JP2012523693A5 - - Google Patents
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- JP2012523693A5 JP2012523693A5 JP2012504713A JP2012504713A JP2012523693A5 JP 2012523693 A5 JP2012523693 A5 JP 2012523693A5 JP 2012504713 A JP2012504713 A JP 2012504713A JP 2012504713 A JP2012504713 A JP 2012504713A JP 2012523693 A5 JP2012523693 A5 JP 2012523693A5
- Authority
- JP
- Japan
- Prior art keywords
- extreme ultraviolet
- chamber
- baffles
- target material
- collector mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16800009P | 2009-04-09 | 2009-04-09 | |
| US16803309P | 2009-04-09 | 2009-04-09 | |
| US16801209P | 2009-04-09 | 2009-04-09 | |
| US61/168,000 | 2009-04-09 | ||
| US61/168,033 | 2009-04-09 | ||
| US61/168,012 | 2009-04-09 | ||
| US12/725,167 US8575575B2 (en) | 2009-04-09 | 2010-03-16 | System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror |
| US12/725,167 | 2010-03-16 | ||
| PCT/US2010/029441 WO2010117859A1 (en) | 2009-04-09 | 2010-03-31 | System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012523693A JP2012523693A (ja) | 2012-10-04 |
| JP2012523693A5 true JP2012523693A5 (enExample) | 2013-05-30 |
| JP5684786B2 JP5684786B2 (ja) | 2015-03-18 |
Family
ID=42933626
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012504714A Active JP5695636B2 (ja) | 2009-04-09 | 2010-03-31 | 最適な極紫外線出力のためにターゲット材料を位置合わせ及び同期させるシステム、方法及び装置 |
| JP2012504712A Active JP5739411B2 (ja) | 2009-04-09 | 2010-03-31 | Euv生成チャンバにおけるはね返り防止のための液滴捕集器に関するシステム、方法、及び装置 |
| JP2012504713A Active JP5684786B2 (ja) | 2009-04-09 | 2010-03-31 | 熱い壁及び冷たい集光ミラーを備えたレーザ生成プラズマ極紫外チャンバのためのシステム、方法及び装置 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012504714A Active JP5695636B2 (ja) | 2009-04-09 | 2010-03-31 | 最適な極紫外線出力のためにターゲット材料を位置合わせ及び同期させるシステム、方法及び装置 |
| JP2012504712A Active JP5739411B2 (ja) | 2009-04-09 | 2010-03-31 | Euv生成チャンバにおけるはね返り防止のための液滴捕集器に関するシステム、方法、及び装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (5) | US8138487B2 (enExample) |
| JP (3) | JP5695636B2 (enExample) |
| KR (3) | KR101702413B1 (enExample) |
| TW (4) | TWI563880B (enExample) |
| WO (3) | WO2010117858A1 (enExample) |
Families Citing this family (92)
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| JP6080481B2 (ja) * | 2012-01-26 | 2017-02-15 | ギガフォトン株式会社 | 極端紫外光生成装置 |
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| JP7328046B2 (ja) * | 2019-07-25 | 2023-08-16 | ギガフォトン株式会社 | Euvチャンバ装置、極端紫外光生成システム、及び電子デバイスの製造方法 |
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