KR100640676B1 - 감열성 기록 재료 - Google Patents
감열성 기록 재료 Download PDFInfo
- Publication number
- KR100640676B1 KR100640676B1 KR1020017007474A KR20017007474A KR100640676B1 KR 100640676 B1 KR100640676 B1 KR 100640676B1 KR 1020017007474 A KR1020017007474 A KR 1020017007474A KR 20017007474 A KR20017007474 A KR 20017007474A KR 100640676 B1 KR100640676 B1 KR 100640676B1
- Authority
- KR
- South Korea
- Prior art keywords
- alkyl
- substituted
- methyl
- unsubstituted
- halogen
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/44—Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton
- C07C317/48—Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton the carbon skeleton being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups
- C07C317/50—Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton the carbon skeleton being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/333—Colour developing components therefor, e.g. acidic compounds
- B41M5/3333—Non-macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/50—Compounds containing any of the groups, X being a hetero atom, Y being any atom
- C07C311/51—Y being a hydrogen or a carbon atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/50—Compounds containing any of the groups, X being a hetero atom, Y being any atom
- C07C311/52—Y being a hetero atom
- C07C311/54—Y being a hetero atom either X or Y, but not both, being nitrogen atoms, e.g. N-sulfonylurea
- C07C311/57—Y being a hetero atom either X or Y, but not both, being nitrogen atoms, e.g. N-sulfonylurea having sulfur atoms of the sulfonylurea groups bound to carbon atoms of six-membered aromatic rings
- C07C311/60—Y being a hetero atom either X or Y, but not both, being nitrogen atoms, e.g. N-sulfonylurea having sulfur atoms of the sulfonylurea groups bound to carbon atoms of six-membered aromatic rings having nitrogen atoms of the sulfonylurea groups bound to carbon atoms of six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/50—Compounds containing any of the groups, X being a hetero atom, Y being any atom
- C07C311/52—Y being a hetero atom
- C07C311/54—Y being a hetero atom either X or Y, but not both, being nitrogen atoms, e.g. N-sulfonylurea
- C07C311/57—Y being a hetero atom either X or Y, but not both, being nitrogen atoms, e.g. N-sulfonylurea having sulfur atoms of the sulfonylurea groups bound to carbon atoms of six-membered aromatic rings
- C07C311/62—Y being a hetero atom either X or Y, but not both, being nitrogen atoms, e.g. N-sulfonylurea having sulfur atoms of the sulfonylurea groups bound to carbon atoms of six-membered aromatic rings having nitrogen atoms of the sulfonylurea groups further acylated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Display Devices Of Pinball Game Machines (AREA)
Abstract
Description
Claims (22)
- 하나 이상의 발색 화합물 a)와하나 이상의 화학식 1의 현색제 b)를 포함하는 감열성 기록 재료.화학식 1위의 화학식 1에서,R1은 치환되지 않거나 치환된 페닐, 나프틸 또는 C1-C20 알킬이고,A는 치환되지 않거나 치환된 페닐렌, 나프틸렌, C1-C12 알킬렌 또는 헤테로사이클릭 그룹이고,B는 화학식 -O-SO2-, -SO2-O-, -NH-SO2-, -SO2-NH-, -S-SO2-, -O-CO-, -O-CO-NH-, -NH-CO-, -NH-CO-O-, -S-CO-NH-, -S-CS-NH-, -CO-NH-SO2-, -O-CO-NH-SO2-, -NH=CH-, -CO-NH-CO-, -S-, -CO-, -O-, -SO2-NH-CO-, -O-CO-O- 또는 -O-PO-(OR2)2의 결합 그룹이며,R2는 치환되지 않거나 치환된 아릴, 벤질 또는 C1-C20 알킬이고,단 B가 화학식 -O-SO2-의 결합 그룹이 아닌 경우, R2는 치환되지 않거나 치환된 페닐, 나프틸 또는 C1-C8 알킬이며, B가 -O-인 경우, R2는 알킬이 아니다.
- 제1항에 있어서, R1이 치환되지 않거나, C1-C8 알킬, C1-C8 알콕시 또는 할로겐에 의해 치환된 페닐인 기록 재료.
- 제1항 또는 제2항에 있어서, R1이, C1-C8 알킬, C1-C8 알콕시 또는 할로겐에 의해 치환된 페닐인 기록 재료.
- 제1항 또는 제2항에 있어서, R1이, C1-C4 알킬에 의해 치환된 페닐인 기록 재료.
- 제1항 또는 제2항에 있어서, A가 치환되지 않거나 C1-C8 알킬, 할로겐 치환된 C1-C8 알킬, C1-C8 알콕시 치환된 C1-C8 알킬, C1-C8 알콕시, 할로겐 치환된 C1-C8 알콕시, C1-C8 알킬설포닐, 할로겐, 페닐, 페녹시 또는 페녹시카보닐에 의해 치환된 페닐렌; 나프틸렌; C1-C12 알킬렌; 또는 치환되지 않거나 C1-C8 알킬에 의해 치환된 피리미딜렌인 기록 재료.
- 제1항 또는 제2항에 있어서, A가 치환되지 않거나 C1-C8 알킬, 할로겐 치환된 C1-C8 알킬, C1-C8 알콕시 치환된 C1-C8 알킬, C1-C8 알콕시, 할로겐 치환된 C1-C8 알콕시, C1-C8 알킬설포닐, 할로겐, 페닐, 페녹시 또는 페녹시카보닐에 의해 치환된 페닐렌인 기록 재료.
- 제1항 또는 제2항에 있어서, A가 치환되지 않거나 C1-C8 알킬, 할로겐 치환된 C1-C8 알킬, C1-C8 알킬설포닐 또는 할로겐에 의해 치환된 페닐렌인 기록 재료.
- 제1항 또는 제2항에 있어서, A가 치환되지 않거나 C1-C4 알킬 또는 할로겐에 의해 치환된 페닐렌인 기록 재료.
- 제1항 또는 제2항에 있어서, B가 화학식 -O-SO2-, -SO2-O-, -SO2-NH-, -S-SO2-, -O-CO-, -O-, -O-CO-NH-, -SO2-NH-CO-, -O-CO-O- 또는 -O-PO-(OR2)2의 결합 그룹인 기록 재료.
- 제1항 또는 제2항에 있어서, B가 화학식 -O-SO2-의 결합 그룹인 기록 재료.
- 제1항 또는 제2항에 있어서, B가 화학식 -O-의 결합 그룹이고, R2가 치환되지 않거나 치환된 아릴 또는 벤질인 기록 재료.
- 제1항 또는 제2항에 있어서, R2가 C1-C6 알킬, 할로겐 치환된 C1-C6 알킬; 페닐 치환된 C1-C6 알킬; 나프틸 치환된 C1-C6 알킬; 치환되지 않거나 C1-C8 알킬, 할로겐 치환된 C1-C8 알킬, C1-C8 알콕시 치환된 C1-C8 알킬, C1-C8 알콕시, 할로겐 치환된 C1-C8 알콕시 또는 할로겐에 의해 치환된 페닐; C1-C4 알킬 또는 할로겐에 의해 치환된 나프틸 및 벤질인 기록 재료.
- 제1항 또는 제2항에 있어서, R2가 C1-C4 알킬, 할로겐 치환된 C1-C4 알킬; 치환되지 않거나 C1-C4 알킬 또는 할로겐에 의해 치환된 페닐; 치환되지 않거나 C1-C4 알킬 또는 할로겐에 의해 치환된 나프틸 및 벤질인 기록 재료.
- 제1항 또는 제2항에 있어서, R2가 치환되지 않거나 C1-C4 알킬에 의해 치환된 페닐인 기록 재료.
- 제1항 또는 제2항에 있어서, 하나 이상의 감광제를 포함하는 기록 재료.
- 제17항에 있어서, 스테아르아미드, 메틸올 스테아르아미드, p-벤질비페닐, m-테르페닐, 2-벤질옥시나프탈렌, 4-메톡시비페닐, 디벤질 옥살레이트, 디(4-메틸벤질)옥살레이트, 디(4-클로로벤질)옥살레이트, 디메틸 프탈레이트, 디벤질 테레프탈레이트, 디벤질 이소프탈레이트, 1,2-디페녹시에탄, 1,2-비스(4-메틸페녹시)에탄, 1,2-비스(3-메틸페녹시)에탄, 4,4'-디메틸비페닐, 페닐-1-하이드록시-2-나프토에이트, 4-메틸페닐 비페닐 에테르, 1,2-비스(3,4-디메틸페닐)에탄, 2,3,5,6-4'-메틸디페닐 메탄, 1,4-디에톡시나프탈렌, 1,4-디아세톡시벤젠, 1,4-디프로프리온옥시벤젠, o-크실릴렌-비스(페닐 에테르), 4-(m-메틸페녹시메틸)비페닐, p-하이드록시아세트아닐리드, p-하이드록시부티르아닐리드, p-하이드록시노난아닐리드, p-하이드록시라우르아닐리드, p-하이드록시옥타데칸아닐리드, N-페닐-페닐설폰아미드 및 화학식 3의 감광제로 이루어진 그룹으로부터 선택된 하나 이상의 감광제를 포함하는 기록 재료.화학식 3위의 화학식 3에서,R 및 R'는 서로 동일하거나 상이하고, 각각 C1-C6 알킬이다.
- 제1항 또는 제2항에 있어서, 하나 이상의 안정화제를 포함하는 기록 재료.
- 제18항에 있어서, 2,2'-메틸렌-비스(4-메틸-6-3급-부틸페놀), 2,2'-메틸렌-비스(4-에틸-6-3급-부틸페놀), 4,4'-부틸리덴-비스(3-메틸-6-3급-부틸페놀), 4,4'-티오-비스(2-3급-부틸-5-메틸페놀), 1,1,3-트리스(2-메틸-4-하이드록시-5-3급-부틸페닐)부탄, 1,1,3-트리스(2-메틸-4-하이드록시-5-사이클로헥실페닐)부탄, 비스(3-3급-부틸-4-하이드록시-6-메틸페닐)설폰, 비스(3,5-디브로모-4-하이드록시페닐)설폰, 4,4'-설피닐 비스(2-3급-부틸-5-메틸페놀), 2,2'-메틸렌 비스(4,6-디-3급-부틸페닐)포스페이트, 이들의 알칼리 금속염, 이들의 암모늄염, 이들의 다가 금속염, 4-벤질옥시-4'-(2-메틸글리시딜옥시)디페닐 설폰, 4,4'-디글리시딜옥시디페닐 설폰, 1,4-디글리시딜옥시벤젠, 4-[α-(하이드록시메틸)벤질옥시]-4-하이드록시디페닐 설폰, p-니트로벤조산의 금속염, 프탈산 모노벤질 에스테르의 금속염, 신남산의 금속염 및 이들의 혼합물로 이루어진 그룹으로부터 선택된 하나 이상의 안정화제를 포함하는 기록 재료.
- 화학식 2의 화합물.화학식 2위의 화학식 2에서,R1은 치환되지 않거나 치환된 페닐, 나프틸 또는 C1-C20 알킬이고,R3 및 R4는 서로 독립적으로 수소, C1-C8 알킬, 할로겐 치환된 C1-C8 알킬, C1-C8 알콕시 치환된 C1-C8 알킬, C1-C8 알콕시, 할로겐 치환된 C1-C8 알콕시, C1-C8 알킬설포닐, 할로겐, 페닐, 페녹시 또는 페녹시카보닐이며,B는 화학식 -O-SO2-, -SO2-O-, -SO2-NH-, -O-CO- 또는 -CO-NH-SO2-의 결합 그룹이며,R2는 치환되지 않거나 치환된 페닐, 나프틸 또는 C1-C20 알킬이고,단 B가 화학식 -O-SO2-의 결합 그룹이 아닌 경우, R2는 치환되지 않거나 치환된 페닐, 나프틸 또는 C1-C8 알킬이다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9827569.6A GB9827569D0 (en) | 1998-12-16 | 1998-12-16 | Heat sensitive recording material |
GB9827569.6 | 1998-12-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010101232A KR20010101232A (ko) | 2001-11-14 |
KR100640676B1 true KR100640676B1 (ko) | 2006-11-02 |
Family
ID=10844238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017007474A KR100640676B1 (ko) | 1998-12-16 | 1999-12-03 | 감열성 기록 재료 |
Country Status (14)
Country | Link |
---|---|
US (1) | US6624117B1 (ko) |
EP (1) | EP1140515B1 (ko) |
JP (1) | JP4601174B2 (ko) |
KR (1) | KR100640676B1 (ko) |
CN (1) | CN1185108C (ko) |
AT (1) | ATE276111T1 (ko) |
AU (1) | AU769040B2 (ko) |
BR (1) | BR9916316B1 (ko) |
DE (1) | DE69920265T2 (ko) |
ES (1) | ES2228155T3 (ko) |
GB (1) | GB9827569D0 (ko) |
ID (1) | ID30230A (ko) |
WO (1) | WO2000035679A1 (ko) |
ZA (1) | ZA200104863B (ko) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR0109540A (pt) * | 2000-03-27 | 2003-06-10 | Ciba Sc Holding Ag | Material para registro sensìvel ao calor |
DE60100682T2 (de) | 2000-06-01 | 2004-03-11 | Oji Paper Co., Ltd. | Wärmeempfindliches Aufzeichnungsmaterial |
WO2002020278A1 (fr) * | 2000-09-08 | 2002-03-14 | Mitsubishi Paper Mills Limited | Matieres de thermographie |
DE60102055T3 (de) * | 2000-11-24 | 2012-03-29 | Oji Paper Co., Ltd. | Wärmeempfindliches Aufzeichnungsmaterial |
EP1480836A1 (en) * | 2002-03-06 | 2004-12-01 | Ciba SC Holding AG | Mixture of colour developers |
AU2003208757A1 (en) | 2002-03-06 | 2003-09-16 | Ciba Specialty Chemicals Holding Inc. | Heat sensitive recording material |
MY141478A (en) * | 2002-06-04 | 2010-04-30 | Ciba Sc Holding Ag | Heat sensitive recording material |
CN100446990C (zh) * | 2003-06-25 | 2008-12-31 | Chemipro化成株式会社 | 记录材料用显色剂 |
ATE342808T1 (de) | 2003-10-28 | 2006-11-15 | Mitsubishi Hitec Paper Flensbu | Wärmeempfindliches aufzeichnungsmaterial, seine verwendung und verfahren zu seiner herstellung |
US20070015092A1 (en) * | 2005-07-13 | 2007-01-18 | Gore Makarand P | Color forming compositions |
WO2007014847A1 (en) * | 2005-07-28 | 2007-02-08 | Ciba Specialty Chemicals Holding Inc. | Stable aqueous dispersions of colour developer |
US20070087292A1 (en) * | 2005-10-13 | 2007-04-19 | Day Michael J | Color forming compositions |
CN100411516C (zh) * | 2006-07-18 | 2008-08-20 | 西安近代化学研究所 | 氨基甲酸酯类除草剂 |
CA2680371A1 (en) | 2007-03-15 | 2008-09-18 | Basf Se | Heat-sensitive coating compositions based on resorcinyl triazine derivatives |
ES2377852T3 (es) | 2007-08-22 | 2012-04-02 | Datalase Ltd | Composición de revestimiento sensible al láser |
US8900414B2 (en) | 2007-11-07 | 2014-12-02 | Datalase, Ltd. | Fiber products |
JP5645832B2 (ja) | 2008-10-27 | 2014-12-24 | データレース リミテッドDatalase Ltd. | 基材にマーキングするためのレーザー感受性水性組成物 |
EP2289896A1 (en) | 2009-08-20 | 2011-03-02 | Basf Se | Process for the manufacture of 3-dibutylamino-6-methyl-7-anilinofluoran |
EP2325018A1 (de) | 2009-11-24 | 2011-05-25 | Mondi Uncoated Fine & Kraft Paper GmbH | Thermisch sensibles Aufzeichnungsmaterial |
WO2012036267A1 (ja) | 2010-09-16 | 2012-03-22 | 株式会社エーピーアイ コーポレーション | 新規なフェノールスルホン酸アリールエステル誘導体及びそれを用いた感熱記録材料 |
CN102433798A (zh) * | 2011-09-29 | 2012-05-02 | 河南省江河纸业有限责任公司 | 能够防止含机浆/化机浆热敏纸褪色的热敏纸的制造方法 |
TWI568715B (zh) | 2011-10-31 | 2017-02-01 | 日本製紙股份有限公司 | 酚磺酸芳基酯、顯色劑及感熱記錄材料 |
EP2794558B1 (en) * | 2011-12-20 | 2017-04-26 | Basf Se | Heat sensitive coating composition |
US9518011B2 (en) | 2012-11-21 | 2016-12-13 | Nippon Soda Co., Ltd. | Recording material produced using non-phenol compound |
DE112015000518B4 (de) | 2014-01-27 | 2019-06-06 | Mitsubishi Paper Mills Limited | Thermisches Aufzeichnungsmaterial |
DE102014107567B3 (de) | 2014-05-28 | 2015-11-05 | Papierfabrik August Koehler Se | Wärmeempfindliches Aufzeichnungsmaterial |
DE102015104306B4 (de) | 2015-03-23 | 2018-05-03 | Papierfabrik August Koehler Se | Wärmeempfindliches Aufzeichnungsmaterial |
PL3109059T3 (pl) | 2015-06-24 | 2018-10-31 | Mitsubishi Hitec Paper Europe Gmbh | Ciepłoczuły materiał rejestrujący |
EP3395583B1 (en) | 2015-12-25 | 2024-03-27 | Nippon Kayaku Kabushiki Kaisha | Heat-sensitive recording material |
DE102016113203B4 (de) | 2016-07-18 | 2018-05-30 | Papierfabrik August Koehler Se | Wärmeempfindliches aufzeichnungsmaterial |
DE102016219569A1 (de) | 2016-10-07 | 2018-04-12 | Mitsubishi Hitec Paper Europe Gmbh | Wärmeempfindliches Aufzeichnungsmaterial |
DE202017006776U1 (de) | 2016-10-07 | 2018-05-16 | Mitsubishi Hitec Paper Europe Gmbh | Wärmeempfindliches Aufzeichnungsmaterial |
DE102016219567A1 (de) | 2016-10-07 | 2018-04-12 | Mitsubishi Hitec Paper Europe Gmbh | Wärmeempfindliches Aufzeichnungsmaterial |
EP3305538A1 (de) | 2016-10-07 | 2018-04-11 | Mitsubishi HiTec Paper Europe GmbH | Wärmeempfindliches aufzeichnungsmaterial |
EP3414099A1 (en) | 2017-01-10 | 2018-12-19 | Mitsubishi HiTec Paper Europe GmbH | Novel colour developer for a thermo-sensitive recording medium, and a heat-sensitive recording material based on pla |
EP3482963A1 (de) | 2017-11-13 | 2019-05-15 | Mitsubishi HiTec Paper Europe GmbH | Wärmeempfindliches aufzeichnungsmaterial auf basis von pla |
WO2018139484A1 (ja) | 2017-01-30 | 2018-08-02 | 日本曹達株式会社 | 記録材料及び記録シート |
DE102017102702B4 (de) | 2017-02-10 | 2019-09-12 | Papierfabrik August Koehler Se | Wärmeempfindliches Aufzeichnungsmaterial |
CN106866471B (zh) * | 2017-03-23 | 2019-08-20 | 康爱特维迅(蓬莱)化学有限公司 | 一种含磺酰脲结构的热敏显色剂的制备方法 |
DE102017111439B4 (de) | 2017-05-24 | 2019-08-22 | Papierfabrik August Koehler Se | Wärmeempfindliches aufzeichnungsmaterial |
CN107311893B (zh) * | 2017-07-13 | 2018-11-09 | 耿潇 | 热敏增感剂n-对甲苯磺酰-n’-(3-对甲苯磺酰氧基苯基)脲的合成方法 |
JPWO2019031526A1 (ja) | 2017-08-09 | 2020-08-20 | 三菱ケミカル株式会社 | 感熱記録材料及び積層体 |
CN110997340A (zh) | 2017-08-09 | 2020-04-10 | 三菱化学株式会社 | 热敏记录材料和层叠体 |
US11945769B2 (en) | 2017-08-31 | 2024-04-02 | Sanko Co., Ltd. | N,N′-diarylurea derivative, manufacturing method thereof, and thermosensitive recording material using same |
EP3482964A1 (de) | 2017-11-13 | 2019-05-15 | Mitsubishi HiTec Paper Europe GmbH | Wärmeempfindliches aufzeichnungsmaterial auf basis von pla |
DE102018102177A1 (de) | 2018-01-31 | 2019-08-01 | Mitsubishi Hitec Paper Europe Gmbh | Beschichtungszusammensetzung, wärmeempfindliche Aufzeichnungsschicht, wärmeempfindliches Aufzeichnungsmaterial sowie entsprechende Verwendungen und Verfahren |
DE102018102180A1 (de) | 2018-01-31 | 2019-08-01 | Mitsubishi Hitec Paper Europe Gmbh | Wärmeempfindliches Aufzeichnungsmaterial |
EP3533619A1 (en) | 2018-03-02 | 2019-09-04 | Basf Se | Heat sensitive recording material and color developer |
DE102018111224B4 (de) | 2018-05-09 | 2020-12-10 | Papierfabrik August Koehler Se | Wärmeempfindliches Aufzeichnungsmaterial |
DE102018133168B4 (de) | 2018-12-20 | 2021-02-18 | Papierfabrik August Koehler Se | Wärmeempfindliches Aufzeichnungsmaterial |
CN114667279A (zh) * | 2019-08-30 | 2022-06-24 | 索理思科技开曼公司 | 包含非酚型显色剂的热敏性记录材料 |
DE102019126220A1 (de) | 2019-09-27 | 2021-04-01 | Mitsubishi Hitec Paper Europe Gmbh | Wärmeempfindliches Aufzeichnungsmaterial, umfassend phenolfreie organische Farbentwickler |
CN114761379A (zh) * | 2019-11-28 | 2022-07-15 | 三菱化学株式会社 | 显色剂及热敏记录材料 |
ES2926007T3 (es) | 2020-03-23 | 2022-10-21 | Koehler Innovation & Tech Gmbh | Uso de N-(p-toluensulfonil)-N¿-(3-p-toluensulfoniloxifenil)urea como revelador cromático en un material de registro sensible al calor |
DE102020112411B3 (de) | 2020-05-07 | 2021-05-27 | Papierfabrik August Koehler Se | Wärmeempfindliches Aufzeichnungsmaterial |
CN116917127A (zh) | 2021-02-18 | 2023-10-20 | 三菱化学株式会社 | 层叠体、卡片、护照、它们的制造方法和激光标记方法 |
EP4349609A1 (en) | 2021-05-31 | 2024-04-10 | Mitsubishi Chemical Corporation | Reversibly thermochromic composition, writing utensil using said reversibly thermochromic composition, and toy |
WO2023276499A1 (ja) | 2021-06-30 | 2023-01-05 | 日華化学株式会社 | 感熱記録材料 |
JP7286053B1 (ja) * | 2021-11-30 | 2023-06-02 | 日本化薬株式会社 | 感熱記録組成物 |
WO2023100900A1 (ja) * | 2021-11-30 | 2023-06-08 | 日本化薬株式会社 | 感熱記録組成物 |
WO2023100902A1 (ja) * | 2021-12-02 | 2023-06-08 | 日本化薬株式会社 | 感熱記録用組成物 |
CN114105833B (zh) * | 2021-12-07 | 2023-09-05 | 河北建新化工股份有限公司 | 一种高白度的含磺酰脲结构的热敏显色剂的制备方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6447757A (en) * | 1987-08-17 | 1989-02-22 | Meiji Seika Kaisha | Novel 2-methylbenzenesulfonylurea derivative, its production and herbicide containing same |
US5246906A (en) | 1991-08-02 | 1993-09-21 | Oji Paper Co., Ltd. | Thermosensitive recording material |
DE69203558T2 (de) | 1991-10-04 | 1996-04-04 | New Oji Paper Co Ltd | Temperaturempfindliches Aufzeichnungsmaterial. |
US5612280A (en) | 1992-12-18 | 1997-03-18 | New Oji Paper Co., Ltd. | Thermosensitive recording material |
JP2819543B2 (ja) * | 1994-08-25 | 1998-10-30 | 日本製紙株式会社 | 記録体 |
DE69506814T2 (de) * | 1994-09-14 | 1999-08-19 | Oji Paper Co. | Wärmeempfindliches Mittel zum reversiblen Entwickeln und Verschwinden einer Farbe |
JP3063070B2 (ja) * | 1995-04-21 | 2000-07-12 | 日本製紙株式会社 | 記録体 |
US5605425A (en) * | 1995-04-27 | 1997-02-25 | Xerox Corporation | Three piece tape bound hard cover books |
JP3453925B2 (ja) * | 1995-04-27 | 2003-10-06 | 王子製紙株式会社 | 感熱記録体 |
JP3063072B2 (ja) * | 1995-05-31 | 2000-07-12 | 日本製紙株式会社 | 感熱記録体 |
JP2967708B2 (ja) * | 1995-09-28 | 1999-10-25 | 日本製紙株式会社 | 感熱記録体 |
DE69706260T2 (de) | 1996-04-04 | 2002-06-13 | Oji Paper Co., Ltd. | Reversibeles wärmeempfindliches aufzeichnungsmaterial |
JPH1058836A (ja) * | 1996-08-27 | 1998-03-03 | Oji Paper Co Ltd | 可逆性感熱記録体 |
JP3632346B2 (ja) * | 1997-01-29 | 2005-03-23 | 王子製紙株式会社 | 感熱記録体 |
US5972577A (en) * | 1997-02-25 | 1999-10-26 | Konica Corporation | Processing method of silver halide photographic light-sensitive material |
JPH10264534A (ja) * | 1997-03-26 | 1998-10-06 | Nippon Paper Ind Co Ltd | 感熱記録体 |
JPH11208123A (ja) * | 1998-01-26 | 1999-08-03 | Nippon Paper Industries Co Ltd | 感熱記録体 |
JP3611079B2 (ja) * | 1998-01-30 | 2005-01-19 | 日本製紙株式会社 | 新規な尿素(チオ尿素)誘導体並びにそれを使用した感熱記録体 |
JPH11216957A (ja) * | 1998-02-04 | 1999-08-10 | Nippon Paper Industries Co Ltd | 感熱記録体 |
JPH11315060A (ja) * | 1998-02-20 | 1999-11-16 | Mitsubishi Paper Mills Ltd | 電子受容性化合物および感熱記録材料 |
-
1998
- 1998-12-16 GB GBGB9827569.6A patent/GB9827569D0/en not_active Ceased
-
1999
- 1999-12-03 AT AT99965436T patent/ATE276111T1/de not_active IP Right Cessation
- 1999-12-03 ES ES99965436T patent/ES2228155T3/es not_active Expired - Lifetime
- 1999-12-03 BR BRPI9916316-0A patent/BR9916316B1/pt not_active IP Right Cessation
- 1999-12-03 DE DE69920265T patent/DE69920265T2/de not_active Expired - Lifetime
- 1999-12-03 US US09/868,105 patent/US6624117B1/en not_active Expired - Lifetime
- 1999-12-03 AU AU20952/00A patent/AU769040B2/en not_active Ceased
- 1999-12-03 KR KR1020017007474A patent/KR100640676B1/ko active IP Right Grant
- 1999-12-03 CN CNB998144762A patent/CN1185108C/zh not_active Expired - Lifetime
- 1999-12-03 JP JP2000587968A patent/JP4601174B2/ja not_active Expired - Lifetime
- 1999-12-03 EP EP99965436A patent/EP1140515B1/en not_active Expired - Lifetime
- 1999-12-03 ID IDW00200101402A patent/ID30230A/id unknown
- 1999-12-03 WO PCT/EP1999/009473 patent/WO2000035679A1/en active IP Right Grant
-
2001
- 2001-06-14 ZA ZA200104863A patent/ZA200104863B/en unknown
Also Published As
Publication number | Publication date |
---|---|
DE69920265D1 (de) | 2004-10-21 |
EP1140515B1 (en) | 2004-09-15 |
ATE276111T1 (de) | 2004-10-15 |
AU2095200A (en) | 2000-07-03 |
CN1185108C (zh) | 2005-01-19 |
BR9916316B1 (pt) | 2011-02-08 |
GB9827569D0 (en) | 1999-02-10 |
US6624117B1 (en) | 2003-09-23 |
WO2000035679A1 (en) | 2000-06-22 |
KR20010101232A (ko) | 2001-11-14 |
AU769040B2 (en) | 2004-01-15 |
JP2002532441A (ja) | 2002-10-02 |
CN1330593A (zh) | 2002-01-09 |
ID30230A (id) | 2001-11-15 |
ES2228155T3 (es) | 2005-04-01 |
DE69920265T2 (de) | 2005-12-22 |
ZA200104863B (en) | 2002-06-14 |
EP1140515A1 (en) | 2001-10-10 |
BR9916316A (pt) | 2001-08-14 |
JP4601174B2 (ja) | 2010-12-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100640676B1 (ko) | 감열성 기록 재료 | |
EP1375182B1 (en) | Composition, recording material, and recording sheet | |
CN114667279A (zh) | 包含非酚型显色剂的热敏性记录材料 | |
JP2005518966A (ja) | 顕色剤の混合物 | |
JPH0532061A (ja) | 感熱記録体 | |
JPH06262856A (ja) | 感熱記録体 | |
JP2005528440A (ja) | 感熱記録材料 | |
JP4410794B2 (ja) | 感熱性記録材料 | |
US20050106491A1 (en) | Heat sensitive recording material | |
JP4161778B2 (ja) | 感熱記録体 | |
JP2959114B2 (ja) | 感熱記録材料 | |
JP2817529B2 (ja) | 感熱記録体 | |
EP1557408A1 (en) | Recording material comprising diphenyl sulfone derivative and novel diphenyl sulfone derivative compound | |
MXPA01006072A (es) | Material de grabacion sensible al calor | |
KR20140109975A (ko) | 감열 코팅 조성물 | |
JP2679514B2 (ja) | 感熱記録体 | |
JPH05185737A (ja) | 感熱記録体 | |
GB2396704A (en) | Heat sensitive recording material | |
JPH061074A (ja) | 感熱記録体 | |
JP2001288163A (ja) | ビスフェノール化合物及びそれを用いた記録材料 | |
JP2000272248A (ja) | 感熱記録紙 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121009 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20131002 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20141002 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20151020 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20161014 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20171012 Year of fee payment: 12 |