JP5001903B2 - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
- Publication number
- JP5001903B2 JP5001903B2 JP2008139680A JP2008139680A JP5001903B2 JP 5001903 B2 JP5001903 B2 JP 5001903B2 JP 2008139680 A JP2008139680 A JP 2008139680A JP 2008139680 A JP2008139680 A JP 2008139680A JP 5001903 B2 JP5001903 B2 JP 5001903B2
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- wiring
- insulating layer
- wiring board
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- semiconductor device
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008139680A JP5001903B2 (ja) | 2008-05-28 | 2008-05-28 | 半導体装置及びその製造方法 |
| TW098112219A TWI458057B (zh) | 2008-05-28 | 2009-04-13 | Semiconductor device and manufacturing method thereof |
| US12/423,826 US8159057B2 (en) | 2008-05-28 | 2009-04-15 | Semiconductor device and manufacturing method therefor |
| CN2009102029677A CN101593736B (zh) | 2008-05-28 | 2009-05-22 | 半导体装置及其制造方法 |
| US13/439,992 US8383456B2 (en) | 2008-05-28 | 2012-04-05 | Semiconductor device and manufacturing method therefor |
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| JP2008139680A JP5001903B2 (ja) | 2008-05-28 | 2008-05-28 | 半導体装置及びその製造方法 |
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| JPWO2012035688A1 (ja) * | 2010-09-16 | 2014-01-20 | パナソニック株式会社 | 半導体装置、半導体装置ユニット、および半導体装置の製造方法 |
| JP5587123B2 (ja) * | 2010-09-30 | 2014-09-10 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
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| JP5647014B2 (ja) | 2011-01-17 | 2014-12-24 | ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. | 半導体装置 |
| KR101831692B1 (ko) * | 2011-08-17 | 2018-02-26 | 삼성전자주식회사 | 기능적으로 비대칭인 전도성 구성 요소들을 갖는 반도체 소자, 패키지 기판, 반도체 패키지, 패키지 적층 구조물 및 전자 시스템 |
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| JP5926988B2 (ja) * | 2012-03-08 | 2016-05-25 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
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| JP6058336B2 (ja) * | 2012-09-28 | 2017-01-11 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| US20140091440A1 (en) * | 2012-09-29 | 2014-04-03 | Vijay K. Nair | System in package with embedded rf die in coreless substrate |
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| JP6438792B2 (ja) * | 2015-02-17 | 2018-12-19 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
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| JP6005805B2 (ja) * | 2015-07-03 | 2016-10-12 | ルネサスエレクトロニクス株式会社 | 半導体装置及び電子装置 |
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| JP2016219844A (ja) * | 2016-09-07 | 2016-12-22 | ルネサスエレクトロニクス株式会社 | 半導体装置及び電子装置 |
| US11101186B2 (en) * | 2018-03-16 | 2021-08-24 | Advanced Semiconductor Engineering, Inc. | Substrate structure having pad portions |
| WO2021215463A1 (ja) * | 2020-04-21 | 2021-10-28 | 京セラ株式会社 | 電子部品、電子デバイス及び電子部品の製造方法 |
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| JPH1174651A (ja) * | 1997-03-13 | 1999-03-16 | Ibiden Co Ltd | プリント配線板及びその製造方法 |
| WO2002063681A1 (fr) * | 2001-02-08 | 2002-08-15 | Hitachi, Ltd. | Dispositif de circuit integre a semi-conducteur et son procede de fabrication |
| JP2003086941A (ja) * | 2001-09-13 | 2003-03-20 | Matsushita Electric Works Ltd | プリント配線板 |
| JP2003124632A (ja) | 2001-10-16 | 2003-04-25 | Nec Toppan Circuit Solutions Inc | 多層プリント配線板及びその製造方法 |
| CN100334929C (zh) * | 2002-05-21 | 2007-08-29 | 株式会社大和工业 | 层间连接结构的形成方法 |
| JP2003338519A (ja) * | 2002-05-21 | 2003-11-28 | Renesas Technology Corp | 半導体装置及びその製造方法 |
| JP4241302B2 (ja) * | 2003-09-30 | 2009-03-18 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
| JP4601365B2 (ja) | 2004-09-21 | 2010-12-22 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP4609074B2 (ja) | 2005-01-13 | 2011-01-12 | 日立化成工業株式会社 | 配線板及び配線板の製造方法 |
| JP4291279B2 (ja) * | 2005-01-26 | 2009-07-08 | パナソニック株式会社 | 可撓性多層回路基板 |
| JP4769022B2 (ja) * | 2005-06-07 | 2011-09-07 | 京セラSlcテクノロジー株式会社 | 配線基板およびその製造方法 |
| CN101283631B (zh) * | 2005-12-20 | 2010-06-09 | 揖斐电株式会社 | 印刷线路板的制造方法 |
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| US20120208322A1 (en) | 2012-08-16 |
| US8383456B2 (en) | 2013-02-26 |
| CN101593736B (zh) | 2013-06-05 |
| US8159057B2 (en) | 2012-04-17 |
| JP2009289908A (ja) | 2009-12-10 |
| CN101593736A (zh) | 2009-12-02 |
| US20090294945A1 (en) | 2009-12-03 |
| TW201010025A (en) | 2010-03-01 |
| TWI458057B (zh) | 2014-10-21 |
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