JP2012104817A - はんだ上での酸化物の生成を抑制する方法 - Google Patents
はんだ上での酸化物の生成を抑制する方法 Download PDFInfo
- Publication number
- JP2012104817A JP2012104817A JP2011238431A JP2011238431A JP2012104817A JP 2012104817 A JP2012104817 A JP 2012104817A JP 2011238431 A JP2011238431 A JP 2011238431A JP 2011238431 A JP2011238431 A JP 2011238431A JP 2012104817 A JP2012104817 A JP 2012104817A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- chamber
- bonding
- substrate
- solder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
- B23K1/206—Cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
- B23K1/0016—Brazing of electronic components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/008—Soldering within a furnace
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
- B23K1/203—Fluxing, i.e. applying flux onto surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/04—Heating appliances
- B23K3/047—Heating appliances electric
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/08—Auxiliary devices therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/741—Apparatus for manufacturing means for bonding, e.g. connectors
- H01L24/742—Apparatus for manufacturing bump connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/273—Manufacturing methods by local deposition of the material of the layer connector
- H01L2224/2731—Manufacturing methods by local deposition of the material of the layer connector in liquid form
- H01L2224/27318—Manufacturing methods by local deposition of the material of the layer connector in liquid form by dispensing droplets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/273—Manufacturing methods by local deposition of the material of the layer connector
- H01L2224/2733—Manufacturing methods by local deposition of the material of the layer connector in solid form
- H01L2224/27334—Manufacturing methods by local deposition of the material of the layer connector in solid form using preformed layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/274—Manufacturing methods by blanket deposition of the material of the layer connector
- H01L2224/27444—Manufacturing methods by blanket deposition of the material of the layer connector in gaseous form
- H01L2224/2745—Physical vapour deposition [PVD], e.g. evaporation, or sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/274—Manufacturing methods by blanket deposition of the material of the layer connector
- H01L2224/2746—Plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/278—Post-treatment of the layer connector
- H01L2224/2781—Cleaning, e.g. oxide removal step, desmearing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/278—Post-treatment of the layer connector
- H01L2224/2782—Applying permanent coating, e.g. in-situ coating
- H01L2224/27826—Physical vapour deposition [PVD], e.g. evaporation, or sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29144—Gold [Au] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7501—Means for cleaning, e.g. brushes, for hydro blasting, for ultrasonic cleaning, for dry ice blasting, using gas-flow, by etching, by applying flux or plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/751—Means for controlling the bonding environment, e.g. valves, vacuum pumps
- H01L2224/75101—Chamber
- H01L2224/75102—Vacuum chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83009—Pre-treatment of the layer connector or the bonding area
- H01L2224/8301—Cleaning the layer connector, e.g. oxide removal step, desmearing
- H01L2224/83013—Plasma cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/832—Applying energy for connecting
- H01L2224/83201—Compression bonding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8338—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/83399—Material
- H01L2224/834—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
- H01L2224/83815—Reflow soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/146—Mixed devices
- H01L2924/1461—MEMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Wire Bonding (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
【解決手段】ある実施例では、システムは、堆積システム及びプラズマ/ボンディングシステムを有する。当該堆積システムは、多数の基板のうちの1つの基板表面にはんだを堆積する。当該プラズマ/ボンディングシステムは、前記基板をプラズマ洗浄するプラズマシステム、及び、前記基板のボンディングを行うボンディングシステムを有する。当該プラズマ/ボンディングシステムは、前記はんだの再酸化を少なくとも緩和する。ある実施例では、基板表面にはんだを堆積する工程、前記基板から金属酸化物を除去する工程、及び、前記基板の表目にキャップ層を堆積することで、前記はんだの再酸化を少なくとも緩和する工程を有する。
【選択図】図3
Description
20 プリントシステム
24 プラズマ/ボンディングシステム
26 堆積システム
30 プラズマ/ボンディングチャンバ
34 プラズマチャンバ
36 ロードロックモジュール
38 ボンディングチャンバ
40 チャンバ
50 プラズマ/ボンディングシステム
60 気体入口
62 電極
64 真空ポンプ
66 支持体
68 ボンディングプレート
Claims (20)
- 複数の基板のうち少なくとも1つの基板の表面にはんだを堆積する堆積システム;及び、
プラズマ/ボンディングシステム;
を有するシステムであって、
前記プラズマ/ボンディングシステムは:
前記少なくとも1つの基板をプラズマ洗浄するプラズマシステム;及び、
前記複数の基板をボンディングするボンディングシステム;
を有し、
前記ボンディングシステムは、前記はんだの再酸化を少なくとも抑制する、
システム。 - 前記プラズマ/ボンディングシステムが、
前記少なくとも1つの基板がプラズマ洗浄され、かつ前記複数の基板がボンディングされる、チャンバを有する、
請求項1に記載のシステム。 - 前記プラズマ/ボンディングシステムが:
前記少なくとも1つの基板がプラズマ洗浄されるプラズマチャンバ;及び、
前記複数の基板がボンディングされるボンディングチャンバ;
を有し、
前記ボンディングチャンバは、前記プラズマチャンバと結合する、
請求項1に記載のシステム。 - 前記プラズマ/ボンディングシステムが:
前記少なくとも1つの基板がプラズマ洗浄されるプラズマチャンバ;
前記複数の基板がボンディングされるボンディングチャンバ;及び、
実質的な真空下で、前記プラズマチャンバ及びボンディングチャンバと結合するロードロックモジュール;
を有する、
請求項1に記載のシステム。 - 前記プラズマ/ボンディングシステムが:
内部が実質的に真空である真空チャンバ;
前記少なくとも1つの基板がプラズマ洗浄される、前記真空チャンバ内部に設けられたプラズマチャンバ;及び、
前記複数の基板がボンディングされる、前記真空チャンバ内部に設けられたボンディングチャンバ;
を有する、
請求項1に記載のシステム。 - 前記プラズマ/ボンディングシステムが:
窒素気体を用いて、酸素気体を前記窒素チャンバ外部へ押し出す窒素チャンバ;
前記少なくとも1つの基板がプラズマ洗浄される、前記窒素チャンバ内部に設けられたプラズマチャンバ;及び、
前記複数の基板がボンディングされる、前記窒素チャンバ内部に設けられたボンディングチャンバ;
を有する、
請求項1に記載のシステム。 - 前記プラズマ/ボンディングシステムが:
内部が実質的に真空である真空チャンバ;
前記少なくとも1つの基板がプラズマ洗浄される、前記真空チャンバ内部に設けられたプラズマチャンバ;
前記複数の基板がボンディングされる、前記真空チャンバ内部に設けられたボンディングチャンバ;及び、
前記プラズマチャンバ及びボンディングチャンバと結合するモジュール;
を有する、
請求項1に記載のシステム。 - 複数の基板のうち少なくとも1つの基板の表面にはんだを堆積する工程;
前記少なくとも1つの基板をプラズマ洗浄する工程;
前記はんだの再酸化を少なくとも抑制する工程;及び、
前記複数の基板のボンディングを行う工程;
を有する方法。 - 前記のはんだの再酸化を少なくとも抑制する工程が:
前記少なくとも1つの基板をチャンバ内でプラズマ洗浄する工程;及び、
前記複数の基板のボンディングを前記チャンバ内で行う工程;
を有する、
請求項8に記載の方法。 - 前記のはんだの再酸化を少なくとも抑制する工程が:
前記少なくとも1つの基板をプラズマチャンバ内でプラズマ洗浄する工程;及び、
前記複数の基板のボンディングを、前記プラズマチャンバと結合するボンディングチャンバ内で行う工程;
を有する、
請求項8に記載の方法。 - 前記のはんだの再酸化を少なくとも抑制する工程が:
前記少なくとも1つの基板をプラズマチャンバ内でプラズマ洗浄する工程;
前記少なくとも1つの基板を、ロードロックモジュールを介して、ボンディングチャンバへ搬送する工程であって、前記ロードロックモジュールは、実質的な真空下で前記プラズマチャンバ及び前記ボンディングチャンバと結合する、工程;並びに、
前記複数の基板のボンディングを前記チャンバ内で行う工程;
を有する、
請求項8に記載の方法。 - 前記のはんだの再酸化を少なくとも抑制する工程が:
内部が実質的に真空である真空チャンバ内に設けられたプラズマチャンバ内で前記少なくとも1つの基板をプラズマ洗浄する工程;及び、
前記真空チャンバ内に設けられたボンディングチャンバ内で複数の基板のボンディングを行う工程;
を有する、
請求項8に記載の方法。 - 前記のはんだの再酸化を少なくとも抑制する工程が:
窒素チャンバ内部に設けられたプラズマチャンバ内で前記少なくとも1つの基板をプラズマ洗浄する工程であって、前記窒素チャンバは、窒素気体を用いて、酸素気体を前記窒素チャンバ外部へ押し出す、工程;及び、
前記窒素チャンバ内に設けられたボンディングチャンバ内で複数の基板のボンディングを行う工程;
を有する、
請求項8に記載の方法。 - 第1基板の表面にはんだを堆積する工程;
前記第1基板から金属酸化物を除去する工程;及び、
前記第1基板の表面にキャップ層を堆積することで、前記はんだの再酸化を少なくとも抑制する工程;
を有する方法。 - 前記第1基板と第2基板とをボンディングする工程をさらに有する、請求項14に記載の方法。
- 前記の第1基板と第2基板とをボンディングする工程の前に、前記第1基板を大気曝露することを可能にする工程をさらに有する、請求項14に記載の方法。
- 前記キャップ層が金を有する、請求項14に記載の方法。
- 第1基板の表面にはんだを堆積する堆積システム;及び、
プラズマ/ボンディングシステム;
を有するシステムであって、
前記プラズマ/ボンディングシステムは、
前記第1基板からの金属酸化物を除去し、かつ、
前記第1基板の表面にキャップ層を堆積することで、前記はんだの再酸化を少なくとも抑制する、
システム。 - 前記プラズマ/ボンディングシステムが、前記第1基板と第2基板とをボンディングする、請求項18に記載のシステム。
- 前記プラズマ/ボンディングシステムが、前記第1基板と第2基板とをボンディングする前に、前記第1基板を大気曝露することを可能にする、請求項18に記載のシステム。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US41045410P | 2010-11-05 | 2010-11-05 | |
US61/410,454 | 2010-11-05 | ||
US13/231,749 US8844793B2 (en) | 2010-11-05 | 2011-09-13 | Reducing formation of oxide on solder |
US13/231,749 | 2011-09-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012104817A true JP2012104817A (ja) | 2012-05-31 |
JP6157799B2 JP6157799B2 (ja) | 2017-07-05 |
Family
ID=45855145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011238431A Active JP6157799B2 (ja) | 2010-11-05 | 2011-10-31 | はんだ上での酸化物の生成を抑制する方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US8844793B2 (ja) |
JP (1) | JP6157799B2 (ja) |
DE (1) | DE102011116233B4 (ja) |
FR (1) | FR2967297B1 (ja) |
IL (1) | IL215681A (ja) |
TW (1) | TWI541909B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015056661A (ja) * | 2013-09-11 | 2015-03-23 | エーエスエム・テクノロジー・シンガポール・ピーティーイー・リミテッド | 活性化フォーミングガスを利用するダイ取付装置及び方法 |
KR20160058816A (ko) * | 2013-09-25 | 2016-05-25 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5442394B2 (ja) * | 2009-10-29 | 2014-03-12 | ソニー株式会社 | 固体撮像装置とその製造方法、及び電子機器 |
US8844793B2 (en) | 2010-11-05 | 2014-09-30 | Raytheon Company | Reducing formation of oxide on solder |
JP2013074093A (ja) * | 2011-09-28 | 2013-04-22 | Renesas Electronics Corp | リフロー前処理装置およびリフロー前処理方法 |
AT16645U1 (de) * | 2012-05-30 | 2020-04-15 | Ev Group E Thallner Gmbh | Vorrichtung und Verfahren zum Bonden von Substraten |
WO2014115702A1 (ja) * | 2013-01-24 | 2014-07-31 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理装置および記録媒体 |
US9570321B1 (en) | 2015-10-20 | 2017-02-14 | Raytheon Company | Use of an external getter to reduce package pressure |
JP6673268B2 (ja) * | 2017-03-14 | 2020-03-25 | オムロン株式会社 | 管理装置、管理装置の制御方法、情報処理プログラム、および記録媒体 |
JP6538894B2 (ja) * | 2018-01-10 | 2019-07-03 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板同士をボンディングする方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63293952A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Ltd | 半導体素子接続端子形成方法 |
JPH02253626A (ja) * | 1989-03-27 | 1990-10-12 | Shimadzu Corp | 半導体チップの実装方法 |
JPH11163036A (ja) * | 1997-09-17 | 1999-06-18 | Tamura Seisakusho Co Ltd | バンプ形成方法、はんだ接合用前処理方法、はんだ接合方法、バンプ形成装置、はんだ接合用前処理装置およびはんだ接合装置 |
JP2002050651A (ja) * | 2000-08-04 | 2002-02-15 | Toray Eng Co Ltd | 実装方法 |
JP2003124612A (ja) * | 2001-10-18 | 2003-04-25 | Matsushita Electric Ind Co Ltd | 減圧プラズマ処理装置及びその方法 |
JP2003318220A (ja) * | 2002-04-26 | 2003-11-07 | Toray Eng Co Ltd | 実装方法および実装装置 |
JP2007027346A (ja) * | 2005-07-15 | 2007-02-01 | Sony Corp | 半導体装置の製造方法および製造装置 |
JP2009105254A (ja) * | 2007-10-24 | 2009-05-14 | Bondtech Inc | 接合方法およびこの方法により作成されるデバイス並びに接合装置 |
Family Cites Families (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1177097A1 (ru) * | 1982-12-24 | 1985-09-07 | Inst Elektroniki An Bssr | "cпocoб пaйkи иhteгpaльhыx mиkpocxem" |
DE4032328A1 (de) * | 1989-11-06 | 1991-09-19 | Wls Karl Heinz Grasmann Weichl | Verfahren und vorrichtung zur verarbeitung von zu verloetenden fuegepartnern |
DE4041270A1 (de) * | 1990-12-21 | 1992-06-25 | Grasmann Karl Heinz Wls | Verfahren und vorrichtung zur verarbeitung von elektronischen flachbaugruppen, insbesondere mit bauelementen bestueckten leiterplatten |
JP2827558B2 (ja) * | 1991-04-09 | 1998-11-25 | 松下電器産業株式会社 | ワイヤボンディング装置およびワイヤボンディング方法 |
US5223691A (en) * | 1991-06-03 | 1993-06-29 | Motorola, Inc. | Plasma based soldering method requiring no additional heat sources or flux |
DE4225378A1 (de) * | 1992-03-20 | 1993-09-23 | Linde Ag | Verfahren zum verloeten von leiterplatten unter niederdruck |
JP3206142B2 (ja) * | 1992-10-15 | 2001-09-04 | 松下電器産業株式会社 | ワイヤボンディング装置及びワイヤボンディング方法 |
US5403459A (en) * | 1993-05-17 | 1995-04-04 | Applied Materials, Inc. | Cleaning of a PVD chamber containing a collimator |
JP3189828B2 (ja) * | 1995-11-24 | 2001-07-16 | 松下電器産業株式会社 | 回路モジュールの製造方法 |
JP3201302B2 (ja) * | 1997-02-10 | 2001-08-20 | 松下電器産業株式会社 | 基板のプラズマクリーニング装置 |
US5843239A (en) * | 1997-03-03 | 1998-12-01 | Applied Materials, Inc. | Two-step process for cleaning a substrate processing chamber |
US20060258176A1 (en) * | 1998-02-05 | 2006-11-16 | Asm Japan K.K. | Method for forming insulation film |
US6230719B1 (en) * | 1998-02-27 | 2001-05-15 | Micron Technology, Inc. | Apparatus for removing contaminants on electronic devices |
US6742701B2 (en) | 1998-09-17 | 2004-06-01 | Kabushiki Kaisha Tamura Seisakusho | Bump forming method, presoldering treatment method, soldering method, bump forming apparatus, presoldering treatment device and soldering apparatus |
JP3400408B2 (ja) | 2000-04-25 | 2003-04-28 | 株式会社タムラ製作所 | フリップチップ実装方法 |
US20020011205A1 (en) * | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
JP4016598B2 (ja) * | 2001-01-16 | 2007-12-05 | 株式会社日立製作所 | 半導体装置の製造方法 |
US6756560B2 (en) * | 2001-11-19 | 2004-06-29 | Geomat Insights, L.L.C. | Plasma enhanced circuit component attach method and device |
US6935553B2 (en) | 2002-04-16 | 2005-08-30 | Senju Metal Industry Co., Ltd. | Reflow soldering method |
JP4233802B2 (ja) * | 2002-04-26 | 2009-03-04 | 東レエンジニアリング株式会社 | 実装方法および実装装置 |
JP2004119430A (ja) * | 2002-09-24 | 2004-04-15 | Tadatomo Suga | 接合装置および方法 |
KR100521081B1 (ko) | 2002-10-12 | 2005-10-14 | 삼성전자주식회사 | 플립 칩의 제조 및 실장 방법 |
US7387738B2 (en) | 2003-04-28 | 2008-06-17 | Air Products And Chemicals, Inc. | Removal of surface oxides by electron attachment for wafer bumping applications |
JP3980539B2 (ja) * | 2003-08-29 | 2007-09-26 | 唯知 須賀 | 基板接合方法、照射方法、および基板接合装置 |
US7645681B2 (en) * | 2003-12-02 | 2010-01-12 | Bondtech, Inc. | Bonding method, device produced by this method, and bonding device |
JP4919604B2 (ja) * | 2004-02-16 | 2012-04-18 | ボンドテック株式会社 | 接合方法及び接合装置 |
US7611322B2 (en) * | 2004-11-18 | 2009-11-03 | Intevac, Inc. | Processing thin wafers |
JP2006222381A (ja) | 2005-02-14 | 2006-08-24 | Olympus Corp | 電子部品の実装方法及びその製造装置 |
JP4742844B2 (ja) | 2005-12-15 | 2011-08-10 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP4671900B2 (ja) * | 2006-04-06 | 2011-04-20 | パナソニック株式会社 | 接合方法および接合装置 |
JP2006279062A (ja) | 2006-05-25 | 2006-10-12 | Nec Corp | 半導体素子および半導体装置 |
JP4783222B2 (ja) * | 2006-06-28 | 2011-09-28 | 株式会社ケミトロニクス | 接合装置 |
FR2911003B1 (fr) * | 2006-12-28 | 2009-10-02 | Cnes Epic | Procede et installation de mise a nu de la surface d'un circuit integre |
KR100936778B1 (ko) * | 2007-06-01 | 2010-01-14 | 주식회사 엘트린 | 웨이퍼 본딩방법 |
US20120132522A1 (en) * | 2007-07-19 | 2012-05-31 | Innovative Micro Technology | Deposition/bonding chamber for encapsulated microdevices and method of use |
KR20100051647A (ko) | 2007-07-24 | 2010-05-17 | 스미또모 가가꾸 가부시키가이샤 | 반도체 장치, 반도체 장치의 제조 방법, 고 캐리어 이동도 트랜지스터 및 발광 장치 |
JP2009094115A (ja) * | 2007-10-04 | 2009-04-30 | Hitachi Kokusai Electric Inc | 半導体装置の製造方法 |
JP4369507B2 (ja) * | 2007-12-07 | 2009-11-25 | 株式会社新川 | ボンディング装置及びボンディング方法 |
JP5297048B2 (ja) * | 2008-01-28 | 2013-09-25 | 三菱重工業株式会社 | プラズマ処理方法及びプラズマ処理装置 |
US8048723B2 (en) | 2008-12-05 | 2011-11-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Germanium FinFETs having dielectric punch-through stoppers |
CN102123811A (zh) * | 2008-08-14 | 2011-07-13 | 日立金属株式会社 | 熔融金属供给筒、内置了该供给筒的熔融金属供给装置和熔融金属供给方法 |
FR2961630B1 (fr) * | 2010-06-22 | 2013-03-29 | Soitec Silicon On Insulator Technologies | Appareil de fabrication de dispositifs semi-conducteurs |
JP2012009597A (ja) | 2010-06-24 | 2012-01-12 | Elpida Memory Inc | 半導体デバイスの製造方法および半導体デバイスの製造装置 |
CA2719927C (en) * | 2010-11-05 | 2014-04-29 | Ibm Canada Limited - Ibm Canada Limitee | Laser ashing of polyimide for semiconductor manufacturing |
US8844793B2 (en) | 2010-11-05 | 2014-09-30 | Raytheon Company | Reducing formation of oxide on solder |
US20120237693A1 (en) * | 2011-03-17 | 2012-09-20 | Applied Materials, Inc. | In-situ clean process for metal deposition chambers |
KR20140023807A (ko) * | 2012-08-17 | 2014-02-27 | 삼성전자주식회사 | 반도체 소자를 제조하는 설비 |
-
2011
- 2011-09-13 US US13/231,749 patent/US8844793B2/en active Active
- 2011-10-04 TW TW100135872A patent/TWI541909B/zh active
- 2011-10-10 IL IL215681A patent/IL215681A/en active IP Right Grant
- 2011-10-17 DE DE102011116233.3A patent/DE102011116233B4/de active Active
- 2011-10-31 JP JP2011238431A patent/JP6157799B2/ja active Active
- 2011-11-04 FR FR1159998A patent/FR2967297B1/fr active Active
-
2014
- 2014-08-26 US US14/468,660 patent/US9132496B2/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63293952A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Ltd | 半導体素子接続端子形成方法 |
JPH02253626A (ja) * | 1989-03-27 | 1990-10-12 | Shimadzu Corp | 半導体チップの実装方法 |
JPH11163036A (ja) * | 1997-09-17 | 1999-06-18 | Tamura Seisakusho Co Ltd | バンプ形成方法、はんだ接合用前処理方法、はんだ接合方法、バンプ形成装置、はんだ接合用前処理装置およびはんだ接合装置 |
JP2002050651A (ja) * | 2000-08-04 | 2002-02-15 | Toray Eng Co Ltd | 実装方法 |
JP2003124612A (ja) * | 2001-10-18 | 2003-04-25 | Matsushita Electric Ind Co Ltd | 減圧プラズマ処理装置及びその方法 |
JP2003318220A (ja) * | 2002-04-26 | 2003-11-07 | Toray Eng Co Ltd | 実装方法および実装装置 |
JP2007027346A (ja) * | 2005-07-15 | 2007-02-01 | Sony Corp | 半導体装置の製造方法および製造装置 |
JP2009105254A (ja) * | 2007-10-24 | 2009-05-14 | Bondtech Inc | 接合方法およびこの方法により作成されるデバイス並びに接合装置 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015056661A (ja) * | 2013-09-11 | 2015-03-23 | エーエスエム・テクノロジー・シンガポール・ピーティーイー・リミテッド | 活性化フォーミングガスを利用するダイ取付装置及び方法 |
KR20160058816A (ko) * | 2013-09-25 | 2016-05-25 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
JP2016540367A (ja) * | 2013-09-25 | 2016-12-22 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板をボンディングする装置および方法 |
US9899223B2 (en) | 2013-09-25 | 2018-02-20 | Ev Group E. Thallner Gmbh | Apparatus and method for bonding substrates including changing a stoichiometry of oxide layers formed on the substrates |
US10438798B2 (en) | 2013-09-25 | 2019-10-08 | Ev Group E. Thallner Gmbh | Apparatus and method for bonding substrates |
KR102182791B1 (ko) * | 2013-09-25 | 2020-11-26 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
KR20200133282A (ko) * | 2013-09-25 | 2020-11-26 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
US11139170B2 (en) | 2013-09-25 | 2021-10-05 | Ev Group E. Thallner Gmbh | Apparatus and method for bonding substrates |
KR102323040B1 (ko) | 2013-09-25 | 2021-11-08 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
KR20210135624A (ko) * | 2013-09-25 | 2021-11-15 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
KR102420245B1 (ko) | 2013-09-25 | 2022-07-13 | 에베 그룹 에. 탈너 게엠베하 | 기판 본딩 장치 및 방법 |
Also Published As
Publication number | Publication date |
---|---|
DE102011116233A1 (de) | 2012-05-10 |
US9132496B2 (en) | 2015-09-15 |
US20120111925A1 (en) | 2012-05-10 |
DE102011116233B4 (de) | 2022-12-08 |
FR2967297B1 (fr) | 2018-02-02 |
TWI541909B (zh) | 2016-07-11 |
JP6157799B2 (ja) | 2017-07-05 |
US8844793B2 (en) | 2014-09-30 |
IL215681A (en) | 2016-07-31 |
FR2967297A1 (fr) | 2012-05-11 |
IL215681A0 (en) | 2012-02-29 |
TW201227843A (en) | 2012-07-01 |
US20150076216A1 (en) | 2015-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6157799B2 (ja) | はんだ上での酸化物の生成を抑制する方法 | |
JP4219927B2 (ja) | 基板保持機構およびその製造方法、基板処理装置 | |
US8163094B1 (en) | Method to improve indium bump bonding via indium oxide removal using a multi-step plasma process | |
US9150969B2 (en) | Method of etching metal layer | |
JP6066569B2 (ja) | 半導体デバイスパッケージング用のパッシベーション層 | |
TW201628082A (zh) | 電漿蝕刻裝置 | |
JP2002270609A (ja) | 半導体装置の製造方法及び半導体装置の製造装置 | |
JP4833088B2 (ja) | 高温リフロースパッタリング装置 | |
JP4709336B2 (ja) | 回路上のソルダ・バンプを清浄するためのプラズマ活性化nf3の使用 | |
WO2020241047A1 (ja) | 接合方法及び構造体 | |
EP2419927A1 (en) | Enhanced focused ion beam etching of dielectrics and silicon | |
JP2003124308A (ja) | 金属配線のコンタクト領域の洗浄方法 | |
TWI638405B (zh) | 預清洗半導體結構之方法 | |
JP4228424B2 (ja) | 半導体装置の製造方法 | |
JP4873321B2 (ja) | はんだバンプの形成方法 | |
JP4833014B2 (ja) | 高温リフロースパッタリング装置 | |
EP4375394A1 (en) | Method of operating a pvd apparatus | |
JP3366002B2 (ja) | エッチング液及びそれを使用したエッチング方法 | |
KR100657762B1 (ko) | 반도체 소자의 제조 방법 | |
KR20230103914A (ko) | Pvd 장치를 동작시키는 방법 | |
WO2019138580A1 (ja) | 表示デバイスの製造方法および蒸着マスクのクリーニング方法並びにリンス液 | |
CN100466223C (zh) | 形成铜线的方法 | |
KR0168890B1 (ko) | 알루미늄배선의 반도체장치의 제조방법 | |
JPH04263423A (ja) | 連続処理エッチング方法及びその装置 | |
JP2004266066A (ja) | Cvd装置、半導体装置及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130718 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20140207 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140218 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140507 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140512 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140616 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140619 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140718 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140724 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140818 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150120 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150417 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20150811 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20151208 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20151215 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20160108 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170321 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170607 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6157799 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |