JP2014528015A5 - - Google Patents

Download PDF

Info

Publication number
JP2014528015A5
JP2014528015A5 JP2014531329A JP2014531329A JP2014528015A5 JP 2014528015 A5 JP2014528015 A5 JP 2014528015A5 JP 2014531329 A JP2014531329 A JP 2014531329A JP 2014531329 A JP2014531329 A JP 2014531329A JP 2014528015 A5 JP2014528015 A5 JP 2014528015A5
Authority
JP
Japan
Prior art keywords
polymer
mol
neutral
resist
unexpectedly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014531329A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014528015A (ja
JP6077547B2 (ja
Filing date
Publication date
Priority claimed from US13/243,640 external-priority patent/US8691925B2/en
Application filed filed Critical
Publication of JP2014528015A publication Critical patent/JP2014528015A/ja
Publication of JP2014528015A5 publication Critical patent/JP2014528015A5/ja
Application granted granted Critical
Publication of JP6077547B2 publication Critical patent/JP6077547B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014531329A 2011-09-23 2012-09-21 誘導自己組織化ブロックコポリマーのための中性層の組成物及びそれの方法 Active JP6077547B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/243,640 US8691925B2 (en) 2011-09-23 2011-09-23 Compositions of neutral layer for directed self assembly block copolymers and processes thereof
US13/243,640 2011-09-23
PCT/IB2012/001905 WO2013041958A1 (en) 2011-09-23 2012-09-21 Compositions of neutral layer for directed self assembly block copolymers and processes thereof

Publications (3)

Publication Number Publication Date
JP2014528015A JP2014528015A (ja) 2014-10-23
JP2014528015A5 true JP2014528015A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2016-01-21
JP6077547B2 JP6077547B2 (ja) 2017-02-08

Family

ID=47911640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014531329A Active JP6077547B2 (ja) 2011-09-23 2012-09-21 誘導自己組織化ブロックコポリマーのための中性層の組成物及びそれの方法

Country Status (9)

Country Link
US (2) US8691925B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (2) EP2949702B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP6077547B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR101829955B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN (1) CN103797066B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
MY (1) MY193745A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SG (1) SG2014004667A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TWI535770B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO2013041958A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9161448B2 (en) 2010-03-29 2015-10-13 Semprius, Inc. Laser assisted transfer welding process
EP2878979A1 (en) * 2011-01-28 2015-06-03 Hewlett-Packard Development Company, L.P. Filter
US9412727B2 (en) 2011-09-20 2016-08-09 Semprius, Inc. Printing transferable components using microstructured elastomeric surfaces with pressure modulated reversible adhesion
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
FR2983773B1 (fr) * 2011-12-09 2014-10-24 Arkema France Procede de preparation de surfaces
US8686109B2 (en) 2012-03-09 2014-04-01 Az Electronic Materials (Luxembourg) S.A.R.L. Methods and materials for removing metals in block copolymers
US8835581B2 (en) 2012-06-08 2014-09-16 Az Electronic Materials (Luxembourg) S.A.R.L. Neutral layer polymer composition for directed self assembly and processes thereof
CN104541357B (zh) 2012-07-10 2018-01-23 株式会社尼康 标记及其形成方法以及曝光装置
JP6126807B2 (ja) * 2012-08-27 2017-05-10 東京応化工業株式会社 パターン形成方法
JP5919210B2 (ja) * 2012-09-28 2016-05-18 東京エレクトロン株式会社 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム
EP2733533B1 (en) * 2012-11-14 2018-02-28 IMEC vzw Etching method using block-copolymers
US8859433B2 (en) * 2013-03-11 2014-10-14 International Business Machines Corporation DSA grapho-epitaxy process with etch stop material
US8999623B2 (en) 2013-03-14 2015-04-07 Wiscousin Alumni Research Foundation Degradable neutral layers for block copolymer lithography applications
US9012270B2 (en) * 2013-03-15 2015-04-21 Globalfoundries Inc. Metal layer enabling directed self-assembly semiconductor layout designs
JP6454324B2 (ja) * 2013-04-03 2019-01-16 ブルーワー サイエンス アイ エヌ シー. 誘導自己組織化用ブロックコポリマーに用いる高エッチング耐性ポリマーブロック
US10457088B2 (en) * 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern
US9291909B2 (en) 2013-05-17 2016-03-22 Az Electronic Materials (Luxembourg) S.A.R.L. Composition comprising a polymeric thermal acid generator and processes thereof
US20140357083A1 (en) * 2013-05-31 2014-12-04 Applied Materials, Inc. Directed block copolymer self-assembly patterns for advanced photolithography applications
US9802400B2 (en) * 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9382444B2 (en) 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
JP2015015425A (ja) * 2013-07-08 2015-01-22 株式会社東芝 パターン形成方法
JP2015023063A (ja) * 2013-07-16 2015-02-02 株式会社東芝 パターン形成方法及びマスクパターンデータ
JP6446195B2 (ja) * 2013-07-31 2018-12-26 東京応化工業株式会社 相分離構造体の製造方法、パターン形成方法及び微細パターン形成方法
WO2015018590A1 (en) * 2013-08-06 2015-02-12 Asml Netherlands B.V. Method of designing lithography features by self-assembly of block copolymer
JP6232226B2 (ja) * 2013-08-09 2017-11-15 東京応化工業株式会社 相分離構造を含む構造体の製造方法
JP6170378B2 (ja) * 2013-08-29 2017-07-26 東京エレクトロン株式会社 エッチング方法
KR102394998B1 (ko) * 2013-09-04 2022-05-04 도쿄엘렉트론가부시키가이샤 유도 자기 조립용 화학 템플릿을 생성하기 위한 경화 포토레지스트의 자외선을 이용한 박리
TWI615885B (zh) * 2013-09-12 2018-02-21 聯華電子股份有限公司 圖案化的方法
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
JP6249714B2 (ja) * 2013-10-25 2017-12-20 東京応化工業株式会社 相分離構造を含む構造体の製造方法
KR102356815B1 (ko) * 2013-11-14 2022-01-27 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 갭-충전 방법
US10202480B2 (en) 2013-12-06 2019-02-12 Lg Chem, Ltd. Block copolymer
CN105899558B (zh) 2013-12-06 2018-09-18 株式会社Lg化学 嵌段共聚物
WO2015084128A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
CN105934456B (zh) 2013-12-06 2018-09-28 株式会社Lg化学 嵌段共聚物
EP3078690B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
WO2015084120A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 단량체 및 블록 공중합체
JP6521975B2 (ja) 2013-12-06 2019-05-29 エルジー・ケム・リミテッド ブロック共重合体
CN105916904B (zh) 2013-12-06 2018-11-09 株式会社Lg化学 嵌段共聚物
WO2015084130A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
JP6432846B2 (ja) 2013-12-06 2018-12-05 エルジー・ケム・リミテッド ブロック共重合体
CN105899560B (zh) 2013-12-06 2018-01-12 株式会社Lg化学 嵌段共聚物
CN105899556B (zh) 2013-12-06 2019-04-19 株式会社Lg化学 嵌段共聚物
CN105960422B (zh) 2013-12-06 2019-01-18 株式会社Lg化学 嵌段共聚物
JP6496318B2 (ja) 2013-12-06 2019-04-03 エルジー・ケム・リミテッド ブロック共重合体
US9181449B2 (en) * 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
US9490117B2 (en) * 2013-12-31 2016-11-08 Dow Global Technologies Llc Directed self-assembly pattern formation methods and compositions
TWI557142B (zh) * 2013-12-31 2016-11-11 陶氏全球科技責任有限公司 可交聯聚合物及下方層組成物
JP6764787B2 (ja) * 2014-01-16 2020-10-07 ブルーワー サイエンス アイ エヌ シー. 誘導自己組織化用高χブロックコポリマー
US9340411B2 (en) 2014-01-27 2016-05-17 Tokyo Electron Limited Defect-less directed self-assembly
JP6234271B2 (ja) * 2014-02-25 2017-11-22 東京エレクトロン株式会社 被処理体を処理する方法
JP6129773B2 (ja) 2014-03-14 2017-05-17 株式会社東芝 パターン形成方法
US9557640B2 (en) * 2014-03-15 2017-01-31 Board Of Regents, University Of Texas System Ordering block copolymers
US9690192B2 (en) * 2014-04-21 2017-06-27 Jsr Corporation Composition for base, and directed self-assembly lithography method
JP6204881B2 (ja) * 2014-06-26 2017-09-27 東京エレクトロン株式会社 被処理体を処理する方法
US9358775B2 (en) 2014-07-20 2016-06-07 X-Celeprint Limited Apparatus and methods for micro-transfer-printing
KR102302704B1 (ko) 2014-09-02 2021-09-15 삼성전자주식회사 마스크용 패턴 구조물, 이를 이용한 홀 형성 방법 및 이를 이용한 반도체 장치의 제조 방법
KR102226116B1 (ko) * 2014-09-12 2021-03-11 삼성디스플레이 주식회사 와이어 그리드 편광자 및 이의 제조방법
WO2016053011A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
CN107075050B (zh) 2014-09-30 2019-08-13 株式会社Lg化学 嵌段共聚物
CN107075053B (zh) * 2014-09-30 2019-05-21 株式会社Lg化学 嵌段共聚物
KR101832031B1 (ko) * 2014-09-30 2018-02-23 주식회사 엘지화학 블록 공중합체
EP3203497B1 (en) 2014-09-30 2023-11-29 LG Chem, Ltd. Method for producing patterned substrate
JP6637495B2 (ja) 2014-09-30 2020-01-29 エルジー・ケム・リミテッド パターン化基板の製造方法
EP3202799B1 (en) 2014-09-30 2021-08-25 LG Chem, Ltd. Block copolymer
US10287429B2 (en) 2014-09-30 2019-05-14 Lg Chem, Ltd. Block copolymer
WO2016053010A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
CN107075052B (zh) 2014-09-30 2020-05-29 株式会社Lg化学 嵌段共聚物
JP6394798B2 (ja) 2014-09-30 2018-09-26 エルジー・ケム・リミテッド ブロック共重合体
US9556353B2 (en) * 2014-10-29 2017-01-31 International Business Machines Corporation Orientation control materials for block copolymers used in directed self-assembly applications
US9505945B2 (en) * 2014-10-30 2016-11-29 Az Electronic Materials (Luxembourg) S.A.R.L. Silicon containing block copolymers for direct self-assembly application
WO2016080972A1 (en) * 2014-11-18 2016-05-26 Seagate Technology Llc Methods and apparatuses for directed self-assembly
KR101750935B1 (ko) 2014-12-12 2017-06-27 주식회사 엘지화학 블록 공중합체, 및 이를 이용한 그래핀의 제조 방법
CN105990223B (zh) * 2015-02-04 2019-03-12 中芯国际集成电路制造(上海)有限公司 一种形成超低介电常数介质层的方法
US9574107B2 (en) 2015-02-16 2017-02-21 International Business Machines Corporation Fluoro-alcohol additives for orientation control of block copolymers
US9733566B2 (en) 2015-03-17 2017-08-15 Tokyo Electron Limited Spin-on layer for directed self assembly with tunable neutrality
US9431219B1 (en) * 2015-05-05 2016-08-30 HGST Netherlands B.V. Method for making guiding lines with oxidized sidewalls for use in directed self-assembly (DSA) of block copolymers
CN107849202B (zh) * 2015-06-04 2020-04-21 株式会社Lg化学 中性层复合物
US9704821B2 (en) 2015-08-11 2017-07-11 X-Celeprint Limited Stamp with structured posts
US10468363B2 (en) 2015-08-10 2019-11-05 X-Celeprint Limited Chiplets with connection posts
US9574104B1 (en) * 2015-10-16 2017-02-21 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions and processes for self-assembly of block copolymers
KR102611450B1 (ko) * 2016-01-26 2023-12-08 삼성전자주식회사 패턴 형성 방법
US10103069B2 (en) 2016-04-01 2018-10-16 X-Celeprint Limited Pressure-activated electrical interconnection by micro-transfer printing
JP6955176B2 (ja) * 2016-07-06 2021-10-27 Jsr株式会社 膜形成用組成物、膜形成方法及び自己組織化リソグラフィープロセス
US10222698B2 (en) 2016-07-28 2019-03-05 X-Celeprint Limited Chiplets with wicking posts
US11064609B2 (en) 2016-08-04 2021-07-13 X Display Company Technology Limited Printable 3D electronic structure
CN109715746B (zh) * 2016-08-18 2021-03-26 默克专利有限公司 用于自组装应用的聚合物组合物
WO2018043304A1 (ja) * 2016-09-01 2018-03-08 Jsr株式会社 基材表面の選択的修飾方法及び組成物
JP2018082033A (ja) * 2016-11-16 2018-05-24 東芝メモリ株式会社 パターン形成方法
KR102071914B1 (ko) * 2016-11-30 2020-01-31 주식회사 엘지화학 블록 공중합체
KR102097819B1 (ko) * 2016-11-30 2020-04-07 주식회사 엘지화학 블록 공중합체
WO2018101743A2 (ko) * 2016-11-30 2018-06-07 주식회사 엘지화학 적층체
WO2018101741A1 (ko) 2016-11-30 2018-06-07 주식회사 엘지화학 적층체
SG10202108825RA (en) * 2016-12-21 2021-09-29 Ridgefield Acquisition Novel compositions and processes for self-assembly of block copolymers
JP7008075B2 (ja) 2016-12-21 2022-01-25 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 金属酸化物ナノ粒子及び有機ポリマーを含むスピンオン材料の組成物
US10243156B2 (en) 2017-03-16 2019-03-26 International Business Machines Corporation Placement of carbon nanotube guided by DSA patterning
KR101947594B1 (ko) 2017-04-13 2019-02-14 주식회사 쎄코 자가치유 기능 폴리비닐계 화합물 및 이의 제조방법
CN110869442B (zh) * 2017-07-14 2022-11-22 株式会社Lg化学 中性层组合物
KR102096276B1 (ko) * 2017-07-14 2020-04-03 주식회사 엘지화학 중성층 조성물
CN107403718A (zh) * 2017-08-17 2017-11-28 中国科学院长春应用化学研究所 纳米结构的引导组装方法
JP2019099749A (ja) 2017-12-06 2019-06-24 東芝メモリ株式会社 パターン形成方法、ブロックコポリマー、及びパターン形成材料
JPWO2019131953A1 (ja) * 2017-12-27 2020-12-24 Jsr株式会社 パターン形成方法及び感放射線性組成物
CN109338332B (zh) * 2018-08-31 2021-02-26 复旦大学 一种高χ值嵌段共聚物的导向自组装方法
TWI772720B (zh) * 2018-12-07 2022-08-01 德商馬克專利公司 用於聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物之接觸孔自組裝的快速可交聯中性底層及其調配物
US10748793B1 (en) 2019-02-13 2020-08-18 X Display Company Technology Limited Printing component arrays with different orientations
US11384193B2 (en) * 2019-09-10 2022-07-12 Merck Patent Gmbh Hydrophobic pinning mat for directed self-assembly of diblock copolymer novel compositions and processes for self-assembly of block copolymers
FR3102295B1 (fr) * 2019-10-16 2021-11-12 Centre Nat Rech Scient Procédé de lithographie par auto-assemblage dirigé
FR3105786A1 (fr) * 2019-12-31 2021-07-02 Arkema France Procédé de nanostructuration d’un substrat
CN113936550B (zh) * 2020-06-29 2023-02-14 华为技术有限公司 内折屏电子设备
KR102457082B1 (ko) * 2021-03-17 2022-10-21 한국과학기술원 물리적 복제 방지용 디바이스 및 이를 포함하는 보안 모듈
EP4341310B1 (en) * 2021-05-18 2025-06-25 Merck Patent GmbH Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers
EP4388021A2 (en) * 2021-08-18 2024-06-26 Merck Patent GmbH Development of novel hydrophilic pinning mat
CN113773432B (zh) * 2021-09-27 2022-07-12 中国科学院兰州化学物理研究所 一种低介电常数形状记忆聚苯乙烯及其制备方法和应用
KR102472451B1 (ko) * 2021-11-29 2022-12-01 한국표준과학연구원 디지털 표면증강 라만분광 센싱 플랫폼

Family Cites Families (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB715913A (en) 1951-03-09 1954-09-22 Rohm & Haas Improvements in or relating to esters of vinyloxyalkoxy compounds and unsaturated carboxylic acids
FR1233582A (fr) 1959-04-20 1960-10-12 Rhone Poulenc Sa Azonitriles sulfonés
US3285949A (en) 1964-04-17 1966-11-15 Goodrich Co B F Carboxyl-terminated butadiene polymers prepared in tertiary butanol with bis-azocyano acid initiation
US3285959A (en) 1965-04-19 1966-11-15 Millmaster Onyx Corp Dodecyl-dimethyl-1, 2, 4, 5-tetramethyl-benzyl ammonium chloride
US3474054A (en) 1966-09-13 1969-10-21 Permalac Corp The Surface coating compositions containing pyridine salts or aromatic sulfonic acids
US3919077A (en) 1972-12-29 1975-11-11 Darrell Duayne Whitehurst Sorbent for removal of heavy metals
US4251665A (en) 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US4200729A (en) 1978-05-22 1980-04-29 King Industries, Inc Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts
JPS58225103A (ja) 1982-06-22 1983-12-27 Sumitomo Bakelite Co Ltd 熱可塑性樹脂の架橋方法
US4698394A (en) * 1985-12-23 1987-10-06 Shell Oil Company Reactive styrene polymers
DE3684115D1 (de) 1985-12-23 1992-04-09 Shell Int Research Olefinische benzocyclobuten-polymere und verfahren zu deren herstellung.
CA1293090C (en) 1986-09-29 1991-12-10 Pui Kwan Wong Olefinic benzocyclobutene polymers and processes for the preparation thereof
US5136029A (en) 1988-10-20 1992-08-04 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Hydrolyzable silyl group-containing azo compound
US5446125A (en) 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
US5187019A (en) 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
US5571657A (en) 1993-09-30 1996-11-05 Shipley Company, Inc. Modified cation exhange process
JP3363051B2 (ja) 1997-02-21 2003-01-07 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去法
NL1014545C2 (nl) 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
EP1095711B1 (en) 1999-10-27 2004-01-28 Novartis AG Process for coating a material surface
JP2003048929A (ja) 2001-05-29 2003-02-21 Nippon Shokubai Co Ltd 硬化性樹脂組成物
KR100924990B1 (ko) 2001-06-20 2009-11-04 니폰 가야꾸 가부시끼가이샤 불순물 함량을 감소시킨 블록 공중합체, 고분자 담체 및고분자 의약제제 및 그 제조 방법
JP2003238682A (ja) 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd ポリアミド系化合物中の金属除去方法
JP4224996B2 (ja) 2002-07-25 2009-02-18 パナソニック株式会社 撮像装置
DK1581272T3 (da) 2003-01-09 2006-10-02 Alcon Inc UV-absorbere med dobbelt funktion til oftalmiske linsematerialer
US7471614B2 (en) 2003-08-29 2008-12-30 International Business Machines Corporation High density data storage medium
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8168284B2 (en) 2005-10-06 2012-05-01 Wisconsin Alumni Research Foundation Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
US7411053B2 (en) 2006-05-25 2008-08-12 Harruna Issifu I Ligand-functionalized/azo compounds and methods of use thereof
JP2008088368A (ja) 2006-10-04 2008-04-17 Canon Inc 高分子化合物を含有する組成物の製造方法、組成物、及び液体付与方法
US7964107B2 (en) 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
KR100926697B1 (ko) * 2007-06-12 2009-11-17 연세대학교 산학협력단 온도와 조성에 의한 부피 수축 원리를 이용한 다공성 나노구조체의 기공 크기 조절
US8080615B2 (en) 2007-06-19 2011-12-20 Micron Technology, Inc. Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
US7790350B2 (en) 2007-07-30 2010-09-07 International Business Machines Corporation Method and materials for patterning a neutral surface
KR100930966B1 (ko) * 2007-09-14 2009-12-10 한국과학기술원 블록공중합체의 나노구조와 일치하지 않는 형태의 표면패턴상에 형성되는 블록공중합체의 나노구조체 및 그 제조방법
WO2009079241A2 (en) 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8017194B2 (en) 2008-01-17 2011-09-13 International Business Machines Corporation Method and material for a thermally crosslinkable random copolymer
US8999492B2 (en) 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
US7560141B1 (en) 2008-11-11 2009-07-14 International Business Machines Corporation Method of positioning patterns from block copolymer self-assembly
US8362179B2 (en) 2008-11-19 2013-01-29 Wisconsin Alumni Research Foundation Photopatternable imaging layers for controlling block copolymer microdomain orientation
US8486613B2 (en) * 2008-12-12 2013-07-16 Samsung Electronics Co., Ltd. Method of manufacturing nano-structure and method of manufacturing a pattern using the method
KR101093204B1 (ko) * 2009-02-02 2011-12-12 한국과학기술원 유기물 포토레지스트 교차패턴을 이용하여 배향이 제어된 블록공중합체의 나노구조체 및 그 제조방법
JP5431012B2 (ja) 2009-04-30 2014-03-05 株式会社ダイセル 共重合体、該共重合体を含む樹脂組成物及びその硬化物
JP5222805B2 (ja) 2009-07-09 2013-06-26 パナソニック株式会社 自己組織化パターン形成方法
US8623458B2 (en) * 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
US8309278B2 (en) 2010-07-07 2012-11-13 Massachusetts Institute Of Technology Guided self-assembly of block copolymer line structures for integrated circuit interconnects
DE102010034577B4 (de) 2010-08-17 2013-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung durchschlagfester ultradünner Dielektrika in elektronischen Bauteilen unter Verwendung vernetzbarer polymerer dielektrischer Materialien
KR101781517B1 (ko) 2010-09-30 2017-09-26 삼성디스플레이 주식회사 블록 공중합체 및 이를 이용한 패턴 형성 방법
KR101892623B1 (ko) 2011-04-29 2018-08-30 삼성디스플레이 주식회사 중성표면을 형성하기 위한 랜덤 공중합체 및 그 제조 및 사용 방법들
JP6064360B2 (ja) 2011-05-11 2017-01-25 Jsr株式会社 パターン形成方法及びレジスト下層膜形成用組成物
JP2013008951A (ja) 2011-05-26 2013-01-10 Sumitomo Chemical Co Ltd 光及び熱エネルギー架橋性有機薄膜トランジスタ絶縁層材料
JP5240380B1 (ja) 2011-07-05 2013-07-17 Jsr株式会社 樹脂組成物、重合体、硬化膜および電子部品
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
NL2009555A (en) 2011-10-03 2013-04-08 Asml Netherlands Bv Method to provide a patterned orientation template for a self-assemblable polymer.
CN104303103B (zh) 2012-02-10 2019-04-26 得克萨斯大学体系董事会 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层
US8686109B2 (en) 2012-03-09 2014-04-01 Az Electronic Materials (Luxembourg) S.A.R.L. Methods and materials for removing metals in block copolymers
US9086621B2 (en) 2012-04-20 2015-07-21 Asml Netherlands B.V. Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
US9250528B2 (en) 2012-04-27 2016-02-02 Asml Netherlands B.V. Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers
US8835581B2 (en) 2012-06-08 2014-09-16 Az Electronic Materials (Luxembourg) S.A.R.L. Neutral layer polymer composition for directed self assembly and processes thereof
US10457088B2 (en) 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using

Similar Documents

Publication Publication Date Title
JP2014528015A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP6377600B2 (ja) 誘導自己組織化のためのコポリマー調合物、その製造方法、及びそれを含む物品
CN103608396B (zh) 树脂组合物
KR101781517B1 (ko) 블록 공중합체 및 이를 이용한 패턴 형성 방법
TWI627215B (zh) 用於促進自組裝之底層組合物及製造與使用方法
JP6613339B2 (ja) 誘導自己組織化のためのコポリマー調合物、その製造方法、及びそれを含む物品
CN105722927B (zh) 用于控制包括嵌段共聚物的共混物的纳米结构化组合体的周期的方法
CN107075051A (zh) 嵌段共聚物
CN104718229B (zh) 非感光性树脂组合物
JP6958561B2 (ja) 上層膜形成組成物及び相分離パターン製造方法
TWI884931B (zh) 相分離構造形成用樹脂組成物及包含相分離構造之構造體之製造方法
JP6936449B2 (ja) 熱硬化性樹脂組成物
JP2023503546A (ja) 遷移金属イオンによって架橋され、ポリジメチルシロキサン誘導体によって結合されているポリ(ピリジン-(メタ)-アクリルアミド)誘導体のポリマー共ネットワーク
JP2022510681A (ja) ポリスチレン-b-ポリ(メチルメタクリレート)ジブロックコポリマーのコンタクトホール自己集合のための高速架橋可能な中性下層及びそれらの調合物
Jarnagin et al. PS-b-PHOST as a high X block copolymers for directed self assembly: optimization of underlayer and solvent anneal processes
JP5136744B2 (ja) 高平坦化膜形成用熱硬化性樹脂組成物
JP2016199647A (ja) 高分子ゲル及びその製造方法
CN110869442B (zh) 中性层组合物
TWI750404B (zh) 無規共聚物、層壓體、以及用於形成圖案的方法
JP6792207B2 (ja) 樹脂組成物
CN110799589A (zh) 中性层组合物
JP6618897B2 (ja) 新規ポリマー及びその製造方法
JP7697465B2 (ja) 上層膜形成組成物及び相分離パターン製造方法
Wei et al. Synthesis and morphology investigations of a novel alkyne‐functionalized diblock copolymer
CN111164146B (zh) 无规共聚物和包含其的钉扎组合物