JP5313873B2 - スルホニウム塩開始剤 - Google Patents

スルホニウム塩開始剤 Download PDF

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Publication number
JP5313873B2
JP5313873B2 JP2009504692A JP2009504692A JP5313873B2 JP 5313873 B2 JP5313873 B2 JP 5313873B2 JP 2009504692 A JP2009504692 A JP 2009504692A JP 2009504692 A JP2009504692 A JP 2009504692A JP 5313873 B2 JP5313873 B2 JP 5313873B2
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JP
Japan
Prior art keywords
substituted
alkyl
acid
hydrogen
compound
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JP2009504692A
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English (en)
Japanese (ja)
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JP2009533377A (ja
JP2009533377A5 (https=
Inventor
ハヨ，パスカル
イルク，シュテファン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
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Ciba Holding AG
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Publication of JP2009533377A publication Critical patent/JP2009533377A/ja
Publication of JP2009533377A5 publication Critical patent/JP2009533377A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03—Powdery paints
    • C09D5/033—Powdery paints characterised by the additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Polyethers (AREA)
  • Detergent Compositions (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP2009504692A 2006-04-13 2007-04-04 スルホニウム塩開始剤 Active JP5313873B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06112602.5 2006-04-13
EP06112602 2006-04-13
PCT/EP2007/053280 WO2007118794A1 (en) 2006-04-13 2007-04-04 Sulphonium salt initiators

Publications (3)

Publication Number Publication Date
JP2009533377A JP2009533377A (ja) 2009-09-17
JP2009533377A5 JP2009533377A5 (https=) 2010-05-20
JP5313873B2 true JP5313873B2 (ja) 2013-10-09

Family

ID=36703163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009504692A Active JP5313873B2 (ja) 2006-04-13 2007-04-04 スルホニウム塩開始剤

Country Status (7)

Country Link
US (1) US8067643B2 (https=)
EP (1) EP2007834B1 (https=)
JP (1) JP5313873B2 (https=)
KR (1) KR101389057B1 (https=)
CN (1) CN101466804B (https=)
TW (1) TWI404699B (https=)
WO (1) WO2007118794A1 (https=)

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WO2009047151A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
EP2197839B1 (en) * 2007-10-10 2013-01-02 Basf Se Sulphonium salt initiators
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EP2349993B1 (en) * 2008-10-20 2012-12-12 Basf Se Sulfonium derivatives and the use therof as latent acids
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CN102317258B (zh) * 2009-02-20 2014-06-04 三亚普罗股份有限公司 锍盐、光酸产生剂及光敏性树脂组合物
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CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
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CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
CN114901638B (zh) 2020-03-17 2024-10-29 三亚普罗股份有限公司 锍盐、光酸产生剂、固化性组合物和抗蚀剂组合物
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

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Also Published As

Publication number Publication date
US20090197987A1 (en) 2009-08-06
KR101389057B1 (ko) 2014-05-13
EP2007834B1 (en) 2015-11-04
CN101466804B (zh) 2012-02-22
EP2007834A1 (en) 2008-12-31
TWI404699B (zh) 2013-08-11
WO2007118794B1 (en) 2008-01-03
CN101466804A (zh) 2009-06-24
KR20080112377A (ko) 2008-12-24
TW200804260A (en) 2008-01-16
US8067643B2 (en) 2011-11-29
JP2009533377A (ja) 2009-09-17
WO2007118794A1 (en) 2007-10-25

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