JP5342139B2 - ガスと蒸発材料との接触を促進する方法及び装置 - Google Patents

ガスと蒸発材料との接触を促進する方法及び装置 Download PDF

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JP5342139B2
JP5342139B2 JP2007515504A JP2007515504A JP5342139B2 JP 5342139 B2 JP5342139 B2 JP 5342139B2 JP 2007515504 A JP2007515504 A JP 2007515504A JP 2007515504 A JP2007515504 A JP 2007515504A JP 5342139 B2 JP5342139 B2 JP 5342139B2
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container
gas
holder
support surface
delivery container
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Japanese (ja)
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JP2008501507A5 (enExample
JP2008501507A (ja
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グレッグ，ジョン
バトル，スコット
バントン，ジェフリー，アイ．
ナイト，ドン
ラックスマン，ラビ，ケイ．
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Advanced Technology Materials Inc
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Advanced Technology Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
JP2007515504A 2004-06-01 2005-06-01 ガスと蒸発材料との接触を促進する方法及び装置 Expired - Lifetime JP5342139B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/858,509 2004-06-01
US10/858,509 US7300038B2 (en) 2002-07-23 2004-06-01 Method and apparatus to help promote contact of gas with vaporized material
PCT/US2005/019138 WO2005118119A1 (en) 2004-06-01 2005-06-01 Method and apparatus to help promote contact of gas with vaporized material

Related Child Applications (1)

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JP2012262401A Division JP2013049926A (ja) 2004-06-01 2012-11-30 ガスと蒸発材料との接触を促進するのを助ける方法及び装置

Publications (3)

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JP2008501507A JP2008501507A (ja) 2008-01-24
JP2008501507A5 JP2008501507A5 (enExample) 2008-07-17
JP5342139B2 true JP5342139B2 (ja) 2013-11-13

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JP2007515504A Expired - Lifetime JP5342139B2 (ja) 2004-06-01 2005-06-01 ガスと蒸発材料との接触を促進する方法及び装置
JP2012262401A Pending JP2013049926A (ja) 2004-06-01 2012-11-30 ガスと蒸発材料との接触を促進するのを助ける方法及び装置
JP2015190933A Expired - Lifetime JP6133954B2 (ja) 2004-06-01 2015-09-29 ガスと蒸発材料との接触を促進するのを助ける方法及び装置

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JP2012262401A Pending JP2013049926A (ja) 2004-06-01 2012-11-30 ガスと蒸発材料との接触を促進するのを助ける方法及び装置
JP2015190933A Expired - Lifetime JP6133954B2 (ja) 2004-06-01 2015-09-29 ガスと蒸発材料との接触を促進するのを助ける方法及び装置

Country Status (8)

Country Link
US (3) US7300038B2 (enExample)
EP (2) EP1750833B1 (enExample)
JP (3) JP5342139B2 (enExample)
KR (2) KR101181011B1 (enExample)
CN (3) CN103031542B (enExample)
AT (1) ATE530249T1 (enExample)
SG (3) SG158097A1 (enExample)
WO (1) WO2005118119A1 (enExample)

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