JP2009501148A5 - - Google Patents
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- Publication number
- JP2009501148A5 JP2009501148A5 JP2008518789A JP2008518789A JP2009501148A5 JP 2009501148 A5 JP2009501148 A5 JP 2009501148A5 JP 2008518789 A JP2008518789 A JP 2008518789A JP 2008518789 A JP2008518789 A JP 2008518789A JP 2009501148 A5 JP2009501148 A5 JP 2009501148A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- compound
- biphenylyl
- iii
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims 16
- 150000001875 compounds Chemical class 0.000 claims 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 8
- -1 biphenylyl Chemical group 0.000 claims 7
- 238000000576 coating method Methods 0.000 claims 6
- 125000002947 alkylene group Chemical group 0.000 claims 5
- 229910052717 sulfur Inorganic materials 0.000 claims 5
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 claims 4
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 4
- 125000001624 naphthyl group Chemical group 0.000 claims 4
- 229910052760 oxygen Inorganic materials 0.000 claims 4
- 125000005561 phenanthryl group Chemical group 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 3
- 150000002431 hydrogen Chemical group 0.000 claims 3
- 238000007639 printing Methods 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 239000008199 coating composition Substances 0.000 claims 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 125000004653 anthracenylene group Chemical group 0.000 claims 1
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000001589 carboacyl group Chemical group 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 238000005260 corrosion Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 239000011350 dental composite resin Substances 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000007641 inkjet printing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000004957 naphthylene group Chemical group 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
- 125000005562 phenanthrylene group Chemical group 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 239000006120 scratch resistant coating Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05105991 | 2005-07-01 | ||
| EP05105991.3 | 2005-07-01 | ||
| PCT/EP2006/063378 WO2007003507A1 (en) | 2005-07-01 | 2006-06-21 | Sulphonium salt initiators |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009501148A JP2009501148A (ja) | 2009-01-15 |
| JP2009501148A5 true JP2009501148A5 (https=) | 2009-08-06 |
| JP5081151B2 JP5081151B2 (ja) | 2012-11-21 |
Family
ID=35453417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008518789A Active JP5081151B2 (ja) | 2005-07-01 | 2006-06-21 | スルホニウム塩開始剤 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7901867B2 (https=) |
| EP (1) | EP1902019B1 (https=) |
| JP (1) | JP5081151B2 (https=) |
| KR (1) | KR101334046B1 (https=) |
| CN (1) | CN101213169A (https=) |
| AT (1) | ATE473209T1 (https=) |
| DE (1) | DE602006015319D1 (https=) |
| TW (1) | TW200710074A (https=) |
| WO (1) | WO2007003507A1 (https=) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4866606B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP4695996B2 (ja) * | 2006-02-27 | 2011-06-08 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| US8012672B2 (en) | 2006-10-04 | 2011-09-06 | Basf Se | Sulphonium salt photoinitiators |
| KR101545931B1 (ko) * | 2007-08-07 | 2015-08-20 | 가부시키가이샤 아데카 | 방향족 술포늄염 화합물 |
| EP2197869B1 (en) | 2007-10-10 | 2013-04-24 | Basf Se | Sulphonium salt initiators |
| WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| EP2197839B1 (en) * | 2007-10-10 | 2013-01-02 | Basf Se | Sulphonium salt initiators |
| US20110171569A1 (en) * | 2008-06-12 | 2011-07-14 | Yuichi Nishimae | Sulfonium derivatives and the use therof as latent acids |
| JP5385017B2 (ja) * | 2008-07-11 | 2014-01-08 | 信越化学工業株式会社 | レジストパターン形成方法及びフォトマスクの製造方法 |
| EP2349993B1 (en) | 2008-10-20 | 2012-12-12 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
| WO2010066380A1 (en) * | 2008-12-12 | 2010-06-17 | Bayer Schering Pharma Aktiengesellschaft | Triaryl-sulphonium compounds, kit and methods for labeling positron emitting isotopes |
| EP2199856B1 (en) | 2008-12-18 | 2013-08-07 | Agfa Graphics N.V. | Cationic radiation curable compositions |
| JP5576139B2 (ja) * | 2009-02-20 | 2014-08-20 | サンアプロ株式会社 | スルホニウム塩，光酸発生剤，光硬化性組成物，及びその硬化体 |
| CN102317258B (zh) * | 2009-02-20 | 2014-06-04 | 三亚普罗股份有限公司 | 锍盐、光酸产生剂及光敏性树脂组合物 |
| JP5448157B2 (ja) * | 2009-03-13 | 2014-03-19 | 株式会社Ａｄｅｋａ | 芳香族スルホニウム塩化合物 |
| JP5491913B2 (ja) * | 2009-03-18 | 2014-05-14 | サンアプロ株式会社 | 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 |
| WO2011052327A1 (ja) * | 2009-10-26 | 2011-05-05 | 株式会社Adeka | 芳香族スルホニウム塩化合物 |
| JP5543757B2 (ja) * | 2009-11-11 | 2014-07-09 | サンアプロ株式会社 | スルホニウム塩，光酸発生剤，硬化性組成物及びポジ型フォトレジスト組成物 |
| US9382352B2 (en) | 2009-11-12 | 2016-07-05 | Ndsu Research Foundation | Polymers derived from plant oil |
| EP2499171A4 (en) * | 2009-11-12 | 2014-06-18 | Ndsu Res Foundation | POLYMERS FROM A VEGETABLE OIL |
| JP5849350B2 (ja) | 2009-12-17 | 2016-01-27 | ディーエスエム アイピー アセッツ ビー．ブイ． | 基材を用いた積層造形法 |
| CN102725689B (zh) | 2010-01-22 | 2014-10-08 | 帝斯曼知识产权资产管理有限公司 | 能固化成具有选择性视觉效果的层的液体可辐射固化树脂及其使用方法 |
| US8871423B2 (en) * | 2010-01-29 | 2014-10-28 | Samsung Electronics Co., Ltd. | Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same |
| EP2552927B1 (en) | 2010-03-30 | 2019-03-13 | SurModics, Inc. | Degradable photo-crosslinkers |
| US10315987B2 (en) | 2010-12-13 | 2019-06-11 | Surmodics, Inc. | Photo-crosslinker |
| JP5787720B2 (ja) | 2010-12-16 | 2015-09-30 | キヤノン株式会社 | 感光性ネガ型樹脂組成物 |
| KR101229312B1 (ko) * | 2011-01-03 | 2013-02-04 | 금호석유화학 주식회사 | 술포늄 화합물, 광산발생제 및 이의 제조방법 |
| US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| EP2502728B1 (en) | 2011-03-23 | 2017-01-04 | DSM IP Assets B.V. | Lightweight and high strength three-dimensional articles producible by additive fabrication processes |
| US9631040B2 (en) | 2012-05-18 | 2017-04-25 | Ndsu Research Foundation | Functionalized amphiphilic plant-based polymers |
| WO2013173734A1 (en) | 2012-05-18 | 2013-11-21 | Ndsu Research Foundation | Functionalized amphiphilic plant-based polymers |
| JP5899068B2 (ja) * | 2012-06-28 | 2016-04-06 | 東京応化工業株式会社 | 厚膜用ポジ型レジスト組成物、厚膜レジストパターンの製造方法、接続端子の製造方法 |
| JP5830503B2 (ja) * | 2012-09-15 | 2015-12-09 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 酸発生剤化合物およびそれを含むフォトレジスト |
| JP5739497B2 (ja) * | 2012-09-15 | 2015-06-24 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 酸発生剤化合物およびそれを含むフォトレジスト |
| TWI573782B (zh) * | 2012-12-07 | 2017-03-11 | Ｄｓｐ五協食品＆化學品股份有限公司 | 新穎鋶鹽化合物、其製造方法及光酸產生劑 |
| US9834626B2 (en) | 2013-01-15 | 2017-12-05 | Ndsu Research Foundation | Plant oil-based materials |
| CN103642383B (zh) * | 2013-12-04 | 2016-04-20 | 江南大学 | 一种本征型光固化抗静电树脂的制备方法 |
| WO2015174471A1 (ja) * | 2014-05-13 | 2015-11-19 | 東洋合成工業株式会社 | オニウム塩、光酸発生剤、感光性樹脂組成物及びデバイスの製造方法 |
| JP6583136B2 (ja) * | 2016-05-11 | 2019-10-02 | 信越化学工業株式会社 | 新規スルホニウム化合物及びその製造方法、レジスト組成物、並びにパターン形成方法 |
| JP6561937B2 (ja) * | 2016-08-05 | 2019-08-21 | 信越化学工業株式会社 | ネガ型レジスト組成物及びレジストパターン形成方法 |
| US10416558B2 (en) * | 2016-08-05 | 2019-09-17 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition, resist pattern forming process, and photomask blank |
| CN107698477B (zh) | 2016-08-08 | 2020-05-12 | 常州强力电子新材料股份有限公司 | 一种新型阳离子型光引发剂及其制备方法和应用 |
| CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
| KR20210005707A (ko) | 2018-05-03 | 2021-01-14 | 디에스엠 아이피 어셋츠 비.브이. | 적층 제조를 통하여 생성된 광-제작된 물품을 후처리하는 방법 |
| JP7499071B2 (ja) * | 2019-06-04 | 2024-06-13 | 住友化学株式会社 | 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法並びに塩の製造方法 |
| CN114901638B (zh) * | 2020-03-17 | 2024-10-29 | 三亚普罗股份有限公司 | 锍盐、光酸产生剂、固化性组合物和抗蚀剂组合物 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ZA805273B (en) * | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
| JPH107649A (ja) * | 1996-06-18 | 1998-01-13 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
| KR100279497B1 (ko) * | 1998-07-16 | 2001-02-01 | 박찬구 | 술포늄 염의 제조방법 |
| TWI250379B (en) | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| JP3476374B2 (ja) * | 1998-10-09 | 2003-12-10 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
| JP3972568B2 (ja) * | 2000-05-09 | 2007-09-05 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物及びスルホニウム塩 |
| JP4177952B2 (ja) * | 2000-05-22 | 2008-11-05 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| TWI286664B (en) * | 2000-06-23 | 2007-09-11 | Sumitomo Chemical Co | Chemical amplification type positive resist composition and sulfonium salt |
| JP4150509B2 (ja) * | 2000-11-20 | 2008-09-17 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP4262402B2 (ja) * | 2000-10-20 | 2009-05-13 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US6749987B2 (en) | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| JP2002202605A (ja) * | 2000-12-28 | 2002-07-19 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| CA2452566C (en) | 2001-07-19 | 2011-08-23 | Lamberti Spa | Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
| JP2003255542A (ja) * | 2002-03-04 | 2003-09-10 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
| GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| EP1516230B1 (en) | 2002-06-26 | 2015-12-30 | FujiFilm Electronic Materials USA, Inc. | Photosensitive compositions |
| JP5131888B2 (ja) * | 2002-09-25 | 2013-01-30 | 株式会社Ａｄｅｋａ | 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法 |
| JP4253486B2 (ja) * | 2002-09-25 | 2009-04-15 | 富士フイルム株式会社 | ポジ型又はネガ型レジスト組成物、酸発生剤及びパターン形成方法 |
| JP4115309B2 (ja) * | 2003-03-24 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4399192B2 (ja) * | 2003-06-03 | 2010-01-13 | 富士フイルム株式会社 | 感光性組成物 |
-
2006
- 2006-06-21 KR KR1020087002868A patent/KR101334046B1/ko active Active
- 2006-06-21 EP EP06777379A patent/EP1902019B1/en active Active
- 2006-06-21 DE DE602006015319T patent/DE602006015319D1/de active Active
- 2006-06-21 CN CNA2006800238530A patent/CN101213169A/zh active Pending
- 2006-06-21 US US11/922,444 patent/US7901867B2/en active Active
- 2006-06-21 WO PCT/EP2006/063378 patent/WO2007003507A1/en not_active Ceased
- 2006-06-21 JP JP2008518789A patent/JP5081151B2/ja active Active
- 2006-06-21 AT AT06777379T patent/ATE473209T1/de not_active IP Right Cessation
- 2006-06-30 TW TW095123894A patent/TW200710074A/zh unknown
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