JP3934719B2 - 光近接効果補正方法 - Google Patents

光近接効果補正方法 Download PDF

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Publication number
JP3934719B2
JP3934719B2 JP33963696A JP33963696A JP3934719B2 JP 3934719 B2 JP3934719 B2 JP 3934719B2 JP 33963696 A JP33963696 A JP 33963696A JP 33963696 A JP33963696 A JP 33963696A JP 3934719 B2 JP3934719 B2 JP 3934719B2
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Japan
Prior art keywords
correction
pattern
optical proximity
area
proximity effect
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Expired - Fee Related
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JP33963696A
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English (en)
Japanese (ja)
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JPH09319067A (ja
JPH09319067A5 (https=
Inventor
和子 山元
幸子 三山
清美 小山
壮一 井上
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Toshiba Corp
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Toshiba Corp
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Priority to JP33963696A priority Critical patent/JP3934719B2/ja
Priority to US08/771,252 priority patent/US5879844A/en
Publication of JPH09319067A publication Critical patent/JPH09319067A/ja
Priority to US09/239,770 priority patent/US6077310A/en
Publication of JPH09319067A5 publication Critical patent/JPH09319067A5/ja
Application granted granted Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP33963696A 1995-12-22 1996-12-19 光近接効果補正方法 Expired - Fee Related JP3934719B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP33963696A JP3934719B2 (ja) 1995-12-22 1996-12-19 光近接効果補正方法
US08/771,252 US5879844A (en) 1995-12-22 1996-12-20 Optical proximity correction method
US09/239,770 US6077310A (en) 1995-12-22 1999-01-29 Optical proximity correction system

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP33545095 1995-12-22
JP7-335450 1995-12-22
JP8-68829 1996-03-25
JP6882996 1996-03-25
JP33963696A JP3934719B2 (ja) 1995-12-22 1996-12-19 光近接効果補正方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005302095A Division JP4006013B2 (ja) 1995-12-22 2005-10-17 光近接効果補正方法

Publications (3)

Publication Number Publication Date
JPH09319067A JPH09319067A (ja) 1997-12-12
JPH09319067A5 JPH09319067A5 (https=) 2004-11-18
JP3934719B2 true JP3934719B2 (ja) 2007-06-20

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Family Applications (1)

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JP33963696A Expired - Fee Related JP3934719B2 (ja) 1995-12-22 1996-12-19 光近接効果補正方法

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US (2) US5879844A (https=)
JP (1) JP3934719B2 (https=)

Families Citing this family (296)

* Cited by examiner, † Cited by third party
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US6077310A (en) 2000-06-20
US5879844A (en) 1999-03-09

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