KR100553481B1 - 챔버 세정을 강화시키는 방법 및 장치 - Google Patents

챔버 세정을 강화시키는 방법 및 장치 Download PDF

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Publication number
KR100553481B1
KR100553481B1 KR1020010004593A KR20010004593A KR100553481B1 KR 100553481 B1 KR100553481 B1 KR 100553481B1 KR 1020010004593 A KR1020010004593 A KR 1020010004593A KR 20010004593 A KR20010004593 A KR 20010004593A KR 100553481 B1 KR100553481 B1 KR 100553481B1
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South Korea
Prior art keywords
chamber
reactive species
cleaning
mirror polished
polished surface
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Expired - Lifetime
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KR1020010004593A
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Korean (ko)
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KR20010078211A (ko
Inventor
쉥 순
콴윤 샹
윌리암알. 하스바거
로버트아이. 그린
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어플라이드 머티어리얼스, 인코포레이티드
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
KR1020010004593A 2000-01-31 2001-01-31 챔버 세정을 강화시키는 방법 및 장치 Expired - Lifetime KR100553481B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/494,581 2000-01-31
US09/494,581 US6432255B1 (en) 2000-01-31 2000-01-31 Method and apparatus for enhancing chamber cleaning

Publications (2)

Publication Number Publication Date
KR20010078211A KR20010078211A (ko) 2001-08-20
KR100553481B1 true KR100553481B1 (ko) 2006-02-22

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KR1020010004593A Expired - Lifetime KR100553481B1 (ko) 2000-01-31 2001-01-31 챔버 세정을 강화시키는 방법 및 장치

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US (2) US6432255B1 (enExample)
EP (1) EP1122766B1 (enExample)
JP (3) JP2001308019A (enExample)
KR (1) KR100553481B1 (enExample)
DE (1) DE60135049D1 (enExample)
SG (1) SG94748A1 (enExample)
TW (1) TW473803B (enExample)

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TW473803B (en) 2002-01-21
KR20010078211A (ko) 2001-08-20
DE60135049D1 (de) 2008-09-11
JP2010242224A (ja) 2010-10-28
US6432255B1 (en) 2002-08-13
EP1122766B1 (en) 2008-07-30
SG94748A1 (en) 2003-03-18
EP1122766A3 (en) 2006-05-31
JP5686999B2 (ja) 2015-03-18
EP1122766A2 (en) 2001-08-08
JP2013175730A (ja) 2013-09-05
US6863077B2 (en) 2005-03-08
JP2001308019A (ja) 2001-11-02

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