JP2010500750A - 接着力が向上した回路材料、同回路材料の製造方法および同回路材料から形成される物品 - Google Patents
接着力が向上した回路材料、同回路材料の製造方法および同回路材料から形成される物品 Download PDFInfo
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- JP2010500750A JP2010500750A JP2009523772A JP2009523772A JP2010500750A JP 2010500750 A JP2010500750 A JP 2010500750A JP 2009523772 A JP2009523772 A JP 2009523772A JP 2009523772 A JP2009523772 A JP 2009523772A JP 2010500750 A JP2010500750 A JP 2010500750A
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- Prior art keywords
- circuit
- poly
- polybutadiene
- styrene
- circuit material
- Prior art date
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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Abstract
Description
本出願は、参照により本明細書中に全体が援用される2006年8月8日に出願された米国仮特許出願第60/821,710号の優先権を主張する。
本発明は一般に回路材料、これらの回路材料の製造方法およびこれらの回路材料から形成される物品に関する。
一実施形態においては、回路積層板を形成するために有用な接着剤が、ポリ(アリーレンエーテル)、好ましくはカルボキシ官能化されているポリ(アリーレンエーテル)と、共硬化性(co−curable)ポリブタジエンまたはポリイソプレンポリマー、好ましくはカルボキシ官能化されているポリブタジエンまたはポリイソプレンポリマーとを含む。別の実施形態においては、接着剤が、アルケニル芳香族化合物と共役ジエンとから得られる単位を含むエラストマーブロックコポリマーをさらに含む。
比較的非極性の樹脂を使用して、導電性金属と比較的非極性の誘電体基板材料との間の接着力を向上させることができることが、本発明の発明者らによって予想外に見いだされた。したがって、本明細書中には、ポリ(アリーレンエーテル)と、任意選択でポリブタジエンまたはポリイソプレンポリマー、好ましくはカルボキシル化ポリブタジエンまたはポリイソプレンポリマーと、任意選択で、アルケニル芳香族化合物と共役ジエンとから得られる単位を含むエラストマーブロックコポリマーとを含む接着向上接着剤組成物が記載されている。ポリ(アリーレンエーテル)は、任意選択でカルボキシ官能化することもできる。これらの成分の組合せにより、導電性金属層と回路基板との間の接着力の強化、ならびに難燃性の向上がもたらされる。向上した接着強度は、はんだ付け作業中に遭遇する温度(たとえば、550°Fまたは288℃)などの高温で有利に維持される。特に有利な特徴においては、接着剤組成物の使用が、低誘電率、低散逸率、低吸水性、向上した絶縁破壊強度など、得られた回路積層板の電気的特性に悪影響を及ぼすことは実質的にはない。
表2に記載した材料を、以下の実施例において使用した。
誘電体回路基板と銅箔との間に配置されている表3に記載の接着剤組成物を用いて、回路積層板を作製した。実施例1、1A〜4およびA〜Dにおける接着剤組成物は、100重量部のマレイン化ポリ(アリーレンエーテル)(トルエン98%とキシレン2%とを有する溶媒における10wt%溶液)と、0.5重量部のVarox(過酸化物硬化開始剤)と、指示量の官能化ポリブタジエンポリマーおよびエラストマーブロックコポリマーとを含有していた。
実施例5および6においては、マレイン化ポリ(アリーレンエーテル)溶液10重量部(トルエン98%とキシレン2%との溶液において10wt%)と、マレイン化ポリブタジエン(7.5重量部)と、エラストマーブロックコポリマー7.5重量部)とを用いて、接着剤溶液を形成した。この接着剤溶液を使用して、RO4350Bプリプレグ(6層)と薄型0.5オンスの銅箔(MLS TOC−500 LZ)とを用いて作製される積層板を形成した。少量の亜鉛による処理を施した銅箔側を、接着剤層と接触させて配置した。
実施例8〜10においては、マレイン化ポリ(アリーレンエーテル)10重量部(トルエン98%とキシレン2%との溶液において10wt%)と、マレイン化ポリブタジエン7.5重量部と、エラストマーブロックコポリマー7.5重量部とを含む接着剤溶液を、RO4233プリプレグ(3層)およびRMSが0.4μmである薄型銅箔(MLS TOC−500−LZ、0.5オンス)を用いて作製される積層板用の接着剤として使用した。亜鉛による処理を施した銅箔側を、接着剤層と接触させて配置した。実施例8〜10について異なるコーティング厚さを使用した(示してある量は乾燥重量ベースである)。比較例Gにおいては、接着剤調合物を使用しなかった。
以下の実施例により、接着剤組成物が、薄型の箔による銅剥離強度を増大させるために有用であることが実証される。これらの実施例により、ポリブタジエンおよび/またはポリイソプレン誘電体基板への接着力を向上させる際のコーティングの有効性も実証される。
これらの実施例により、標準的な生産設備による有効で経済的なコーティングに対するこれらの接着剤調合物の適性、ならびに銅剥離強度および高温耐性が向上する広範囲にわたる調合物が実証される。
Claims (36)
- 導電性金属層または誘電体回路基板層と、
前記導電性金属層または前記誘電体基板層上に配置されている接着剤層と、を備える回路材料であって、前記接着剤が、
ポリ(アリーレンエーテル)と、
ポリブタジエンまたはポリイソプレンポリマーとを含む回路材料。 - 前記ポリ(アリーレンエーテル)がカルボキシ官能化されている、請求項1に記載の回路材料。
- 前記ポリ(アリーレンエーテル)が、ポリ(アリーレンエーテル)と環状無水物との反応生成物である、請求項1に記載の回路材料。
- 前記ポリ(アリーレンエーテル)が、ポリ(アリーレンエーテル)と無水マレイン酸との反応生成物である、請求項1に記載の回路材料。
- 前記ポリブタジエンまたはポリイソプレンポリマーがカルボキシ官能化されている、請求項1に記載の回路材料。
- 前記ポリブタジエンまたはポリイソプレンポリマーが、ポリブタジエンまたはポリイソプレンポリマーと環状無水物との反応生成物である、請求項1に記載の回路材料。
- 前記ポリブタジエンまたはポリイソプレンポリマーが、マレイン化ポリブタジエン−スチレンまたはマレイン化ポリイソプレン−スチレンコポリマーである、請求項1に記載の回路材料。
- 前記ポリ(アリーレンエーテル)と前記ポリブタジエンまたはポリイソプレンポリマーとの総合重量にそれぞれ基づいて、前記ポリ(アリーレンエーテル)約20wt%〜約99wt%と、前記ポリブタジエンまたはポリイソプレンポリマー約1wt%〜約80wt%とを含む、請求項1に記載の回路材料。
- アルケニル芳香族化合物と共役ジエンとから得られる単位を含むエラストマーブロックコポリマーをさらに含む、請求項1に記載の回路材料。
- 前記アルケニル芳香族化合物がスチレンであり、前記共役ジエンがポリブタジエンである、請求項9に記載の回路材料。
- 前記エラストマーブロックコポリマーが、スチレン−ブタジエンジブロックコポリマー、スチレン−ブタジエン−スチレントリブロックコポリマー、スチレン−イソプレンジブロックコポリマー、スチレン−イソプレン−スチレントリブロックコポリマー、スチレン−(エチレン−ブチレン)−スチレントリブロックコポリマー、スチレン−(エチレン−プロピレン)−スチレントリブロックコポリマー、スチレン−(エチレン−ブチレン)−ジブロックコポリマー、または上記コポリマーの少なくとも1つを含む組合せである、請求項9に記載の回路材料。
- 前記ブロックコポリマーが、スチレン−ブタジエンジブロックコポリマー、スチレン−ブタジエン−スチレントリブロックコポリマー、または上記コポリマーの少なくとも1つを含む組合せである、請求項9に記載の回路材料。
- 前記ブロックコポリマーが、スチレン−ブタジエンジブロックコポリマーとスチレン−ブタジエン−スチレントリブロックコポリマーとの組合せである、請求項9に記載の回路材料。
- 前記ポリ(アリーレンエーテル)と、前記ポリブタジエンまたはポリイソプレンポリマーと、前記エラストマーブロックコポリマーとの総合重量にそれぞれ基づいて、前記ポリ(アリーレンエーテル)約20wt%〜約98wt%と、前記ポリブタジエンまたはポリイソプレンポリマー約1wt%〜約79wt%と、前記エラストマーブロックコポリマー約1wt%〜約79wt%とを含む、請求項9に記載の回路材料。
- 前記接着剤層が硬化開始剤をさらに含む、請求項1に記載の回路材料。
- 前記硬化開始剤が、ジクミルペルオキシド、アルファ,アルファ−ジ(t−ブチルペルオキシ)−m,p−ジイソプロピルベンゼン、2,5−ジメチル−2,5−ジ(t−ブチルペルオキシ)ヘキサン−3,2,5−ジメチル−2,5−ジ(t−ブチルペルオキシ)ヘキシン−3、または上記硬化開始剤のうちの1種または複数種を含む混合物である、請求項15に記載の回路材料。
- 前記接着剤層が、約2〜約15グラム毎平方メートルの量で存在する、請求項1に記載の回路材料。
- 前記接着剤層が、約4〜約7グラム毎平方メートルの量で存在する、請求項1に記載の回路材料。
- 前記導電層が銅箔である、請求項1に記載の回路材料。
- 前記銅箔のRMSが2マイクロメートル未満である、請求項19に記載の回路材料。
- 前記銅箔のRMSが0.7マイクロメートル未満である、請求項19に記載の回路材料。
- 導電性金属層と、
前記導電性金属層上に配置されている接着剤層とを備える回路材料であって、前記接着剤が、
ポリ(アリーレンエーテル)と、
ポリブタジエンまたはポリイソプレンポリマーとを含む回路材料。 - 前記ポリ(アリーレンエーテル)がカルボキシ官能化されている、請求項22に記載の回路積層板。
- 前記ポリブタジエンまたはポリイソプレンポリマーがカルボキシ官能化されている、請求項22に記載の回路材料。
- 導電層と誘電体回路基板層との間に配置されている接着剤層であって、
ポリ(アリーレンエーテル)と、
ポリブタジエンまたはポリイソプレンポリマーと、
アルケニル芳香族化合物と共役ジエンとから得られる単位を含むエラストマーブロックコポリマーとを含む接着剤層を備える回路積層板。 - 前記ポリ(アリーレンエーテル)がカルボキシ官能化されている、請求項25に記載の回路積層板。
- 前記ポリブタジエンまたはポリイソプレンポリマーがカルボキシ官能化されている、請求項25に記載の回路材料。
- 前記接着剤層が、アルケニル芳香族化合物と共役ジエンとから得られる単位を含むエラストマーブロックコポリマーをさらに含む、請求項25に記載の回路積層板。
- 前記硬化回路基板層および前記接着剤層が、1〜10ギガヘルツの周波数でそれぞれ測定される約3.8未満の誘電率および約0.007未満の散逸率を有する、請求項25に記載の回路積層板。
- 前記回路基板の第2の面に配置されている第2の導電層をさらに含む、請求項25に記載の回路積層板。
- 導電層と非極性誘電体回路基板層との間に配置されている接着剤層であって、ポリ(アリーレンエーテル)を含む接着剤層を備える回路積層板。
- 前記ポリ(アリーレンエーテル)がカルボキシ官能化されている、請求項31に記載の回路積層板。
- 前記回路基板が、ポリブタジエンおよび/またはポリイソプレンコポリマーを含む、請求項31に記載の回路積層板。
- 低誘電率低散逸率回路積層板を形成する方法であって、
ポリ(アリーレンエーテル)と、
カルボキシ官能化されているポリブタジエンまたはポリイソプレンポリマーと
を含む接着剤層を、導電層と回路基板との間に配置すること、および
前記層を積層することを含む方法。 - 請求項1に記載の前記回路材料を含む回路。
- 請求項1に記載の前記回路材料を含む多層回路。
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US60/821,710 | 2006-08-08 | ||
PCT/US2007/016987 WO2008020984A2 (en) | 2006-08-08 | 2007-07-27 | Circuit materials with improved bond, method of manufacture thereof, and articles formed therefrom |
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JP (1) | JP5433416B2 (ja) |
CN (1) | CN101522318B (ja) |
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JP2004307761A (ja) * | 2003-04-10 | 2004-11-04 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物及びそれを用いたプリプレグ、金属張積層板、印刷配線板 |
JP2005248147A (ja) * | 2004-02-04 | 2005-09-15 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物及びそれを用いたプリプレグ、金属張積層板、印刷配線板 |
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JP5433416B2 (ja) | 2014-03-05 |
CN101522318A (zh) | 2009-09-02 |
DE112007001861B4 (de) | 2022-08-11 |
WO2008020984A2 (en) | 2008-02-21 |
US8722192B2 (en) | 2014-05-13 |
GB2455917A (en) | 2009-07-01 |
DE112007001861T5 (de) | 2009-11-05 |
GB0902189D0 (en) | 2009-03-25 |
WO2008020984A3 (en) | 2008-04-10 |
US20130034725A1 (en) | 2013-02-07 |
US8431222B2 (en) | 2013-04-30 |
US20080038528A1 (en) | 2008-02-14 |
GB2455917B (en) | 2011-08-17 |
CN101522318B (zh) | 2013-11-06 |
DE112007001861T9 (de) | 2009-11-05 |
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