JP2013026500A5 - - Google Patents

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Publication number
JP2013026500A5
JP2013026500A5 JP2011160982A JP2011160982A JP2013026500A5 JP 2013026500 A5 JP2013026500 A5 JP 2013026500A5 JP 2011160982 A JP2011160982 A JP 2011160982A JP 2011160982 A JP2011160982 A JP 2011160982A JP 2013026500 A5 JP2013026500 A5 JP 2013026500A5
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JP
Japan
Prior art keywords
exposure apparatus
holding frame
original
space
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011160982A
Other languages
English (en)
Japanese (ja)
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JP5847474B2 (ja
JP2013026500A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011160982A priority Critical patent/JP5847474B2/ja
Priority claimed from JP2011160982A external-priority patent/JP5847474B2/ja
Priority to US13/548,362 priority patent/US9523926B2/en
Publication of JP2013026500A publication Critical patent/JP2013026500A/ja
Publication of JP2013026500A5 publication Critical patent/JP2013026500A5/ja
Application granted granted Critical
Publication of JP5847474B2 publication Critical patent/JP5847474B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011160982A 2011-07-22 2011-07-22 露光装置、それを用いたデバイスの製造方法 Expired - Fee Related JP5847474B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011160982A JP5847474B2 (ja) 2011-07-22 2011-07-22 露光装置、それを用いたデバイスの製造方法
US13/548,362 US9523926B2 (en) 2011-07-22 2012-07-13 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011160982A JP5847474B2 (ja) 2011-07-22 2011-07-22 露光装置、それを用いたデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2013026500A JP2013026500A (ja) 2013-02-04
JP2013026500A5 true JP2013026500A5 (enExample) 2014-09-04
JP5847474B2 JP5847474B2 (ja) 2016-01-20

Family

ID=47555561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011160982A Expired - Fee Related JP5847474B2 (ja) 2011-07-22 2011-07-22 露光装置、それを用いたデバイスの製造方法

Country Status (2)

Country Link
US (1) US9523926B2 (enExample)
JP (1) JP5847474B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8876290B2 (en) * 2009-07-06 2014-11-04 Wavetec Vision Systems, Inc. Objective quality metric for ocular wavefront measurements
NL2012291A (en) * 2013-02-20 2014-08-21 Asml Netherlands Bv Gas flow optimization in reticle stage environment.
JP6274246B2 (ja) * 2016-04-08 2018-02-07 株式会社デンソー 監視装置
US10527956B2 (en) 2017-03-24 2020-01-07 Nikon Corporation Temperature controlled heat transfer frame for pellicle
US10670959B2 (en) * 2017-05-10 2020-06-02 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same
NL2021333A (en) * 2017-07-28 2019-02-01 Asml Holding Nv Particle suppression systems and methods

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05188583A (ja) * 1992-01-17 1993-07-30 Fujitsu Ltd ペリクル
JPH06273922A (ja) * 1993-03-22 1994-09-30 Nippon Precision Circuits Kk マスク保護用ペリクル
JPH1126376A (ja) * 1997-07-09 1999-01-29 Canon Inc 投影露光装置およびディバイス製造方法
US6192100B1 (en) * 1999-06-18 2001-02-20 International Business Machines Corporation X-ray mask pellicles and their attachment in semiconductor manufacturing
JP2002353127A (ja) 2001-05-30 2002-12-06 Canon Inc 露光装置およびデバイス製造方法
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
JP2010045300A (ja) * 2008-08-18 2010-02-25 Canon Inc 露光装置
KR101990345B1 (ko) * 2009-10-02 2019-06-18 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 제조 방법
JP5479868B2 (ja) * 2009-12-02 2014-04-23 旭化成イーマテリアルズ株式会社 ペリクル及びその取付方法
JP5295283B2 (ja) * 2011-02-07 2013-09-18 キヤノン株式会社 露光装置及びデバイス製造方法

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