JP4077849B2 - リソグラフィ装置およびデバイス製造方法 - Google Patents

リソグラフィ装置およびデバイス製造方法 Download PDF

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JP4077849B2
JP4077849B2 JP2006128497A JP2006128497A JP4077849B2 JP 4077849 B2 JP4077849 B2 JP 4077849B2 JP 2006128497 A JP2006128497 A JP 2006128497A JP 2006128497 A JP2006128497 A JP 2006128497A JP 4077849 B2 JP4077849 B2 JP 4077849B2
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substrate
substrate table
gap
liquid
lithographic apparatus
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JP2006313910A (ja
JP2006313910A5 (enExample
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シュトレーフケルク ボブ
ニコラース ランベルトゥス ドンデルス シュールト
フレデリック デ グラーフ ロエロフ
アレクサンダー ホーゲンダム クリスティアーン
ヘンドリクス アントニウス レーンデルス マルティヌス
ヨハネス ソフィア マリア メルテンス ジェローン
リーペン ミケル
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006128497A 2005-05-03 2006-05-02 リソグラフィ装置およびデバイス製造方法 Active JP4077849B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/120,176 US7433016B2 (en) 2005-05-03 2005-05-03 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

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JP2007324518A Division JP4820809B2 (ja) 2005-05-03 2007-12-17 リソグラフィ装置およびデバイス製造方法

Publications (3)

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JP2006313910A JP2006313910A (ja) 2006-11-16
JP2006313910A5 JP2006313910A5 (enExample) 2007-07-26
JP4077849B2 true JP4077849B2 (ja) 2008-04-23

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JP2006128497A Active JP4077849B2 (ja) 2005-05-03 2006-05-02 リソグラフィ装置およびデバイス製造方法
JP2007324518A Active JP4820809B2 (ja) 2005-05-03 2007-12-17 リソグラフィ装置およびデバイス製造方法
JP2010048947A Expired - Fee Related JP5235926B2 (ja) 2005-05-03 2010-03-05 リソグラフィ装置

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JP2010048947A Expired - Fee Related JP5235926B2 (ja) 2005-05-03 2010-03-05 リソグラフィ装置

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US (10) US7433016B2 (enExample)
EP (4) EP2339404B1 (enExample)
JP (3) JP4077849B2 (enExample)
KR (1) KR100706922B1 (enExample)
CN (3) CN1858656B (enExample)
SG (1) SG126920A1 (enExample)
TW (2) TWI410745B (enExample)

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KR101911400B1 (ko) 2012-05-29 2018-10-24 에이에스엠엘 네델란즈 비.브이. 대상물 홀더 및 리소그래피 장치
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US20120013873A1 (en) 2012-01-19
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US7433016B2 (en) 2008-10-07
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CN1858656A (zh) 2006-11-08
EP1720074A1 (en) 2006-11-08
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US10025196B2 (en) 2018-07-17
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