JP2014216647A5 - - Google Patents

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JP2014216647A5
JP2014216647A5 JP2014080117A JP2014080117A JP2014216647A5 JP 2014216647 A5 JP2014216647 A5 JP 2014216647A5 JP 2014080117 A JP2014080117 A JP 2014080117A JP 2014080117 A JP2014080117 A JP 2014080117A JP 2014216647 A5 JP2014216647 A5 JP 2014216647A5
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forming
electrode
layer
resistance
oxide layer
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JP2014080117A 2013-04-29 2014-04-09 金属ドープされた抵抗切り替え層を有する抵抗変化型メモリを製造する方法 Pending JP2014216647A (ja)

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US201361817211P 2013-04-29 2013-04-29
US61/817,211 2013-04-29

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JP2014216647A JP2014216647A (ja) 2014-11-17
JP2014216647A5 true JP2014216647A5 (enExample) 2017-03-16

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JP2014080117A Pending JP2014216647A (ja) 2013-04-29 2014-04-09 金属ドープされた抵抗切り替え層を有する抵抗変化型メモリを製造する方法

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US (1) US9385164B2 (enExample)
EP (1) EP2802022A3 (enExample)
JP (1) JP2014216647A (enExample)
KR (1) KR102090221B1 (enExample)
TW (1) TWI611519B (enExample)

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