KR101525275B1 - 전자 재료용 세정제 및 세정 방법 - Google Patents

전자 재료용 세정제 및 세정 방법 Download PDF

Info

Publication number
KR101525275B1
KR101525275B1 KR1020107014846A KR20107014846A KR101525275B1 KR 101525275 B1 KR101525275 B1 KR 101525275B1 KR 1020107014846 A KR1020107014846 A KR 1020107014846A KR 20107014846 A KR20107014846 A KR 20107014846A KR 101525275 B1 KR101525275 B1 KR 101525275B1
Authority
KR
South Korea
Prior art keywords
acid
carbon atoms
cleaning
group
salt
Prior art date
Application number
KR1020107014846A
Other languages
English (en)
Korean (ko)
Other versions
KR20100107003A (ko
Inventor
요시타카 가츠카와
가즈미츠 스즈키
쇼헤이 사토
Original Assignee
산요가세이고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 산요가세이고교 가부시키가이샤 filed Critical 산요가세이고교 가부시키가이샤
Publication of KR20100107003A publication Critical patent/KR20100107003A/ko
Application granted granted Critical
Publication of KR101525275B1 publication Critical patent/KR101525275B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/04—Carboxylic acids or salts thereof
    • C11D1/06—Ether- or thioether carboxylic acids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
    • C11D1/14—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aliphatic hydrocarbons or mono-alcohols
    • C11D1/143—Sulfonic acid esters
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
    • C11D1/14—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aliphatic hydrocarbons or mono-alcohols
    • C11D1/146—Sulfuric acid esters
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/34—Derivatives of acids of phosphorus
    • C11D1/342—Phosphonates; Phosphinates or phosphonites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/34—Derivatives of acids of phosphorus
    • C11D1/345—Phosphates or phosphites
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40—Specific cleaning or washing processes
    • C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020107014846A 2007-12-17 2008-11-17 전자 재료용 세정제 및 세정 방법 KR101525275B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2007324597 2007-12-17
JPJP-P-2007-324597 2007-12-17
JPJP-P-2008-022135 2008-01-31
JP2008022135 2008-01-31
PCT/JP2008/003342 WO2009078123A1 (ja) 2007-12-17 2008-11-17 電子材料用洗浄剤及び洗浄方法

Publications (2)

Publication Number Publication Date
KR20100107003A KR20100107003A (ko) 2010-10-04
KR101525275B1 true KR101525275B1 (ko) 2015-06-02

Family

ID=40795247

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107014846A KR101525275B1 (ko) 2007-12-17 2008-11-17 전자 재료용 세정제 및 세정 방법

Country Status (5)

Country Link
JP (1) JP5155121B2 (ja)
KR (1) KR101525275B1 (ja)
CN (1) CN101888906B (ja)
TW (1) TWI398515B (ja)
WO (1) WO2009078123A1 (ja)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011014027A2 (ko) * 2009-07-29 2011-02-03 동우 화인켐 주식회사 세정액 조성물 및 이를 이용한 패널의 세정방법
JP5500911B2 (ja) * 2009-08-26 2014-05-21 ライオン株式会社 ハードディスク基板用洗浄剤組成物、およびハードディスク基板の洗浄方法
KR20110028239A (ko) * 2009-09-11 2011-03-17 동우 화인켐 주식회사 평판표시장치 제조용 기판의 세정액 조성물
WO2011031092A2 (ko) * 2009-09-11 2011-03-17 동우 화인켐 주식회사 평판표시장치 제조용 기판의 세정액 조성물
JP5515588B2 (ja) * 2009-10-05 2014-06-11 栗田工業株式会社 ウエハ用洗浄水及びウエハの洗浄方法
JP5585076B2 (ja) 2009-12-24 2014-09-10 栗田工業株式会社 洗浄方法
JP5401359B2 (ja) * 2010-02-16 2014-01-29 花王株式会社 硬質表面用アルカリ洗浄剤組成物
JP5774330B2 (ja) * 2011-02-28 2015-09-09 三洋化成工業株式会社 電子材料用洗浄剤
KR20140053003A (ko) * 2011-05-24 2014-05-07 아사히 가라스 가부시키가이샤 세정제 및 유리 기판의 세정 방법
TW201323102A (zh) * 2011-12-15 2013-06-16 Dongwoo Fine Chem Co Ltd 清洗製造有機el裝置的氣相沉積掩模的方法及清洗液
WO2013122172A1 (ja) 2012-02-17 2013-08-22 三菱化学株式会社 半導体デバイス用洗浄液及び半導体デバイス用基板の洗浄方法
CN102911821B (zh) * 2012-10-25 2015-01-28 东莞市伟思化学科技有限公司 一种水基光学透镜清洗剂组合物
JP6234673B2 (ja) * 2012-12-05 2017-11-22 花王株式会社 ガラス基板の洗浄方法
WO2014208353A1 (ja) * 2013-06-24 2014-12-31 三菱電機株式会社 太陽光発電装置用基板の製造方法および太陽光発電装置用基板の製造装置
JP6208575B2 (ja) * 2013-12-24 2017-10-04 花王株式会社 洗浄剤組成物
JP2016037606A (ja) * 2014-08-08 2016-03-22 三洋化成工業株式会社 電子材料用洗浄剤組成物及び電子材料の製造方法
SG11201710747WA (en) 2015-06-24 2018-01-30 Kao Corp Cleaning agent composition for glass hard disk substrate
WO2017094592A1 (ja) * 2015-11-30 2017-06-08 花王株式会社 磁気ディスク基板用研磨液組成物
WO2017139419A1 (en) * 2016-02-11 2017-08-17 Qiagen Waltham, Inc. Polyphenolic additives in sequencing-by-synthesis
CN105714585B (zh) * 2016-04-12 2017-10-31 张家港市德宝化工有限公司 一种用于合成纤维的还原清洗剂、其制备方法及应用
US10533146B2 (en) * 2016-10-06 2020-01-14 Fujifilm Electronic Materials U.S.A., Inc. Cleaning formulations for removing residues on semiconductor substrates
CN106753865A (zh) * 2016-11-29 2017-05-31 洛阳新巨能高热技术有限公司 电子材料清洗剂
CN106800982A (zh) * 2016-11-29 2017-06-06 洛阳新巨能高热技术有限公司 一种电子材料用清洗剂
CN106847691B (zh) * 2016-12-11 2020-05-22 安徽兆利光电科技有限公司 一种整流二极管清洗方法
CN110447090A (zh) * 2017-03-22 2019-11-12 三菱化学株式会社 半导体器件用基板的清洗液、半导体器件用基板的清洗方法、半导体器件用基板的制造方法和半导体器件用基板
KR101955597B1 (ko) * 2017-05-17 2019-05-31 세메스 주식회사 세정액 제조 장치 및 방법
JP7138432B2 (ja) * 2017-12-26 2022-09-16 花王株式会社 シリコンウェーハ製造方法
KR102029442B1 (ko) * 2018-01-04 2019-10-08 삼성전기주식회사 드라이필름 레지스트 제거용 박리조성물 및 이를 이용한 드라이필름 레지스트의 박리방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05179289A (ja) * 1991-12-30 1993-07-20 Lion Corp 電子部品用洗浄剤組成物
JPH05335294A (ja) * 1992-05-29 1993-12-17 Mitsubishi Gas Chem Co Inc 半導体基板洗浄液
KR20050105084A (ko) * 2004-04-30 2005-11-03 산요가세이고교 가부시키가이샤 알칼리 세정제
WO2006025373A1 (ja) * 2004-08-31 2006-03-09 Sanyo Chemical Industries, Ltd. 界面活性剤

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05179289A (ja) * 1991-12-30 1993-07-20 Lion Corp 電子部品用洗浄剤組成物
JPH05335294A (ja) * 1992-05-29 1993-12-17 Mitsubishi Gas Chem Co Inc 半導体基板洗浄液
KR20050105084A (ko) * 2004-04-30 2005-11-03 산요가세이고교 가부시키가이샤 알칼리 세정제
WO2006025373A1 (ja) * 2004-08-31 2006-03-09 Sanyo Chemical Industries, Ltd. 界面活性剤

Also Published As

Publication number Publication date
WO2009078123A1 (ja) 2009-06-25
CN101888906B (zh) 2012-12-19
JP5155121B2 (ja) 2013-02-27
JP2009206481A (ja) 2009-09-10
KR20100107003A (ko) 2010-10-04
CN101888906A (zh) 2010-11-17
TWI398515B (zh) 2013-06-11
TW200927914A (en) 2009-07-01

Similar Documents

Publication Publication Date Title
KR101525275B1 (ko) 전자 재료용 세정제 및 세정 방법
TWI398514B (zh) 用於清潔磁光碟基板的清潔劑
JP5410943B2 (ja) 電子材料用洗浄剤
JP5117480B2 (ja) 電子材料用洗浄剤
JP5192953B2 (ja) 磁気ディスク用ガラス基板洗浄剤
JP5192952B2 (ja) 磁気ディスク基板用洗浄剤
JP5553985B2 (ja) 電子材料用洗浄剤
JP2008182221A (ja) 半導体基板用洗浄剤
KR102399218B1 (ko) Cmp 후 세정 조성물 및 그와 관련된 방법
JP6949846B2 (ja) 化学機械研磨後の洗浄組成物
JP2009194049A (ja) 銅配線半導体用洗浄剤
JP5711589B2 (ja) 磁気ディスク基板用洗浄剤
JP5323017B2 (ja) 磁気ディスク基板用洗浄剤
JP2005060660A (ja) 半導体基板用洗浄液
TWI752196B (zh) 半導體裝置用基板之清潔劑組合物、半導體裝置用基板之清潔方法、半導體裝置用基板之製造方法及半導體裝置用基板
JP5324242B2 (ja) 電子材料用洗浄剤及び洗浄方法
TWI675913B (zh) 硬碟用基板用之清潔劑組合物
JP5086450B2 (ja) 磁気ディスク基板用洗浄剤
JP2014141669A (ja) 電子材料用洗浄剤
JP2003109930A (ja) 半導体デバイス用基板の洗浄液及び洗浄方法
JP5307759B2 (ja) シリコンウエハ製造工程用洗浄剤
JP2013151677A (ja) 電子材料用洗浄剤
JP2009263508A (ja) 電子材料用洗浄剤及び洗浄方法
JP2017168177A (ja) 電子材料用洗浄剤及び電子材料の製造方法
JP2017050039A (ja) 電子材料基板用洗浄液

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20180523

Year of fee payment: 4

LAPS Lapse due to unpaid annual fee