DE602006015319D1 - Sulfoniumsalzinitiatoren - Google Patents
SulfoniumsalzinitiatorenInfo
- Publication number
- DE602006015319D1 DE602006015319D1 DE602006015319T DE602006015319T DE602006015319D1 DE 602006015319 D1 DE602006015319 D1 DE 602006015319D1 DE 602006015319 T DE602006015319 T DE 602006015319T DE 602006015319 T DE602006015319 T DE 602006015319T DE 602006015319 D1 DE602006015319 D1 DE 602006015319D1
- Authority
- DE
- Germany
- Prior art keywords
- c20alkyl
- phenanthryl
- anthryl
- naphthyl
- biphenylyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/06—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05105991 | 2005-07-01 | ||
PCT/EP2006/063378 WO2007003507A1 (en) | 2005-07-01 | 2006-06-21 | Sulphonium salt initiators |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006015319D1 true DE602006015319D1 (de) | 2010-08-19 |
Family
ID=35453417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006015319T Active DE602006015319D1 (de) | 2005-07-01 | 2006-06-21 | Sulfoniumsalzinitiatoren |
Country Status (9)
Country | Link |
---|---|
US (1) | US7901867B2 (de) |
EP (1) | EP1902019B1 (de) |
JP (1) | JP5081151B2 (de) |
KR (1) | KR101334046B1 (de) |
CN (1) | CN101213169A (de) |
AT (1) | ATE473209T1 (de) |
DE (1) | DE602006015319D1 (de) |
TW (1) | TW200710074A (de) |
WO (1) | WO2007003507A1 (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4866606B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
JP4695996B2 (ja) * | 2006-02-27 | 2011-06-08 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
WO2008040648A1 (en) | 2006-10-04 | 2008-04-10 | Ciba Holding Inc. | Sulphonium salt photoinitiators |
CN101778818B (zh) * | 2007-08-07 | 2014-01-08 | 株式会社Adeka | 芳香族硫鎓盐化合物 |
WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
WO2009047152A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
KR101571912B1 (ko) * | 2007-10-10 | 2015-11-25 | 바스프 에스이 | 술포늄 염 개시제 |
WO2009150074A1 (en) * | 2008-06-12 | 2009-12-17 | Basf Se | Sulfonium derivatives and the use thereof as latent acids |
JP5385017B2 (ja) * | 2008-07-11 | 2014-01-08 | 信越化学工業株式会社 | レジストパターン形成方法及びフォトマスクの製造方法 |
WO2010046240A1 (en) | 2008-10-20 | 2010-04-29 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
US20120020881A1 (en) * | 2008-12-12 | 2012-01-26 | Bayer Schering Pharma Aktiengesellschaft | Triaryl-sulphonium compounds, kit and methods for labeling positron emitting isotopes |
EP2199856B1 (de) | 2008-12-18 | 2013-08-07 | Agfa Graphics N.V. | Kationische strahlungshärtbare Zusammensetzungen |
US8617787B2 (en) * | 2009-02-20 | 2013-12-31 | San-Apro, Ltd. | Sulfonium salt, photo-acid generator, and photosensitive resin composition |
JP5576139B2 (ja) * | 2009-02-20 | 2014-08-20 | サンアプロ株式会社 | スルホニウム塩,光酸発生剤,光硬化性組成物,及びその硬化体 |
JP5448157B2 (ja) * | 2009-03-13 | 2014-03-19 | 株式会社Adeka | 芳香族スルホニウム塩化合物 |
JP5491913B2 (ja) * | 2009-03-18 | 2014-05-14 | サンアプロ株式会社 | 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 |
JP5635526B2 (ja) * | 2009-10-26 | 2014-12-03 | 株式会社Adeka | 芳香族スルホニウム塩化合物 |
JP5543757B2 (ja) * | 2009-11-11 | 2014-07-09 | サンアプロ株式会社 | スルホニウム塩,光酸発生剤,硬化性組成物及びポジ型フォトレジスト組成物 |
WO2011060293A1 (en) * | 2009-11-12 | 2011-05-19 | Ndsu Research Foundation | Polymers derived from plant oil |
US9382352B2 (en) | 2009-11-12 | 2016-07-05 | Ndsu Research Foundation | Polymers derived from plant oil |
JP5699365B2 (ja) | 2009-12-17 | 2015-04-08 | ディーエスエム アイピー アセッツ ビー.ブイ. | カチオン系光重合開始剤トリアリールスルホニウムボレートを含む積層造形用液状放射線硬化樹脂 |
EP2526463B1 (de) | 2010-01-22 | 2016-07-13 | DSM IP Assets B.V. | Verfahren zur herstellung eines dreidimensionalen artikels mit selektiven visuellen effekten |
US8871423B2 (en) * | 2010-01-29 | 2014-10-28 | Samsung Electronics Co., Ltd. | Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same |
JP2013523751A (ja) | 2010-03-30 | 2013-06-17 | サーモディクス,インコーポレイテッド | 分解性光架橋剤 |
US10315987B2 (en) | 2010-12-13 | 2019-06-11 | Surmodics, Inc. | Photo-crosslinker |
JP5787720B2 (ja) * | 2010-12-16 | 2015-09-30 | キヤノン株式会社 | 感光性ネガ型樹脂組成物 |
KR101229312B1 (ko) * | 2011-01-03 | 2013-02-04 | 금호석유화학 주식회사 | 술포늄 화합물, 광산발생제 및 이의 제조방법 |
US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
EP2502728B1 (de) | 2011-03-23 | 2017-01-04 | DSM IP Assets B.V. | Leichte und hochfeste, mittels Additivherstellungsverfahren erzeugbare dreidimensionale Artikel |
US9631040B2 (en) | 2012-05-18 | 2017-04-25 | Ndsu Research Foundation | Functionalized amphiphilic plant-based polymers |
WO2013173734A1 (en) | 2012-05-18 | 2013-11-21 | Ndsu Research Foundation | Functionalized amphiphilic plant-based polymers |
JP5899068B2 (ja) * | 2012-06-28 | 2016-04-06 | 東京応化工業株式会社 | 厚膜用ポジ型レジスト組成物、厚膜レジストパターンの製造方法、接続端子の製造方法 |
TWI498675B (zh) * | 2012-09-15 | 2015-09-01 | 羅門哈斯電子材料有限公司 | 酸產生劑化合物及含該化合物之光阻劑 |
TWI545118B (zh) * | 2012-09-15 | 2016-08-11 | 羅門哈斯電子材料有限公司 | 酸產生劑化合物及包含該化合物之光阻劑 |
JP6215229B2 (ja) * | 2012-12-07 | 2017-10-18 | Dsp五協フード&ケミカル株式会社 | 新規なスルホニウム塩化合物、その製造方法及び光酸発生剤 |
WO2014113326A2 (en) | 2013-01-15 | 2014-07-24 | Ndsu Research Foundation | Plant oil-based materials |
CN103642383B (zh) * | 2013-12-04 | 2016-04-20 | 江南大学 | 一种本征型光固化抗静电树脂的制备方法 |
CN106458879A (zh) * | 2014-05-13 | 2017-02-22 | 东洋合成工业株式会社 | 鎓盐、光酸产生剂、感光性树脂组合物及装置的制造方法 |
JP6583136B2 (ja) * | 2016-05-11 | 2019-10-02 | 信越化学工業株式会社 | 新規スルホニウム化合物及びその製造方法、レジスト組成物、並びにパターン形成方法 |
US10416558B2 (en) * | 2016-08-05 | 2019-09-17 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition, resist pattern forming process, and photomask blank |
JP6561937B2 (ja) * | 2016-08-05 | 2019-08-21 | 信越化学工業株式会社 | ネガ型レジスト組成物及びレジストパターン形成方法 |
CN107698477B (zh) | 2016-08-08 | 2020-05-12 | 常州强力电子新材料股份有限公司 | 一种新型阳离子型光引发剂及其制备方法和应用 |
CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
JP2021522086A (ja) | 2018-05-03 | 2021-08-30 | ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. | 積層造形によって作られる光造形物品の後加工方法 |
EP4122915A4 (de) * | 2020-03-17 | 2023-09-06 | San-Apro Ltd. | Sulfoniumsalz, fotosäuregenerator, härtbare zusammensetzung und resistzusammensetzung |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ZA805273B (en) * | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
JPH107649A (ja) * | 1996-06-18 | 1998-01-13 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
KR100279497B1 (ko) * | 1998-07-16 | 2001-02-01 | 박찬구 | 술포늄 염의 제조방법 |
TWI250379B (en) | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
JP3476374B2 (ja) * | 1998-10-09 | 2003-12-10 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
JP3972568B2 (ja) * | 2000-05-09 | 2007-09-05 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物及びスルホニウム塩 |
JP4177952B2 (ja) * | 2000-05-22 | 2008-11-05 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
TWI286664B (en) * | 2000-06-23 | 2007-09-11 | Sumitomo Chemical Co | Chemical amplification type positive resist composition and sulfonium salt |
JP4150509B2 (ja) * | 2000-11-20 | 2008-09-17 | 富士フイルム株式会社 | ポジ型感光性組成物 |
US6749987B2 (en) | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
JP4262402B2 (ja) * | 2000-10-20 | 2009-05-13 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
JP2002202605A (ja) * | 2000-12-28 | 2002-07-19 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
AU2002331332A1 (en) | 2001-07-19 | 2003-03-03 | Lamberti Spa | Sulfonium salts as phtoinitiators for radiation curable systems |
JP2003255542A (ja) * | 2002-03-04 | 2003-09-10 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
JP4516425B2 (ja) * | 2002-06-26 | 2010-08-04 | フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド | 放射線感受性組成物 |
EP2308865B1 (de) * | 2002-09-25 | 2013-08-07 | Adeka Corporation | Neue aromatische Sulfoniumsalz-Verbindung, diese enthaltender Photosäuregenerator und diese enthaltende photopolymerisierbare Zusammensetzung, Harzzusammensetzung für optische 3D-Formung und optisches Herstellungsverfahren für 3D-Form |
JP4253486B2 (ja) * | 2002-09-25 | 2009-04-15 | 富士フイルム株式会社 | ポジ型又はネガ型レジスト組成物、酸発生剤及びパターン形成方法 |
JP4115309B2 (ja) * | 2003-03-24 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
JP4399192B2 (ja) * | 2003-06-03 | 2010-01-13 | 富士フイルム株式会社 | 感光性組成物 |
-
2006
- 2006-06-21 JP JP2008518789A patent/JP5081151B2/ja active Active
- 2006-06-21 DE DE602006015319T patent/DE602006015319D1/de active Active
- 2006-06-21 US US11/922,444 patent/US7901867B2/en active Active
- 2006-06-21 AT AT06777379T patent/ATE473209T1/de not_active IP Right Cessation
- 2006-06-21 EP EP06777379A patent/EP1902019B1/de active Active
- 2006-06-21 KR KR1020087002868A patent/KR101334046B1/ko active IP Right Grant
- 2006-06-21 WO PCT/EP2006/063378 patent/WO2007003507A1/en active Application Filing
- 2006-06-21 CN CNA2006800238530A patent/CN101213169A/zh active Pending
- 2006-06-30 TW TW095123894A patent/TW200710074A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2009501148A (ja) | 2009-01-15 |
EP1902019A1 (de) | 2008-03-26 |
JP5081151B2 (ja) | 2012-11-21 |
KR20080030082A (ko) | 2008-04-03 |
KR101334046B1 (ko) | 2013-12-02 |
CN101213169A (zh) | 2008-07-02 |
TW200710074A (en) | 2007-03-16 |
US20090208872A1 (en) | 2009-08-20 |
ATE473209T1 (de) | 2010-07-15 |
EP1902019B1 (de) | 2010-07-07 |
WO2007003507A1 (en) | 2007-01-11 |
US7901867B2 (en) | 2011-03-08 |
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