JP2006523026A5 - - Google Patents

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JP2006523026A5
JP2006523026A5 JP2006509534A JP2006509534A JP2006523026A5 JP 2006523026 A5 JP2006523026 A5 JP 2006523026A5 JP 2006509534 A JP2006509534 A JP 2006509534A JP 2006509534 A JP2006509534 A JP 2006509534A JP 2006523026 A5 JP2006523026 A5 JP 2006523026A5
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Prior art keywords
pressurized gas
fluid control
fluid
exposure area
nozzle
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JP2006509534A
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Japanese (ja)
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JP4488004B2 (ja
JP2006523026A (ja
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Priority claimed from PCT/US2004/009911 external-priority patent/WO2004093159A2/en
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Publication of JP4488004B2 publication Critical patent/JP4488004B2/ja
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JP2006509534A 2003-04-09 2004-03-29 液浸リソグラフィ流体制御システム Expired - Lifetime JP4488004B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46214203P 2003-04-09 2003-04-09
PCT/US2004/009911 WO2004093159A2 (en) 2003-04-09 2004-03-29 Immersion lithography fluid control system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010024368A Division JP5428909B2 (ja) 2003-04-09 2010-02-05 液浸リソグラフィ流体制御システム

Publications (3)

Publication Number Publication Date
JP2006523026A JP2006523026A (ja) 2006-10-05
JP2006523026A5 true JP2006523026A5 (enExample) 2010-03-25
JP4488004B2 JP4488004B2 (ja) 2010-06-23

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JP2006509534A Expired - Lifetime JP4488004B2 (ja) 2003-04-09 2004-03-29 液浸リソグラフィ流体制御システム
JP2010024368A Expired - Fee Related JP5428909B2 (ja) 2003-04-09 2010-02-05 液浸リソグラフィ流体制御システム
JP2013200777A Expired - Fee Related JP5679023B2 (ja) 2003-04-09 2013-09-27 液浸リソグラフィ流体制御システム

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Application Number Title Priority Date Filing Date
JP2010024368A Expired - Fee Related JP5428909B2 (ja) 2003-04-09 2010-02-05 液浸リソグラフィ流体制御システム
JP2013200777A Expired - Fee Related JP5679023B2 (ja) 2003-04-09 2013-09-27 液浸リソグラフィ流体制御システム

Country Status (5)

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US (6) US7339650B2 (enExample)
JP (3) JP4488004B2 (enExample)
KR (2) KR20110104084A (enExample)
TW (2) TW200801847A (enExample)
WO (1) WO2004093159A2 (enExample)

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