JP4667378B2 - 極紫外放射又は軟x線放射を生成する方法及び装置 - Google Patents
極紫外放射又は軟x線放射を生成する方法及び装置 Download PDFInfo
- Publication number
- JP4667378B2 JP4667378B2 JP2006525971A JP2006525971A JP4667378B2 JP 4667378 B2 JP4667378 B2 JP 4667378B2 JP 2006525971 A JP2006525971 A JP 2006525971A JP 2006525971 A JP2006525971 A JP 2006525971A JP 4667378 B2 JP4667378 B2 JP 4667378B2
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- Prior art keywords
- electrodes
- metal
- metal melt
- radiation
- energy beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
- H05G2/0035—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state the material containing metals as principal radiation-generating components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10342239.0A DE10342239B4 (de) | 2003-09-11 | 2003-09-11 | Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung |
| PCT/IB2004/051651 WO2005025280A2 (en) | 2003-09-11 | 2004-09-01 | Method and apparatus for producing extreme ultraviolett radiation or soft x-ray radiation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007505460A JP2007505460A (ja) | 2007-03-08 |
| JP4667378B2 true JP4667378B2 (ja) | 2011-04-13 |
Family
ID=34258623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006525971A Expired - Lifetime JP4667378B2 (ja) | 2003-09-11 | 2004-09-01 | 極紫外放射又は軟x線放射を生成する方法及び装置 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7427766B2 (de) |
| EP (1) | EP1665907B1 (de) |
| JP (1) | JP4667378B2 (de) |
| KR (1) | KR101058067B1 (de) |
| CN (1) | CN100420352C (de) |
| AT (1) | ATE356531T1 (de) |
| DE (2) | DE10342239B4 (de) |
| TW (1) | TWI382789B (de) |
| WO (1) | WO2005025280A2 (de) |
Families Citing this family (97)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2466953A1 (en) * | 2001-11-14 | 2003-08-14 | Blacklight Power, Inc. | Hydrogen power, plasma, and reactor for lasing, and power conversion |
| DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
| RU2278483C2 (ru) * | 2004-04-14 | 2006-06-20 | Владимир Михайлович Борисов | Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы |
| JP4704788B2 (ja) * | 2005-03-31 | 2011-06-22 | 株式会社日立エンジニアリング・アンド・サービス | 二次荷電粒子発生装置 |
| DE102005023060B4 (de) * | 2005-05-19 | 2011-01-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung |
| DE102005045568A1 (de) * | 2005-05-31 | 2006-12-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Schutz einer optischen Komponente, insbesondere in einer EUV-Quelle |
| EP1897422A2 (de) * | 2005-06-14 | 2008-03-12 | Philips Intellectual Property & Standards GmbH | Verfahren zum schutz einer euv- und/oder weiche röntgenstrahlung erzeugenden strahlungsquelle gegen kurzschlüsse |
| DE102005030304B4 (de) | 2005-06-27 | 2008-06-26 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung |
| DE102005039849B4 (de) * | 2005-08-19 | 2011-01-27 | Xtreme Technologies Gmbh | Vorrichtung zur Strahlungserzeugung mittels einer Gasentladung |
| JP5176052B2 (ja) * | 2005-10-05 | 2013-04-03 | 国立大学法人大阪大学 | 放射線源用ターゲット生成供給装置 |
| JP4904809B2 (ja) * | 2005-12-28 | 2012-03-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| US7501642B2 (en) * | 2005-12-29 | 2009-03-10 | Asml Netherlands B.V. | Radiation source |
| DE102006015641B4 (de) * | 2006-03-31 | 2017-02-23 | Ushio Denki Kabushiki Kaisha | Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung |
| DE102006015640B3 (de) * | 2006-03-31 | 2007-10-04 | Xtreme Technologies Gmbh | Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung auf Basis einer elektrisch betriebenen Gasentladung |
| US7557366B2 (en) * | 2006-05-04 | 2009-07-07 | Asml Netherlands B.V. | Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| KR101396158B1 (ko) | 2006-05-16 | 2014-05-19 | 코닌클리케 필립스 엔.브이. | Euv 램프 및 연질 x-선 램프의 전환 효율을 증가시키는 방법, 및 euv 방사선 및 연질 x-선을 생성하는 장치 |
| DE102006027856B3 (de) | 2006-06-13 | 2007-11-22 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden |
| US8766212B2 (en) * | 2006-07-19 | 2014-07-01 | Asml Netherlands B.V. | Correction of spatial instability of an EUV source by laser beam steering |
| TW200808134A (en) | 2006-07-28 | 2008-02-01 | Ushio Electric Inc | Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation |
| JP2008053696A (ja) * | 2006-07-28 | 2008-03-06 | Ushio Inc | 極端紫外光光源装置および極端紫外光発生方法 |
| ATE486488T1 (de) * | 2006-09-06 | 2010-11-15 | Koninkl Philips Electronics Nv | Euv plasmaentladungslampe mit förderbandelektroden |
| JP4888046B2 (ja) | 2006-10-26 | 2012-02-29 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| US7518134B2 (en) * | 2006-12-06 | 2009-04-14 | Asml Netherlands B.V. | Plasma radiation source for a lithographic apparatus |
| US7759663B1 (en) * | 2006-12-06 | 2010-07-20 | Asml Netherlands B.V. | Self-shading electrodes for debris suppression in an EUV source |
| US7696492B2 (en) | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7696493B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7838853B2 (en) * | 2006-12-14 | 2010-11-23 | Asml Netherlands B.V. | Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method |
| DE102006060998B4 (de) * | 2006-12-20 | 2011-06-09 | Fachhochschule Hildesheim/Holzminden/Göttingen - Körperschaft des öffentlichen Rechts - | Verfahren und Vorrichtungen zum Erzeugen von Röntgenstrahlung |
| DE102007004440B4 (de) | 2007-01-25 | 2011-05-12 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung |
| JP5149514B2 (ja) * | 2007-02-20 | 2013-02-20 | ギガフォトン株式会社 | 極端紫外光源装置 |
| EP1976344B1 (de) | 2007-03-28 | 2011-04-20 | Tokyo Institute Of Technology | Lichtquellenvorrichtung für extremes Ultraviolettlicht und Verfahren zur Erzeugung einer extremen Ultraviolettstrahlung |
| US20080239262A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation |
| DE102007020742B8 (de) * | 2007-04-28 | 2009-06-18 | Xtreme Technologies Gmbh | Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung |
| JP2008311465A (ja) * | 2007-06-15 | 2008-12-25 | Nikon Corp | Euv光源、euv露光装置および半導体デバイスの製造方法 |
| US7629593B2 (en) * | 2007-06-28 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method |
| US8227771B2 (en) * | 2007-07-23 | 2012-07-24 | Asml Netherlands B.V. | Debris prevention system and lithographic apparatus |
| US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2009031104A1 (en) * | 2007-09-07 | 2009-03-12 | Philips Intellectual Property & Standards Gmbh | Electrode device for gas discharge sources and method of operating a gas discharge source having this electrode device |
| JP5709251B2 (ja) * | 2007-09-07 | 2015-04-30 | コーニンクレッカ フィリップス エヌ ヴェ | 高パワー動作のためのホイールカバーを有するガス放電光源のための回転ホイール電極 |
| JP2009087807A (ja) | 2007-10-01 | 2009-04-23 | Tokyo Institute Of Technology | 極端紫外光発生方法及び極端紫外光光源装置 |
| EP2198676A1 (de) | 2007-10-01 | 2010-06-23 | Philips Intellectual Property & Standards GmbH | Hochspannungsstromanschlussleitung |
| US20090095924A1 (en) * | 2007-10-12 | 2009-04-16 | International Business Machines Corporation | Electrode design for euv discharge plasma source |
| JP2009099390A (ja) * | 2007-10-17 | 2009-05-07 | Tokyo Institute Of Technology | 極端紫外光光源装置および極端紫外光発生方法 |
| JP4952513B2 (ja) * | 2007-10-31 | 2012-06-13 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| DE102007060807B4 (de) | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
| NL1036272A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Radiation source, lithographic apparatus and device manufacturing method. |
| NL1036595A1 (nl) * | 2008-02-28 | 2009-08-31 | Asml Netherlands Bv | Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method. |
| RU2365069C1 (ru) * | 2008-03-26 | 2009-08-20 | Владимир Михайлович Борисов | Устройство для получения мощного коротковолнового излучения из разрядной плазмы |
| TWI448209B (zh) * | 2008-05-02 | 2014-08-01 | Hon Hai Prec Ind Co Ltd | X射線成像設備 |
| EP2298041B1 (de) | 2008-07-07 | 2015-09-09 | Philips Deutschland GmbH | Vorrichtung zur erzeugung einer extremen uv-strahlung mit einem korrosionsfesten material |
| US8891058B2 (en) | 2008-07-18 | 2014-11-18 | Koninklijke Philips N.V. | Extreme UV radiation generating device comprising a contamination captor |
| EP2308272B1 (de) * | 2008-07-28 | 2012-09-19 | Philips Intellectual Property & Standards GmbH | Verfahren und vorrichtung zur erzeugung von euv-strahlung oder weichen röntgenstrahlen |
| JP4623192B2 (ja) | 2008-09-29 | 2011-02-02 | ウシオ電機株式会社 | 極端紫外光光源装置および極端紫外光発生方法 |
| EP2380411B1 (de) * | 2008-12-16 | 2015-04-15 | Philips Deutschland GmbH | Verfahren und einrichtung zum erzeugen von euv-strahlung oder weichen röntgenstrahlen mit erhöhtem wirkungsgrad |
| JP5245857B2 (ja) | 2009-01-21 | 2013-07-24 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| JP5455661B2 (ja) | 2009-01-29 | 2014-03-26 | ギガフォトン株式会社 | 極端紫外光源装置 |
| US8881526B2 (en) | 2009-03-10 | 2014-11-11 | Bastian Family Holdings, Inc. | Laser for steam turbine system |
| JP5504673B2 (ja) * | 2009-03-30 | 2014-05-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| WO2011051839A1 (en) | 2009-10-29 | 2011-05-05 | Koninklijke Philips Electronics N.V. | Electrode system, in particular for gas discharge light sources |
| US8559599B2 (en) * | 2010-02-04 | 2013-10-15 | Energy Resources International Co., Ltd. | X-ray generation device and cathode thereof |
| US9072152B2 (en) | 2010-03-29 | 2015-06-30 | Gigaphoton Inc. | Extreme ultraviolet light generation system utilizing a variation value formula for the intensity |
| US9072153B2 (en) | 2010-03-29 | 2015-06-30 | Gigaphoton Inc. | Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target |
| JP5802410B2 (ja) * | 2010-03-29 | 2015-10-28 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| TW201212726A (en) | 2010-07-15 | 2012-03-16 | Fraunhofer Ges Forschung | Method of improving the operation efficiency of a EUV plasma discharge lamp |
| JP5659711B2 (ja) | 2010-11-10 | 2015-01-28 | ウシオ電機株式会社 | 極端紫外光光源装置における照度分布の検出方法および極端紫外光光源装置 |
| TWI580316B (zh) * | 2011-03-16 | 2017-04-21 | Gigaphoton Inc | Extreme UV light generation device |
| EP2555598A1 (de) * | 2011-08-05 | 2013-02-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur Erzeugung optischer Strahlung mithilfe elektrisch betätigter gepulster Entladungen |
| TWI596384B (zh) * | 2012-01-18 | 2017-08-21 | Asml荷蘭公司 | 光源收集器元件、微影裝置及元件製造方法 |
| EP2837016B1 (de) | 2012-06-15 | 2016-08-17 | Siemens Aktiengesellschaft | Röntgenstrahlungsquelle und deren verwendung und verfahren zum erzeugen von röntgenstrahlung |
| JP5724986B2 (ja) | 2012-10-30 | 2015-05-27 | ウシオ電機株式会社 | 放電電極 |
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| DE102013103668B4 (de) | 2013-04-11 | 2016-02-25 | Ushio Denki Kabushiki Kaisha | Anordnung zum Handhaben eines flüssigen Metalls zur Kühlung von umlaufenden Komponenten einer Strahlungsquelle auf Basis eines strahlungsemittierenden Plasmas |
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| JP6135410B2 (ja) | 2013-09-06 | 2017-05-31 | ウシオ電機株式会社 | ホイルトラップ及びこのホイルトラップを用いた光源装置 |
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| DE102014102720B4 (de) * | 2014-02-28 | 2017-03-23 | Ushio Denki Kabushiki Kaisha | Anordnung zum Kühlen einer plasmabasierten Strahlungsquelle mit einer metallischen Kühlflüssigkeit und Verfahren zur Inbetriebnahme einer solchen Kühlanordnung |
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| JP6036785B2 (ja) * | 2014-10-15 | 2016-11-30 | ウシオ電機株式会社 | ホイルトラップ及びマスク検査用極端紫外光光源装置 |
| JP6513106B2 (ja) | 2015-01-28 | 2019-05-15 | ギガフォトン株式会社 | ターゲット供給装置 |
| JP6477179B2 (ja) | 2015-04-07 | 2019-03-06 | ウシオ電機株式会社 | 放電電極及び極端紫外光光源装置 |
| CN105376919B (zh) * | 2015-11-06 | 2017-08-01 | 华中科技大学 | 一种激光诱导液滴靶放电产生等离子体的装置 |
| DE102015224534B4 (de) | 2015-12-08 | 2017-06-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung von extremer Ultraviolett- und/ oder weicher Röntgenstrahlung |
| DE102016204407A1 (de) | 2016-03-17 | 2017-09-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung von extremer Ultraviolett- und/oder weicher Röntgenstrahlung |
| JP6237825B2 (ja) * | 2016-05-27 | 2017-11-29 | ウシオ電機株式会社 | 高温プラズマ原料供給装置および極端紫外光光源装置 |
| US11259394B2 (en) | 2019-11-01 | 2022-02-22 | Kla Corporation | Laser produced plasma illuminator with liquid sheet jet target |
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| US11862922B2 (en) * | 2020-12-21 | 2024-01-02 | Energetiq Technology, Inc. | Light emitting sealed body and light source device |
| JP7626009B2 (ja) * | 2021-08-30 | 2025-02-04 | ウシオ電機株式会社 | 放電プラズマ生成ユニット、及びそれを搭載した光源装置 |
| EP4466953B1 (de) | 2022-01-17 | 2025-10-29 | Isteq B.V. | Zielmaterial, euv-quelle mit hoher helligkeit und verfahren zur erzeugung von euv-strahlung |
| JP7503159B1 (ja) * | 2023-02-03 | 2024-06-19 | レーザーテック株式会社 | 光源装置 |
| JP7754369B2 (ja) * | 2023-03-31 | 2025-10-15 | ウシオ電機株式会社 | 光源装置及び発光ユニット |
| KR20250109087A (ko) | 2024-01-09 | 2025-07-16 | 한국표준과학연구원 | 레이저 생성 플라즈마를 사용하는 극자외선 발생 장치 및 방법 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2614457B2 (ja) * | 1986-09-11 | 1997-05-28 | ホーヤ 株式会社 | レーザープラズマx線発生装置及びx線射出口開閉機構 |
| DE3927089C1 (de) * | 1989-08-17 | 1991-04-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
| JPH04110800A (ja) * | 1990-08-31 | 1992-04-13 | Shimadzu Corp | 標的物質の供給装置 |
| US5317574A (en) * | 1992-12-31 | 1994-05-31 | Hui Wang | Method and apparatus for generating x-ray and/or extreme ultraviolet laser |
| DE19743311A1 (de) * | 1996-09-30 | 1998-04-02 | Fraunhofer Ges Forschung | Target für die Erzeugung gepulster Röntgen- und Extrem-UV-Strahlung (EUV), Verfahren zur Erzeugung eines solchen Targets sowie seine Verwendung |
| US5963616A (en) * | 1997-03-11 | 1999-10-05 | University Of Central Florida | Configurations, materials and wavelengths for EUV lithium plasma discharge lamps |
| US6586757B2 (en) | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
| US6566667B1 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
| JPH1164598A (ja) * | 1997-08-26 | 1999-03-05 | Shimadzu Corp | レーザプラズマx線源 |
| DE19753696A1 (de) | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
| DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
| JP2001021697A (ja) * | 1999-07-06 | 2001-01-26 | Shimadzu Corp | レーザープラズマx線源 |
| JP3587745B2 (ja) | 1999-09-08 | 2004-11-10 | 株式会社ニチレイ | 甲殻類の剥ぎ残し殻の検出排除方法及び装置 |
| JP2001108799A (ja) * | 1999-10-08 | 2001-04-20 | Nikon Corp | X線発生装置、x線露光装置及び半導体デバイスの製造方法 |
| TW508980B (en) * | 1999-12-23 | 2002-11-01 | Koninkl Philips Electronics Nv | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| TW502559B (en) * | 1999-12-24 | 2002-09-11 | Koninkl Philips Electronics Nv | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| US6320937B1 (en) * | 2000-04-24 | 2001-11-20 | Takayasu Mochizuki | Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target |
| TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| TW519574B (en) * | 2000-10-20 | 2003-02-01 | Nikon Corp | Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same |
| US6673524B2 (en) * | 2000-11-17 | 2004-01-06 | Kouros Ghandehari | Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method |
| US6804327B2 (en) * | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
| EP1401248B1 (de) | 2002-09-19 | 2012-07-25 | ASML Netherlands B.V. | Strahlungsquelle, Lithographiegerät und Methode zur Herstellung von Bauelementen |
-
2003
- 2003-09-11 DE DE10342239.0A patent/DE10342239B4/de not_active Expired - Lifetime
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2004
- 2004-09-01 KR KR1020067004980A patent/KR101058067B1/ko not_active Expired - Fee Related
- 2004-09-01 AT AT04769907T patent/ATE356531T1/de not_active IP Right Cessation
- 2004-09-01 EP EP04769907A patent/EP1665907B1/de not_active Expired - Lifetime
- 2004-09-01 JP JP2006525971A patent/JP4667378B2/ja not_active Expired - Lifetime
- 2004-09-01 CN CNB2004800262831A patent/CN100420352C/zh not_active Expired - Lifetime
- 2004-09-01 US US10/570,535 patent/US7427766B2/en not_active Expired - Lifetime
- 2004-09-01 DE DE602004005225T patent/DE602004005225D1/de not_active Expired - Lifetime
- 2004-09-01 WO PCT/IB2004/051651 patent/WO2005025280A2/en not_active Ceased
- 2004-09-08 TW TW093127205A patent/TWI382789B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060119962A (ko) | 2006-11-24 |
| EP1665907B1 (de) | 2007-03-07 |
| WO2005025280A3 (en) | 2005-06-16 |
| TWI382789B (zh) | 2013-01-11 |
| DE602004005225D1 (de) | 2007-04-19 |
| CN1849850A (zh) | 2006-10-18 |
| JP2007505460A (ja) | 2007-03-08 |
| KR101058067B1 (ko) | 2011-08-24 |
| TW200511900A (en) | 2005-03-16 |
| WO2005025280A2 (en) | 2005-03-17 |
| DE10342239B4 (de) | 2018-06-07 |
| EP1665907A2 (de) | 2006-06-07 |
| DE10342239A1 (de) | 2005-06-16 |
| US20070090304A1 (en) | 2007-04-26 |
| US7427766B2 (en) | 2008-09-23 |
| ATE356531T1 (de) | 2007-03-15 |
| CN100420352C (zh) | 2008-09-17 |
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