KR101389057B1 - 설포늄 염 개시제 - Google Patents

설포늄 염 개시제 Download PDF

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Publication number
KR101389057B1
KR101389057B1 KR1020087027838A KR20087027838A KR101389057B1 KR 101389057 B1 KR101389057 B1 KR 101389057B1 KR 1020087027838 A KR1020087027838 A KR 1020087027838A KR 20087027838 A KR20087027838 A KR 20087027838A KR 101389057 B1 KR101389057 B1 KR 101389057B1
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KR
South Korea
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substituted
alkyl
acid
hydrogen
compound
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Korean (ko)
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KR20080112377A (ko
Inventor
파스칼 하이오츠
슈테판 일크
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시바 홀딩 인크
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Application granted granted Critical
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Assigned to 바스프 슈바이츠 아게 reassignment 바스프 슈바이츠 아게 권리의 전부이전등록 Assignors: 시바 홀딩 인크
Assigned to 바스프 에스이 reassignment 바스프 에스이 권리의 전부이전등록 Assignors: 바스프 슈바이츠 아게
Assigned to 아이지엠 그룹 비.브이. reassignment 아이지엠 그룹 비.브이. 권리의 전부이전등록 Assignors: 바스프 에스이
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03—Powdery paints
    • C09D5/033—Powdery paints characterised by the additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyethers (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Detergent Compositions (AREA)
KR1020087027838A 2006-04-13 2007-04-04 설포늄 염 개시제 Active KR101389057B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06112602 2006-04-13
EP06112602.5 2006-04-13
PCT/EP2007/053280 WO2007118794A1 (en) 2006-04-13 2007-04-04 Sulphonium salt initiators

Publications (2)

Publication Number Publication Date
KR20080112377A KR20080112377A (ko) 2008-12-24
KR101389057B1 true KR101389057B1 (ko) 2014-05-13

Family

ID=36703163

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087027838A Active KR101389057B1 (ko) 2006-04-13 2007-04-04 설포늄 염 개시제

Country Status (7)

Country Link
US (1) US8067643B2 (https=)
EP (1) EP2007834B1 (https=)
JP (1) JP5313873B2 (https=)
KR (1) KR101389057B1 (https=)
CN (1) CN101466804B (https=)
TW (1) TWI404699B (https=)
WO (1) WO2007118794A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190059327A (ko) * 2016-10-17 2019-05-30 도요 고세이 고교 가부시키가이샤 조성물 및 이를 이용한 디바이스의 제조 방법

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CN101522613B (zh) 2006-10-04 2013-03-06 西巴控股有限公司 锍盐光引发剂
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
KR101599562B1 (ko) * 2007-10-10 2016-03-03 바스프 에스이 술포늄 염 개시제
CN101952269B (zh) * 2007-10-10 2014-06-25 巴斯夫欧洲公司 锍盐引发剂
KR20110025211A (ko) * 2008-06-12 2011-03-09 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
JP5721630B2 (ja) * 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ スルホニウム誘導体および潜在酸としてのその使用
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP2199856B1 (en) 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
KR101700980B1 (ko) * 2009-02-20 2017-01-31 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물
EP2438122A1 (en) * 2009-06-02 2012-04-11 Massachusetts Institute of Technology Coatings
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
CN106125509B (zh) * 2009-12-17 2019-12-17 帝斯曼知识产权资产管理有限公司 用于加成法制造的可led固化的液体树脂组合物
KR101813298B1 (ko) 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
JP5872470B2 (ja) * 2010-07-14 2016-03-01 日本化薬株式会社 感光性樹脂組成物及びその硬化物
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US20140127626A1 (en) * 2010-10-07 2014-05-08 Riken Resist composition for negative development which is used for formation of guide pattern, guide pattern formation method, and method for forming pattern on layer containing block copolymer
JP5691987B2 (ja) * 2010-10-13 2015-04-01 信越化学工業株式会社 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
JP5749631B2 (ja) * 2010-12-07 2015-07-15 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
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KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
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CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
WO2021186846A1 (ja) 2020-03-17 2021-09-23 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

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EP1036789A1 (en) * 1997-12-04 2000-09-20 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190059327A (ko) * 2016-10-17 2019-05-30 도요 고세이 고교 가부시키가이샤 조성물 및 이를 이용한 디바이스의 제조 방법
KR102278416B1 (ko) * 2016-10-17 2021-07-15 도요 고세이 고교 가부시키가이샤 조성물 및 이를 이용한 디바이스의 제조 방법

Also Published As

Publication number Publication date
EP2007834B1 (en) 2015-11-04
TW200804260A (en) 2008-01-16
CN101466804A (zh) 2009-06-24
CN101466804B (zh) 2012-02-22
US20090197987A1 (en) 2009-08-06
JP5313873B2 (ja) 2013-10-09
US8067643B2 (en) 2011-11-29
WO2007118794A1 (en) 2007-10-25
TWI404699B (zh) 2013-08-11
EP2007834A1 (en) 2008-12-31
JP2009533377A (ja) 2009-09-17
KR20080112377A (ko) 2008-12-24
WO2007118794B1 (en) 2008-01-03

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