KR100968316B1 - 기판처리장치 및 기판처리방법 - Google Patents

기판처리장치 및 기판처리방법 Download PDF

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Publication number
KR100968316B1
KR100968316B1 KR1020040004130A KR20040004130A KR100968316B1 KR 100968316 B1 KR100968316 B1 KR 100968316B1 KR 1020040004130 A KR1020040004130 A KR 1020040004130A KR 20040004130 A KR20040004130 A KR 20040004130A KR 100968316 B1 KR100968316 B1 KR 100968316B1
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KR
South Korea
Prior art keywords
substrate
supporting
unit
pressing
support
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KR1020040004130A
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English (en)
Korean (ko)
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KR20040072034A (ko
Inventor
니시오카신지
사카이미쓰히로
무라카미다쿠토
다지리겐이치
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도쿄엘렉트론가부시키가이샤
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Publication of KR20040072034A publication Critical patent/KR20040072034A/ko
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Publication of KR100968316B1 publication Critical patent/KR100968316B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020040004130A 2003-02-07 2004-01-20 기판처리장치 및 기판처리방법 KR100968316B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00031016 2003-02-07
JP2003031016A JP3989384B2 (ja) 2003-02-07 2003-02-07 基板処理装置及び基板処理方法

Publications (2)

Publication Number Publication Date
KR20040072034A KR20040072034A (ko) 2004-08-16
KR100968316B1 true KR100968316B1 (ko) 2010-07-08

Family

ID=32957735

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040004130A KR100968316B1 (ko) 2003-02-07 2004-01-20 기판처리장치 및 기판처리방법

Country Status (4)

Country Link
JP (1) JP3989384B2 (ja)
KR (1) KR100968316B1 (ja)
CN (1) CN100347812C (ja)
TW (1) TWI232485B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108231644A (zh) * 2016-12-09 2018-06-29 亚威科股份有限公司 掩膜对准装置用基板升降装置

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100966430B1 (ko) * 2004-08-31 2010-06-28 엘지디스플레이 주식회사 기판지지핀을 구비하는 소프트 베이크 장치 및 이를이용한 소프트 베이킹 방법
CN100409424C (zh) * 2005-04-26 2008-08-06 大日本网目版制造株式会社 基板处理装置
JP2007057132A (ja) * 2005-08-23 2007-03-08 Koyo Thermo System Kk 熱処理装置
US8003919B2 (en) * 2005-12-06 2011-08-23 Dainippon Screen Mfg. Co., Ltd. Substrate heat treatment apparatus
JP2007158077A (ja) * 2005-12-06 2007-06-21 Dainippon Screen Mfg Co Ltd 基板熱処理装置
CN100383952C (zh) * 2005-12-08 2008-04-23 北京北方微电子基地设备工艺研究中心有限责任公司 用于半导体设备具有调节长度功能的举升装置
JP5073230B2 (ja) * 2006-06-20 2012-11-14 東京応化工業株式会社 支持ピン
JP2008041760A (ja) * 2006-08-02 2008-02-21 Sekisui Chem Co Ltd プラズマ処理等の表面処理用設置装置
KR100780356B1 (ko) 2006-11-27 2007-11-30 삼성전자주식회사 나노 임프린팅 장치와 이에 의한 소프트스템퍼의 이형방법
KR101495340B1 (ko) * 2006-11-28 2015-02-24 엘지디스플레이 주식회사 기판 수취 장치
JP4850811B2 (ja) * 2007-11-06 2012-01-11 東京エレクトロン株式会社 載置台、処理装置および処理システム
JP4683670B2 (ja) 2009-04-17 2011-05-18 キヤノン株式会社 電子写真画像形成装置、プロセスカートリッジ、及び、現像カートリッジ
WO2011007616A1 (ja) * 2009-07-13 2011-01-20 シャープ株式会社 支持装置およびこの支持装置を備える乾燥装置
JP2011086807A (ja) * 2009-10-16 2011-04-28 Tokyo Electron Ltd 減圧乾燥装置
JP2013161946A (ja) * 2012-02-06 2013-08-19 Tokyo Electron Ltd 基板処理装置及び基板処理方法
CN103241677B (zh) * 2013-05-08 2015-10-28 武汉理工大学 一种顶起装置
CN105652608B (zh) * 2016-04-14 2017-11-07 京东方科技集团股份有限公司 曝光机及曝光方法
JP6863747B2 (ja) * 2017-01-05 2021-04-21 東レエンジニアリング株式会社 減圧乾燥装置
KR102180211B1 (ko) * 2019-01-07 2020-11-18 주식회사 아바코 마스크 정렬장치용 기판 리프트 장치
JP2021096961A (ja) * 2019-12-17 2021-06-24 東京エレクトロン株式会社 減圧乾燥装置および減圧乾燥方法
CN112265369B (zh) * 2020-10-29 2022-05-17 滁州新彩家用玻璃有限公司 一种平板玻璃压膜装置
JP2022147234A (ja) * 2021-03-23 2022-10-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板昇降装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1076211A (ja) * 1996-09-03 1998-03-24 Dainippon Screen Mfg Co Ltd 減圧乾燥装置
JPH10303099A (ja) * 1997-04-24 1998-11-13 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11251257A (ja) * 1998-03-05 1999-09-17 Nec Corp 基板熱処理装置及び同装置からの基板の分離方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11238673A (ja) * 1998-02-20 1999-08-31 Hirata Corp 基板現像装置
JP3748028B2 (ja) * 2000-04-27 2006-02-22 大日本スクリーン製造株式会社 基板処理装置
US6437296B1 (en) * 2000-12-21 2002-08-20 Lg. Philips Lcd Co. Ltd. Alignment apparatus of the substrate for LCD
US6935466B2 (en) * 2001-03-01 2005-08-30 Applied Materials, Inc. Lift pin alignment and operation methods and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1076211A (ja) * 1996-09-03 1998-03-24 Dainippon Screen Mfg Co Ltd 減圧乾燥装置
JPH10303099A (ja) * 1997-04-24 1998-11-13 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11251257A (ja) * 1998-03-05 1999-09-17 Nec Corp 基板熱処理装置及び同装置からの基板の分離方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108231644A (zh) * 2016-12-09 2018-06-29 亚威科股份有限公司 掩膜对准装置用基板升降装置
CN108231644B (zh) * 2016-12-09 2021-11-19 亚威科股份有限公司 掩膜对准装置用基板升降装置

Also Published As

Publication number Publication date
JP2004241702A (ja) 2004-08-26
CN1525528A (zh) 2004-09-01
TW200421423A (en) 2004-10-16
JP3989384B2 (ja) 2007-10-10
TWI232485B (en) 2005-05-11
KR20040072034A (ko) 2004-08-16
CN100347812C (zh) 2007-11-07

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