 반송 수단
13 : 제 1 반송 수단
14 : 제 2 반송 수단
F : 고리형의 프레임
T : 다이싱 테이프
W : 반도체 웨이퍼
Claims (5)
- 피가공물에 절삭 가공을 실시하는 절삭 장치로서,
피가공물을 유지하여 가공 이송 방향 (X 축 방향) 으로 이동 가능하게 구성되고 X 축 방향과 직교하는 산출 이송 방향 (Y 축 방향) 에 서로 인접하여 배치 형성되는 제 1 척 테이블 및 제 2 척 테이블과,
그 제 1 척 테이블 및 그 제 2 척 테이블에 유지된 피가공물에 각각 절삭 가공을 실시하는 제 1 절삭 기구 및 제 2 절삭 기구와,
그 제 1 절삭 기구 및 그 제 2 절삭 기구에 의해 절삭된 피가공물을 세정하는 세정 수단을 구비하고,
그 제 1 척 테이블은 피가공물을 반출입하는 제 1 반출입 영역과 그 제 1 절삭 기구가 배치 형성된 제 1 절삭 영역에 위치되도록 구성되고, 그 제 2 척 테이블은 그 제 1 반출입 영역과 Y 축 방향의 직선 상에 인접하여 피가공물을 반출입하는 제 2 반출입 영역과 그 제 2 절삭 기구가 배치 형성된 제 2 절삭 영역에 위치되도록 구성되어 있고,
그 제 1 절삭 기구는 Y 축 방향의 직선 상에 배치 형성된 2 개의 회전 스핀들과 그 2 개의 회전 스핀들의 서로 대향하는 단부에 각각 장착된 절삭 블레이드를 구비한 제 1 절삭 수단 및 제 2 절삭 수단을 구비하고, 그 제 2 절삭 기구는 Y 축 방향의 직선 상에 배치 형성된 2 개의 회전 스핀들과 그 2 개의 회전 스핀들의 서로 대향하는 단부에 각각 장착된 절삭 블레이드를 구비한 제 1 절삭 수단 및 제 2 절삭 수단을 구비하고,
그 제 1 절삭 기구와 그 제 2 절삭 기구는 그 제 1 반출입 영역과 그 제 2 반출입 영역의 중간 위치를 축으로 하여 점대칭의 위치에 배치 형성되어 있고,
그 세정 수단은, 그 제 1 반출입 영역과 그 제 2 반출입 영역을 잇는 Y 축 방향의 직선 상에 배치 형성되는 것을 특징으로 하는 절삭 장치. - 제 1 항에 있어서,
그 제 1 반출입 영역과 그 제 2 반출입 영역과 그 세정 수단으로 피가공물을 반송하는 반송 수단을 구비하고 있는 절삭 장치. - 제 2 항에 있어서,
그 세정 수단의 상방에 피가공물을 임시 거치하는 2 개의 가이드 레일이 간격 조정 가능하게 구성된 임시 거치 수단이 배치 형성되고,
그 반송 수단은, 그 임시 거치 수단에 임시 거치된 절삭 가공 전의 피가공물을 그 제 1 반출입 영역에 위치된 그 제 1 척 테이블 및 그 제 2 반출입 영역에 위치된 제 2 척 테이블로 반송함과 함께, 그 세정 수단으로부터 세정이 끝난 피가공물을 그 임시 거치 수단으로 반송하고, 또, 그 제 1 반출입 영역에 위치된 그 제 1 척 테이블 및 그 제 2 반출입 영역에 위치된 제 2 척 테이블로부터 절삭 가공이 끝난 피가공물을 그 세정 수단으로 반송하는 절삭 장치. - 제 3 항에 있어서,
그 반송 수단은, 제 1 반송 수단과 제 2 반송 수단을 구비하고,
그 제 1 반송 수단은, 그 임시 거치 수단에 임시 거치된 절삭 가공 전의 피가공물을 그 제 1 반출입 영역에 위치된 그 제 1 척 테이블 및 그 제 2 반출입 영역에 위치된 제 2 척 테이블로 반송함과 함께, 그 세정 수단으로부터 세정이 끝난 피가공물을 그 임시 거치 수단으로 반송하고,
그 제 2 반송 수단, 그 제 1 반출입 영역에 위치된 그 제 1 척 테이블 및 그 제 2 반출입 영역에 위치된 제 2 척 테이블로부터 절삭 가공이 끝난 피가공물을 그 세정 수단으로 반송하는 절삭 장치. - 제 3 항 또는 제 4 항에 있어서,
그 임시 거치 수단에 인접하여 X 축 방향으로 피가공물을 수용한 카세트가 재치되는 카세트 테이블이 배치 형성되고, X 축 방향으로 진퇴시켜 그 카세트 테이블에 재치된 그 카세트에 수용된 절삭 가공 전의 피가공물을 그 임시 거치 수단으로 반출함과 함께 그 임시 거치 수단으로부터 세정이 끝난 피가공물을 그 카세트로 반입하는 반출입 수단이 배치 형성되어 있는 절삭 장치.
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Application Number | Priority Date | Filing Date | Title |
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JP2015233110A JP6560110B2 (ja) | 2015-11-30 | 2015-11-30 | 切削装置 |
JPJP-P-2015-233110 | 2015-11-30 |
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KR20170063379A true KR20170063379A (ko) | 2017-06-08 |
KR102463660B1 KR102463660B1 (ko) | 2022-11-03 |
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KR (1) | KR102463660B1 (ko) |
CN (1) | CN107030902B (ko) |
TW (1) | TWI691018B (ko) |
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CN107030902A (zh) | 2017-08-11 |
KR102463660B1 (ko) | 2022-11-03 |
JP6560110B2 (ja) | 2019-08-14 |
CN107030902B (zh) | 2020-05-26 |
TW201727820A (zh) | 2017-08-01 |
JP2017103274A (ja) | 2017-06-08 |
TWI691018B (zh) | 2020-04-11 |
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