CN103031542B - 用于递送汽化源材料的装置 - Google Patents

用于递送汽化源材料的装置 Download PDF

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Publication number
CN103031542B
CN103031542B CN201210534049.6A CN201210534049A CN103031542B CN 103031542 B CN103031542 B CN 103031542B CN 201210534049 A CN201210534049 A CN 201210534049A CN 103031542 B CN103031542 B CN 103031542B
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China
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support
container
interior region
gas
vaporized
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Expired - Lifetime
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CN201210534049.6A
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English (en)
Chinese (zh)
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CN103031542A (zh
Inventor
约翰·格雷格
斯科特·巴特尔
杰弗里·I·邦东
唐·奈托
拉维·K·拉克斯曼
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Entegris Inc
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Entegris Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN201210534049.6A 2004-06-01 2005-06-01 用于递送汽化源材料的装置 Expired - Lifetime CN103031542B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/858,509 2004-06-01
US10/858,509 US7300038B2 (en) 2002-07-23 2004-06-01 Method and apparatus to help promote contact of gas with vaporized material
CNA2005800259208A CN1993172A (zh) 2004-06-01 2005-06-01 有助于增进气体与汽化材料接触的方法和装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNA2005800259208A Division CN1993172A (zh) 2004-06-01 2005-06-01 有助于增进气体与汽化材料接触的方法和装置

Publications (2)

Publication Number Publication Date
CN103031542A CN103031542A (zh) 2013-04-10
CN103031542B true CN103031542B (zh) 2015-11-25

Family

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Family Applications (3)

Application Number Title Priority Date Filing Date
CN201210534049.6A Expired - Lifetime CN103031542B (zh) 2004-06-01 2005-06-01 用于递送汽化源材料的装置
CNA2005800259208A Pending CN1993172A (zh) 2004-06-01 2005-06-01 有助于增进气体与汽化材料接触的方法和装置
CN201210532357.5A Expired - Lifetime CN103028270B (zh) 2004-06-01 2005-06-01 蒸汽递送容器和在容器内提供可汽化源材料的方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
CNA2005800259208A Pending CN1993172A (zh) 2004-06-01 2005-06-01 有助于增进气体与汽化材料接触的方法和装置
CN201210532357.5A Expired - Lifetime CN103028270B (zh) 2004-06-01 2005-06-01 蒸汽递送容器和在容器内提供可汽化源材料的方法

Country Status (8)

Country Link
US (3) US7300038B2 (enExample)
EP (2) EP2363199A1 (enExample)
JP (3) JP5342139B2 (enExample)
KR (2) KR101181011B1 (enExample)
CN (3) CN103031542B (enExample)
AT (1) ATE530249T1 (enExample)
SG (3) SG10201507473RA (enExample)
WO (1) WO2005118119A1 (enExample)

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