KR20020085880A - 에폭시 수지-경화 생산물의 처리 방법 - Google Patents
에폭시 수지-경화 생산물의 처리 방법 Download PDFInfo
- Publication number
- KR20020085880A KR20020085880A KR1020027004386A KR20027004386A KR20020085880A KR 20020085880 A KR20020085880 A KR 20020085880A KR 1020027004386 A KR1020027004386 A KR 1020027004386A KR 20027004386 A KR20027004386 A KR 20027004386A KR 20020085880 A KR20020085880 A KR 20020085880A
- Authority
- KR
- South Korea
- Prior art keywords
- epoxy resin
- cured product
- alkali metal
- resin
- salts
- Prior art date
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- 239000004593 Epoxy Substances 0.000 title claims abstract description 93
- 238000000034 method Methods 0.000 title claims abstract description 54
- 239000007788 liquid Substances 0.000 claims abstract description 90
- 229910010272 inorganic material Inorganic materials 0.000 claims abstract description 49
- 239000011147 inorganic material Substances 0.000 claims abstract description 49
- 239000003960 organic solvent Substances 0.000 claims abstract description 39
- 239000002131 composite material Substances 0.000 claims abstract description 30
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 24
- 239000003054 catalyst Substances 0.000 claims abstract description 22
- 239000000047 product Substances 0.000 claims description 109
- 239000003822 epoxy resin Substances 0.000 claims description 52
- 229920000647 polyepoxide Polymers 0.000 claims description 52
- 150000003839 salts Chemical class 0.000 claims description 43
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 150000001875 compounds Chemical class 0.000 claims description 30
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 28
- 239000002904 solvent Substances 0.000 claims description 27
- -1 alkali metal salt Chemical class 0.000 claims description 23
- 239000002253 acid Substances 0.000 claims description 20
- 229910052698 phosphorus Inorganic materials 0.000 claims description 18
- 239000011574 phosphorus Substances 0.000 claims description 18
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 17
- 229910052783 alkali metal Inorganic materials 0.000 claims description 15
- 150000007513 acids Chemical class 0.000 claims description 14
- 150000007524 organic acids Chemical class 0.000 claims description 14
- 235000005985 organic acids Nutrition 0.000 claims description 10
- 150000001408 amides Chemical class 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 8
- 150000001340 alkali metals Chemical class 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- 239000005456 alcohol based solvent Substances 0.000 claims description 5
- 239000004210 ether based solvent Substances 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 5
- 239000005453 ketone based solvent Substances 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- 229920003002 synthetic resin Polymers 0.000 claims description 4
- 239000000057 synthetic resin Substances 0.000 claims description 4
- 239000007857 degradation product Substances 0.000 claims 1
- 239000011095 metalized laminate Substances 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 45
- 239000011347 resin Substances 0.000 abstract description 45
- 238000005979 thermal decomposition reaction Methods 0.000 abstract description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 94
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 50
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 48
- 230000000052 comparative effect Effects 0.000 description 25
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 23
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 20
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 19
- 239000000203 mixture Substances 0.000 description 17
- 229920001223 polyethylene glycol Polymers 0.000 description 15
- 239000011888 foil Substances 0.000 description 14
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 13
- 239000011734 sodium Substances 0.000 description 13
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 229910052794 bromium Inorganic materials 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 150000002739 metals Chemical class 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 229940093915 gynecological organic acid Drugs 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 6
- 239000003365 glass fiber Substances 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000004064 recycling Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- 239000008187 granular material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000011575 calcium Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 150000002170 ethers Chemical group 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 150000004679 hydroxides Chemical class 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000012784 inorganic fiber Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QPRQEDXDYOZYLA-UHFFFAOYSA-N 2-methylbutan-1-ol Chemical compound CCC(C)CO QPRQEDXDYOZYLA-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 3
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 229910052792 caesium Inorganic materials 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 229960003975 potassium Drugs 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 229910052701 rubidium Inorganic materials 0.000 description 3
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 235000002906 tartaric acid Nutrition 0.000 description 3
- 239000011975 tartaric acid Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- CETWDUZRCINIHU-UHFFFAOYSA-N 2-heptanol Chemical compound CCCCCC(C)O CETWDUZRCINIHU-UHFFFAOYSA-N 0.000 description 2
- PFNHSEQQEPMLNI-UHFFFAOYSA-N 2-methyl-1-pentanol Chemical compound CCCC(C)CO PFNHSEQQEPMLNI-UHFFFAOYSA-N 0.000 description 2
- MXLMTQWGSQIYOW-UHFFFAOYSA-N 3-methyl-2-butanol Chemical compound CC(C)C(C)O MXLMTQWGSQIYOW-UHFFFAOYSA-N 0.000 description 2
- HTSABYAWKQAHBT-UHFFFAOYSA-N 3-methylcyclohexanol Chemical compound CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- MQWCXKGKQLNYQG-UHFFFAOYSA-N 4-methylcyclohexan-1-ol Chemical compound CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- 229910017119 AlPO Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 2
- 239000005695 Ammonium acetate Substances 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- RZKSECIXORKHQS-UHFFFAOYSA-N Heptan-3-ol Chemical compound CCCCC(O)CC RZKSECIXORKHQS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- 241001460678 Napo <wasp> Species 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000001241 acetals Chemical class 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 150000008043 acidic salts Chemical class 0.000 description 2
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- 238000006467 substitution reaction Methods 0.000 description 1
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- 150000003464 sulfur compounds Chemical class 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- RXMRGBVLCSYIBO-UHFFFAOYSA-M tetramethylazanium;iodide Chemical compound [I-].C[N+](C)(C)C RXMRGBVLCSYIBO-UHFFFAOYSA-M 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- XHTMGDWCCPGGET-UHFFFAOYSA-N tris(3,3-dichloropropyl) phosphate Chemical compound ClC(Cl)CCOP(=O)(OCCC(Cl)Cl)OCCC(Cl)Cl XHTMGDWCCPGGET-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229940116269 uric acid Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J11/00—Recovery or working-up of waste materials
- C08J11/04—Recovery or working-up of waste materials of polymers
- C08J11/10—Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation
- C08J11/16—Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation by treatment with inorganic material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J11/00—Recovery or working-up of waste materials
- C08J11/04—Recovery or working-up of waste materials of polymers
- C08J11/10—Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/288—Removal of non-metallic coatings, e.g. for repairing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/17—Post-manufacturing processes
- H05K2203/178—Demolishing, e.g. recycling, reverse engineering, destroying for security purposes; Using biodegradable materials
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
- Processing Of Solid Wastes (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Abstract
Description
실시예 | 처리 액체의 조성 | 브롬 함량 :20 중량% | 브롬 함량 :30 중량% | |||||
60 ℃ | 80 ℃ | 100 ℃ | 60 ℃ | 80 ℃ | 100 ℃ | |||
A 1 | KOH | NMP | 4 | 5 | 5 | 5 | 5 | 5 |
A 2 | CHON | 2 | 3 | 4 | 4 | 4 | 5 | |
A 3 | PEG | 0 | 1 | 2 | 3 | 3 | 5 | |
A 4 | DGMM | 1 | 1 | 2 | 3 | 4 | 5 | |
A 5 | DGDM | 0 | 1 | 3 | 3 | 4 | 5 | |
A 6 | NaCl | NMP | 3 | 4 | 5 | 4 | 5 | 5 |
A 7 | CHON | 1 | 2 | 3 | 2 | 4 | 5 | |
A 8 | PEG | 0 | 0 | 1 | 1 | 2 | 2 | |
A 9 | DGMM | 0 | 1 | 2 | 2 | 2 | 3 | |
A 10 | DGDM | 0 | 1 | 3 | 2 | 3 | 3 | |
A 11 | Na2CO3 | NMP | 1 | 3 | 5 | 3 | 5 | 5 |
A 12 | CHON | 0 | 2 | 2 | 2 | 3 | 4 | |
A 13 | PEG | 0 | 0 | 1 | 1 | 2 | 2 | |
A 14 | DGMM | 0 | 1 | 2 | 2 | 3 | 3 | |
A 15 | DGDM | 0 | 1 | 2 | 2 | 3 | 3 | |
비교예 | ||||||||
A 1 | - | NMP | 0 | 0 | 0 | 0 | 0 | 0 |
A 2 | CHON | 0 | 0 | 0 | 0 | 0 | 0 | |
A 3 | PEG | 0 | 0 | 0 | 0 | 0 | 0 | |
A 4 | DGMM | 0 | 0 | 0 | 0 | 0 | 0 | |
A 5 | DGDM | 0 | 0 | 0 | 0 | 0 | 0 | |
A 6 | KOH | 물 | 0 | 0 | 0 | 0 | 0 | 0 |
실시예 | 처리 액체의 조성 | 온도 : 60 ℃ | 온도 : 100 ℃ | |||||
E- 679Br 15wt% | E- 67Br 20wt% | 샘플*Br 28wt% | E- 679Br 15Wt% | E- 67Br 20wt% | 샘플*Br 28wt% | |||
B 1 | KOH | NMP, PEG | 1.3 | 4.9 | 48.0 | 2.5 | 29.7 | 93.5 |
B 2 | CHON,DGMM | 2.1 | 2.2 | 12.3 | 2.9 | 5.4 | 57.8 | |
B 3 | PEG | 2.2 | 2.3 | 3.3 | 2.3 | 6.1 | 33.7 | |
B 4 | DGMM | 1.7 | 2.1 | 9.6 | 2.6 | 16.3 | 89.0 | |
B 5 | DGDM,PEG | 1.8 | 2.1 | 12.7 | 2.9 | 5.4 | 57.8 | |
B 6 | NaCl | NMP | 0.9 | 3.5 | 25.1 | 3.2 | 4.5 | 68.0 |
B 7 | CHON | 1.9 | 1.7 | 11.6 | 2.0 | 2.4 | 23.8 | |
B 8 | PEG | 2.1 | 1.8 | 3.4 | 2.7 | 2.1 | 4.2 | |
B 9 | DGMM | 1.7 | 1.2 | 7.2 | 2.3 | 1.8 | 8.3 | |
B 10 | DGDM | 1.5 | 1.8 | 9.4 | 1.6 | 2.8 | 9.8 | |
B 11 | Na2CO3 | NMP | 0.9 | 1.8 | 25.4 | 1.9 | 23.4 | 53.3 |
B 12 | CHON | 1.8 | 1.7 | 9.7 | 1.9 | 3.7 | 22.6 | |
B 13 | PEG | 2.1 | 1.5 | 3.3 | 1.7 | 1.9 | 3.1 | |
B 14 | DGMM | 2.0 | 2.7 | 9.6 | 2.3 | 3.2 | 10.0 | |
B 15 | DGDM | 2.2 | 1.6 | 13.4 | 2.0 | 3.0 | 13.8 | |
비교예 | ||||||||
B 1 | - | NMP | 0.4 | 0.2 | 0.6 | 0.8 | 0.5 | 0.9 |
B 2 | CHON | 0.3 | 0.3 | 0.4 | - | - | - | |
B 3 | PEG | 0.2 | 0.2 | 0.3 | - | - | - | |
B 4 | DGMM | 0.4 | 0.3 | 0.5 | - | - | - | |
B 5 | DGDM | 0.5 | 0.4 | 0.4 | - | - | - | |
B 6 | KOH | 물 | 0.3 | 0.1 | 0.2 | 0.2 | 0.4 | 0.8 |
실시예 | 조성 | /% | |
C 1 | HPO3 | NMP | 3.6 |
C 2 | DGMM | 1.2 | |
C 3 | CHON | 0.4 | |
C 4 | H3PO4 | NMP | 13.9 |
C 5 | DGMM | 0.3 | |
C 6 | CHON | 0.1 | |
C 7 | H3PO3 | NMP | 11.4 |
C 8 | DGMM | 0.2 | |
C 9 | CHON | 0.1 | |
C 10 | Na3PO4·12H2O | NMP | 37.6 |
C 11 | DGMM | 28.1 | |
C 12 | CHON | 4.5 | |
C 13 | (NaPO3)n | NMP | 2.1 |
C 14 | DGMM | 1.1 | |
C 15 | CHON | 0.5 | |
C 16 | Na2HPO4 | NMP | 2.5 |
C 17 | DGMM | 2.3 | |
C 18 | CHON | 0.3 | |
C 19 | Na2HPO4·12H2O | NMP | 6.1 |
C 20 | CHON | 1.0 | |
C 21 | NaH2PO4·2H2O | NMP | 13.0 |
C 22 | DGMM | 1.2 | |
C 23 | CHON | 0.4 |
실시예 | 조성 | /% | |
C 24 | Na2HPO3·5H2O | NMP | 6.5 |
C 25 | DGMM | 2.2 | |
C 26 | CHON | 0.8 | |
C 27 | NaPH2O2·H2O | NMP | 11.0 |
C 28 | DGMM | 1.6 | |
C 29 | CHON | 0.9 | |
C 30 | K3PO4·nH2O | NMP | 20.5 |
C 31 | DGMM | 33.7 | |
C 32 | CHON | 6.4 | |
C 33 | (KPO3)n | NMP | 3.8 |
C 34 | DGMM | 1.1 | |
C 35 | CHON | 0.2 | |
C 36 | Mg3PO4·8H2O | NMP | 7.4 |
C 37 | DGMM | 1.5 | |
C 38 | AlPO4 | NMP | 2.2 |
C 39 | DGMM | 1.8 | |
C 40 | Ca3(PO4)2 | NMP | 1.8 |
C 41 | DGMM | 1.2 | |
C 42 | FePO4·nH2O | NMP | 3.7 |
C 43 | DGMM | 1.1 | |
C 44 | (NH4)3PO4·3H2O | NMP | 5.8 |
C 45 | DGMM | 1.6 |
비교예 | 조성 | /% |
C 1 | NMP | 0.8 |
C 2 | DGMM | 1.2 |
C 3 | CHON | 0.9 |
C 4 | W (= 물) | 0.0 |
C 5 | HPO3+ W | 0.0 |
C 6 | H3PO4+ W | 0.0 |
C 7 | H3PO3+ W | 0.0 |
C 8 | Na3PO4·12H2O + W | 0.0 |
C 9 | (NaPO3)n + W | 0.0 |
C 10 | Na2HPO4+ W | 0.0 |
C 11 | Na2HPO4·12H2O + W | 0.0 |
C 12 | NaH2PO4·2H2O + W | 0.0 |
C 13 | Na2HPO3·5H2O + W | 0.0 |
C 14 | NaPH2O2·H2O + W | 0.0 |
C 15 | K3PO4·nH2O + W | 0.0 |
C 16 | (KPO3)n + W | 0.0 |
C 17 | Mg3PO4·8H2O + W | 0.0 |
C 18 | AlPO4+ W | 0.0 |
C 19 | Ca3(PO4)2+ W | 0.0 |
C 20 | FePO4·nH2O + W | 0.0 |
C 21 | (NH4)3PO4·3H2O + W | 0.0 |
실시예 | 조성 | /% | |
D1 | 아세트산 리튬 | NMP | 8.2 |
D2 | DGMM | 2.1 | |
D3 | 아세트산 리튬 이수화물 | NMP | 21.3 |
D4 | DGMM | 3.2 | |
D5 | 시트르산 리튬 사수화물 | NMP | 7.6 |
D6 | DGMM | 12.3 | |
D7 | 아세트산 나트륨 | NMP | 7.4 |
D8 | DGMM | 4.2 | |
D9 | 벤조산 나트륨 | NMP | 12.5 |
D10 | DGMM | 1.3 | |
D11 | 시트르산 나트륨 탈수화물 | NMP | 7.0 |
D12 | DGMM | 2.1 | |
D13 | 숙신산 나트륨 육수화물 | NMP | 9.3 |
D14 | DGMM | 2.0 | |
D15 | 타르트르산 나트륨 이수화물 | NMP | 6.5 |
D16 | DGMM | 2.4 | |
D17 | 벤젠술폰산 나트륨 수화물 | NMP | 1.9 |
D18 | DGMM | 1.3 | |
D19 | 아세트산 칼륨 | NMP | 22.0 |
D20 | DGMM | 13.3 | |
D21 | 벤조산 칼륨 | NMP | 10.2 |
D22 | DGMM | 1.6 | |
D23 | 시트르산 칼륨 | NMP | 5.6 |
D24 | DGMM | 2.1 | |
D25 | 아세트산 알루미늄 수화물 | NMP | 3.5 |
D26 | DGMM | 1.7 | |
D27 | 아세트산 칼슘 수화물 | NMP | 7.3 |
D28 | DGMM | 1.6 | |
D29 | 시트르산 철 수화물 | NMP | 3.3 |
D30 | DGMM | 2.1 | |
D31 | 아세트산 암모늄 | NMP | 6.4 |
D32 | DGMM | 1.4 | |
D33 | 타르타르산 | NMP | 1.3 |
D34 | DGMM | 1.9 |
비교예 | 조성 | /% |
D1 | NMP | 0.8 |
D2 | DGMM | 1.2 |
D3 | W (= 물) | 0.0 |
D4 | 아세트산 리튬 + W | 0.0 |
D5 | 아세트산 리튬 이수화물 + w | 0.0 |
D6 | 시트르산 리튬 사수화물 + w | 0.0 |
D7 | 아세트산 나트륨 + W | 0.0 |
D8 | 벤조산 나트륨 + W | 0.0 |
D9 | 시트르산 나트륨 탈수화물 + W | 0.0 |
D10 | 숙신산 나트륨 육수화물 + W | 0.0 |
D11 | 타르트르산 나트륨 이수화물 + W | 0.0 |
D12 | 벤젠술폰산 나트륨 수화물 +W | 0.0 |
D13 | 아세트산 칼륨 + W | 0.0 |
D14 | 벤조산 칼륨 + W | 0.0 |
D15 | 시트르산 칼륨 + W | 0.0 |
D16 | 아세트산 알루미늄 수화물 + W | 0.0 |
D17 | 아세트산 칼슘 수화물 + W | 0.0 |
D18 | 시트르산 철 수화물 + W | 0.0 |
D19 | 아세트산 암모늄 + W | 0.0 |
D20 | 타르타르산 + W | 0.0 |
Claims (25)
- 에폭시 수지-경화 생산물을 분해 및 용해하기 위해 에폭시 수지-경화 생산물용 분해 촉매와 유기 용매를 함유하는 처리 액체로 에폭시 수지-경화 생산물을 처리하는 방법.
- 제1항에 있어서, 에폭시 수지-경화 생산물용 분해 촉매는 알칼리 금속 및/또는 알칼리 금속 화합물, 인-함유 산 및/또는 이의 염, 및 유기산 및/또는 이의 염에서 선택된 1종 이상의 화합물을 함유하는 것이 특징인 처리 방법.
- 제1항에 있어서, 유기 용매는 아미드계 용매, 알콜계 용매, 케톤계 용매 및 에테르계 용매에서 선택된 1종 이상의 용매를 함유하는 것이 특징인 처리 방법.
- 제2항에 있어서, 알칼리 금속 화합물은 알칼리 금속염인 것이 특징인 처리 방법.
- 제2항에 있어서, 인-함유 산의 염은 수화물 및/또는 알칼리 금속염인 것이 특징인 처리 방법.
- 제2항에 있어서, 유기 산의 염은 수화물 및/또는 알칼리 금속염인 것이 특징인 처리 방법.
- 제1항에 있어서, 에폭시 수지-경화 생산물은 할로겐 원자를 함유하는 것이 특징인 처리 방법.
- 제1항에 있어서, 에폭시 수지-경화 생산물의 분해 생산물은 합성 수지의 원료로서 재생이용가능한 화합물을 함유하는 것이 특징인 처리 방법.
- 제1항에 있어서, 에폭시 수지-경화 생산물은 대기압하에 처리하는 것이 특징인 처리 방법.
- 제1항에 있어서, 처리 액체의 온도는 공기 중 250℃ 또는 그 이하, 그리고 비활성 기체 중 300℃ 또는 그 이하인 것이 특징인 처리 방법.
- 하기 단계 (1) 및 (2)를 포함하여, 무기 물질과 에폭시-수지 경화 생산물로 된 복합성 재료를 분리하는 방법:(1) 에폭시 수지-경화 생산물용 분해 촉매 및 유기 용매를 함유하는 처리 액체로 무기 물질과 에폭시 수지-경화 생산물로 된 복합성 재료를 처리하여 에폭시 수지-경화 생산물을 분해 및 용해시키는 단계; 및(2) 단계 (1)에서 수득된 액체로부터 무기 물질을 분리하는 단계.
- 제11항에 있어서, 에폭시 수지-경화 생산물용 분해 촉매는 알칼리 금속 및/또는 알칼리 금속 화합물, 인-함유 산 및/또는 이의 염, 및 유기산 및/또는 이의 염에서 선택된 1종 이상의 화합물을 함유하는 것이 특징인 분리 방법.
- 제11항에 있어서, 유기 용매는 아미드계 용매, 알콜계 용매, 케톤계 용매 및 에테르계 용매에서 선택된 1종 이상의 용매를 함유하는 것이 특징인 분리 방법.
- 제12항에 있어서, 알칼리 금속 화합물은 알칼리 금속염인 것이 특징인 분리 방법.
- 제12항에 있어서, 인-함유 산의 염은 수화물 및/또는 알칼리 금속염인 것이 특징인 분리 방법.
- 제12항에 있어서, 유기 산의 염은 수화물 및/또는 알칼리 금속염인 것이 특징인 분리 방법.
- 제11항에 있어서, 에폭시 수지-경화 생산물은 할로겐 원자를 함유하는 것이 특징인 처리 방법.
- 제11항에 있어서, 무기 물질은 금속 및/또는 유리인 것이 특징인 분리 방법.
- 제11항에 있어서, 무기 물질과 에폭시 수지-경화 생산물로 된 복합성 재료는 절연판, 금속이 피복된 적층물 또는 인쇄 배선 기판(printed wiring board) 중 어느 하나인 것이 특징인 분리 방법.
- 제11항에 있어서, 에폭시 수지-경화 생산물의 분해 생산물은 합성 수지의 원료로서 재생이용가능한 화합물을 함유하는 것이 특징인 분리 방법.
- 제11항에 있어서, 에폭시 수지-경화 생산물은 단계 (1)에서 대기압하에 처리하는 것이 특징인 분리 방법.
- 제11항에 있어서, 단계 (1)에서 처리 액체의 온도는 공기 중 250℃ 또는 그 이하, 그리고 비활성 기체 중 300℃ 또는 그 이하인 것이 특징인 분리 방법.
- 에폭시 수지-경화 생산물용 분해 촉매와 유기 용매를 함유하는 에폭시 수지-경화 생산물용 처리 액체.
- 제23항에 있어서, 에폭시 수지-경화 생산물용 분해 촉매는 알칼리 금속 및/또는 알칼리 금속 화합물, 인-함유 산 및/또는 이의 염, 및 유기산 및/또는 이의염에서 선택된 1종 이상의 화합물을 함유하는 것이 특징인 처리 액체.
- 제23항에 있어서, 유기 용매는 아미드계 용매, 알콜계 용매, 케톤계 용매 및 에테르계 용매에서 선택된 1종 이상의 용매를 함유하는 것이 특징인 처리 액체.
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JP28618799 | 1999-10-07 | ||
JPJP-P-1999-00286188 | 1999-10-07 | ||
JPJP-P-1999-00286187 | 1999-10-07 | ||
JP28618899 | 1999-10-07 |
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US (1) | US6962628B1 (ko) |
EP (1) | EP1220876B1 (ko) |
KR (1) | KR100468802B1 (ko) |
CN (1) | CN1185286C (ko) |
AT (1) | ATE293653T1 (ko) |
DE (1) | DE60019624T2 (ko) |
ES (1) | ES2239038T3 (ko) |
TW (1) | TWI284572B (ko) |
WO (1) | WO2001025317A2 (ko) |
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Cited By (2)
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WO2018021645A1 (ko) * | 2016-07-27 | 2018-02-01 | 한국기계연구원 | 섬유보강 복합재의 재활용을 위한 화학분해 가능한 열경화성 수지 조성물 및 이의 용해방법 |
KR20180012892A (ko) * | 2016-07-27 | 2018-02-07 | 한국기계연구원 | 섬유보강 복합재의 재활용을 위한 화학분해 가능한 열경화성 수지 조성물 및 이의 용해방법 |
Also Published As
Publication number | Publication date |
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ES2239038T3 (es) | 2005-09-16 |
CN1434838A (zh) | 2003-08-06 |
KR100468802B1 (ko) | 2005-02-02 |
WO2001025317A2 (en) | 2001-04-12 |
US6962628B1 (en) | 2005-11-08 |
CN1185286C (zh) | 2005-01-19 |
EP1220876B1 (en) | 2005-04-20 |
ATE293653T1 (de) | 2005-05-15 |
WO2001025317A3 (en) | 2002-05-02 |
DE60019624T2 (de) | 2006-03-09 |
DE60019624D1 (de) | 2005-05-25 |
EP1220876A2 (en) | 2002-07-10 |
TWI284572B (en) | 2007-08-01 |
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