JP6325552B2 - 銀ナノプレート組成物および方法 - Google Patents
銀ナノプレート組成物および方法 Download PDFInfo
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- JP6325552B2 JP6325552B2 JP2015536844A JP2015536844A JP6325552B2 JP 6325552 B2 JP6325552 B2 JP 6325552B2 JP 2015536844 A JP2015536844 A JP 2015536844A JP 2015536844 A JP2015536844 A JP 2015536844A JP 6325552 B2 JP6325552 B2 JP 6325552B2
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- solution
- silver
- nanoplate
- optical density
- concentration
- Prior art date
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Description
本願は、参照によりその全文が組み込まれる、2012年10月11日出願の米国特許仮出願第61/795,149号の優先権の利益を主張する。
本明細書に記載される本発明は、Sienna Labs,Inc.とnanoComposix,Inc.との間の共同研究契約によって作り出された。
発明の分野
本発明は、高い光学濃度の銀小板ナノ粒子(例えば、ナノプレート)の溶液を調製するための方法、ならびに前記方法によって調製されるナノ粒子、溶液および基板に関する。
ナノ粒子は、ナノスフェア、ナノロッド、ナノワイヤ、ナノキューブ、ナノプレート、ならびにその他の形状を含み、さまざまな材料から合成することができる。一実施形態では、小板ナノ粒子はナノプレートである。金および銀をはじめとする金属から作製されたナノ粒子は、これらのナノ材料によって支持される局在表面プラズモン共鳴のために、電磁スペクトル全体にわたって光と相互作用するよう調整することのできる特有の光学的性質を有する。銀ナノ粒子の特有の光学的性質を利用する技術としては、限定されるものではないが、診断技術、光通信技術、医療技術、および遮蔽技術が挙げられる。数ある中でも光熱腫瘍除去、毛髪除去、にきび処置、創傷治癒、および抗菌用途を含むこれらの技術の部分集合は、高い光学濃度をもつナノ粒子の溶液を使用することがある。銀小板ナノ粒子またはナノプリズムとしても公知の銀ナノプレートは、それらの調整できるスペクトルピークおよび極めて高い光学効率のために、ナノ粒子の光学的性質を利用する技術に特に注目される。光変換(Jin et al.2001;Jin et al.2003)、pH制御光変換(Xue 2007)、熱成長(Hao et al.2004;Hao 2002;He 2008;Metraux 2005)、鋳型成長(Hao et al.2004;Hao 2002)、およびシード媒介成長(Aherne 2008;Chen;Carroll 2003;Chen;Carroll 2002、2004;Chen et al.2002;He 2008;Le Guevel 2009;Xiong et al.2007)による銀ナノプレートの調製の方法が開発されており、これらの方法は、比較的希薄な、それに対応して低可視性および近赤外光学濃度をもつ溶液を生成する。
本発明のいくつかの実施形態は、標的組織領域の熱変調を実施するのに適した銀ナノプレートを含むプラズモンナノ粒子の溶液を作製するための方法を含む。一実施形態では、標的組織の熱変調は、複数のプラズモンナノ粒子を含む組成物が、有効量のプラズモンナノ粒子が標的組織領域のドメインに局在するような条件下で被験体に投与される場合に達成することができる。標的組織領域は、励起表面プラズモン共鳴源から送られるエネルギーにさらされる。エネルギーは、標的組織領域のドメインの熱変調を誘発するために効果的な量で送られる。
一実施形態では、ナノプレート、例えば銀ナノプレートなどは、3本の主軸に沿った長さを特徴とする:主軸のうちの2本の軸長は、最も短い主軸の軸長よりも少なくとも2倍大きく、最も短い主軸長は、約500nm未満(例えば、450。400、350、300、250、100、150、50、30、20、10nm)である。ナノプレートの「エッジ長さ」は、2本の長い主軸の長さの平均と規定される。ナノプレートの「厚さ」は、最も短い主軸と規定される。
現代のナノ粒子合成技法は、診断、遮蔽、および治療用途を含む広範囲の用途のための、特有の光学的性質をもつ材料の開発を可能にした。光交換、pH制御光交換、熱成長、および/またはシード媒介成長法を含む現行の従来法によって調製されたままの銀ナノプレートは、一般に0.1から10cm-1に及ぶ(例えば、0.1〜9.9cm-1、1〜9cm-1、3〜7cm-1、1〜5cm-1、および/または5〜10cm-1の)光学濃度を有する。いくつかの技術が、銀ナノプレートのより高い光学濃度の溶液を探し求めている。本発明のいくつかの実施形態は、銀ナノプレートを濃縮し、より高い光学濃度の銀ナノプレート溶液を生成するための新規かつ自明でない方法を記載する。例えば、様々な実施形態では、方法は、銀ナノプレートの光学濃度溶液を10cm-1、20cm-1、30cm-1、50cm-1、80cm-1、100cm-1、150cm-1、200cm-1、300cm-1、400cm-1、500cm-1、600cm-1、700cm-1、800cm-1、900cm-1、および/または1000cm-1よりも高く、またはそれ以上まで増加させることができる。
一実施形態では、銀ナノプレートは、粒子表面に吸着されているかまたはそうでなければ結合している分子を有する。表面上の分子は、合成の反応体または反応体副産物である。本発明の一目的は、銀ナノプレートの表面に結合した分子を、濃縮の間に粒子が形状を変化させることをより完全に防ぐその他の分子に部分的にまたは完全に交換することである。本発明の別の目的は、調製の間に、プレート形状を生成し、その後の濃縮の間にプレートを安定化させる安定剤を使用することである。
本発明の一実施形態では、銀ナノプレートは、水溶液中で調製される。その他の実施形態では、銀ナノプレートは、エタノール、イソプロパノール、または、ヘプタン、トルエン、もしくはブタノールなどの有機溶媒をはじめとするその他の溶液中で調製される。
様々な実施形態では、安定化剤は、銀ナノプレート溶液に添加される固体もしくは液体製剤であり得る。安定化剤は、銀ナノプレートの表面に対して親和性を有し、広い範囲の相対濃度でプレート表面と会合する能力をもつ。一部の実施形態では、銀ナノプレート上の結合分子は、安定化剤によって置き換えられる。あるいは、安定化剤、例えばポリマーなどは、ナノプレートの表面に存在する銀原子に共有結合している。ポリマー被膜は、銀ナノプレートの外面の全部または一部に及んでよい。例えば、銀ナノプレートの外面の少なくとも5%、10%、15%、20%、25%、50%、75%、80%、90%、95%、99%、99.9%、または99.9%以上が、1種類のポリマーまたは複数の異なるポリマー種で被覆される。一実施形態では、安定化剤は銀ナノプレートの形成の前に添加されるが、別の実施形態では、安定化種は、銀ナノプレートの合成の後に添加される。従って、ポリマーで被覆された銀ナノプレートを含有する組成物が提供され、これらの組成物を含有する溶液は、10cm-1以下の光学濃度を有してよい。あるいは、そのような溶液は、ポリマーで被覆された銀ナノプレートおよび10cm-1よりも高い光学濃度を有する;これらの溶液は、濃縮することによるか、またはそれよりも希薄な溶液中に存在するポリマーで被覆された銀ナノプレートを精製することによって達成することができる。一部の実施形態では、安定剤を調製されたままの銀ナノプレート溶液に添加する。その他の実施形態では、ナノプレートの溶液を洗浄するか、またはそうでなければ残留する反応体を除去する。一部の実施形態では、懸濁溶液は、安定化剤が添加される前に、例えば、ナノプレートを洗浄するため、または溶液のpHを変えるために、1または複数の溶液と1または複数回交換される。また、1またはそれ以上の容器の中に、10cm-1よりも高い光学濃度を有する溶液中のナノプレートと、ナノプレートを金属酸化物のシェル(または被膜)で被覆するのに適した金属酸化物含有溶液または金属酸化物前駆体含有溶液とを含有するキットも提供される。好ましくは、容器はその取扱説明書とともに提供される。一部の実施形態では、キットは、ポリビニルポリマーを含有する被膜を有するナノプレートを含有する。その他の実施形態では、ポリビニルポリマーは、ホウ酸塩を含有する。安定剤被膜を有するナノプレートは、本明細書に記載されるか、またはそうでなければ当技術分野で公知の通り、例えば粒子分析装置または発光検出器、例えばNMR、フーリエ変換分光法、質量分析、または同様のアッセイなどによって、特徴づけられる。
一実施形態では、安定化工程が完了した後、銀ナノプレートを洗浄して、残留する反応体を除去するかまたは溶液を別の溶液と交換することができる。溶液の交換は、透析、遠心分離、濾過、または接線流濾過(クロスフロー濾過としても公知)を用いて達成することができる。様々な実施形態では、サンプル内で交換される洗浄量(wash volume)の数は、0、1、2、3、4、5、1および5、5〜10、10〜20、または20以上の洗浄量である。
一実施形態では、濃縮された銀ナノプレートは、シリカのシェルで封入されている。被膜は、銀ナノプレートの外面の全部または一部に及んでよい。例えば、銀ナノプレートの外面の少なくとも5%、10%、15%、20%、25%、50%、75%、80%、90%、95%、99%、99.9%、または99.9%以上がシリカで被覆されている。濃縮されたプレートは、アルコール(例えば、エタノールまたはイソプロパノール)と混合することができる。一実施形態では、アミノシランまたはメルカプトシランを溶液に添加して、シラン分子をナノプレートの表面に結合させる。シラン分子のナノプレートの表面への結合は、ナノプレート上の表面被膜に特有である。処理中にナノプレートを安定化させる一部のナノ粒子の被膜は、シリカシェルの形成と両立しない。一実施形態では、ナノプレートの表面は、溶液中のシラン分子に親和性を有する分子で被覆される。一実施形態では、ポリビニルアルコールまたはポリビニルピロリドンなどのポリビニル系ポリマーは、シラン分子の添加の前にナノプレートの表面に結合している。その他の実施形態では、ポリビニル系ポリマー表面は、シラン分子の添加の前に、緩衝液中に存在する水溶性塩(例えば、1または複数の硫酸塩、炭酸塩、クロム酸塩、ホウ酸塩、リン酸塩、および亜硫酸塩、酢酸塩、および硝酸塩)と複合化している。その他の実施形態では、メルカプトヘキサデカン酸、メルカプトウンデカン酸、またはその他のチオール含有酸は、ナノプレートの表面に結合している。ナノプレートの表面に結合している初期シランが存在するならば、さらなるシランを塩基の存在下で溶液に添加してシリカシェルを形成することができる。一実施形態では、シリカシェルで被覆したナノプレートを水に移し、接線流濾過などの濃縮方法を用いて濃縮することができる。もう一つの実施形態では、シリカシェルは、塩化アルミニウムなどのアルミニウム塩、ポリビニルピロリドンなどの安定化ポリマー、または炭酸水素塩などの緩衝液の溶液と混合される。
様々な実施形態では、濃縮された粒子は、−10、0、4、6、10、または20℃よりも低い温度で貯蔵される。一実施形態では、粒子は凍結され、真空乾燥される。一実施形態では、粒子はフリーズドライされる。一実施形態では、粒子は超臨界乾燥される。一実施形態では、さらなる安定剤またはその他の抗凍結剤を、粒子が熱乾燥されるかまたはフリーズドライされる前に溶液に添加する。
本発明の一実施形態では、銀ナノプレートの高光学濃度溶液は、基板と会合する。様々な実施形態では、基板の例としては、繊維、布地、メッシュ、包帯、ソックス、ラップ、その他の衣料品、スポンジ、高多孔性基板、1ミクロンよりも大きいエッジ長さをもつ粒子、ビーズ、毛髪、皮膚、紙、吸収性ポリマー、発泡体、木材、コルク、スライド、粗面、生体適合性基板、フィルタ、または医療用インプラントが挙げられる。様々な実施形態では、少なくとも1mg/mL、10mg/mL、および/または100mg/mLの濃度の銀ナノプレートの溶液は、基板とともにインキュベートされる。いくつかの実施形態では、基板とともにインキュベートされる銀ナノプレート濃度は、0.1〜1.0、0.3〜3.0、0.5〜5.0、1.0〜10.0、3.0〜30.0、5.0〜50.0、10.0〜20.0、5.0〜50.0、3.0〜50.0、1.0〜100.0mg/mL、10.0〜100.0、20.0〜100.0、30.0〜100.0mg/mLの間である。もう一つの実施形態では、基板とともにインキュベートされる銀ナノプレートの溶液は、1ミリリットルあたり、106〜1013の間、107〜1013の間、108〜1013の間、109〜1013の間、1010〜1013の間、1011〜1013の間、1012〜1013の間、または1013以上の粒子である。もう一つの実施形態では、銀ナノプレートは、基板とともにインキュベートする前に、少なくとも10、20、50、100、300、500、1000および/または2000cm-1の光学濃度で調製される。様々な実施形態では、銀ナノプレートは、10〜100の間、20〜200の間、30〜300の間、50〜500の間、100〜1000の間、200〜1000の間、300〜1000の間、500〜1000の間、または200〜2000の間の光学濃度で調製される。もう一つの実施形態では、基板は、ナノプレートと基板との結合を増加させるために化学処理される。例えば、基板は、正または負に帯電した表面をもたらす分子によって官能化され得る。もう一つの実施形態では、インキュベーション溶液のpHは、結合を最適化するために選択される。もう一つの実施形態では、銀ナノプレートは、基板の少なくとも5%、10%、20%、30%、50%または75%を覆う。様々な実施形態では、銀ナノプレートは、基板の5%〜10%の間、10%〜100%の間、10%〜50%の間、50%〜100%の間、30%〜100%の間、30%〜70%の間、40%〜80%の間、50%〜90%の間、60%〜100%の間、70%〜100%の間、80%〜100%の間、90%〜100%の間、0%〜5%の間、0%〜10%の間、0%〜20%の間、0%〜30%の間、または0%〜50%の間を覆う。もう一つの実施形態では、その他の溶媒または化学物質がインキュベーション溶液に添加される。もう一つの実施形態では、生物学的リンカー(例えば、抗体、ペプチド、DNA)を用いて、高光学濃度の銀ナノプレートと基板の表面とを結合する。一実施形態では、インキュベーションは、1分未満、5分、20分、60分、または120分の間である。様々な実施形態では、インキュベーションは、0〜1分の間、1分〜120分の間、5分〜120分の間、20分〜120分の間、60分〜120分の間、5分〜60分の間、10分〜60分の間、20分〜60分の間、0分〜10分の間、0分〜20分の間、または0分〜5分の間である。
銀ナノプレートを、水性条件下、三塩基性クエン酸ナトリウムおよびポリスチレンスルホン酸ナトリウムの存在下で、硝酸銀を水素化ホウ素ナトリウムで還元することによって調製した銀シードを用いて合成した。銀シードの調製:21.3mLの2.5mM三塩基性クエン酸ナトリウム水溶液を、磁気撹拌下で混合させた。1mLの2g/Lポリスチレンスルホン酸ナトリウム(PSSS)溶液を次に別々のビーカーで調製した。次に、21.3mLの0.5mM硝酸銀溶液を、該塩を水に溶解することによって調製した。上記溶液が調製されれば、1.33mLの0.5mM水素化ホウ素ナトリウム溶液を4℃の水中で調製した。次に、ホウ化水素およびPSSS溶液を、該クエン酸塩を含有するビーカーに添加し、混合させた。次に、蠕動ポンプを100mL/分の速度で用いて、硝酸銀溶液を該クエン酸塩溶液の中に注ぎ込んだ。次に、このシード溶液を室温で一晩撹拌させた。1530mLのミリQ水を35mLの10mMアスコルビン酸溶液と混合することによって、銀ナノプレートを調製した。溶液が十分に混合されれば、調製した銀シードを反応器に添加した。353mLの2mM硝酸銀溶液を100mL/分の速度で反応器の中に注ぎ込んだ。反応物を2時間混合した。TEM分析は、70%を超える粒子がナノプレートであることを示した。溶液の光学濃度は2.8cm-1であった。
約5cm-1のピーク光学濃度をもつ、15Lの銀ナノプレートを、3.5gのポリビニルアルコール(PVA)およびホウ酸ナトリウムと混合し、3100cm2の表面積をもつ500kDポリスルホン接線流膜を用いて接線流濾過を用いて濃縮した。溶液を約90分間濃縮し、最終溶液体積は、15Lから0.5Lに減少した。銀ナノプレート溶液の光学濃度を約150cm-1に増加させた。従って、一実施形態によれば、銀ナノプレート溶液を5cm-1から150cm-1に増加させるための方法(例えば、ざっと30倍の光学濃度の増加)は、PVAおよびホウ酸ナトリウムを銀ナノプレートに添加する工程、および溶液を接線流濾過で濃縮する工程を含む。
銀ナノプレートを濃縮する一例では、約4cm-1のピーク光学濃度をもつ1.2Lの銀ナノプレートを、4Lの無水エタノールおよび約49mLの水酸化アンモニウム溶液と混合した。0.6mLの希釈したアミノプロピルトリエトキシシラン(APTES)を溶液に添加した。15分のインキュベーションの後、6.5mLのテトラエチルオルトケイ酸塩(TEOS)溶液を添加した。24時間後、1Lの溶液を、1050cm2の表面積をもつ500kDポリスルホン接線流膜を用いて濃縮した。最終溶液量は150mLに減少し、銀ナノ粒子溶液の光学濃度を約40cm-1に増加させた。従って、一実施形態によれば、銀ナノプレート溶液を4cm-1から40cm-1まで増加させるための方法(例えば、ざっと10倍の光学濃度の増加)は、無水エタノール、水酸化アンモニウム溶液、アミノプロピルトリエトキシシラン(APTES)、およびテトラエチルオルトケイ酸塩(TEOS)を銀ナノプレートに添加する工程、および溶液を接線流濾過で濃縮する工程を含む。
シリカシェルを、800nm共鳴(エッジ長さ約75nm)ポリビニルピロリドン(PVP)でキャップした銀ナノプレートの表面で成長させた。2mg/mL(O.D.20cm-1)の濃度の800nm共鳴PVPでキャップされた銀ナノプレートの溶液400mLを、2.3Lの試薬等級エタノールおよび190mLのミリQ水に一定撹拌下で添加した。4.3mLの希釈したアミノプロピルトリエトキシシラン(4.085mLイソプロパノール中215uL APTES)を次に溶液に添加し、その直後に44mLの30%水酸化アンモニウムを添加した。15分のインキュベーションの後、31mLの希釈したテトラエチルオルトケイ酸塩(29.45mLイソプロパノール中1.55mL TEOS)を溶液に添加した。次に、溶液を一晩撹拌させた。次に、ナノプレートをUltracentrifugeで17000RCFで15分間遠心し、ミリQ水中に毎回再構成して2回繰り返した。シリカシェルの厚さは15nmであった。濃縮された材料の光学濃度は2040cm-1であった。
ポリビニルアルコールおよびホウ酸ナトリウムで安定化された、濃縮された銀ナノプレートの40O.D.溶液の溶液40mLを、3000RCFで30分間回転させた。上清を除去し、浴超音波処理によってペレットを再分散させた。濃縮された銀ナノプレートは、図8に示されるように900O.D.よりも高い光学濃度を有した。
1000O.D.銀ナノプレートの溶液5mLを、吸収性の布の3”x3”切片(Ab
sorber Synthetic Drying Chamois、Clean Tools)に添加した。添加後、基板を風乾させた。乾燥すると、銀ナノプレートは、吸収性の布の表面に結合し、その後に布が湿り、圧力を印加することによって水を除去したときに放出されなかった。
Claims (25)
- 光学濃度を増加させる一方で、濃縮後に形状を保存する、濃縮された銀ナノプレートを作製するための方法であって、
安定化剤及び緩衝剤を濃縮される前の溶液に添加する工程であって、
該濃縮される前の溶液が銀ナノプレートを含み、
該銀ナノプレートの各々がプレート形状を有し、
該濃縮される前の溶液が第1の波長でピーク光学濃度を有し;
該安定化剤がポリビニル系ポリマーを含み、該緩衝剤がホウ酸塩を含む、工程と;
該濃縮される前の溶液中の該銀ナノプレートの濃度を増加させて濃縮溶液を生成する工程であって、
該濃縮溶液が第2の波長でピーク光学濃度を有し、
該濃縮溶液の該ピーク光学濃度が、該濃縮される前の溶液の該ピーク光学濃度よりも高く、
該濃縮される前の溶液中の該銀ナノプレートの少なくとも50%が、該濃縮溶液中で該プレート形状を保持する、工程とを含む、方法。 - 該濃度を増加させる工程が、接線流濾過を用いて実施され、
該濃縮溶液の該ピーク光学濃度が、該濃縮される前の溶液の該ピーク光学濃度よりも少なくとも10倍高く、
該濃縮溶液の該ピーク光学濃度が少なくとも100cm-1であり、
該ポリビニル系ポリマーが、ポリビニルピロリドン(PVP)およびポリビニルアルコール(PVA)からなる群の少なくとも1つを含み、
該ホウ酸塩がホウ酸ナトリウムを含み、
該濃縮溶液の該第2の波長が、300nm〜1500nmの間の範囲内であり、
該濃縮される前の溶液の該ピーク光学濃度と該濃縮溶液の該ピーク光学濃度が起こる波長の差が、該濃縮される前の溶液の波長の10%未満内であり、
該プレート形状を保持する該銀ナノプレートの該部分が、該濃縮溶液中で90%よりも多い、請求項1に記載の方法。 - 該銀ナノプレートが、シード媒介成長機構によって調製され、
該シード媒介成長機構が、
クエン酸塩、ポリスチレンスルホン酸ナトリウム(PSSS)、および水素化ホウ素ナトリウムを第1の溶液中で合すること、
硝酸銀を該第1の溶液に添加して、シード溶液を形成すること、
該シード溶液の一部分を第2の溶液に添加することであって、該第2の溶液がアスコルビン酸を含むこと、および
硝酸銀を該第2の溶液に添加して、該濃縮される前の溶液を形成することを含む、
請求項1〜2のいずれか一項に記載の方法。 - 該濃度を増加させる工程が、接線流濾過を用いて実施され、
該接線流濾過が、10kDa〜0.05ミクロンの間の範囲の分子量カットオフをもつ細孔を有する濾過膜を利用し、
該濃縮溶液の該ピーク光学濃度が、該濃縮される前の溶液の該ピーク光学濃度よりも少なくとも10倍高く、
該濃縮溶液の該ピーク光学濃度が少なくとも100cm-1である、
請求項1又は3に記載の方法。 - 該銀ナノプレートをシリカで被覆する工程をさらに含み、該銀ナノプレートをシリカでコーティングする工程が:
エタノールを該濃縮される前の溶液に添加すること、
塩基を該濃縮される前の溶液に添加すること、および
シランを該濃縮される前の溶液に添加することを含む、
請求項1〜4のいずれか一項に記載の方法。 - 該第2の波長が、300nm〜1100nmの間の範囲内であり、該濃縮される前の溶液の該光学濃度が、0.1〜10cm-1の間の範囲内であり、該濃縮溶液の該光学濃度が、少なくとも100cm-1である、請求項1〜5のいずれか一項に記載の方法。
- 該ポリビニル系ポリマーが、ポリビニルピロリドン(PVP)、および/またはポリビニルアルコール(PVA)であり、該安定化剤が、ポリエチレングリコール(PEG)をさらに含む、請求項1〜6のいずれか一項に記載の方法。
- 該銀ナノプレートの該表面に金属酸化物のシェルを形成する工程をさらに含む、請求項1〜4、6及び7のいずれか一項に記載の方法。
- 該金属酸化物シェルが、シリカシェルおよび二酸化チタンシェルからなる群のいずれかであり、該金属酸化物シェルが、1nm〜100nmの間の範囲内の厚さを有する、請求項8に記載の方法。
- ポリスチレンシェルを該銀ナノプレートの該表面に形成する工程をさらに含む、請求項1〜9のいずれか一項に記載の方法。
- 該安定化剤が、さらにチオール化学基を含む、請求項1〜10のいずれか一項に記載の方法。
- 該チオール化学基が、メルカプトヘキサデカン酸、メルカプトウンデカン酸、およびジヒドロリポ酸からなる群の少なくとも1つを含む、請求項11に記載の方法。
- 酸及び塩基から選択される群のいずれかを、該濃縮される前の溶液に添加する工程をさらに含む、請求項1〜12のいずれか一項に記載の方法。
- 該第2の波長と該第1の波長との差が、該第1の波長の10%以内である、請求項1〜13のいずれか一項に記載の方法。
- 該銀ナノプレートが、10nm〜250nmの間の範囲のエッジ長さを有する、請求項1〜14のいずれか一項に記載の方法。
- 該濃度を増加させた後に該プレート形状を保持する該濃縮された銀ナノプレートの該部分が、80%よりも多い、請求項1に記載の方法。
- 該濃縮される前の溶液が、シード媒介成長法を用いて形成される、請求項1、2及び4〜16のいずれか一項に記載の方法。
- 該濃縮される前の溶液が、該濃度を増加させた後に遠心される、請求項1〜17のいずれか一項に記載の方法。
- 該濃縮される前の溶液が、基板とともにインキュベートされ、該基板が繊維を含む、請求項1〜18のいずれか一項に記載の方法。
- 100cm-1よりも高い光学濃度を有する溶液中の複数の銀ナノプレートを含む、組成物であって、
該銀ナノプレートが、該銀ナノプレートの表面の被膜を含み、
該被膜が、ホウ酸塩、及び、ポリビニル系ポリマーを含む、組成物。 - 該ホウ酸塩が、ホウ酸ナトリウムおよびテトラホウ酸カリウムからなる群の少なくとも1つを含む、請求項20に記載の組成物。
- 該被膜が前記ポリビニル系ポリマーを含み、該ポリビニル系ポリマーが、:ポリビニルピロリドン(PVP)およびポリビニルアルコール(PVA)からなる群から選択される、請求項20〜21のいずれか一項に記載の組成物。
- 該被膜が前記チオール含有分子をさらに含み、該チオール含有分子が、メルカプトヘキサデカン酸、メルカプトウンデカン酸、およびジヒドロリポ酸からなる群の少なくとも1つを含む、請求項20〜22のいずれか一項に記載の組成物。
- 該被膜が、金属酸化物をさらに含む、請求項20〜23のいずれか一項に記載の組成物。
- 該金属酸化物が、シリカシェルおよび二酸化チタンシェルからなる群のいずれかの金属酸化物シェルであり、該金属酸化物シェルが、1nm〜100nmの間の範囲の厚さを有する、請求項24に記載の組成物。
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| JP2020020044A (ja) * | 2012-10-11 | 2020-02-06 | ナノコンポジックス,インコーポレイテッド | 銀ナノプレート組成物および方法 |
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