ATE486488T1 - Euv plasmaentladungslampe mit förderbandelektroden - Google Patents

Euv plasmaentladungslampe mit förderbandelektroden

Info

Publication number
ATE486488T1
ATE486488T1 AT07826197T AT07826197T ATE486488T1 AT E486488 T1 ATE486488 T1 AT E486488T1 AT 07826197 T AT07826197 T AT 07826197T AT 07826197 T AT07826197 T AT 07826197T AT E486488 T1 ATE486488 T1 AT E486488T1
Authority
AT
Austria
Prior art keywords
electrodes
gap
metal
discharge lamp
plasma discharge
Prior art date
Application number
AT07826197T
Other languages
English (en)
Inventor
Jeroen Jonkers
Jakob Neff
Ralf Pruemmer
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE486488T1 publication Critical patent/ATE486488T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/62—Lamps with gaseous cathode, e.g. plasma cathode
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • X-Ray Techniques (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT07826197T 2006-09-06 2007-08-29 Euv plasmaentladungslampe mit förderbandelektroden ATE486488T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06120170 2006-09-06
EP06120419 2006-09-11
PCT/IB2007/053480 WO2008029327A2 (en) 2006-09-06 2007-08-29 Euv plasma discharge lamp with conveyor belt electrodes

Publications (1)

Publication Number Publication Date
ATE486488T1 true ATE486488T1 (de) 2010-11-15

Family

ID=39022694

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07826197T ATE486488T1 (de) 2006-09-06 2007-08-29 Euv plasmaentladungslampe mit förderbandelektroden

Country Status (8)

Country Link
US (1) US7897948B2 (de)
EP (1) EP2064929B1 (de)
JP (1) JP5216772B2 (de)
KR (1) KR101340901B1 (de)
CN (1) CN101513135B (de)
AT (1) ATE486488T1 (de)
DE (1) DE602007010169D1 (de)
WO (1) WO2008029327A2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006027856B3 (de) * 2006-06-13 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
KR101477472B1 (ko) * 2007-09-07 2014-12-30 코닌클리케 필립스 엔.브이. 가스 방전 소스를 위한 전극 장치 및 이 전극 장치를 갖는 가스 방전 소스를 동작시키는 방법
JP5709251B2 (ja) * 2007-09-07 2015-04-30 コーニンクレッカ フィリップス エヌ ヴェ 高パワー動作のためのホイールカバーを有するガス放電光源のための回転ホイール電極
JP4952513B2 (ja) * 2007-10-31 2012-06-13 ウシオ電機株式会社 極端紫外光光源装置
US8519368B2 (en) 2008-07-28 2013-08-27 Koninklijke Philips N.V. Method and device for generating EUV radiation or soft X-rays
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
JP5608173B2 (ja) * 2008-12-16 2014-10-15 コーニンクレッカ フィリップス エヌ ヴェ 向上された効率によってｅｕｖ放射又は軟ｘ線を生成する方法及び装置
EP2555598A1 (de) * 2011-08-05 2013-02-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur Erzeugung optischer Strahlung mithilfe elektrisch betätigter gepulster Entladungen
CN102647844B (zh) * 2012-04-28 2015-02-25 河北大学 低电压下产生大间隙大气压均匀放电的装置及方法
EP2816876B1 (de) * 2013-06-21 2016-02-03 Ushio Denki Kabushiki Kaisha EUV-Entladungslampe mit beweglicher Schutzkomponente
KR101770183B1 (ko) 2014-12-11 2017-09-05 김형석 동축 케이블형 플라즈마 램프 장치
JP6477179B2 (ja) * 2015-04-07 2019-03-06 ウシオ電機株式会社 放電電極及び極端紫外光光源装置
KR20190128757A (ko) 2018-05-08 2019-11-19 정이교 플라즈마 램프 장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU518822A1 (ru) * 1974-11-27 1976-06-25 Московский Ордена Трудового Красного Знамени Научно-Исследовательский Рентгено-Радиологический Институт Рентгеновска трубка
US4896341A (en) 1984-11-08 1990-01-23 Hampshire Instruments, Inc. Long life X-ray source target
DE4243210A1 (de) * 1992-12-19 1994-06-30 Heraeus Noblelight Gmbh Hochleistungsstrahler
JPH1164598A (ja) * 1997-08-26 1999-03-05 Shimadzu Corp レーザプラズマｘ線源
JP2001357997A (ja) * 2000-06-13 2001-12-26 Teikoku Electric Mfg Co Ltd レーザプラズマｘ線発生装置
JP2002214400A (ja) 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
DE10219173A1 (de) * 2002-04-30 2003-11-20 Philips Intellectual Property Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung
JP2004037324A (ja) * 2002-07-04 2004-02-05 Japan Science & Technology Corp レーザプラズマｘ線発生装置
JP2005032510A (ja) * 2003-07-10 2005-02-03 Nikon Corp Ｅｕｖ光源、露光装置及び露光方法
DE10342239B4 (de) 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
DE102006027856B3 (de) * 2006-06-13 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden
JP4159584B2 (ja) 2006-06-20 2008-10-01 エルピーダメモリ株式会社 半導体装置の製造方法
CN100565781C (zh) * 2007-03-14 2009-12-02 北京真美视听技术有限责任公司 等离子体无极放电灯和组合光源
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby

Also Published As

Publication number Publication date
KR101340901B1 (ko) 2013-12-13
WO2008029327A3 (en) 2008-05-15
JP2010503170A (ja) 2010-01-28
CN101513135B (zh) 2013-03-06
EP2064929A2 (de) 2009-06-03
KR20090052382A (ko) 2009-05-25
EP2064929B1 (de) 2010-10-27
US7897948B2 (en) 2011-03-01
WO2008029327A2 (en) 2008-03-13
US20090250638A1 (en) 2009-10-08
CN101513135A (zh) 2009-08-19
JP5216772B2 (ja) 2013-06-19
DE602007010169D1 (de) 2010-12-09

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