DE60129377T2 - Lithographischer Projektionsapparat mit einer Stützanordnung - Google Patents
Lithographischer Projektionsapparat mit einer Stützanordnung Download PDFInfo
- Publication number
- DE60129377T2 DE60129377T2 DE60129377T DE60129377T DE60129377T2 DE 60129377 T2 DE60129377 T2 DE 60129377T2 DE 60129377 T DE60129377 T DE 60129377T DE 60129377 T DE60129377 T DE 60129377T DE 60129377 T2 DE60129377 T2 DE 60129377T2
- Authority
- DE
- Germany
- Prior art keywords
- gas
- pressure chamber
- movable element
- mask
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 59
- 230000005855 radiation Effects 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 113
- 230000003068 static effect Effects 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 13
- 238000003860 storage Methods 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 230000005484 gravity Effects 0.000 description 7
- 238000000059 patterning Methods 0.000 description 6
- 241000219739 Lens Species 0.000 description 5
- 238000010276 construction Methods 0.000 description 5
- 238000013519 translation Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000001052 transient effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 240000004322 Lens culinaris Species 0.000 description 1
- 101001094044 Mus musculus Solute carrier family 26 member 6 Proteins 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
- F16F15/0275—Control of stiffness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Aviation & Aerospace Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Acoustics & Sound (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00304713 | 2000-06-02 | ||
| EP00304713 | 2000-06-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60129377D1 DE60129377D1 (de) | 2007-08-30 |
| DE60129377T2 true DE60129377T2 (de) | 2008-03-20 |
Family
ID=8173041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60129377T Expired - Lifetime DE60129377T2 (de) | 2000-06-02 | 2001-05-30 | Lithographischer Projektionsapparat mit einer Stützanordnung |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6473161B2 (enExample) |
| JP (2) | JP4028969B2 (enExample) |
| KR (1) | KR100592576B1 (enExample) |
| DE (1) | DE60129377T2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6756751B2 (en) * | 2002-02-15 | 2004-06-29 | Active Precision, Inc. | Multiple degree of freedom substrate manipulator |
| US6753945B2 (en) * | 2002-03-01 | 2004-06-22 | Asml Netherlands B.V. | Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method |
| JP3746242B2 (ja) | 2002-03-08 | 2006-02-15 | ファナック株式会社 | 層流空気静圧軸受 |
| JP2004063653A (ja) * | 2002-07-26 | 2004-02-26 | Nikon Corp | 防振装置、ステージ装置及び露光装置 |
| JP4175086B2 (ja) * | 2002-10-29 | 2008-11-05 | 日本電気株式会社 | 検査用ウエハ支持装置及び検査用ウエハ支持方法 |
| EP1688988A1 (en) * | 2003-11-17 | 2006-08-09 | Nikon Corporation | Stage drive method, stage apparatus, and exposure apparatus |
| WO2005093792A1 (ja) * | 2004-03-25 | 2005-10-06 | Nikon Corporation | 露光装置及び露光方法、並びにデバイス製造方法 |
| WO2005096101A1 (ja) * | 2004-03-30 | 2005-10-13 | Pioneer Corporation | 露光装置 |
| EP1811526A4 (en) * | 2004-07-23 | 2008-04-16 | Nikon Corp | HOLDING DEVICE, STAGE DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD |
| US20060061218A1 (en) * | 2004-09-21 | 2006-03-23 | Nikon Corporation | Dual force wafer table |
| US7462958B2 (en) * | 2004-09-21 | 2008-12-09 | Nikon Corporation | Z actuator with anti-gravity |
| US7417714B2 (en) * | 2004-11-02 | 2008-08-26 | Nikon Corporation | Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage |
| US7869000B2 (en) * | 2004-11-02 | 2011-01-11 | Nikon Corporation | Stage assembly with lightweight fine stage and low transmissibility |
| JP4626753B2 (ja) * | 2005-02-15 | 2011-02-09 | 株式会社ニコン | ステージ装置及び露光装置 |
| US7424846B2 (en) * | 2005-04-18 | 2008-09-16 | Nippei Toyama Corporation | Pneumatically static balancer for machine tool |
| US7730746B1 (en) * | 2005-07-14 | 2010-06-08 | Imaging Systems Technology | Apparatus to prepare discrete hollow microsphere droplets |
| US20070030462A1 (en) * | 2005-08-03 | 2007-02-08 | Nikon Corporation | Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers |
| US7466396B2 (en) * | 2005-10-13 | 2008-12-16 | Nikon Corporation | Lithography apparatus and method utilizing pendulum interferometer system |
| US20070236854A1 (en) * | 2006-04-11 | 2007-10-11 | Lee Martin E | Anti-Gravity Device for Supporting Weight and Reducing Transmissibility |
| CN102193325B (zh) * | 2010-03-19 | 2013-04-10 | 上海微电子装备有限公司 | 主动隔震装置的控制系统 |
| CN102486215B (zh) * | 2010-12-02 | 2014-02-19 | 上海微电子装备有限公司 | 一种重力补偿装置 |
| JP5994298B2 (ja) * | 2012-03-09 | 2016-09-21 | 日本精工株式会社 | 移動テーブル装置 |
| WO2014004873A1 (en) * | 2012-06-29 | 2014-01-03 | Rudolph Technologies Inc. | Flying sensor head |
| JP5541398B1 (ja) | 2013-07-02 | 2014-07-09 | 日本精工株式会社 | テーブル装置、及び搬送装置 |
| KR102075686B1 (ko) * | 2018-06-11 | 2020-02-11 | 세메스 주식회사 | 카메라 자세 추정 방법 및 기판 처리 장치 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6050921A (ja) * | 1983-08-31 | 1985-03-22 | Hitachi Ltd | 上下駆動装置 |
| US4818838A (en) * | 1988-01-11 | 1989-04-04 | The Perkin-Elmer Corporation | Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems |
| JPH01181522A (ja) * | 1988-01-12 | 1989-07-19 | Sumitomo Heavy Ind Ltd | 半導体素子製造用ｘ線露光装置 |
| JPH0517876Y2 (enExample) * | 1988-01-22 | 1993-05-13 | ||
| US5874820A (en) * | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
| US6246204B1 (en) * | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
| US5959732A (en) * | 1996-04-10 | 1999-09-28 | Nikon Corporation | Stage apparatus and a stage control method |
| KR100522886B1 (ko) * | 1997-07-22 | 2005-10-19 | 에이에스엠엘 네델란즈 비.브이. | 가스베어링을 구비한 지지장치 |
| JPH11297616A (ja) * | 1998-04-09 | 1999-10-29 | Canon Inc | ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法 |
| TWI242113B (en) * | 1998-07-17 | 2005-10-21 | Asml Netherlands Bv | Positioning device and lithographic projection apparatus comprising such a device |
| JP4314648B2 (ja) * | 1998-08-13 | 2009-08-19 | 株式会社ニコン | ステージ装置およびそれを備えた光学装置 |
| US6351041B1 (en) * | 1999-07-29 | 2002-02-26 | Nikon Corporation | Stage apparatus and inspection apparatus having stage apparatus |
-
2001
- 2001-05-30 US US09/866,913 patent/US6473161B2/en not_active Expired - Lifetime
- 2001-05-30 JP JP2001161615A patent/JP4028969B2/ja not_active Expired - Lifetime
- 2001-05-30 DE DE60129377T patent/DE60129377T2/de not_active Expired - Lifetime
- 2001-05-30 KR KR1020010030006A patent/KR100592576B1/ko not_active Expired - Fee Related
-
2006
- 2006-11-15 JP JP2006309413A patent/JP4512081B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR20010110130A (ko) | 2001-12-12 |
| DE60129377D1 (de) | 2007-08-30 |
| JP4512081B2 (ja) | 2010-07-28 |
| US6473161B2 (en) | 2002-10-29 |
| JP2002057102A (ja) | 2002-02-22 |
| US20020005939A1 (en) | 2002-01-17 |
| JP4028969B2 (ja) | 2008-01-09 |
| JP2007134729A (ja) | 2007-05-31 |
| KR100592576B1 (ko) | 2006-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |