KR20030091357A - 액정 표시 장치용 박막 트랜지스터 기판 - Google Patents
액정 표시 장치용 박막 트랜지스터 기판 Download PDFInfo
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- KR20030091357A KR20030091357A KR1020020029290A KR20020029290A KR20030091357A KR 20030091357 A KR20030091357 A KR 20030091357A KR 1020020029290 A KR1020020029290 A KR 1020020029290A KR 20020029290 A KR20020029290 A KR 20020029290A KR 20030091357 A KR20030091357 A KR 20030091357A
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- gate
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- pixel
- thin film
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- 239000010409 thin film Substances 0.000 title claims abstract description 34
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 238000002161 passivation Methods 0.000 claims description 7
- 239000003990 capacitor Substances 0.000 claims description 6
- 230000009977 dual effect Effects 0.000 claims 1
- 238000012423 maintenance Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 28
- 239000010408 film Substances 0.000 description 18
- 239000011651 chromium Substances 0.000 description 8
- 229910000838 Al alloy Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 101100489584 Solanum lycopersicum TFT1 gene Proteins 0.000 description 2
- 101100214488 Solanum lycopersicum TFT2 gene Proteins 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13624—Active matrix addressed cells having more than one switching element per pixel
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134345—Subdivided pixels, e.g. for grey scale or redundancy
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136213—Storage capacitors associated with the pixel electrode
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Claims (5)
- 가로 방향으로 각각 뻗어 주사 신호를 전달하며 하나의 행 화소마다 이중으로 배치되어 있는 게이트선과 이중의 상기 게이트선과 각각 연결되어 있는 제1 및 제2 박막 트랜지스터의 게이트 전극을 포함하는 게이트 배선,상기 게이트선과 절연되어 세로 방향으로 뻗어 있으며 서로 이웃하는 두 상기 화소 열마다 하나씩 배치되어 있는 데이터선, 상기 데이터선에 각각 연결되어 있는 상기 제1 및 제2 박막 트랜지스터의 소스 전극, 상기 소스 전극과 분리되어 상기 게이트 전극을 중심으로 각각 상기 소스 전극과 마주하는 상기 제1 및 제2 박막 트랜지스터의 드레인 전극을 포함하는 데이터 배선,상기 게이트선과 절연되어 교차하며 상기 화소 열마다 하나씩 상기 데이터선과 교대로 배치되어 있는 더미 신호선,상기 이중의 게이트선 및 상기 데이터선과 상기 제1 및 제2 박막 트랜지스터를 통하여 연결되어 있으며, 가장자리 부분은 상기 데이터선 및 상기 더미 신호선과 중첩되어 있는 화소 전극을 포함하는 액정 표시 장치용 박막 트랜지스터 기판.
- 제1항에서,상기 화소 전극과 중첩되어 유지 용량을 형성하는 유지 배선을 더 포함하는 액정 표시 장치용 박막 트랜지스터 기판.
- 제3항에서,상기 유지 배선은 가로 방향으로 뻗어 있는 유지 전극선과 상기 드레인 전극과 중첩되어 있는 유지 전극을 포함하는 액정 표시 장치용 박막 트랜지스터 기판.
- 제3항에서,상기 유지 배선은 열 방향으로 뻗어 상기 화소 사이에 배치되어 있으며, 서로 이웃하는 상기 화소 전극의 가장자리 부분과 중첩되어 있는 액정 표시 장치용 박막 트랜지스터 기판.
- 제1항에서,상기 화소 전극과 상기 드레인 전극 사이에 형성되어 있으며, 상기 화소 전극과 상기 드레인 전극을 연결하기 위한 접촉 구멍을 가지는 보호막을 더 포함하는 액정 표시 장치용 박막 트랜지스터 기판.
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020029290A KR100848099B1 (ko) | 2002-05-27 | 2002-05-27 | 액정 표시 장치용 박막 트랜지스터 기판 |
AU2002367982A AU2002367982A1 (en) | 2002-05-27 | 2002-08-01 | A thin film transistor panel for a liquid crystal display |
JP2004507908A JP2005527857A (ja) | 2002-05-27 | 2002-08-01 | 液晶表示装置用薄膜トランジスタ基板 |
PCT/KR2002/001459 WO2003100512A1 (en) | 2002-05-27 | 2002-08-01 | A thin film transistor panel for a liquid crystal display |
CNB028179455A CN100416388C (zh) | 2002-05-27 | 2002-08-01 | 用于液晶显示器的薄膜晶体管面板 |
TW91117517A TW550824B (en) | 2001-02-26 | 2002-08-02 | A thin film transistor panel for a liquid crystal display |
US10/228,211 US6710372B2 (en) | 2000-05-27 | 2002-08-26 | Thin film transistor array panel for liquid crystal display |
US10/788,154 US6969872B2 (en) | 2002-05-27 | 2004-02-26 | Thin film transistor array panel for liquid crystal display |
US11/177,114 US7403239B2 (en) | 2002-05-27 | 2005-07-08 | Thin film transistor array panel for liquid crystal display |
US12/146,959 US20090004787A1 (en) | 2002-05-27 | 2008-06-26 | Thin film transistor array panel for liquid crystal display |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020029290A KR100848099B1 (ko) | 2002-05-27 | 2002-05-27 | 액정 표시 장치용 박막 트랜지스터 기판 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030091357A true KR20030091357A (ko) | 2003-12-03 |
KR100848099B1 KR100848099B1 (ko) | 2008-07-24 |
Family
ID=29546379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020020029290A KR100848099B1 (ko) | 2000-05-27 | 2002-05-27 | 액정 표시 장치용 박막 트랜지스터 기판 |
Country Status (6)
Country | Link |
---|---|
US (4) | US6710372B2 (ko) |
JP (1) | JP2005527857A (ko) |
KR (1) | KR100848099B1 (ko) |
CN (1) | CN100416388C (ko) |
AU (1) | AU2002367982A1 (ko) |
WO (1) | WO2003100512A1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100940567B1 (ko) * | 2003-04-23 | 2010-02-03 | 삼성전자주식회사 | 액정 표시 장치 |
US8253874B2 (en) | 2008-08-22 | 2012-08-28 | Samsung Electronics Co., Ltd. | Liquid crystal display with different voltages applied on storage electrode lines |
Families Citing this family (76)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100288772B1 (ko) * | 1998-11-12 | 2001-05-02 | 윤종용 | 액정 표시 장치 및 그 제조 방법 |
TW578028B (en) * | 1999-12-16 | 2004-03-01 | Sharp Kk | Liquid crystal display and manufacturing method thereof |
AU2002245519A1 (en) * | 2001-03-02 | 2002-09-19 | Tokyo Electron Limited | Apparatus and method of improving impedance matching between an rf signal and a multi-segmented electrode |
KR100392603B1 (ko) * | 2001-04-09 | 2003-07-28 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 구동 아이씨 연결부 |
JP4035094B2 (ja) * | 2002-07-31 | 2008-01-16 | エルジー.フィリップス エルシーデー カンパニー,リミテッド | 反射透過型液晶表示装置及びその製造方法 |
KR20040038355A (ko) * | 2002-10-31 | 2004-05-08 | 엘지.필립스 엘시디 주식회사 | 개구율이 향상된 횡전계모드 액정표시소자 |
US7153753B2 (en) * | 2003-08-05 | 2006-12-26 | Micron Technology, Inc. | Strained Si/SiGe/SOI islands and processes of making same |
US7190000B2 (en) * | 2003-08-11 | 2007-03-13 | Samsung Electronics Co., Ltd. | Thin film transistor array panel and manufacturing method thereof |
KR100556701B1 (ko) * | 2003-10-14 | 2006-03-07 | 엘지.필립스 엘시디 주식회사 | 표시 소자용 박막 트랜지스터 기판 및 그 제조 방법 |
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2002
- 2002-05-27 KR KR1020020029290A patent/KR100848099B1/ko active IP Right Grant
- 2002-08-01 WO PCT/KR2002/001459 patent/WO2003100512A1/en active Application Filing
- 2002-08-01 AU AU2002367982A patent/AU2002367982A1/en not_active Abandoned
- 2002-08-01 JP JP2004507908A patent/JP2005527857A/ja active Pending
- 2002-08-01 CN CNB028179455A patent/CN100416388C/zh not_active Expired - Lifetime
- 2002-08-26 US US10/228,211 patent/US6710372B2/en not_active Expired - Lifetime
-
2004
- 2004-02-26 US US10/788,154 patent/US6969872B2/en not_active Expired - Lifetime
-
2005
- 2005-07-08 US US11/177,114 patent/US7403239B2/en not_active Expired - Fee Related
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2008
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Also Published As
Publication number | Publication date |
---|---|
US20040173797A1 (en) | 2004-09-09 |
AU2002367982A1 (en) | 2003-12-12 |
WO2003100512A1 (en) | 2003-12-04 |
US6710372B2 (en) | 2004-03-23 |
CN1555506A (zh) | 2004-12-15 |
US6969872B2 (en) | 2005-11-29 |
US20050242351A1 (en) | 2005-11-03 |
JP2005527857A (ja) | 2005-09-15 |
US20090004787A1 (en) | 2009-01-01 |
US20030218178A1 (en) | 2003-11-27 |
US7403239B2 (en) | 2008-07-22 |
KR100848099B1 (ko) | 2008-07-24 |
CN100416388C (zh) | 2008-09-03 |
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