JP2011530652A5 - - Google Patents
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- Publication number
- JP2011530652A5 JP2011530652A5 JP2011522047A JP2011522047A JP2011530652A5 JP 2011530652 A5 JP2011530652 A5 JP 2011530652A5 JP 2011522047 A JP2011522047 A JP 2011522047A JP 2011522047 A JP2011522047 A JP 2011522047A JP 2011530652 A5 JP2011530652 A5 JP 2011530652A5
- Authority
- JP
- Japan
- Prior art keywords
- acrylate
- meth
- carboxylate
- metal
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 59
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- -1 oxy, thio Chemical group 0.000 claims description 16
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052758 niobium Inorganic materials 0.000 claims description 8
- 239000010955 niobium Substances 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- 239000002243 precursor Substances 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- JRALHSJVDAZMAH-UHFFFAOYSA-N C(C=C)(=O)O[GeH3] Chemical compound C(C=C)(=O)O[GeH3] JRALHSJVDAZMAH-UHFFFAOYSA-N 0.000 claims description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- IEZZIYKTEBHBRQ-UHFFFAOYSA-L but-3-enoate hafnium(4+) oxygen(2-) Chemical compound C(=C)CC(=O)[O-].C(=C)CC(=O)[O-].[O-2].[Hf+4] IEZZIYKTEBHBRQ-UHFFFAOYSA-L 0.000 claims description 3
- HXDFSRUSLMZJEN-UHFFFAOYSA-L but-3-enoate oxygen(2-) titanium(4+) Chemical compound C(=C)CC(=O)[O-].C(=C)CC(=O)[O-].[O-2].[Ti+4] HXDFSRUSLMZJEN-UHFFFAOYSA-L 0.000 claims description 3
- IJBFRXAGQXANTD-UHFFFAOYSA-N ethenyl acetate;hafnium Chemical compound [Hf].CC(=O)OC=C IJBFRXAGQXANTD-UHFFFAOYSA-N 0.000 claims description 3
- DCDITIFKQFNPHX-UHFFFAOYSA-N ethenyl acetate;titanium Chemical compound [Ti].CC(=O)OC=C DCDITIFKQFNPHX-UHFFFAOYSA-N 0.000 claims description 3
- LIIWPMGRDQVHJQ-UHFFFAOYSA-N ethenyl acetate;zirconium Chemical compound [Zr].CC(=O)OC=C LIIWPMGRDQVHJQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910000078 germane Inorganic materials 0.000 claims description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- UCXFJGMSJQNRDJ-UHFFFAOYSA-J 2-bromo-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylate hafnium(4+) Chemical compound [Hf+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br UCXFJGMSJQNRDJ-UHFFFAOYSA-J 0.000 claims description 2
- VXCWFNCPUBWGJG-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid zirconium Chemical compound [Zr].OC(=O)CCOC(=O)C=C.OC(=O)CCOC(=O)C=C.OC(=O)CCOC(=O)C=C.OC(=O)CCOC(=O)C=C VXCWFNCPUBWGJG-UHFFFAOYSA-N 0.000 claims description 2
- ZSSWJEIYDJGJRA-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid;tantalum Chemical compound [Ta].OC(=O)CCOC(=O)C=C ZSSWJEIYDJGJRA-UHFFFAOYSA-N 0.000 claims description 2
- QSAWSTOTHRARBS-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid;titanium Chemical compound [Ti].OC(=O)CCOC(=O)C=C QSAWSTOTHRARBS-UHFFFAOYSA-N 0.000 claims description 2
- MABJZCQTALLEGQ-UHFFFAOYSA-N C(CCC)O[Ge](OC(C(=C)C)=O)(OC(C(=C)C)=O)OCCCC Chemical compound C(CCC)O[Ge](OC(C(=C)C)=O)(OC(C(=C)C)=O)OCCCC MABJZCQTALLEGQ-UHFFFAOYSA-N 0.000 claims description 2
- UYKLIWZPRMRNDQ-IITHXBDYSA-J C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Zr+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] Chemical compound C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Zr+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] UYKLIWZPRMRNDQ-IITHXBDYSA-J 0.000 claims description 2
- BZWCKTVNRBTCQP-YZUKSGEXSA-N CC(C)([C@H](CC1)CC2=O)[C@@]12OS(C)(=O)=O.SC1=CC2=CC=CC=C2C=C1 Chemical compound CC(C)([C@H](CC1)CC2=O)[C@@]12OS(C)(=O)=O.SC1=CC2=CC=CC=C2C=C1 BZWCKTVNRBTCQP-YZUKSGEXSA-N 0.000 claims description 2
- QBCQKFGJPPBHLN-UHFFFAOYSA-I [Ta+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Ta+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br QBCQKFGJPPBHLN-UHFFFAOYSA-I 0.000 claims description 2
- XYHFOGFBDCDCBS-UHFFFAOYSA-I [Ta+5].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 Chemical compound [Ta+5].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 XYHFOGFBDCDCBS-UHFFFAOYSA-I 0.000 claims description 2
- FDBUONQYVUSEGA-UHFFFAOYSA-J [Ti+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Ti+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br FDBUONQYVUSEGA-UHFFFAOYSA-J 0.000 claims description 2
- SRSZLIFGDFXEBE-UHFFFAOYSA-J [Ti+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 Chemical compound [Ti+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 SRSZLIFGDFXEBE-UHFFFAOYSA-J 0.000 claims description 2
- GRNSGUXSBNAART-UHFFFAOYSA-J [Zr+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 Chemical compound [Zr+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 GRNSGUXSBNAART-UHFFFAOYSA-J 0.000 claims description 2
- AMRRNBRZCNLQBA-UHFFFAOYSA-K aluminum 2-bromo-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylate Chemical compound [Al+3].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br AMRRNBRZCNLQBA-UHFFFAOYSA-K 0.000 claims description 2
- NPPKLNJUOJIWFW-UHFFFAOYSA-K bis(3-oxatricyclo[3.2.1.02,4]octane-6-carbonyloxy)alumanyl 3-oxatricyclo[3.2.1.02,4]octane-6-carboxylate Chemical compound [Al+3].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 NPPKLNJUOJIWFW-UHFFFAOYSA-K 0.000 claims description 2
- CKEGKURXFKLBDX-UHFFFAOYSA-N butan-1-ol;hafnium Chemical compound [Hf].CCCCO.CCCCO.CCCCO.CCCCO CKEGKURXFKLBDX-UHFFFAOYSA-N 0.000 claims description 2
- PVZMSIQWTGPSHJ-UHFFFAOYSA-N butan-1-ol;tantalum Chemical compound [Ta].CCCCO.CCCCO.CCCCO.CCCCO.CCCCO PVZMSIQWTGPSHJ-UHFFFAOYSA-N 0.000 claims description 2
- DINQVNXOZUORJS-UHFFFAOYSA-N butan-1-olate;niobium(5+) Chemical compound [Nb+5].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] DINQVNXOZUORJS-UHFFFAOYSA-N 0.000 claims description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 claims description 2
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 claims description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 claims description 2
- NSANGDPBUXTZLU-UHFFFAOYSA-N ethenyl acetate;niobium Chemical compound [Nb].CC(=O)OC=C NSANGDPBUXTZLU-UHFFFAOYSA-N 0.000 claims description 2
- CEWRRSHXODUOEA-UHFFFAOYSA-N ethenyl acetate;tantalum Chemical compound [Ta].CC(=O)OC=C CEWRRSHXODUOEA-UHFFFAOYSA-N 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- OKOAUMOHCRQSOV-UHFFFAOYSA-J hafnium(4+) 3-oxatricyclo[3.2.1.02,4]octane-6-carboxylate Chemical compound [Hf+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 OKOAUMOHCRQSOV-UHFFFAOYSA-J 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- AWGVROXZUWZNIG-UHFFFAOYSA-N hafnium;3-prop-2-enoyloxypropanoic acid Chemical compound [Hf].OC(=O)CCOC(=O)C=C AWGVROXZUWZNIG-UHFFFAOYSA-N 0.000 claims description 2
- MYCXXYXQXKLHFN-UHFFFAOYSA-N niobium;3-prop-2-enoyloxypropanoic acid Chemical compound [Nb].OC(=O)CCOC(=O)C=C MYCXXYXQXKLHFN-UHFFFAOYSA-N 0.000 claims description 2
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 claims description 2
- DYWSVUBJGFTOQC-UHFFFAOYSA-N xi-2-Ethylheptanoic acid Chemical compound CCCCCC(CC)C(O)=O DYWSVUBJGFTOQC-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 12
- 125000000524 functional group Chemical group 0.000 claims 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 229910052738 indium Inorganic materials 0.000 claims 4
- 239000003446 ligand Substances 0.000 claims 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 3
- 229920002554 vinyl polymer Polymers 0.000 claims 3
- 229910052693 Europium Inorganic materials 0.000 claims 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims 2
- 229910052779 Neodymium Inorganic materials 0.000 claims 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- 229910052772 Samarium Inorganic materials 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 229910052787 antimony Inorganic materials 0.000 claims 2
- 229910052785 arsenic Inorganic materials 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052788 barium Inorganic materials 0.000 claims 2
- 238000009739 binding Methods 0.000 claims 2
- 229910052791 calcium Inorganic materials 0.000 claims 2
- 229910052804 chromium Inorganic materials 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 2
- 150000002118 epoxides Chemical class 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 229910052745 lead Inorganic materials 0.000 claims 2
- 229910052748 manganese Inorganic materials 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052763 palladium Inorganic materials 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 125000005504 styryl group Chemical group 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- 229910052716 thallium Inorganic materials 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 229910052720 vanadium Inorganic materials 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- PNBIMJYQLLNKQY-IITHXBDYSA-J C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Hf+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] Chemical compound C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Hf+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] PNBIMJYQLLNKQY-IITHXBDYSA-J 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 241000006460 Cyana Species 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 1
- NBQPTPWLHFPJCC-UHFFFAOYSA-N N#CS[N-]N=C=[S+]N=C=O Chemical class N#CS[N-]N=C=[S+]N=C=O NBQPTPWLHFPJCC-UHFFFAOYSA-N 0.000 claims 1
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical group O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical group OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- OBLMVUQQGJTRSA-UHFFFAOYSA-J [Zr+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Zr+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br OBLMVUQQGJTRSA-UHFFFAOYSA-J 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- LIQDVINWFSWENU-UHFFFAOYSA-K aluminum;prop-2-enoate Chemical compound [Al+3].[O-]C(=O)C=C.[O-]C(=O)C=C.[O-]C(=O)C=C LIQDVINWFSWENU-UHFFFAOYSA-K 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims 1
- 150000001540 azides Chemical class 0.000 claims 1
- JESWDXIHOJGWBP-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3-carboxylic acid Chemical compound C1CC2C(C(=O)O)CC1C2 JESWDXIHOJGWBP-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 150000004985 diamines Chemical class 0.000 claims 1
- YASNYMOWPQKVTK-UHFFFAOYSA-N diarsane Chemical compound [AsH2][AsH2] YASNYMOWPQKVTK-UHFFFAOYSA-N 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000001072 heteroaryl group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 239000002105 nanoparticle Substances 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000004001 thioalkyl group Chemical group 0.000 claims 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- TUYAYQSYGXMTGC-UHFFFAOYSA-N 3-oxatricyclo[3.2.1.02,4]octane-6-carboxylic acid Chemical compound OC(=O)C1CC2C3OC3C1C2 TUYAYQSYGXMTGC-UHFFFAOYSA-N 0.000 description 1
- LUVAQAGMHUTQQE-UHFFFAOYSA-I C(C=C)(=O)[O-].[Ta+5].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-] Chemical compound C(C=C)(=O)[O-].[Ta+5].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-] LUVAQAGMHUTQQE-UHFFFAOYSA-I 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- NGBOURMYWRXWDG-UHFFFAOYSA-I [Nb+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Nb+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br NGBOURMYWRXWDG-UHFFFAOYSA-I 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18818208P | 2008-08-07 | 2008-08-07 | |
| US61/188,182 | 2008-08-07 | ||
| PCT/US2009/003841 WO2010059174A1 (en) | 2008-08-07 | 2009-06-27 | Metal compositions and methods of making same |
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| Publication Number | Publication Date |
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| JP2011530652A JP2011530652A (ja) | 2011-12-22 |
| JP2011530652A5 true JP2011530652A5 (cg-RX-API-DMAC7.html) | 2012-08-16 |
| JP6004649B2 JP6004649B2 (ja) | 2016-10-12 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011522047A Active JP6004649B2 (ja) | 2008-08-07 | 2009-06-27 | 金属組成物及びその製法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8802346B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2326744B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6004649B2 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI547528B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2010059174A1 (cg-RX-API-DMAC7.html) |
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| JP2020515722A (ja) * | 2017-03-29 | 2020-05-28 | アイエイチ アイピー ホールディングス リミテッド | 材料中の水素捕捉空位を増加させるための方法 |
| JP7140686B2 (ja) * | 2017-09-11 | 2022-09-21 | フジフイルム エレクトロニック マテリアルズ ユー.エス.エー., インコーポレイテッド | 誘電フィルム形成用組成物 |
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2009
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- 2009-06-27 JP JP2011522047A patent/JP6004649B2/ja active Active
- 2009-06-27 EP EP09827844.3A patent/EP2326744B1/en active Active
- 2009-06-27 US US12/737,694 patent/US8802346B2/en active Active
- 2009-08-10 TW TW098126808A patent/TWI547528B/zh active
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