JP3580366B2 - 熱伝導性シリコーン組成物及び半導体装置 - Google Patents

熱伝導性シリコーン組成物及び半導体装置 Download PDF

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JP3580366B2
JP3580366B2 JP2001133895A JP2001133895A JP3580366B2 JP 3580366 B2 JP3580366 B2 JP 3580366B2 JP 2001133895 A JP2001133895 A JP 2001133895A JP 2001133895 A JP2001133895 A JP 2001133895A JP 3580366 B2 JP3580366 B2 JP 3580366B2
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component
group
package
carbon atoms
heat
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JP2002327116A (ja
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邦弘 山田
憲一 磯部
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Shin-Etsu Chemical Co Ltd
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Priority to JP2001133895A priority Critical patent/JP3580366B2/ja
Priority to US10/133,312 priority patent/US6649258B2/en
Priority to DE2002600630 priority patent/DE60200630T2/de
Priority to EP20020253010 priority patent/EP1254924B1/en
Priority to TW91109016A priority patent/TWI303261B/zh
Publication of JP2002327116A publication Critical patent/JP2002327116A/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00—Arrangements for thermal protection or thermal control
    • H10W40/20—Arrangements for cooling
    • H10W40/25—Arrangements for cooling characterised by their materials
    • H10W40/251—Organics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/08—Metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/08—Metals
    • C08K2003/0812—Aluminium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2296—Oxides; Hydroxides of metals of zinc
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H10W72/07251—Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/874—On different surfaces
    • H10W72/877—Bump connectors and die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
JP2001133895A 2001-05-01 2001-05-01 熱伝導性シリコーン組成物及び半導体装置 Expired - Lifetime JP3580366B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001133895A JP3580366B2 (ja) 2001-05-01 2001-05-01 熱伝導性シリコーン組成物及び半導体装置
US10/133,312 US6649258B2 (en) 2001-05-01 2002-04-29 Heat conductive silicone composition and semiconductor device
DE2002600630 DE60200630T2 (de) 2001-05-01 2002-04-29 Wärmeleitende Siliconzusammensetzung und Halbleiteranordnung
EP20020253010 EP1254924B1 (en) 2001-05-01 2002-04-29 Heat conductive silicone composition and semiconductor device
TW91109016A TWI303261B (enExample) 2001-05-01 2002-04-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001133895A JP3580366B2 (ja) 2001-05-01 2001-05-01 熱伝導性シリコーン組成物及び半導体装置

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JP2002327116A JP2002327116A (ja) 2002-11-15
JP3580366B2 true JP3580366B2 (ja) 2004-10-20

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US (1) US6649258B2 (enExample)
EP (1) EP1254924B1 (enExample)
JP (1) JP3580366B2 (enExample)
DE (1) DE60200630T2 (enExample)
TW (1) TWI303261B (enExample)

Cited By (21)

* Cited by examiner, † Cited by third party
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JP2005064281A (ja) * 2003-08-14 2005-03-10 Shin Etsu Chem Co Ltd 熱軟化性熱伝導性部材
JP2007150349A (ja) * 2007-02-09 2007-06-14 Shin Etsu Chem Co Ltd 熱軟化性熱伝導性部材
JP2014080546A (ja) * 2012-10-18 2014-05-08 Shin Etsu Chem Co Ltd シリコーン組成物
WO2014181657A1 (ja) 2013-05-07 2014-11-13 信越化学工業株式会社 熱伝導性シリコーン組成物及びその硬化物
KR20160028965A (ko) 2014-09-04 2016-03-14 신에쓰 가가꾸 고교 가부시끼가이샤 실리콘 조성물
US9481851B2 (en) 2012-04-24 2016-11-01 Shin-Etsu Chemical Co., Ltd. Thermally-curable heat-conductive silicone grease composition
US9698077B2 (en) 2013-01-22 2017-07-04 Shin-Etsu Chemical Co., Ltd. Heat conductive silicone composition based on combination of components, heat conductive layer, and semiconductor device
US9969919B2 (en) 2013-09-20 2018-05-15 Shin-Etsu Chemical Co., Ltd. Silicone composition and method for manufacturing heat-conductive silicone composition
US10023741B2 (en) 2013-05-24 2018-07-17 Shin-Etsu Chemical Co., Ltd. Heat-conductive silicone composition
US10689515B2 (en) 2016-01-07 2020-06-23 Shin-Etsu Chemical Co., Ltd. Silicone composition based on both condensation/curing reaction and organic-peroxide curing reaction
KR20200135992A (ko) 2018-03-23 2020-12-04 신에쓰 가가꾸 고교 가부시끼가이샤 실리콘 조성물
US11041072B2 (en) 2014-11-25 2021-06-22 Shin-Etsu Chemical Co., Ltd. One-pack addition curable silicone composition, method for storing same, and method for curing same
KR20210076046A (ko) 2018-10-12 2021-06-23 신에쓰 가가꾸 고교 가부시끼가이샤 부가 경화형 실리콘 조성물 및 그 제조 방법
KR20210135235A (ko) 2019-03-04 2021-11-12 신에쓰 가가꾸 고교 가부시끼가이샤 비경화형 열전도성 실리콘 조성물
KR20210148140A (ko) 2019-04-01 2021-12-07 신에쓰 가가꾸 고교 가부시끼가이샤 열전도성 실리콘 조성물, 그의 제조방법 및 반도체장치
US11319412B2 (en) 2016-10-31 2022-05-03 Dow Toray Co., Ltd. Thermally conductive silicone compound
KR20220121805A (ko) 2019-12-23 2022-09-01 신에쓰 가가꾸 고교 가부시끼가이샤 열전도성 실리콘 조성물
US11591470B2 (en) 2018-01-15 2023-02-28 Shin-Etsu Chemical Co., Ltd. Silicone composition
WO2023171353A1 (ja) 2022-03-08 2023-09-14 信越化学工業株式会社 2液型熱伝導性付加硬化型シリコーン組成物及びそのシリコーン硬化物
WO2023171352A1 (ja) 2022-03-08 2023-09-14 信越化学工業株式会社 熱伝導性付加硬化型シリコーン組成物及びそのシリコーン硬化物
US12104113B2 (en) 2019-09-27 2024-10-01 Shin-Etsu Chemical Co., Ltd. Thermally conductive silicone composition, production method thereof, and semiconductor device

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US7060747B2 (en) 2001-03-30 2006-06-13 Intel Corporation Chain extension for thermal materials
JP3803058B2 (ja) 2001-12-11 2006-08-02 信越化学工業株式会社 熱伝導性シリコーン組成物、その硬化物及び敷設方法並びにそれを用いた半導体装置の放熱構造体
JP2004176016A (ja) * 2002-11-29 2004-06-24 Shin Etsu Chem Co Ltd 熱伝導性シリコーン組成物及びその成形体
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JP2005064291A (ja) * 2003-08-14 2005-03-10 Nissan Motor Co Ltd 絶縁シートおよびこの絶縁シートを用いた半導体装置組立体
JP4154605B2 (ja) * 2004-01-23 2008-09-24 信越化学工業株式会社 熱伝導性シリコーン放熱用組成物及び放熱構造の製造方法
US7119143B2 (en) * 2004-03-04 2006-10-10 Laird Technologies, Inc. Silicone pads for electronics thermal management
TWI385246B (zh) 2004-05-21 2013-02-11 信越化學工業股份有限公司 聚矽氧烷潤滑油組成物
US7211637B2 (en) 2004-06-03 2007-05-01 Therm-O-Disc, Incorporated Sterically hindered reagents for use in single component siloxane cure systems
JP4687887B2 (ja) * 2004-10-14 2011-05-25 信越化学工業株式会社 熱伝導性シリコーングリース組成物
JP2006143978A (ja) * 2004-11-25 2006-06-08 Ge Toshiba Silicones Co Ltd 熱伝導性シリコーン組成物
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EP1878767A1 (en) * 2006-07-12 2008-01-16 Shin-Etsu Chemical Co., Ltd. Heat conductive silicone grease composition and cured product thereof
US8012420B2 (en) 2006-07-18 2011-09-06 Therm-O-Disc, Incorporated Robust low resistance vapor sensor materials
JP2008106185A (ja) * 2006-10-27 2008-05-08 Shin Etsu Chem Co Ltd 熱伝導性シリコーン組成物の接着方法、熱伝導性シリコーン組成物接着用プライマー及び熱伝導性シリコーン組成物の接着複合体の製造方法
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US8106119B2 (en) * 2007-12-04 2012-01-31 Sea-Fue Wang Thermally conductive silicone composition
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JP2008160126A (ja) * 2007-12-21 2008-07-10 Shin Etsu Chem Co Ltd 電子部品の冷却構造
JP5372388B2 (ja) * 2008-01-30 2013-12-18 東レ・ダウコーニング株式会社 熱伝導性シリコーングリース組成物
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JP5182515B2 (ja) * 2008-12-25 2013-04-17 信越化学工業株式会社 熱伝導性シリコーングリース組成物
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JP6023737B2 (ja) * 2014-03-18 2016-11-09 信越化学工業株式会社 ウエハ加工体、ウエハ加工用仮接着材、及び薄型ウエハの製造方法
KR102410261B1 (ko) 2014-09-25 2022-06-17 신에쓰 가가꾸 고교 가부시끼가이샤 자외선 증점형 열전도성 실리콘 그리스 조성물
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JP6223590B2 (ja) * 2015-05-22 2017-11-01 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 熱伝導性組成物
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JP7422742B2 (ja) 2019-03-29 2024-01-26 ダウ・東レ株式会社 多成分型熱伝導性シリコーンゲル組成物、熱伝導性部材および放熱構造体
EP4050068B1 (en) * 2019-10-24 2025-01-29 Shin-Etsu Chemical Co., Ltd. Thermally conductive silicone composition and production method therefor
JP7136065B2 (ja) * 2019-11-14 2022-09-13 信越化学工業株式会社 熱伝導性シリコーン組成物及び熱伝導性シリコーンシート
US12503599B2 (en) 2020-03-16 2025-12-23 Dow Silicones Corporation Thermal conductive silicone composition
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