KR100445711B1 - 규소계정공전송재및이의제조방법 - Google Patents
규소계정공전송재및이의제조방법 Download PDFInfo
- Publication number
- KR100445711B1 KR100445711B1 KR1019960052206A KR19960052206A KR100445711B1 KR 100445711 B1 KR100445711 B1 KR 100445711B1 KR 1019960052206 A KR1019960052206 A KR 1019960052206A KR 19960052206 A KR19960052206 A KR 19960052206A KR 100445711 B1 KR100445711 B1 KR 100445711B1
- Authority
- KR
- South Korea
- Prior art keywords
- silicon
- hole transport
- group
- transport material
- adsorbent
- Prior art date
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- 239000000463 material Substances 0.000 title claims abstract description 55
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 42
- 239000010703 silicon Substances 0.000 title claims abstract description 39
- 238000012546 transfer Methods 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 230000005525 hole transport Effects 0.000 claims abstract description 43
- 125000003118 aryl group Chemical group 0.000 claims abstract description 41
- 150000001875 compounds Chemical class 0.000 claims abstract description 24
- 150000003058 platinum compounds Chemical class 0.000 claims abstract description 24
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000003463 adsorbent Substances 0.000 claims abstract description 19
- 150000003512 tertiary amines Chemical class 0.000 claims abstract description 13
- 239000003054 catalyst Substances 0.000 claims abstract description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 10
- 125000001424 substituent group Chemical group 0.000 claims abstract description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000741 silica gel Substances 0.000 claims description 5
- 229910002027 silica gel Inorganic materials 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 4
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 3
- 229910052736 halogen Chemical group 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 39
- 239000011347 resin Substances 0.000 abstract description 39
- -1 polysiloxane Polymers 0.000 abstract description 25
- 229920001296 polysiloxane Polymers 0.000 abstract description 20
- 125000001931 aliphatic group Chemical group 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 description 53
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 48
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 239000000243 solution Substances 0.000 description 23
- 229910052697 platinum Inorganic materials 0.000 description 22
- 239000000203 mixture Substances 0.000 description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 150000002430 hydrocarbons Chemical group 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- BGGDZDRRHQTSPV-UHFFFAOYSA-N 4-ethenyl-n,n-diphenylaniline Chemical compound C1=CC(C=C)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 BGGDZDRRHQTSPV-UHFFFAOYSA-N 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- UESSERYYFWCTBU-UHFFFAOYSA-N 4-(n-phenylanilino)benzaldehyde Chemical compound C1=CC(C=O)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 UESSERYYFWCTBU-UHFFFAOYSA-N 0.000 description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 6
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- JFCRMLAWUGDKSG-UHFFFAOYSA-N n-(3,4-dimethylphenyl)-n-(4-ethenylphenyl)-3,4-dimethylaniline Chemical compound C1=C(C)C(C)=CC=C1N(C=1C=C(C)C(C)=CC=1)C1=CC=C(C=C)C=C1 JFCRMLAWUGDKSG-UHFFFAOYSA-N 0.000 description 4
- 239000013014 purified material Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- HGLSODSGUIRVGI-UHFFFAOYSA-N 4-(n-(3,4-dimethylphenyl)-3,4-dimethylanilino)benzaldehyde Chemical compound C1=C(C)C(C)=CC=C1N(C=1C=C(C)C(C)=CC=1)C1=CC=C(C=O)C=C1 HGLSODSGUIRVGI-UHFFFAOYSA-N 0.000 description 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 3
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- ZGNMUTLEGVXIES-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane;platinum Chemical compound [Pt].[Pt].C[Si](C)(C)O[Si](C)(C=C)C=C.C[Si](C)(C)O[Si](C)(C=C)C=C.C[Si](C)(C)O[Si](C)(C=C)C=C ZGNMUTLEGVXIES-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000001110 calcium chloride Substances 0.000 description 3
- 229910001628 calcium chloride Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000012259 ether extract Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000005457 ice water Substances 0.000 description 3
- ACKSWDYVIGJBJV-UHFFFAOYSA-N n-(3,4-dimethylphenyl)-3,4-dimethyl-n-phenylaniline Chemical compound C1=C(C)C(C)=CC=C1N(C=1C=C(C)C(C)=CC=1)C1=CC=CC=C1 ACKSWDYVIGJBJV-UHFFFAOYSA-N 0.000 description 3
- 150000001451 organic peroxides Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000012312 sodium hydride Substances 0.000 description 3
- 229910000104 sodium hydride Inorganic materials 0.000 description 3
- ZTXFOCMYRCGSMU-UHFFFAOYSA-M tetramethylphosphanium;bromide Chemical compound [Br-].C[P+](C)(C)C ZTXFOCMYRCGSMU-UHFFFAOYSA-M 0.000 description 3
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000007239 Wittig reaction Methods 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- PAOHAQSLJSMLAT-UHFFFAOYSA-N 1-butylperoxybutane Chemical compound CCCCOOCCCC PAOHAQSLJSMLAT-UHFFFAOYSA-N 0.000 description 1
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
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- 238000004220 aggregation Methods 0.000 description 1
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- 238000000149 argon plasma sintering Methods 0.000 description 1
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- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
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- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
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- YWRMORUGKIBBKS-UHFFFAOYSA-N n-(3,4-dimethylphenyl)-3,4-dimethyl-n-[4-(2-triethoxysilylethyl)phenyl]aniline Chemical compound C1=CC(CC[Si](OCC)(OCC)OCC)=CC=C1N(C=1C=C(C)C(C)=CC=1)C1=CC=C(C)C(C)=C1 YWRMORUGKIBBKS-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
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- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
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- 239000002994 raw material Substances 0.000 description 1
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- 238000011160 research Methods 0.000 description 1
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- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0612—Acyclic or carbocyclic compounds containing nitrogen
- G03G5/0614—Amines
- G03G5/06142—Amines arylamine
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- G—PHYSICS
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- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0557—Macromolecular bonding materials obtained otherwise than by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0578—Polycondensates comprising silicon atoms in the main chain
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- G—PHYSICS
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- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
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- G03G5/061443—Amines arylamine diamine benzidine
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- G—PHYSICS
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- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0612—Acyclic or carbocyclic compounds containing nitrogen
- G03G5/0614—Amines
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- G03G5/06147—Amines arylamine alkenylarylamine
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- G—PHYSICS
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- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0612—Acyclic or carbocyclic compounds containing nitrogen
- G03G5/0614—Amines
- G03G5/06142—Amines arylamine
- G03G5/06147—Amines arylamine alkenylarylamine
- G03G5/061473—Amines arylamine alkenylarylamine plural alkenyl groups linked directly to the same aryl group
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/07—Polymeric photoconductive materials
- G03G5/078—Polymeric photoconductive materials comprising silicon atoms
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP95-287644 | 1995-11-06 | ||
JP28764495A JP3614222B2 (ja) | 1995-11-06 | 1995-11-06 | ケイ素系正孔輸送材の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970028877A KR970028877A (ko) | 1997-06-24 |
KR100445711B1 true KR100445711B1 (ko) | 2005-04-06 |
Family
ID=17719895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960052206A KR100445711B1 (ko) | 1995-11-06 | 1996-11-06 | 규소계정공전송재및이의제조방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5688961A (zh) |
EP (1) | EP0771807B1 (zh) |
JP (1) | JP3614222B2 (zh) |
KR (1) | KR100445711B1 (zh) |
CN (1) | CN1067398C (zh) |
AU (1) | AU707231B2 (zh) |
DE (1) | DE69619465T2 (zh) |
TW (1) | TW349186B (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4158204B2 (ja) * | 1995-04-10 | 2008-10-01 | 住友化学株式会社 | ポリシラン化合物、その製造方法およびその原料 |
JP3640444B2 (ja) * | 1995-11-06 | 2005-04-20 | ダウ コーニング アジア株式会社 | ポリシロキサン系正孔輸送材料の製造方法 |
JPH09127710A (ja) * | 1995-11-06 | 1997-05-16 | Dow Corning Asia Ltd | ケイ素系正孔輸送材の製造方法 |
JP3916269B2 (ja) * | 1995-11-06 | 2007-05-16 | 東レ・ダウコーニング株式会社 | 有機ケイ素変性電荷輸送性化合物及び該化合物を含有する電荷輸送能を有する硬化性組成物 |
US7750175B2 (en) * | 1996-06-25 | 2010-07-06 | Northwestern University | Organic light-emitting diodes and related hole transport compounds |
US6046348A (en) * | 1996-07-17 | 2000-04-04 | Fuji Xerox Co., Ltd. | Silane compound, method for making the same, and electrophotographic photoreceptor |
JP4063384B2 (ja) * | 1998-03-02 | 2008-03-19 | ダウ・コ−ニング・コ−ポレ−ション | ハイドロカーボンオキシシリル官能性ポリマーの製造方法 |
TW558561B (en) | 1997-07-22 | 2003-10-21 | Sumitomo Chemical Co | Hole transporting polymer and organic electroluminescence device using the same |
JPH11194513A (ja) * | 1998-01-06 | 1999-07-21 | Konica Corp | 電子写真感光体用塗布液及び電子写真感光体 |
US6143452A (en) * | 1998-09-29 | 2000-11-07 | Konica Corporation | Electrophotographic photoreceptor |
US6187491B1 (en) | 1999-02-08 | 2001-02-13 | Eastman Kodak Company | Electrophotographic charge generating element containing acid scavenger in overcoat |
DE19934576C2 (de) * | 1999-07-23 | 2003-12-18 | Degussa | Verfahren zur Herstellung von Epoxysilanen |
US6517984B1 (en) | 2001-03-27 | 2003-02-11 | Heidelberger Druckmaschinen Ag | Silsesquioxane compositions containing tertiary arylamines for hole transport |
KR100438888B1 (ko) * | 2001-09-07 | 2004-07-02 | 한국전자통신연구원 | 정공 수송/주입 능력이 있는 화합물과 이를 포함하는분자자기조립막을 갖춘 유기 전기발광 소자 |
US7700248B2 (en) * | 2002-07-08 | 2010-04-20 | Eastman Kodak Company | Organic charge transporting polymers including charge transport moieties and silane groups, and silsesquioxane compositions prepared therefrom |
KR100811877B1 (ko) * | 2006-07-31 | 2008-03-11 | 울산대학교 산학협력단 | 방향족 환을 포함하는 유기물질 흡착용 실리카 겔 |
JP5762932B2 (ja) | 2010-11-30 | 2015-08-12 | 信越化学工業株式会社 | シラノール基を有するトリアリールアミン誘導体 |
CN102219700A (zh) * | 2011-04-22 | 2011-10-19 | 南京邮电大学 | 一种基于芴苯胺结构的有机光电材料 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3899328A (en) * | 1973-05-07 | 1975-08-12 | Xerox Corp | Active matrix and intrinsic photoconductive polymer of a linear polysiloxane |
JPS5595953A (en) * | 1979-01-11 | 1980-07-21 | Ricoh Co Ltd | Electrophotographic photoreceptor |
JPS61238062A (ja) * | 1985-04-16 | 1986-10-23 | Canon Inc | 電子写真感光体 |
JPH071400B2 (ja) | 1985-11-05 | 1995-01-11 | 三菱化成株式会社 | 電子写真感光体 |
EP0224784A3 (de) * | 1985-11-21 | 1988-09-28 | BASF Aktiengesellschaft | Carbazolsubstituierte Polysiloxane, daraus hergestellte feste, fotoleitfähige Schichten und diese enthaltende elektrofotographische Aufzeichnungsmaterialien |
US5187310A (en) * | 1990-03-14 | 1993-02-16 | Kao Corporation | Organic silicon compound, method of its production, and photoreceptor for electrophotography incorporating it |
US5290963A (en) * | 1990-05-12 | 1994-03-01 | Kao Corporation | Organic silicon compound, method of its production, and photoreceptor for electrophotography incorporating it |
US5272029A (en) * | 1991-02-28 | 1993-12-21 | Canon Kabushiki Kaisha | Image-bearing member and apparatus including same |
JPH04273252A (ja) | 1991-02-28 | 1992-09-29 | Canon Inc | 像保持部材及びそれを用いた装置 |
US5189131A (en) * | 1991-04-26 | 1993-02-23 | General Electric Company | Hydrosilylation method |
JPH04346356A (ja) * | 1991-05-24 | 1992-12-02 | Matsushita Electric Ind Co Ltd | 電子写真感光体 |
JPH0778067B2 (ja) * | 1991-08-07 | 1995-08-23 | 信越化学工業株式会社 | シロキサン化合物 |
US5326661A (en) * | 1991-11-13 | 1994-07-05 | Hoechst Celanese Corp. | Photorefractive polymers containing discrete photoconductive and electrooptical units |
US5232801A (en) * | 1991-12-23 | 1993-08-03 | Eastman Kodak Company | Hole-transport liquid crystalline polymeric compounds, electrophotographic elements comprising same, and electrophotographic process |
US5230976A (en) * | 1991-12-27 | 1993-07-27 | Xerox Corporation | Polymeric arylamine silane compounds and imaging members incorporating same |
JPH05323634A (ja) * | 1992-05-26 | 1993-12-07 | Konica Corp | 電子写真感光体 |
US5436099A (en) * | 1993-12-21 | 1995-07-25 | Xerox Corporation | Photoreceptor with low surface energy overcoat |
JPH0862864A (ja) * | 1994-08-17 | 1996-03-08 | Konica Corp | 感光体 |
US5587224A (en) * | 1995-03-27 | 1996-12-24 | Xerox Corporation | Developing apparatus including a coated developer roller |
JP3486705B2 (ja) * | 1995-05-25 | 2004-01-13 | 株式会社リコー | ポリシロキサン化合物ならびにその製造方法及びそれを用いた電子写真用感光体 |
JPH09124794A (ja) * | 1995-11-06 | 1997-05-13 | Dow Corning Asia Ltd | 有機光機能材を含有するポリシロキサン樹脂組成物及びそれから得られる透明な光機能素子 |
JP3916269B2 (ja) * | 1995-11-06 | 2007-05-16 | 東レ・ダウコーニング株式会社 | 有機ケイ素変性電荷輸送性化合物及び該化合物を含有する電荷輸送能を有する硬化性組成物 |
JPH09127710A (ja) * | 1995-11-06 | 1997-05-16 | Dow Corning Asia Ltd | ケイ素系正孔輸送材の製造方法 |
JP3640444B2 (ja) * | 1995-11-06 | 2005-04-20 | ダウ コーニング アジア株式会社 | ポリシロキサン系正孔輸送材料の製造方法 |
JPH09188764A (ja) * | 1995-11-06 | 1997-07-22 | Dow Corning Asia Ltd | ポリシロキサン正孔輸送材料の製造方法 |
JP3267519B2 (ja) * | 1995-11-06 | 2002-03-18 | キヤノン株式会社 | 電子写真感光体、該電子写真感光体を有するプロセスカートリッジ及び画像形成装置 |
-
1995
- 1995-11-06 JP JP28764495A patent/JP3614222B2/ja not_active Expired - Fee Related
-
1996
- 1996-11-04 AU AU70594/96A patent/AU707231B2/en not_active Ceased
- 1996-11-04 US US08/740,738 patent/US5688961A/en not_active Expired - Fee Related
- 1996-11-06 CN CN96123304A patent/CN1067398C/zh not_active Expired - Fee Related
- 1996-11-06 KR KR1019960052206A patent/KR100445711B1/ko not_active IP Right Cessation
- 1996-11-06 DE DE69619465T patent/DE69619465T2/de not_active Expired - Fee Related
- 1996-11-06 EP EP96117734A patent/EP0771807B1/en not_active Expired - Lifetime
- 1996-11-13 TW TW085113890A patent/TW349186B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW349186B (en) | 1999-01-01 |
EP0771807A1 (en) | 1997-05-07 |
US5688961A (en) | 1997-11-18 |
DE69619465T2 (de) | 2002-10-17 |
AU707231B2 (en) | 1999-07-08 |
JP3614222B2 (ja) | 2005-01-26 |
CN1067398C (zh) | 2001-06-20 |
KR970028877A (ko) | 1997-06-24 |
DE69619465D1 (de) | 2002-04-04 |
CN1150591A (zh) | 1997-05-28 |
AU7059496A (en) | 1997-05-15 |
EP0771807B1 (en) | 2002-02-27 |
JPH09124942A (ja) | 1997-05-13 |
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