JP2011530652A5 - - Google Patents

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JP2011530652A5
JP2011530652A5 JP2011522047A JP2011522047A JP2011530652A5 JP 2011530652 A5 JP2011530652 A5 JP 2011530652A5 JP 2011522047 A JP2011522047 A JP 2011522047A JP 2011522047 A JP2011522047 A JP 2011522047A JP 2011530652 A5 JP2011530652 A5 JP 2011530652A5
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acrylate
meth
carboxylate
metal
group
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JP2011522047A
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JP2011530652A (ja
JP6004649B2 (ja
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Priority claimed from PCT/US2009/003841 external-priority patent/WO2010059174A1/en
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JP2011522047A 2008-08-07 2009-06-27 金属組成物及びその製法 Active JP6004649B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18818208P 2008-08-07 2008-08-07
US61/188,182 2008-08-07
PCT/US2009/003841 WO2010059174A1 (en) 2008-08-07 2009-06-27 Metal compositions and methods of making same

Publications (3)

Publication Number Publication Date
JP2011530652A JP2011530652A (ja) 2011-12-22
JP2011530652A5 true JP2011530652A5 (cg-RX-API-DMAC7.html) 2012-08-16
JP6004649B2 JP6004649B2 (ja) 2016-10-12

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JP2011522047A Active JP6004649B2 (ja) 2008-08-07 2009-06-27 金属組成物及びその製法

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US (1) US8802346B2 (cg-RX-API-DMAC7.html)
EP (1) EP2326744B1 (cg-RX-API-DMAC7.html)
JP (1) JP6004649B2 (cg-RX-API-DMAC7.html)
TW (1) TWI547528B (cg-RX-API-DMAC7.html)
WO (1) WO2010059174A1 (cg-RX-API-DMAC7.html)

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JP7334684B2 (ja) 2019-08-02 2023-08-29 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP7334683B2 (ja) 2019-08-02 2023-08-29 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
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JP7351257B2 (ja) 2019-08-14 2023-09-27 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP7354954B2 (ja) 2019-09-04 2023-10-03 信越化学工業株式会社 レジスト材料及びパターン形成方法
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JP7622544B2 (ja) 2020-05-18 2025-01-28 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
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