JP2009533377A5 - - Google Patents

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Publication number
JP2009533377A5
JP2009533377A5 JP2009504692A JP2009504692A JP2009533377A5 JP 2009533377 A5 JP2009533377 A5 JP 2009533377A5 JP 2009504692 A JP2009504692 A JP 2009504692A JP 2009504692 A JP2009504692 A JP 2009504692A JP 2009533377 A5 JP2009533377 A5 JP 2009533377A5
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Japan
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substituted
interrupted
alkyl
hydrogen
compound
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JP2009504692A
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English (en)
Japanese (ja)
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JP5313873B2 (ja
JP2009533377A (ja
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Priority claimed from PCT/EP2007/053280 external-priority patent/WO2007118794A1/en
Publication of JP2009533377A publication Critical patent/JP2009533377A/ja
Publication of JP2009533377A5 publication Critical patent/JP2009533377A5/ja
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JP2009504692A 2006-04-13 2007-04-04 スルホニウム塩開始剤 Active JP5313873B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06112602 2006-04-13
EP06112602.5 2006-04-13
PCT/EP2007/053280 WO2007118794A1 (en) 2006-04-13 2007-04-04 Sulphonium salt initiators

Publications (3)

Publication Number Publication Date
JP2009533377A JP2009533377A (ja) 2009-09-17
JP2009533377A5 true JP2009533377A5 (https=) 2010-05-20
JP5313873B2 JP5313873B2 (ja) 2013-10-09

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009504692A Active JP5313873B2 (ja) 2006-04-13 2007-04-04 スルホニウム塩開始剤

Country Status (7)

Country Link
US (1) US8067643B2 (https=)
EP (1) EP2007834B1 (https=)
JP (1) JP5313873B2 (https=)
KR (1) KR101389057B1 (https=)
CN (1) CN101466804B (https=)
TW (1) TWI404699B (https=)
WO (1) WO2007118794A1 (https=)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101522613B (zh) 2006-10-04 2013-03-06 西巴控股有限公司 锍盐光引发剂
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
KR101599562B1 (ko) * 2007-10-10 2016-03-03 바스프 에스이 술포늄 염 개시제
CN101952269B (zh) * 2007-10-10 2014-06-25 巴斯夫欧洲公司 锍盐引发剂
KR20110025211A (ko) * 2008-06-12 2011-03-09 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Mems用感光性樹脂組成物及びその硬化物
JP5721630B2 (ja) * 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se スルホニウム誘導体および潜在酸としてのその使用
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP2199856B1 (en) 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
KR101700980B1 (ko) * 2009-02-20 2017-01-31 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물
EP2438122A1 (en) * 2009-06-02 2012-04-11 Massachusetts Institute of Technology Coatings
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
CN106125509B (zh) * 2009-12-17 2019-12-17 帝斯曼知识产权资产管理有限公司 用于加成法制造的可led固化的液体树脂组合物
KR101813298B1 (ko) 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
JP5872470B2 (ja) * 2010-07-14 2016-03-01 日本化薬株式会社 感光性樹脂組成物及びその硬化物
US8394575B2 (en) * 2010-09-30 2013-03-12 Lexmark International, Inc. Formulations for environmentally friendly photoresist film layers
US20140127626A1 (en) * 2010-10-07 2014-05-08 Riken Resist composition for negative development which is used for formation of guide pattern, guide pattern formation method, and method for forming pattern on layer containing block copolymer
JP5691987B2 (ja) * 2010-10-13 2015-04-01 信越化学工業株式会社 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
JP5749631B2 (ja) * 2010-12-07 2015-07-15 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
GB201223064D0 (en) * 2012-12-20 2013-02-06 Rainbow Technology Systems Ltd Curable coatings for photoimaging
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
EP3567428B1 (en) 2015-10-01 2021-06-23 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
JP2018536731A (ja) 2015-11-17 2018-12-13 ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. 改善された付加造形用アンチモンフリー放射線硬化性組成物およびインベストメント鋳造プロセスにおけるその用途
US11370751B2 (en) 2016-07-28 2022-06-28 San Apro Ltd. Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
US11142495B2 (en) * 2016-10-17 2021-10-12 Toyo Gosei Co., Ltd. Composition and method for manufacturing device using same
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
WO2021186846A1 (ja) 2020-03-17 2021-09-23 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488378A (en) 1966-04-06 1970-01-06 Dow Chemical Co Complexes of organic sulfoxides and hydrogen chloride and related sulfonium salts
US4197174A (en) * 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
US4201640A (en) * 1979-03-14 1980-05-06 American Can Company Method for producing bis-[4-(diphenylsulfonio)phenyl] sulfide bis-M.X6
ZA805273B (en) 1979-09-28 1981-11-25 Gen Electric Process of deep section curing photocurable compositions
US4451409A (en) 1982-02-08 1984-05-29 The Dow Chemical Company Sulfonium organosulfonates
US4694029A (en) 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
DE4211060A1 (de) 1992-04-03 1993-10-07 Roehm Gmbh Polymerprodukte zur Behandlung von Leder
US5254760A (en) 1992-07-29 1993-10-19 Ciba-Geigy Corporation Inhibiting polymerization of vinyl aromatic monomers
US5554664A (en) 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JP4204113B2 (ja) 1997-12-04 2009-01-07 株式会社Adeka 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US5973020A (en) 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US5998092A (en) 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
US6337426B1 (en) 1998-11-23 2002-01-08 Nalco/Exxon Energy Chemicals, L.P. Antifoulant compositions and processes
US6444733B1 (en) 1999-03-01 2002-09-03 Ciba Specialty Chemicals Corporation Stabilizer combination for the rotomolding process
DE60134574D1 (de) * 2000-12-15 2008-08-07 San Apro Ltd Verfahren zur herstellung von sulfoniumsalzen
US6468595B1 (en) 2001-02-13 2002-10-22 Sigma Technologies International, Inc. Vaccum deposition of cationic polymer systems
US6696216B2 (en) * 2001-06-29 2004-02-24 International Business Machines Corporation Thiophene-containing photo acid generators for photolithography
ES2329345T3 (es) 2001-07-19 2009-11-25 Lamberti Spa Sales de sulfonio como fotoiniciadores para sistemas que se pueden curar por radiacion.
GB0204467D0 (en) 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
CA2485516A1 (en) * 2002-05-16 2003-11-27 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
US6632960B2 (en) * 2002-06-21 2003-10-14 Goldschmidt Ag Diaryliodonium salt catalysts made from iodotoluene and a method for preparing them
AU2003268671A1 (en) * 2002-09-25 2004-04-19 Asahi Denka Co.Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
EP1595182B1 (en) 2003-02-19 2015-09-30 Basf Se Halogenated oxime derivatives and the use thereof as latent acids
US20050148679A1 (en) * 2003-12-29 2005-07-07 Chingfan Chiu Aryl sulfonium salt, polymerizable composition and polymerization method of the same
JP2007523974A (ja) 2004-01-27 2007-08-23 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 熱安定性のカチオン光硬化性組成物
US7592376B2 (en) * 2004-08-23 2009-09-22 Rensselaer Polytechnic Institute Photopolymerizable epoxide and oxetane compositions
CN1727333A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 一种链烷基硫鎓盐的制法及作为光聚合引发剂的用途
JPWO2007029448A1 (ja) * 2005-09-02 2009-03-12 コニカミノルタエムジー株式会社 活性光線硬化型インクジェットインク
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂

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