KR100706922B1 - 리소그래피 장치 및 디바이스 제조 방법 - Google Patents

리소그래피 장치 및 디바이스 제조 방법 Download PDF

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KR100706922B1
KR100706922B1 KR1020060040022A KR20060040022A KR100706922B1 KR 100706922 B1 KR100706922 B1 KR 100706922B1 KR 1020060040022 A KR1020060040022 A KR 1020060040022A KR 20060040022 A KR20060040022 A KR 20060040022A KR 100706922 B1 KR100706922 B1 KR 100706922B1
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liquid
substrate
substrate table
gap
gas
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KR20060115612A (ko
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봅 스트리프케르크
쇼에르트 니콜라스 람베르투스 돈더스
로엘로프 프레데릭 데 그라프
크리스티안 알렉산더 후겐담
마르티누스 헨드리쿠스 안토니우스 렌더스
예뢴 요한네스 소피아 마리아 메르텐스
미첼 리펜
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020060040022A 2005-05-03 2006-05-03 리소그래피 장치 및 디바이스 제조 방법 Active KR100706922B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/120,176 US7433016B2 (en) 2005-05-03 2005-05-03 Lithographic apparatus and device manufacturing method
US11/120,176 2005-05-03

Publications (2)

Publication Number Publication Date
KR20060115612A KR20060115612A (ko) 2006-11-09
KR100706922B1 true KR100706922B1 (ko) 2007-04-13

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US (10) US7433016B2 (enExample)
EP (4) EP2339404B1 (enExample)
JP (3) JP4077849B2 (enExample)
KR (1) KR100706922B1 (enExample)
CN (3) CN1858656B (enExample)
SG (1) SG126920A1 (enExample)
TW (2) TWI410745B (enExample)

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KR101689226B1 (ko) * 2012-05-22 2016-12-23 에이에스엠엘 네델란즈 비.브이. 센서, 리소그래피 장치 및 디바이스 제조 방법
KR101911400B1 (ko) 2012-05-29 2018-10-24 에이에스엠엘 네델란즈 비.브이. 대상물 홀더 및 리소그래피 장치
CN104570618B (zh) * 2014-12-25 2016-08-17 浙江大学 基于亲疏水交替表面的浸没流场密封装置
CN104597720B (zh) * 2015-01-15 2016-08-17 浙江大学 一种用于浸没式光刻机的气液隔离装置
CN113189849B (zh) 2021-04-22 2023-08-11 中国科学院光电技术研究所 一种近场光刻浸没系统及其浸没单元和接口模组

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