JP2007134729A5 - - Google Patents

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Publication number
JP2007134729A5
JP2007134729A5 JP2006309413A JP2006309413A JP2007134729A5 JP 2007134729 A5 JP2007134729 A5 JP 2007134729A5 JP 2006309413 A JP2006309413 A JP 2006309413A JP 2006309413 A JP2006309413 A JP 2006309413A JP 2007134729 A5 JP2007134729 A5 JP 2007134729A5
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JP
Japan
Prior art keywords
pressure chamber
gas
movable member
housing
pressure
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006309413A
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English (en)
Japanese (ja)
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JP4512081B2 (ja
JP2007134729A (ja
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Application filed filed Critical
Publication of JP2007134729A publication Critical patent/JP2007134729A/ja
Publication of JP2007134729A5 publication Critical patent/JP2007134729A5/ja
Application granted granted Critical
Publication of JP4512081B2 publication Critical patent/JP4512081B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006309413A 2000-06-02 2006-11-15 リソグラフィ投影装置、支持アセンブリ、およびデバイス製造方法 Expired - Fee Related JP4512081B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00304713 2000-06-02

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001161615A Division JP4028969B2 (ja) 2000-06-02 2001-05-30 リソグラフィ投影装置、支持アセンブリ、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2007134729A JP2007134729A (ja) 2007-05-31
JP2007134729A5 true JP2007134729A5 (enExample) 2008-12-18
JP4512081B2 JP4512081B2 (ja) 2010-07-28

Family

ID=8173041

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2001161615A Expired - Lifetime JP4028969B2 (ja) 2000-06-02 2001-05-30 リソグラフィ投影装置、支持アセンブリ、およびデバイス製造方法
JP2006309413A Expired - Fee Related JP4512081B2 (ja) 2000-06-02 2006-11-15 リソグラフィ投影装置、支持アセンブリ、およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2001161615A Expired - Lifetime JP4028969B2 (ja) 2000-06-02 2001-05-30 リソグラフィ投影装置、支持アセンブリ、およびデバイス製造方法

Country Status (4)

Country Link
US (1) US6473161B2 (enExample)
JP (2) JP4028969B2 (enExample)
KR (1) KR100592576B1 (enExample)
DE (1) DE60129377T2 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6756751B2 (en) * 2002-02-15 2004-06-29 Active Precision, Inc. Multiple degree of freedom substrate manipulator
US6753945B2 (en) * 2002-03-01 2004-06-22 Asml Netherlands B.V. Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method
JP3746242B2 (ja) 2002-03-08 2006-02-15 ファナック株式会社 層流空気静圧軸受
JP2004063653A (ja) * 2002-07-26 2004-02-26 Nikon Corp 防振装置、ステージ装置及び露光装置
JP4175086B2 (ja) * 2002-10-29 2008-11-05 日本電気株式会社 検査用ウエハ支持装置及び検査用ウエハ支持方法
EP1688988A1 (en) * 2003-11-17 2006-08-09 Nikon Corporation Stage drive method, stage apparatus, and exposure apparatus
WO2005093792A1 (ja) * 2004-03-25 2005-10-06 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
WO2005096101A1 (ja) * 2004-03-30 2005-10-13 Pioneer Corporation 露光装置
EP1811526A4 (en) * 2004-07-23 2008-04-16 Nikon Corp HOLDING DEVICE, STAGE DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
US20060061218A1 (en) * 2004-09-21 2006-03-23 Nikon Corporation Dual force wafer table
US7462958B2 (en) * 2004-09-21 2008-12-09 Nikon Corporation Z actuator with anti-gravity
US7417714B2 (en) * 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
US7869000B2 (en) * 2004-11-02 2011-01-11 Nikon Corporation Stage assembly with lightweight fine stage and low transmissibility
JP4626753B2 (ja) * 2005-02-15 2011-02-09 株式会社ニコン ステージ装置及び露光装置
US7424846B2 (en) * 2005-04-18 2008-09-16 Nippei Toyama Corporation Pneumatically static balancer for machine tool
US7730746B1 (en) * 2005-07-14 2010-06-08 Imaging Systems Technology Apparatus to prepare discrete hollow microsphere droplets
US20070030462A1 (en) * 2005-08-03 2007-02-08 Nikon Corporation Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers
US7466396B2 (en) * 2005-10-13 2008-12-16 Nikon Corporation Lithography apparatus and method utilizing pendulum interferometer system
US20070236854A1 (en) * 2006-04-11 2007-10-11 Lee Martin E Anti-Gravity Device for Supporting Weight and Reducing Transmissibility
CN102193325B (zh) * 2010-03-19 2013-04-10 上海微电子装备有限公司 主动隔震装置的控制系统
CN102486215B (zh) * 2010-12-02 2014-02-19 上海微电子装备有限公司 一种重力补偿装置
JP5994298B2 (ja) * 2012-03-09 2016-09-21 日本精工株式会社 移動テーブル装置
WO2014004873A1 (en) * 2012-06-29 2014-01-03 Rudolph Technologies Inc. Flying sensor head
JP5541398B1 (ja) 2013-07-02 2014-07-09 日本精工株式会社 テーブル装置、及び搬送装置
KR102075686B1 (ko) * 2018-06-11 2020-02-11 세메스 주식회사 카메라 자세 추정 방법 및 기판 처리 장치

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6050921A (ja) * 1983-08-31 1985-03-22 Hitachi Ltd 上下駆動装置
US4818838A (en) * 1988-01-11 1989-04-04 The Perkin-Elmer Corporation Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems
JPH01181522A (ja) * 1988-01-12 1989-07-19 Sumitomo Heavy Ind Ltd 半導体素子製造用ｘ線露光装置
JPH0517876Y2 (enExample) * 1988-01-22 1993-05-13
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5959732A (en) * 1996-04-10 1999-09-28 Nikon Corporation Stage apparatus and a stage control method
KR100522886B1 (ko) * 1997-07-22 2005-10-19 에이에스엠엘 네델란즈 비.브이. 가스베어링을 구비한 지지장치
JPH11297616A (ja) * 1998-04-09 1999-10-29 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
TWI242113B (en) * 1998-07-17 2005-10-21 Asml Netherlands Bv Positioning device and lithographic projection apparatus comprising such a device
JP4314648B2 (ja) * 1998-08-13 2009-08-19 株式会社ニコン ステージ装置およびそれを備えた光学装置
US6351041B1 (en) * 1999-07-29 2002-02-26 Nikon Corporation Stage apparatus and inspection apparatus having stage apparatus

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