JPS6339920Y2 - - Google Patents

Info

Publication number
JPS6339920Y2
JPS6339920Y2 JP1982139953U JP13995382U JPS6339920Y2 JP S6339920 Y2 JPS6339920 Y2 JP S6339920Y2 JP 1982139953 U JP1982139953 U JP 1982139953U JP 13995382 U JP13995382 U JP 13995382U JP S6339920 Y2 JPS6339920 Y2 JP S6339920Y2
Authority
JP
Japan
Prior art keywords
torch
plasma
flange
tube
circular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982139953U
Other languages
English (en)
Other versions
JPS5945900U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1982139953U priority Critical patent/JPS5945900U/ja
Priority to EP83108781A priority patent/EP0103809B1/en
Priority to DE8383108781T priority patent/DE3378817D1/de
Priority to US06/532,937 priority patent/US4578560A/en
Publication of JPS5945900U publication Critical patent/JPS5945900U/ja
Application granted granted Critical
Publication of JPS6339920Y2 publication Critical patent/JPS6339920Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Gas Burners (AREA)

Description

【考案の詳細な説明】 本考案は高周波電力の誘導によりプラズマ炎を
形成する高周波誘導プラズマ用トーチに関する。
高周波誘導プラズマ（熱プラズマ）はプラズマ
炎の中心温度が通常5000℃以上と極めて高い。そ
のためプラズマ炎を形成するトーチの材料として
は耐熱性が高く、かつ熱膨張係数の低いものが要
求され、一般には石英ガラスが使用される。その
従来のプラズマ用トーチを第１図に示す。図示す
るようにプラズマ用トーチ１は管径の異なる３本
の円管２，３，４を同心に嵌挿し、円管２，３，
４の基端を各々融着してなる多重管である。また
最内側の円管２以外の円管３，４には枝管６，７
がそれぞれ突設され、この枝管６からプラズマ用
ガス、枝管７から冷却ガスが導入されるようにな
つている。従つてプラズマ炎に接するトーチ１の
内壁は多量の冷却ガス例えばAr，O2等により保
護される。更にプラズマ用トーチの上部外周には
環状の高周波誘導コイル５が設けられる。
このような構成のプラズマ用トーチ１は円管
２，３，４を融着して製造するため、手加工にた
よらなければならないが、前述したように円管
２，３，４の材質が石英ガラスであるため、その
手加工は高温下での極めて熟練度を要する作業と
なる。そのため、高精度のトーチ１を得ることは
難しく、特にトーチ１の開口部における円管２，
３，４の相互の間隔を周方向に均一に製造するこ
とができなかつた。そのため従前のプラズマ用ト
ーチ１ではプラズマ炎が片より、片よつたプラズ
マ炎に接する円管を変形させ、或いは蒸発させて
しまうことがあつた。
このように従前のプラズマ用トーチは精度、特
に開口部における間隔の精度が不十分であり、
種々の不具合が生じていた。
本考案は、プラズマ用トーチの精度を向上させ
て、プラズマ炎をトーチの中央部に安定して形成
することのできる高周波誘導プラズマ用トーチを
提供することを目的とするものであつて、その構
成は高周波電力の誘導によりプラズマ炎を形成す
る多重管構造のトーチにおいて、内管、外管を同
心に嵌挿すると共に該外管の基端部外周に環状の
フランジを垂直に設ける一方、前記内管の基端部
を二重に形成した部分のうちの外周部分に環状の
フランジを垂直に設け、更に該フランジと前記フ
ランジとを相互に重ね合せて緊結し、又前記外周
部分にガス導入用枝管を突設したことを特徴とす
る。
以下、本考案の高周波誘導プラズマ用トーチを
実施例に基づいて詳細に説明する。
第２図イ，ロに本考案の第一の実施例を示す。
図示するように本考案の高周波誘導プラズマ用ト
ーチ１１においては、管径の異なる３本の円管１
２，１３，１４が同心に嵌挿され、その外側の円
管１４と内側の円管１２，１３とが夫々形成され
たフランジを介し緊密に締結され多重管が構成さ
れている。即ち、最内側の円管１２はその基端部
が２重に形成され、その外側の管の上端には環状
のフランジ１２ａが一体に設けられている。ま
た、この外側の管にはプラズマ用ガスを導入する
ための枝管１７が突設されている。このような円
管１２の外周に嵌挿される円管１３の基端にはフ
ランジ１３ａと上記フランジ１２ａとが密着して
いる。これらフランジ１３ａ，１２ａに締結金具
１５が装着されており、フランジ１２ａ，１３ａ
は緊密に締結される。更に円管１３の基端部は２
重に形成され、その外側の管の上端には環状のフ
ランジ１３ｂが一体に設けられてている。またこ
の外側の管には冷却ガスを導入するための枝管１
８が突設される。この枝管１８の突設する態様と
しては、第２図ロのようにトーチ１１の接線方向
を向くように突設すると、この枝管１８を通つて
導入される冷却ガスがトーチ内を回転しながら上
昇し、より安定したプラズマ炎が得られ好都合で
ある。このような円管１３の外周に嵌挿される円
管１４の基端にはフランジ１４ａが一体に設けら
れ、このフランジ１４ａと上記フランジ１３ｂと
が密着している。これらフランジ１３ｂ，１４ａ
に締付金具１６が装着され、これらフランジ１３
ｂ，１４ａは緊密に締結される。
上記構成を有する本考案の高周波誘導プラズマ
用トーチ１１は円管１２，１３，１４のフランジ
１２ａ，１３ａ，１３ｂ，１４ａを単に締結して
組み立てるだけで製造でき、従前と異なり円管を
融着して製造する必要がなく、高温下での極めて
熟練を要した作業を回避できる。また、同時に、
フランジ１２ａ，１３ａ，１３ｂ，１４ａを相互
にずらし、あるいはこれらの間にスペーサ等を介
装することが可能なため、トーチ１１の開口部に
おける円管１２，１３，１４の周方向の間隔を高
精度に均一に調整することができる。この場合フ
ランジ面をスリ合せ状に形成しておき、このフラ
ンジ面の間に耐高温グリースをわずかに塗布して
おくと、更に調整し易くなると共にプラズマ用ガ
スのリークを完全に防止でき好都合である。
また、本考案のプラズマ用トーチ１１は組立、
分解が簡単なため、故障部分のみを交換し他の部
分は継続して使用できる経済上のメリツトがあ
る。例えば、プラズマ用トーチ１１の内壁、特に
最外側は反応用導入ガス（弗素系ガス等）の付着
物の堆積によりプラズマ炎の形成に支障が生ずる
場合があるが、この場合に付着物の堆積した部分
のみを交換すればトーチ１１全体を取り換るより
安価である。
次に本考案の第２の実施例を第３図に示す。同
図に示されるプラズマ用トーチ１１′はガス導入
用の枝管１７′，１８′を最内側の円管１２′と最
外側の円管１４′から突設した例であり、その他
の構造は第２図に示される第一の実施例とほぼ同
一になつている。
以上、実施例に基づいて具体的に説明したよう
に本考案の高周波誘導プラズマ用トーチは開口部
の精度が高く、プラズマ炎をトーチの中央部に安
定して形成することができる。またこのため、ト
ーチの熱劣化の虞が極めて少なくなつた。
尚、上記実施例では３重管構造のプラズマ用ト
ーチについて適用した例を示しているが、本考案
はこれに限らず２重管或いは４重管以上の構造で
あつても適用することが可能である。
【図面の簡単な説明】
第１図は従来の高周波誘導プラズマ用トーチの
断面図、第２図及び第３図は、本考案の高周波誘
導プラズマ用トーチに係り、第２図イは第一の実
施例の縦断面図、第２図ロはその横断面図、第３
図は第２の実施例の縦断面図である。 図面中、１１，１１′は高周波誘導プラズマ用
トーチ、１２，１３，１４，１２′，１３′，１
４′、は円管、１５，１６は締付金具、１７，１
８，１７′，１８′は枝管である。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) 高周波電力の誘導によりプラズマ炎を形成す
    る多重管構造のトーチにおいて、内管、外管を
    同心に嵌挿すると共に該外管の基端部外周に環
    状のフランジを垂直に設ける一方、前記内管の
    基端部を二重に形成した部分のうちの外周部分
    に環状のフランジを垂直に設け、更に該フラン
    ジと前記フランジとを相互に重ね合せて緊結
    し、又前記外周部分にガス導入用枝管を突設し
    たことを特徴とする高周波誘導プラズマ用トー
    チ。 (2) 実用新案登録請求の範囲第一項において、上
    記ガス導入用枝管がトーチの接線方向を向き、
    かつ、複数個設けられることを特徴とする高周
    波誘導プラズマ用トーチ。
JP1982139953U 1982-09-17 1982-09-17 高周波誘導プラズマ用ト−チ Granted JPS5945900U (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1982139953U JPS5945900U (ja) 1982-09-17 1982-09-17 高周波誘導プラズマ用ト−チ
EP83108781A EP0103809B1 (en) 1982-09-17 1983-09-06 High frequency induction coupled plasma torch
DE8383108781T DE3378817D1 (en) 1982-09-17 1983-09-06 High frequency induction coupled plasma torch
US06/532,937 US4578560A (en) 1982-09-17 1983-09-16 High frequency induction coupled plasma torch with concentric pipes having flanges thereon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982139953U JPS5945900U (ja) 1982-09-17 1982-09-17 高周波誘導プラズマ用ト−チ

Publications (2)

Publication Number Publication Date
JPS5945900U JPS5945900U (ja) 1984-03-27
JPS6339920Y2 true JPS6339920Y2 (ja) 1988-10-19

Family

ID=15257517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982139953U Granted JPS5945900U (ja) 1982-09-17 1982-09-17 高周波誘導プラズマ用ト−チ

Country Status (4)

Country Link
US (1) US4578560A (ja)
EP (1) EP0103809B1 (ja)
JP (1) JPS5945900U (ja)
DE (1) DE3378817D1 (ja)

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* Cited by examiner, † Cited by third party
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Also Published As

Publication number Publication date
EP0103809A2 (en) 1984-03-28
US4578560A (en) 1986-03-25
EP0103809B1 (en) 1988-12-28
DE3378817D1 (en) 1989-02-02
EP0103809A3 (en) 1984-09-05
JPS5945900U (ja) 1984-03-27

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